JP2001002241A5 - - Google Patents

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Publication number
JP2001002241A5
JP2001002241A5 JP1999173318A JP17331899A JP2001002241A5 JP 2001002241 A5 JP2001002241 A5 JP 2001002241A5 JP 1999173318 A JP1999173318 A JP 1999173318A JP 17331899 A JP17331899 A JP 17331899A JP 2001002241 A5 JP2001002241 A5 JP 2001002241A5
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JP
Japan
Prior art keywords
movable
transfer
unit
module
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1999173318A
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English (en)
Japanese (ja)
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JP2001002241A (ja
JP4330703B2 (ja
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Publication date
Application filed filed Critical
Priority to JP17331899A priority Critical patent/JP4330703B2/ja
Priority claimed from JP17331899A external-priority patent/JP4330703B2/ja
Priority to TW089111497A priority patent/TW483860B/zh
Priority to US09/595,930 priority patent/US6634845B1/en
Priority to KR1020000033122A priority patent/KR100756152B1/ko
Publication of JP2001002241A publication Critical patent/JP2001002241A/ja
Publication of JP2001002241A5 publication Critical patent/JP2001002241A5/ja
Application granted granted Critical
Publication of JP4330703B2 publication Critical patent/JP4330703B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP17331899A 1999-06-18 1999-06-18 搬送モジュール及びクラスターシステム Expired - Fee Related JP4330703B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP17331899A JP4330703B2 (ja) 1999-06-18 1999-06-18 搬送モジュール及びクラスターシステム
TW089111497A TW483860B (en) 1999-06-18 2000-06-13 Transfer module and clusyter system for semiconductor manufacturing process
US09/595,930 US6634845B1 (en) 1999-06-18 2000-06-16 Transfer module and cluster system for semiconductor manufacturing process
KR1020000033122A KR100756152B1 (ko) 1999-06-18 2000-06-16 반송 모듈 및 클러스터 시스템

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17331899A JP4330703B2 (ja) 1999-06-18 1999-06-18 搬送モジュール及びクラスターシステム

Publications (3)

Publication Number Publication Date
JP2001002241A JP2001002241A (ja) 2001-01-09
JP2001002241A5 true JP2001002241A5 (https=) 2005-10-27
JP4330703B2 JP4330703B2 (ja) 2009-09-16

Family

ID=15958223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17331899A Expired - Fee Related JP4330703B2 (ja) 1999-06-18 1999-06-18 搬送モジュール及びクラスターシステム

Country Status (4)

Country Link
US (1) US6634845B1 (https=)
JP (1) JP4330703B2 (https=)
KR (1) KR100756152B1 (https=)
TW (1) TW483860B (https=)

Families Citing this family (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4330703B2 (ja) * 1999-06-18 2009-09-16 東京エレクトロン株式会社 搬送モジュール及びクラスターシステム
TWI294155B (en) * 2002-06-21 2008-03-01 Applied Materials Inc Transfer chamber for vacuum processing system
US6935828B2 (en) * 2002-07-17 2005-08-30 Transfer Engineering And Manufacturing, Inc. Wafer load lock and magnetically coupled linear delivery system
US8960099B2 (en) * 2002-07-22 2015-02-24 Brooks Automation, Inc Substrate processing apparatus
US7959395B2 (en) * 2002-07-22 2011-06-14 Brooks Automation, Inc. Substrate processing apparatus
US20070183871A1 (en) * 2002-07-22 2007-08-09 Christopher Hofmeister Substrate processing apparatus
US7988398B2 (en) 2002-07-22 2011-08-02 Brooks Automation, Inc. Linear substrate transport apparatus
AU2003253689A1 (en) * 2002-07-31 2004-02-16 Tokyo Electron Limited Reduced volume, high conductance process chamber
GB0329933D0 (en) * 2003-12-24 2004-01-28 Boc Group Plc Load lock
US20050189399A1 (en) * 2004-02-26 2005-09-01 Progressive Tool & Industries, Co. Flexible body workstation for assembling workpieces
TWI298895B (en) * 2004-06-02 2008-07-11 Applied Materials Inc Electronic device manufacturing chamber and methods of forming the same
US7784164B2 (en) * 2004-06-02 2010-08-31 Applied Materials, Inc. Electronic device manufacturing chamber method
US7438175B2 (en) * 2005-06-10 2008-10-21 Applied Materials, Inc. Linear vacuum deposition system
US7469715B2 (en) 2005-07-01 2008-12-30 Applied Materials, Inc. Chamber isolation valve RF grounding
US7699957B2 (en) 2006-03-03 2010-04-20 Advanced Display Process Engineering Co., Ltd. Plasma processing apparatus
KR101020160B1 (ko) * 2006-03-03 2011-03-09 엘아이지에이디피 주식회사 플라즈마 처리장치
KR101020155B1 (ko) * 2006-03-03 2011-03-09 엘아이지에이디피 주식회사 플라즈마 처리장치
KR100920427B1 (ko) * 2006-03-03 2009-10-08 주식회사 에이디피엔지니어링 플라즈마 처리장치
US20090053017A1 (en) * 2006-03-17 2009-02-26 Shlomo Shmuelov Storage and purge system for semiconductor wafers
US8398355B2 (en) * 2006-05-26 2013-03-19 Brooks Automation, Inc. Linearly distributed semiconductor workpiece processing tool
KR20080004118A (ko) * 2006-07-04 2008-01-09 피에스케이 주식회사 기판 처리 설비
JP5283835B2 (ja) * 2006-07-06 2013-09-04 東京エレクトロン株式会社 マイクロ波プラズマ処理装置及びマイクロ波プラズマ処理装置用ゲートバルブ
US20080025821A1 (en) * 2006-07-25 2008-01-31 Applied Materials, Inc. Octagon transfer chamber
JP2008034740A (ja) * 2006-07-31 2008-02-14 Dainippon Screen Mfg Co Ltd ロードロック装置、それを備えた基板処理装置および基板処理システム
US20080025823A1 (en) * 2006-07-31 2008-01-31 Masahiko Harumoto Load lock device, and substrate processing apparatus and substrate processing system including the same
JP4781192B2 (ja) * 2006-07-31 2011-09-28 大日本スクリーン製造株式会社 ロードロック装置、それを備えた基板処理装置および基板処理システム
US20080175694A1 (en) * 2007-01-19 2008-07-24 Dong-Seok Park Unit and method for transferring substrates and apparatus and method for treating substrates with the unit
JP5125290B2 (ja) * 2007-07-27 2013-01-23 株式会社Ihi 浮上搬送装置及び処理搬送システム
CN101802996B (zh) * 2007-09-20 2012-03-28 株式会社爱发科 检测搬运装置停止的方法
JP5353107B2 (ja) * 2008-08-07 2013-11-27 シンフォニアテクノロジー株式会社 搬送装置
JP5470770B2 (ja) 2008-08-07 2014-04-16 シンフォニアテクノロジー株式会社 真空処理装置
US20100098518A1 (en) * 2008-10-20 2010-04-22 Applied Materials, Inc. In/out door for a vacuum chamber
US20100127201A1 (en) * 2008-11-21 2010-05-27 Applied Materials, Inc. Interlocking valve chamber and lid
JP5280522B2 (ja) * 2009-04-28 2013-09-04 キヤノンアネルバ株式会社 識別情報設定装置、および識別情報設定方法
JP5306908B2 (ja) * 2009-06-03 2013-10-02 東京エレクトロン株式会社 搬送モジュール
US8602706B2 (en) 2009-08-17 2013-12-10 Brooks Automation, Inc. Substrate processing apparatus
KR101124209B1 (ko) * 2010-07-26 2012-03-28 엘아이지에이디피 주식회사 플라즈마 처리장치
KR101331288B1 (ko) * 2010-08-06 2013-11-20 도쿄엘렉트론가부시키가이샤 기판 처리 시스템, 반송 모듈, 기판 처리 방법 및 반도체 소자의 제조 방법
JP2013062316A (ja) * 2011-09-12 2013-04-04 Tokyo Electron Ltd 搬送装置及びプラズマ処理システム
US9679751B2 (en) 2012-03-15 2017-06-13 Lam Research Corporation Chamber filler kit for plasma etch chamber useful for fast gas switching
US10297481B2 (en) * 2013-03-21 2019-05-21 Tokyo Electron Limited Magnetic annealing apparatus
US10037869B2 (en) * 2013-08-13 2018-07-31 Lam Research Corporation Plasma processing devices having multi-port valve assemblies
US20150047785A1 (en) * 2013-08-13 2015-02-19 Lam Research Corporation Plasma Processing Devices Having Multi-Port Valve Assemblies
JP6114668B2 (ja) * 2013-09-18 2017-04-12 東京エレクトロン株式会社 基板処理装置及び基板処理方法
US20170194181A1 (en) * 2016-01-04 2017-07-06 Micron Technology, Inc. Overhead traveling vehicle, transportation system with the same, and method of operating the same
KR101964327B1 (ko) * 2017-04-05 2019-04-01 코스텍시스템(주) 웨이퍼 이송 장치
US10784175B2 (en) 2018-03-20 2020-09-22 Tokyo Electron Limited Platform and method of operating for integrated end-to-end gate contact process
TWI733342B (zh) * 2019-03-20 2021-07-11 日商國際電氣股份有限公司 氣體供給部,基板處理裝置及半導體裝置的製造方法
DE102020212223A1 (de) * 2020-09-29 2022-03-31 Robert Bosch Gesellschaft mit beschränkter Haftung Berührungslose Beförderungsvorrichtung
KR102491101B1 (ko) * 2020-10-06 2023-01-19 세메스 주식회사 Oht 대차 견인 장치 및 이를 이용한 oht 시스템 운영 방법
JP7519923B2 (ja) * 2021-01-12 2024-07-22 東京エレクトロン株式会社 基板搬送装置、基板搬送方法、および基板処理システム
JP7679629B2 (ja) * 2021-01-25 2025-05-20 東京エレクトロン株式会社 基板の搬送を行う装置、基板を処理するシステム及び基板を処理する方法
DE102021202915A1 (de) * 2021-03-25 2022-09-29 Robert Bosch Gesellschaft mit beschränkter Haftung Berührungslose Beförderungsvorrichtung
DE102022123236A1 (de) * 2022-09-12 2024-03-14 Mafu Robotics GmbH Behandlung von Werkstücken insbesondere von Wafern
CN117810137B (zh) * 2024-03-01 2024-04-26 深圳市锐铂自动化科技有限公司 Igbt模块的自动插针机

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60162731U (ja) * 1983-11-16 1985-10-29 東京エレクトロン株式会社 セラミツク材を用いた空気軸受装置
JPS60162731A (ja) 1984-01-31 1985-08-24 Nippon Steel Corp 時効性の小さい連続焼鈍冷延鋼板の製造方法
US4624617A (en) * 1984-10-09 1986-11-25 David Belna Linear induction semiconductor wafer transportation apparatus
JPS6288528A (ja) 1985-10-15 1987-04-23 Omron Tateisi Electronics Co Xyステ−ジ
US4742286A (en) 1985-10-29 1988-05-03 Micro-Stage, Inc. Gas bearing X-Y-θ stage assembly
US4917556A (en) * 1986-04-28 1990-04-17 Varian Associates, Inc. Modular wafer transport and processing system
US4836733A (en) * 1986-04-28 1989-06-06 Varian Associates, Inc. Wafer transfer system
US4790258A (en) * 1987-04-03 1988-12-13 Tegal Corporation Magnetically coupled wafer lift pins
US5202716A (en) * 1988-02-12 1993-04-13 Tokyo Electron Limited Resist process system
US5447409A (en) * 1989-10-20 1995-09-05 Applied Materials, Inc. Robot assembly
DE69222025T2 (de) 1991-11-05 1998-02-05 Seiko Epson Corp., Tokio/Tokyo Mikro-roboter
JP2598353B2 (ja) * 1991-12-04 1997-04-09 アネルバ株式会社 基板処理装置、基板搬送装置及び基板交換方法
WO1993024343A1 (fr) 1992-05-22 1993-12-09 Daifuku Co., Ltd. Appareil permettant de fournir, sans contact du courant electrique a un objet mobile
JPH05336613A (ja) * 1992-05-29 1993-12-17 Ntn Corp 超電導スライダの起動方法
JPH0649529A (ja) 1992-07-29 1994-02-22 Kawasaki Steel Corp 溶鋼の脱炭・脱ガス方法
US5417537A (en) * 1993-05-07 1995-05-23 Miller; Kenneth C. Wafer transport device
JPH07211762A (ja) * 1994-01-13 1995-08-11 Hitachi Ltd ウエハ搬送処理装置
US5793184A (en) 1994-04-20 1998-08-11 Opcon, Ltd. Solar power supply unit for battery operated devices
JPH09283467A (ja) * 1996-04-18 1997-10-31 Mitsubishi Electric Corp 半導体装置の製造方法
US5855681A (en) * 1996-11-18 1999-01-05 Applied Materials, Inc. Ultra high throughput wafer vacuum processing system
US5838121A (en) 1996-11-18 1998-11-17 Applied Materials, Inc. Dual blade robot
JPH1126550A (ja) * 1997-07-04 1999-01-29 Tokyo Electron Ltd 基板搬送装置およびそれを用いた基板処理装置
JPH11103531A (ja) 1997-09-29 1999-04-13 Nec Mori Energy Kk 非接触充電装置
KR100265287B1 (ko) * 1998-04-21 2000-10-02 윤종용 반도체소자 제조용 식각설비의 멀티챔버 시스템
JP4354039B2 (ja) 1999-04-02 2009-10-28 東京エレクトロン株式会社 駆動装置
JP4330703B2 (ja) * 1999-06-18 2009-09-16 東京エレクトロン株式会社 搬送モジュール及びクラスターシステム

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