IL152497A0 - Etching pastes for inorganic surfaces - Google Patents
Etching pastes for inorganic surfacesInfo
- Publication number
- IL152497A0 IL152497A0 IL15249701A IL15249701A IL152497A0 IL 152497 A0 IL152497 A0 IL 152497A0 IL 15249701 A IL15249701 A IL 15249701A IL 15249701 A IL15249701 A IL 15249701A IL 152497 A0 IL152497 A0 IL 152497A0
- Authority
- IL
- Israel
- Prior art keywords
- inorganic surfaces
- etching pastes
- pastes
- etching
- inorganic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Weting (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10020817 | 2000-04-28 | ||
DE10101926A DE10101926A1 (de) | 2000-04-28 | 2001-01-16 | Ätzpasten für anorganische Oberflächen |
PCT/EP2001/003317 WO2001083391A1 (de) | 2000-04-28 | 2001-03-23 | Ätzpasten für anorganische oberflächen |
Publications (1)
Publication Number | Publication Date |
---|---|
IL152497A0 true IL152497A0 (en) | 2003-05-29 |
Family
ID=26005499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL15249701A IL152497A0 (en) | 2000-04-28 | 2001-03-23 | Etching pastes for inorganic surfaces |
Country Status (14)
Country | Link |
---|---|
US (1) | US20030160026A1 (zh) |
EP (1) | EP1276701B1 (zh) |
JP (1) | JP2003531807A (zh) |
KR (1) | KR100812891B1 (zh) |
CN (1) | CN100343189C (zh) |
AU (2) | AU4251001A (zh) |
CA (1) | CA2407530C (zh) |
HK (1) | HK1053295A1 (zh) |
IL (1) | IL152497A0 (zh) |
MX (1) | MXPA02010634A (zh) |
PL (1) | PL207872B1 (zh) |
RU (1) | RU2274615C2 (zh) |
TW (1) | TWI243801B (zh) |
WO (1) | WO2001083391A1 (zh) |
Families Citing this family (78)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10150040A1 (de) | 2001-10-10 | 2003-04-17 | Merck Patent Gmbh | Kombinierte Ätz- und Dotiermedien |
WO2003047005A2 (en) | 2001-11-26 | 2003-06-05 | Shell Solar Gmbh | Manufacturing a solar cell with backside contacts |
EP1378947A1 (en) * | 2002-07-01 | 2004-01-07 | Interuniversitair Microelektronica Centrum Vzw | Semiconductor etching paste and the use thereof for localised etching of semiconductor substrates |
DE10239656A1 (de) * | 2002-08-26 | 2004-03-11 | Merck Patent Gmbh | Ätzpasten für Titanoxid-Oberflächen |
DE10241300A1 (de) * | 2002-09-04 | 2004-03-18 | Merck Patent Gmbh | Ätzpasten für Siliziumoberflächen und -schichten |
TWI282814B (en) * | 2002-09-13 | 2007-06-21 | Daikin Ind Ltd | Etchant and etching method |
KR20040042243A (ko) * | 2002-11-13 | 2004-05-20 | 박진국 | 유리표면의 반투명 처리용 부식액조성물과 이를 이용한저반사처리방법 |
US7388147B2 (en) * | 2003-04-10 | 2008-06-17 | Sunpower Corporation | Metal contact structure for solar cell and method of manufacture |
US7339110B1 (en) | 2003-04-10 | 2008-03-04 | Sunpower Corporation | Solar cell and method of manufacture |
JP4549655B2 (ja) * | 2003-11-18 | 2010-09-22 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング | 機能性塗料 |
KR100619449B1 (ko) * | 2004-07-10 | 2006-09-13 | 테크노세미켐 주식회사 | 박막트랜지스터 형성용 모든 전극을 위한 통합 식각액조성물 |
MXGT04000020A (es) * | 2004-12-10 | 2005-06-07 | Luis Rendon Granados Juan | Proceso quimico para satinado - mateado total o parcial de vidrio por inmersion en solucion acida para produccion simultanea y continua de una o varias piezas y/o laminas de vidrio de dimensiones estandares y variables. |
US20060151434A1 (en) * | 2005-01-07 | 2006-07-13 | The Boc Group, Inc. | Selective surface texturing through the use of random application of thixotropic etching agents |
DE102005007743A1 (de) * | 2005-01-11 | 2006-07-20 | Merck Patent Gmbh | Druckfähiges Medium zur Ätzung von Siliziumdioxid- und Siliziumnitridschichten |
DE102005031469A1 (de) * | 2005-07-04 | 2007-01-11 | Merck Patent Gmbh | Medium zur Ätzung von oxidischen, transparenten, leitfähigen Schichten |
DE102005032807A1 (de) * | 2005-07-12 | 2007-01-18 | Merck Patent Gmbh | Kombinierte Ätz- und Dotiermedien für Siliziumdioxidschichten und darunter liegendes Silizium |
DE102005033724A1 (de) * | 2005-07-15 | 2007-01-18 | Merck Patent Gmbh | Druckfähige Ätzmedien für Siliziumdioxid-und Siliziumnitridschichten |
DE102005035255A1 (de) * | 2005-07-25 | 2007-02-01 | Merck Patent Gmbh | Ätzmedien für oxidische, transparente, leitfähige Schichten |
DE102005037335B4 (de) * | 2005-08-04 | 2008-12-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Rückstandsfrei abnehmbares Beizmittel |
KR101188425B1 (ko) * | 2005-08-24 | 2012-10-05 | 엘지디스플레이 주식회사 | 식각 테이프 및 이를 이용한 액정 표시 장치용 어레이기판의 제조 방법 |
JP4657068B2 (ja) * | 2005-09-22 | 2011-03-23 | シャープ株式会社 | 裏面接合型太陽電池の製造方法 |
DE102006047579A1 (de) * | 2006-10-05 | 2008-04-17 | Institut Für Solarenergieforschung Gmbh | Verfahren zur Herstellung von Solarzellen mit durch eine Ätzlösung lokal strukturierten Oberflächen |
DE102006051735A1 (de) | 2006-10-30 | 2008-05-08 | Merck Patent Gmbh | Druckfähiges Medium zur Ätzung von oxidischen, transparenten, leitfähigen Schichten |
DE102006051952A1 (de) * | 2006-11-01 | 2008-05-08 | Merck Patent Gmbh | Partikelhaltige Ätzpasten für Siliziumoberflächen und -schichten |
TW201418875A (zh) * | 2006-12-05 | 2014-05-16 | Nano Terra Inc | 用於圖案化表面的方法 |
US8608972B2 (en) * | 2006-12-05 | 2013-12-17 | Nano Terra Inc. | Method for patterning a surface |
JP2008186927A (ja) * | 2007-01-29 | 2008-08-14 | Sharp Corp | 裏面接合型太陽電池とその製造方法 |
JP5226255B2 (ja) * | 2007-07-13 | 2013-07-03 | シャープ株式会社 | 太陽電池の製造方法 |
EP2207756B1 (en) * | 2007-09-24 | 2017-12-06 | Dip Tech. Ltd. | Liquid etching composition and etching method for drop on demand inkjet printing |
JP4947654B2 (ja) * | 2007-09-28 | 2012-06-06 | シャープ株式会社 | 誘電体膜のパターニング方法 |
US20090092745A1 (en) * | 2007-10-05 | 2009-04-09 | Luca Pavani | Dopant material for manufacturing solar cells |
WO2009067483A1 (en) * | 2007-11-19 | 2009-05-28 | Applied Materials, Inc. | Solar cell contact formation process using a patterned etchant material |
WO2009067475A1 (en) * | 2007-11-19 | 2009-05-28 | Applied Materials, Inc. | Crystalline solar cell metallization methods |
JP4410312B2 (ja) * | 2007-12-20 | 2010-02-03 | 株式会社テオス | 増粘エッチング塗布液を用いた太陽電池用太陽光発電素子基板の選択エッチング方法 |
JP5242703B2 (ja) * | 2008-02-01 | 2013-07-24 | ニューサウス・イノベーションズ・ピーティーワイ・リミテッド | 選択された材料のパターン化されたエッチング法 |
CN101981227B (zh) | 2008-03-26 | 2013-08-21 | 默克专利有限公司 | 制造半导体器件的方法 |
WO2010022849A2 (de) * | 2008-09-01 | 2010-03-04 | Merck Patent Gmbh | Randentschichtung von dünnschicht-solar-modulen mittels ätzen |
GB0820126D0 (en) * | 2008-11-04 | 2008-12-10 | Conductive Inkjet Technology Ltd | Inkjet ink |
KR101000556B1 (ko) | 2008-12-23 | 2010-12-14 | 주식회사 효성 | 태양전지 및 그 제조방법 |
CN102449112B (zh) * | 2009-06-04 | 2014-09-24 | 默克专利股份有限公司 | 双组分蚀刻 |
KR20120093313A (ko) * | 2009-10-30 | 2012-08-22 | 메르크 파텐트 게엠베하 | 선택적 에미터를 갖는 태양 전지들의 제조 방법 |
CN102088042A (zh) * | 2009-12-02 | 2011-06-08 | 上海交大泰阳绿色能源有限公司 | 一种高效率晶体硅太阳能电池用浆料的制备方法和浆料 |
US8524524B2 (en) * | 2010-04-22 | 2013-09-03 | General Electric Company | Methods for forming back contact electrodes for cadmium telluride photovoltaic cells |
SG186343A1 (en) * | 2010-06-14 | 2013-01-30 | Merck Patent Gmbh | Cross-linking and multi-phase etch pastes for high resolution feature patterning |
CN103154081B (zh) * | 2010-08-06 | 2015-11-25 | 普罗米鲁斯有限责任公司 | 用于微电子组装件的聚合物组合物 |
US8393707B2 (en) | 2010-08-24 | 2013-03-12 | Sunpower Corporation | Apparatuses and methods for removal of ink buildup |
RU2571167C2 (ru) | 2010-12-06 | 2015-12-20 | Син-Эцу Кемикал Ко., Лтд. | Солнечный элемент и модуль солнечного элемента |
RU2571444C2 (ru) | 2010-12-06 | 2015-12-20 | Син-Эцу Кемикал Ко., Лтд. | Солнечный элемент и модуль солнечного элемента |
US20140021400A1 (en) * | 2010-12-15 | 2014-01-23 | Sun Chemical Corporation | Printable etchant compositions for etching silver nanoware-based transparent, conductive film |
KR20120067198A (ko) * | 2010-12-15 | 2012-06-25 | 제일모직주식회사 | 에칭 페이스트, 그 제조방법 및 이를 이용한 패턴 형성방법 |
JP2011124603A (ja) * | 2011-02-09 | 2011-06-23 | Sharp Corp | 裏面接合型太陽電池の製造方法 |
CN102775071A (zh) * | 2011-05-09 | 2012-11-14 | 代芳 | 一种表面粗化的玻璃纤维制造技术 |
US20140166613A1 (en) * | 2011-07-18 | 2014-06-19 | Merck Patent Gmbh | Structuring of antistatic and antireflection coatings and of corresponding stacked layers |
CN102955596B (zh) * | 2011-08-20 | 2016-04-06 | 宸鸿科技(厦门)有限公司 | 保护层处理方法及其装置 |
CN104603077B (zh) | 2012-05-10 | 2019-01-29 | 康宁股份有限公司 | 玻璃蚀刻介质和方法 |
CN102800380A (zh) * | 2012-08-21 | 2012-11-28 | 海南汉能光伏有限公司 | 浆料及其制备方法、太阳能电池边缘膜层的去除方法 |
JP5888202B2 (ja) * | 2012-10-16 | 2016-03-16 | 日立化成株式会社 | 液状組成物 |
MY170453A (en) * | 2012-10-16 | 2019-08-01 | Hitachi Chemical Co Ltd | Etching material |
WO2014070869A1 (en) * | 2012-11-02 | 2014-05-08 | Corning Incorporated | Methods to texture opaque, colored and translucent materials |
KR20140086669A (ko) * | 2012-12-28 | 2014-07-08 | 동우 화인켐 주식회사 | 금속 산화물막의 식각액 조성물 |
KR101536001B1 (ko) * | 2014-04-30 | 2015-07-13 | 주식회사 지앤티 | 반투명 또는 불투명 유리 제조방법 |
CN104150782A (zh) * | 2014-07-18 | 2014-11-19 | 张家港市德力特新材料有限公司 | 一种显示屏用玻璃的制备方法 |
TWI546371B (zh) * | 2014-11-10 | 2016-08-21 | 盟智科技股份有限公司 | 研磨組成物 |
JP2016086187A (ja) * | 2016-02-01 | 2016-05-19 | 日立化成株式会社 | SiN膜の除去方法 |
CN106242307A (zh) * | 2016-08-11 | 2016-12-21 | 京东方科技集团股份有限公司 | 用于强化制品的边缘的方法、玻璃及显示装置 |
CN106587649B (zh) * | 2016-12-31 | 2019-03-22 | 深圳迈辽技术转移中心有限公司 | Tft玻璃基板薄化工艺预处理剂 |
CN106630658B (zh) * | 2016-12-31 | 2018-11-20 | 江苏来德福汽车部件有限公司 | 液晶显示屏玻璃基板薄化工艺预处理组合物 |
US10632783B1 (en) | 2017-04-25 | 2020-04-28 | Ysidro C. Chacon | Method for adhering embellishments to a glass substrate |
US11186771B2 (en) * | 2017-06-05 | 2021-11-30 | Versum Materials Us, Llc | Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device |
US10870799B2 (en) * | 2017-08-25 | 2020-12-22 | Versum Materials Us, Llc | Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor device |
US11142830B2 (en) | 2019-02-08 | 2021-10-12 | The Boeing Company | Method of surface micro-texturing with a subtractive agent |
US11136673B2 (en) | 2019-02-08 | 2021-10-05 | The Boeing Company | Method of surface micro-texturing with a subtractive agent |
CN114620939B (zh) * | 2020-12-09 | 2023-03-14 | Oppo广东移动通信有限公司 | 壳体组件及其制备方法和电子设备 |
CN116040952B (zh) * | 2021-10-28 | 2024-06-18 | 比亚迪股份有限公司 | 玻璃刻蚀液、具有晶耀图案的玻璃及其生产方法 |
CN116040949B (zh) * | 2021-10-28 | 2024-06-18 | 比亚迪股份有限公司 | 一种玻璃刻蚀液、具有螺母图案的玻璃及其生产方法 |
CN115124249B (zh) * | 2022-01-20 | 2024-01-23 | 佛山犀马精细化工有限公司 | 一种玻璃基材萤石状抗指纹印及闪光效果蚀刻成型工艺 |
WO2024127794A1 (ja) * | 2022-12-13 | 2024-06-20 | 株式会社ダイセル | 表面処理剤、及びエッチングされたシリコン基板の製造方法 |
CN115881969B (zh) * | 2023-02-07 | 2023-05-16 | 四川大学 | 一种硼氮掺杂多孔碳基负极活性材料及其制备方法与应用 |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US283423A (en) * | 1883-08-21 | Bekgke | ||
US1470772A (en) * | 1922-08-21 | 1923-10-16 | Henry L Greenbaum | Paste for etching glass |
US2067925A (en) * | 1934-03-07 | 1937-01-19 | Clayton-Kennedy Nance | Composition for etching and etching transfers |
US2903345A (en) * | 1957-11-15 | 1959-09-08 | American Cyanamid Co | Etching of barium glass |
US3810784A (en) * | 1969-10-09 | 1974-05-14 | Owens Corning Fiberglass Corp | Reversible shear thinning gel coated glass fiber strand |
DE2557079C2 (de) * | 1975-12-18 | 1984-05-24 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zum Herstellen einer Maskierungsschicht |
US4097309A (en) * | 1977-01-31 | 1978-06-27 | The Boeing Company | Thermally isolated solar cell construction |
DE2929589A1 (de) * | 1979-07-04 | 1981-01-22 | Bbc Brown Boveri & Cie | Verfahren zur herstellung eines optisch transparenten und elektrisch leitfaehigen filmmusters |
DD153360A1 (de) * | 1980-10-01 | 1982-01-06 | Heinz Schicht | Mattierungspaste fuer glas |
US4376673A (en) * | 1981-02-19 | 1983-03-15 | Pennwalt Corporation | Method for etching dental porcelain |
JPS5888142A (ja) * | 1981-11-20 | 1983-05-26 | Nissha Printing Co Ltd | 高温用ガラス腐触剤並びにそれを用いたガラスの腐触方法 |
JPS5888143A (ja) * | 1981-11-20 | 1983-05-26 | Nissha Printing Co Ltd | 凹凸表面を有する着色ガラス製品の製造方法 |
US4578407A (en) * | 1982-03-31 | 1986-03-25 | Gaf Corporation | Thixotropic rust removal coating and process |
US4781792A (en) * | 1985-05-07 | 1988-11-01 | Hogan James V | Method for permanently marking glass |
DE3601834A1 (de) * | 1986-01-20 | 1987-07-23 | Schering Ag | Verfahren zur haftfesten metallisierung von keramischen materialien |
US4761244A (en) * | 1987-01-27 | 1988-08-02 | Olin Corporation | Etching solutions containing ammonium fluoride and an alkyl polyaccharide surfactant |
DE3725346A1 (de) * | 1987-07-30 | 1989-02-09 | Nukem Gmbh | Verfahren zur wiederverwendung von silizium-basismaterial einer metall-isolator-halbleiter-(mis)-inversionsschicht-solarzelle |
US4921626A (en) * | 1989-08-23 | 1990-05-01 | Automark Corporation | Glass etching composition and method of making |
JP2890988B2 (ja) * | 1992-08-17 | 1999-05-17 | 日立化成工業株式会社 | 剥離用組成物及び剥離方法 |
US6084175A (en) * | 1993-05-20 | 2000-07-04 | Amoco/Enron Solar | Front contact trenches for polycrystalline photovoltaic devices and semi-conductor devices with buried contacts |
US6552414B1 (en) * | 1996-12-24 | 2003-04-22 | Imec Vzw | Semiconductor device with selectively diffused regions |
WO1998030652A1 (en) * | 1997-01-09 | 1998-07-16 | Henkel Corporation | Acid deoxidizing/etching composition and process suitable for vertical aluminum surfaces |
US5965465A (en) * | 1997-09-18 | 1999-10-12 | International Business Machines Corporation | Etching of silicon nitride |
US6670281B2 (en) * | 1998-12-30 | 2003-12-30 | Honeywell International Inc. | HF etching and oxide scale removal |
US6337029B1 (en) * | 1999-01-21 | 2002-01-08 | Xim Products | Method and composition for etching glass ceramic and porcelain surfaces |
DE19910816A1 (de) * | 1999-03-11 | 2000-10-05 | Merck Patent Gmbh | Dotierpasten zur Erzeugung von p,p+ und n,n+ Bereichen in Halbleitern |
JP3626100B2 (ja) * | 1999-04-27 | 2005-03-02 | 博 三輪 | ガラスエッチング組成物およびこれを用いたガラス表面のフロスト加工法 |
-
2001
- 2001-03-23 CN CNB018087086A patent/CN100343189C/zh not_active Expired - Fee Related
- 2001-03-23 RU RU2002130248/03A patent/RU2274615C2/ru not_active IP Right Cessation
- 2001-03-23 PL PL358687A patent/PL207872B1/pl unknown
- 2001-03-23 EP EP01915409A patent/EP1276701B1/de not_active Expired - Lifetime
- 2001-03-23 IL IL15249701A patent/IL152497A0/xx unknown
- 2001-03-23 KR KR1020027014508A patent/KR100812891B1/ko not_active IP Right Cessation
- 2001-03-23 US US10/258,747 patent/US20030160026A1/en not_active Abandoned
- 2001-03-23 WO PCT/EP2001/003317 patent/WO2001083391A1/de active Application Filing
- 2001-03-23 AU AU4251001A patent/AU4251001A/xx active Pending
- 2001-03-23 AU AU2001242510A patent/AU2001242510B2/en not_active Ceased
- 2001-03-23 CA CA2407530A patent/CA2407530C/en not_active Expired - Fee Related
- 2001-03-23 JP JP2001580827A patent/JP2003531807A/ja active Pending
- 2001-03-23 MX MXPA02010634A patent/MXPA02010634A/es active IP Right Grant
- 2001-04-20 TW TW090109529A patent/TWI243801B/zh not_active IP Right Cessation
-
2003
- 2003-08-01 HK HK03105546A patent/HK1053295A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
AU4251001A (en) | 2001-11-12 |
PL358687A1 (en) | 2004-08-09 |
WO2001083391A1 (de) | 2001-11-08 |
CA2407530A1 (en) | 2002-10-25 |
AU2001242510B2 (en) | 2006-02-23 |
TWI243801B (en) | 2005-11-21 |
US20030160026A1 (en) | 2003-08-28 |
RU2274615C2 (ru) | 2006-04-20 |
RU2002130248A (ru) | 2004-03-20 |
EP1276701B1 (de) | 2012-12-05 |
EP1276701A1 (de) | 2003-01-22 |
KR20030004377A (ko) | 2003-01-14 |
PL207872B1 (pl) | 2011-02-28 |
CN100343189C (zh) | 2007-10-17 |
MXPA02010634A (es) | 2003-03-10 |
JP2003531807A (ja) | 2003-10-28 |
HK1053295A1 (en) | 2003-10-17 |
CA2407530C (en) | 2010-05-11 |
CN1426381A (zh) | 2003-06-25 |
KR100812891B1 (ko) | 2008-03-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
IL152497A0 (en) | Etching pastes for inorganic surfaces | |
AU2001242510A1 (en) | Etching pastes for inorganic surfaces | |
GB0011749D0 (en) | Light-eminating devices | |
GB0015716D0 (en) | Devices | |
GB0025342D0 (en) | Etching process | |
GB2362119B (en) | Chuck | |
AU143396S (en) | Robot | |
GB2365427B (en) | Surfactant | |
AU9374801A (en) | Devices | |
GB0115878D0 (en) | Etching method | |
AU145174S (en) | Flush fin | |
TW418747U (en) | Wrench | |
GB0022441D0 (en) | Cartons | |
GB2369445B (en) | Component measures | |
GB2365849B (en) | Cartons | |
GB0017133D0 (en) | Cartons | |
GB0031595D0 (en) | Inspection technique | |
GB0029794D0 (en) | Semiconductor etching | |
AU140755S (en) | Profile substrate | |
GB0017493D0 (en) | Flat wafer | |
GB0027935D0 (en) | Spacemate/roommate | |
GB0016629D0 (en) | Jointing wafers | |
GB2360969B (en) | Tool | |
PL344875A1 (en) | Chuck | |
GB0014121D0 (en) | Zero compliance force transducer-2 |