JP2002252200A - 基板処理装置及び処理方法 - Google Patents

基板処理装置及び処理方法

Info

Publication number
JP2002252200A
JP2002252200A JP2001046355A JP2001046355A JP2002252200A JP 2002252200 A JP2002252200 A JP 2002252200A JP 2001046355 A JP2001046355 A JP 2001046355A JP 2001046355 A JP2001046355 A JP 2001046355A JP 2002252200 A JP2002252200 A JP 2002252200A
Authority
JP
Japan
Prior art keywords
substrate
processing
liquid
upward
supplying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001046355A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002252200A5 (OSRAM
Inventor
Noriya Wada
憲也 和田
Kazuto Kinoshita
和人 木下
Kazuhiko Kenmori
和彦 権守
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi Electronics Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Electronics Engineering Co Ltd filed Critical Hitachi Electronics Engineering Co Ltd
Priority to JP2001046355A priority Critical patent/JP2002252200A/ja
Publication of JP2002252200A publication Critical patent/JP2002252200A/ja
Publication of JP2002252200A5 publication Critical patent/JP2002252200A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Rollers For Roller Conveyors For Transfer (AREA)
JP2001046355A 2001-02-22 2001-02-22 基板処理装置及び処理方法 Pending JP2002252200A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001046355A JP2002252200A (ja) 2001-02-22 2001-02-22 基板処理装置及び処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001046355A JP2002252200A (ja) 2001-02-22 2001-02-22 基板処理装置及び処理方法

Publications (2)

Publication Number Publication Date
JP2002252200A true JP2002252200A (ja) 2002-09-06
JP2002252200A5 JP2002252200A5 (OSRAM) 2008-01-17

Family

ID=18907999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001046355A Pending JP2002252200A (ja) 2001-02-22 2001-02-22 基板処理装置及び処理方法

Country Status (1)

Country Link
JP (1) JP2002252200A (OSRAM)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004112106A1 (ja) * 2003-06-13 2004-12-23 Sumitomo Precision Products Co., Ltd. レジスト剥離装置
JP2005244022A (ja) * 2004-02-27 2005-09-08 Sharp Corp 液処理装置および液処理方法
JP2007005695A (ja) * 2005-06-27 2007-01-11 Tokyo Electron Ltd 基板処理装置
JP2008098227A (ja) * 2006-10-06 2008-04-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2008227195A (ja) * 2007-03-14 2008-09-25 Hitachi High-Technologies Corp 液処理装置
JP2009135508A (ja) * 2008-12-22 2009-06-18 Shibaura Mechatronics Corp 基板の処理装置
KR100964127B1 (ko) * 2008-08-11 2010-06-16 (주)에스티아이 슬라이딩 틸팅부를 구비한 평판 디스플레이의 습윤 공정 처리 장치
KR101052755B1 (ko) * 2008-11-17 2011-08-01 세메스 주식회사 기판 이송 유닛 및 이를 포함하는 기판 처리 장치
JP2018187496A (ja) * 2018-09-06 2018-11-29 株式会社アイホー 食器洗浄装置
CN114229738A (zh) * 2021-11-10 2022-03-25 国信智能系统(广东)有限公司 一种自主智能车升降平台
CN110257793B (zh) * 2019-07-04 2025-03-28 深圳市捷佳伟创新能源装备股份有限公司 倾斜运输托盘的镀膜设备

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59204238A (ja) * 1983-05-04 1984-11-19 Nec Corp 処理装置
JPS6188531A (ja) * 1984-10-05 1986-05-06 Nec Corp 集積回路装置の洗浄装置
JPH01137453U (OSRAM) * 1988-03-16 1989-09-20
JPH0817723A (ja) * 1994-06-30 1996-01-19 Dainippon Screen Mfg Co Ltd 基板表面処理装置
JPH08321536A (ja) * 1995-05-25 1996-12-03 Sharp Corp 液処理装置の基板搬送装置
JPH10296200A (ja) * 1997-04-30 1998-11-10 Shibaura Eng Works Co Ltd 超音波洗浄方法およびその洗浄装置
JPH1187210A (ja) * 1997-09-02 1999-03-30 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JPH11204489A (ja) * 1998-01-12 1999-07-30 Dainippon Screen Mfg Co Ltd 基板乾燥装置及び基板乾燥方法
JP2000246191A (ja) * 1999-02-26 2000-09-12 Canon Inc 基板表面処理装置、基板表面処理方法、表面伝導型電子源基板および画像形成装置

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59204238A (ja) * 1983-05-04 1984-11-19 Nec Corp 処理装置
JPS6188531A (ja) * 1984-10-05 1986-05-06 Nec Corp 集積回路装置の洗浄装置
JPH01137453U (OSRAM) * 1988-03-16 1989-09-20
JPH0817723A (ja) * 1994-06-30 1996-01-19 Dainippon Screen Mfg Co Ltd 基板表面処理装置
JPH08321536A (ja) * 1995-05-25 1996-12-03 Sharp Corp 液処理装置の基板搬送装置
JPH10296200A (ja) * 1997-04-30 1998-11-10 Shibaura Eng Works Co Ltd 超音波洗浄方法およびその洗浄装置
JPH1187210A (ja) * 1997-09-02 1999-03-30 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法
JPH11204489A (ja) * 1998-01-12 1999-07-30 Dainippon Screen Mfg Co Ltd 基板乾燥装置及び基板乾燥方法
JP2000246191A (ja) * 1999-02-26 2000-09-12 Canon Inc 基板表面処理装置、基板表面処理方法、表面伝導型電子源基板および画像形成装置

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004112106A1 (ja) * 2003-06-13 2004-12-23 Sumitomo Precision Products Co., Ltd. レジスト剥離装置
JP2005244022A (ja) * 2004-02-27 2005-09-08 Sharp Corp 液処理装置および液処理方法
JP2007005695A (ja) * 2005-06-27 2007-01-11 Tokyo Electron Ltd 基板処理装置
KR101194975B1 (ko) * 2005-06-27 2012-10-25 도쿄엘렉트론가부시키가이샤 기판처리장치
JP2008098227A (ja) * 2006-10-06 2008-04-24 Dainippon Screen Mfg Co Ltd 基板処理装置
JP2008227195A (ja) * 2007-03-14 2008-09-25 Hitachi High-Technologies Corp 液処理装置
KR100964127B1 (ko) * 2008-08-11 2010-06-16 (주)에스티아이 슬라이딩 틸팅부를 구비한 평판 디스플레이의 습윤 공정 처리 장치
KR101052755B1 (ko) * 2008-11-17 2011-08-01 세메스 주식회사 기판 이송 유닛 및 이를 포함하는 기판 처리 장치
JP2009135508A (ja) * 2008-12-22 2009-06-18 Shibaura Mechatronics Corp 基板の処理装置
JP2018187496A (ja) * 2018-09-06 2018-11-29 株式会社アイホー 食器洗浄装置
CN110257793B (zh) * 2019-07-04 2025-03-28 深圳市捷佳伟创新能源装备股份有限公司 倾斜运输托盘的镀膜设备
CN114229738A (zh) * 2021-11-10 2022-03-25 国信智能系统(广东)有限公司 一种自主智能车升降平台

Similar Documents

Publication Publication Date Title
JP4643684B2 (ja) 液処理装置および液処理方法
JP5877954B2 (ja) 非接触浮上搬送機能を有する基板処理装置
JP2002252200A (ja) 基板処理装置及び処理方法
CN101071761A (zh) 面板清洗设备和清洗方法
JPH07283185A (ja) 基板洗浄装置
JP3628919B2 (ja) 基板処理装置および基板処理方法
JP4079579B2 (ja) ウェット処理装置
JP4602567B2 (ja) 基板の洗浄装置
JP2001284777A (ja) 基板処理装置及び基板処理方法
JP2000254605A (ja) 可撓性基板の洗浄装置
JP2001227868A (ja) 基板乾燥装置及び乾燥方法
JP2002299403A (ja) 薄板基板の搬送装置及び搬送方法
TW535195B (en) A carrying-typed device for treating substrate
KR101149455B1 (ko) 기판의 처리 장치, 반송 장치 및 처리 방법
JP4280075B2 (ja) 基板の処理装置
TWI343842B (OSRAM)
JP2824031B2 (ja) 基板の表面処理装置
TW200824518A (en) Conveyer for surface treatment
JP3766968B2 (ja) 基板処理方法及び基板処理装置
JP2004319547A (ja) 物品の自動搬送水切り装置および自動搬送水切り方法、並びに物品の自動洗浄装置及び自動洗浄方法
JPH07204547A (ja) 薄板部材の液処理装置
TWI834399B (zh) 顯影裝置
JPH1012582A (ja) 基板洗浄装置および基板洗浄方法
JPH11216430A (ja) 洗浄装置
JP2001284310A (ja) 基板の処理装置及び処理方法

Legal Events

Date Code Title Description
A711 Notification of change in applicant

Effective date: 20060516

Free format text: JAPANESE INTERMEDIATE CODE: A712

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071126

A621 Written request for application examination

Effective date: 20071126

Free format text: JAPANESE INTERMEDIATE CODE: A621

A977 Report on retrieval

Effective date: 20091021

Free format text: JAPANESE INTERMEDIATE CODE: A971007

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091104

A521 Written amendment

Effective date: 20091228

Free format text: JAPANESE INTERMEDIATE CODE: A523

A02 Decision of refusal

Effective date: 20100428

Free format text: JAPANESE INTERMEDIATE CODE: A02