AU2001242510A1 - Etching pastes for inorganic surfaces - Google Patents

Etching pastes for inorganic surfaces

Info

Publication number
AU2001242510A1
AU2001242510A1 AU2001242510A AU2001242510A AU2001242510A1 AU 2001242510 A1 AU2001242510 A1 AU 2001242510A1 AU 2001242510 A AU2001242510 A AU 2001242510A AU 2001242510 A AU2001242510 A AU 2001242510A AU 2001242510 A1 AU2001242510 A1 AU 2001242510A1
Authority
AU
Australia
Prior art keywords
inorganic surfaces
etching pastes
pastes
etching
inorganic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
AU2001242510A
Other versions
AU2001242510B2 (en
Inventor
Lilia Heider
Sylke Klein
Armin Kubelbeck
Werner Stockum
Claudia Zielinski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Merck Patent GmbH
Original Assignee
Merck Patent GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10101926A external-priority patent/DE10101926A1/en
Application filed by Merck Patent GmbH filed Critical Merck Patent GmbH
Priority claimed from PCT/EP2001/003317 external-priority patent/WO2001083391A1/en
Publication of AU2001242510A1 publication Critical patent/AU2001242510A1/en
Application granted granted Critical
Publication of AU2001242510B2 publication Critical patent/AU2001242510B2/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

AU2001242510A 2000-04-28 2001-03-23 Etching pastes for inorganic surfaces Ceased AU2001242510B2 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE10020817 2000-04-28
DE10020817.7 2000-04-28
DE10101926.2 2001-01-16
DE10101926A DE10101926A1 (en) 2000-04-28 2001-01-16 Etching pastes for inorganic surfaces
PCT/EP2001/003317 WO2001083391A1 (en) 2000-04-28 2001-03-23 Etching pastes for inorganic surfaces

Publications (2)

Publication Number Publication Date
AU2001242510A1 true AU2001242510A1 (en) 2002-01-31
AU2001242510B2 AU2001242510B2 (en) 2006-02-23

Family

ID=26005499

Family Applications (2)

Application Number Title Priority Date Filing Date
AU4251001A Pending AU4251001A (en) 2000-04-28 2001-03-23 Etching pastes for inorganic surfaces
AU2001242510A Ceased AU2001242510B2 (en) 2000-04-28 2001-03-23 Etching pastes for inorganic surfaces

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AU4251001A Pending AU4251001A (en) 2000-04-28 2001-03-23 Etching pastes for inorganic surfaces

Country Status (14)

Country Link
US (1) US20030160026A1 (en)
EP (1) EP1276701B1 (en)
JP (1) JP2003531807A (en)
KR (1) KR100812891B1 (en)
CN (1) CN100343189C (en)
AU (2) AU4251001A (en)
CA (1) CA2407530C (en)
HK (1) HK1053295A1 (en)
IL (1) IL152497A0 (en)
MX (1) MXPA02010634A (en)
PL (1) PL207872B1 (en)
RU (1) RU2274615C2 (en)
TW (1) TWI243801B (en)
WO (1) WO2001083391A1 (en)

Families Citing this family (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10150040A1 (en) 2001-10-10 2003-04-17 Merck Patent Gmbh Etching passivating and antireflection layers made from silicon nitride on solar cells comprises applying a phosphoric acid and/or etching medium containing a salt of phosphoric acid the surface regions to be etched
JP2005510885A (en) 2001-11-26 2005-04-21 シェル・ゾラール・ゲーエムベーハー Manufacture of solar cells with back contacts
EP1378947A1 (en) * 2002-07-01 2004-01-07 Interuniversitair Microelektronica Centrum Vzw Semiconductor etching paste and the use thereof for localised etching of semiconductor substrates
DE10239656A1 (en) * 2002-08-26 2004-03-11 Merck Patent Gmbh Etching pastes for titanium oxide surfaces
DE10241300A1 (en) * 2002-09-04 2004-03-18 Merck Patent Gmbh Etching for silicon surfaces and layers, used in photovoltaic, semiconductor and high power electronics technology, for producing photodiode, circuit, electronic device or solar cell, is thickened alkaline liquid
TWI282814B (en) * 2002-09-13 2007-06-21 Daikin Ind Ltd Etchant and etching method
KR20040042243A (en) * 2002-11-13 2004-05-20 박진국 Semitransparent processing erosion solution of external glass and low reflection processing
US7339110B1 (en) 2003-04-10 2008-03-04 Sunpower Corporation Solar cell and method of manufacture
US7388147B2 (en) * 2003-04-10 2008-06-17 Sunpower Corporation Metal contact structure for solar cell and method of manufacture
JP4549655B2 (en) * 2003-11-18 2010-09-22 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツング Functional paint
KR100619449B1 (en) * 2004-07-10 2006-09-13 테크노세미켐 주식회사 Etchant composition for all the electrodes of TFT in FPD
MXGT04000020A (en) * 2004-12-10 2005-06-07 Luis Rendon Granados Juan Chemical process for a satin-partial or complete unpolished glass by immersion in an acid solution for simultaneously and continuously producing one or several pieces and/or sheets of glass, the same having standard and variable dimensions.
US20060151434A1 (en) * 2005-01-07 2006-07-13 The Boc Group, Inc. Selective surface texturing through the use of random application of thixotropic etching agents
DE102005007743A1 (en) * 2005-01-11 2006-07-20 Merck Patent Gmbh Printable medium for the etching of silicon dioxide and silicon nitride layers
DE102005031469A1 (en) * 2005-07-04 2007-01-11 Merck Patent Gmbh Medium for the etching of oxidic, transparent, conductive layers
DE102005032807A1 (en) * 2005-07-12 2007-01-18 Merck Patent Gmbh Combined etching and doping media for silicon dioxide layers and underlying silicon
DE102005033724A1 (en) * 2005-07-15 2007-01-18 Merck Patent Gmbh Printable etching media for silicon dioxide and silicon nitride layers
DE102005035255A1 (en) 2005-07-25 2007-02-01 Merck Patent Gmbh Etching media for oxide, transparent, conductive layers
DE102005037335B4 (en) * 2005-08-04 2008-12-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Residue-free removable pickling agent
KR101188425B1 (en) * 2005-08-24 2012-10-05 엘지디스플레이 주식회사 Etching tape and method for fabricating array substrate of liquid crystal display using the etching tape
JP4657068B2 (en) * 2005-09-22 2011-03-23 シャープ株式会社 Manufacturing method of back junction solar cell
DE102006047579A1 (en) * 2006-10-05 2008-04-17 Institut Für Solarenergieforschung Gmbh Solar cell manufacturing method for conversion of light into electrical energy, involves etching surface of solar cell substrate by etching solution during etching time, and removing etching solution from surface of substrate
DE102006051735A1 (en) 2006-10-30 2008-05-08 Merck Patent Gmbh Printable medium for the etching of oxidic, transparent, conductive layers
DE102006051952A1 (en) * 2006-11-01 2008-05-08 Merck Patent Gmbh Particle-containing etching pastes for silicon surfaces and layers
KR20090107494A (en) * 2006-12-05 2009-10-13 나노 테라 인코포레이티드 Method for patterning a surface
US8608972B2 (en) * 2006-12-05 2013-12-17 Nano Terra Inc. Method for patterning a surface
JP2008186927A (en) * 2007-01-29 2008-08-14 Sharp Corp Back face junction solar battery and manufacturing method therefor
JP5226255B2 (en) * 2007-07-13 2013-07-03 シャープ株式会社 Manufacturing method of solar cell
US8894872B2 (en) * 2007-09-24 2014-11-25 Dip Tech Ltd. Etching compositions, methods and printing components
JP4947654B2 (en) * 2007-09-28 2012-06-06 シャープ株式会社 Dielectric film patterning method
US20090092745A1 (en) * 2007-10-05 2009-04-09 Luca Pavani Dopant material for manufacturing solar cells
WO2009067475A1 (en) * 2007-11-19 2009-05-28 Applied Materials, Inc. Crystalline solar cell metallization methods
CN101889348B (en) * 2007-11-19 2013-03-27 应用材料公司 Solar cell contact formation process using a patterned etchant material
EP2224471A4 (en) * 2007-12-20 2013-01-09 Teoss Co Ltd Thickened etching coating liquid, and method for selectively etching sunlight power generation element substrate for solar cell using the thickened etching coating liquid
CN101990705A (en) * 2008-02-01 2011-03-23 新南部创新有限公司 Method for patterned etching of selected material
EP2291549A2 (en) 2008-03-26 2011-03-09 Merck Patent GmbH Composition for manufacturing sio2 resist layers and method of its use
US8497215B2 (en) * 2008-09-01 2013-07-30 Merck Patent Gmbh Edge deletion of thin-layer solar modules by etching
GB0820126D0 (en) * 2008-11-04 2008-12-10 Conductive Inkjet Technology Ltd Inkjet ink
KR101000556B1 (en) 2008-12-23 2010-12-14 주식회사 효성 Solar Cell and Method for manufacturing thereof
EP2438140A1 (en) * 2009-06-04 2012-04-11 Merck Patent GmbH Two component etching
US8723340B2 (en) * 2009-10-30 2014-05-13 Merck Patent Gmbh Process for the production of solar cells comprising a selective emitter
CN102088042A (en) * 2009-12-02 2011-06-08 上海交大泰阳绿色能源有限公司 Preparation method of slurry for high-efficiency crystalline silica solar cell and slurry
US8524524B2 (en) * 2010-04-22 2013-09-03 General Electric Company Methods for forming back contact electrodes for cadmium telluride photovoltaic cells
CN102939356A (en) * 2010-06-14 2013-02-20 默克专利有限公司 Cross-linking etch paste for high resolution feature patterning
WO2012019092A1 (en) * 2010-08-06 2012-02-09 Promerus Llc Polymer composition for microelectronic assembly
US8393707B2 (en) 2010-08-24 2013-03-12 Sunpower Corporation Apparatuses and methods for removal of ink buildup
CN103329279B (en) 2010-12-06 2016-11-02 信越化学工业株式会社 Solaode and solar cell module
RU2571444C2 (en) 2010-12-06 2015-12-20 Син-Эцу Кемикал Ко., Лтд. Solar cell and solar cell module
WO2012083082A1 (en) 2010-12-15 2012-06-21 Sun Chemical Corporation Printable etchant compositions for etching silver nanoware-based transparent, conductive film
KR20120067198A (en) * 2010-12-15 2012-06-25 제일모직주식회사 Etching paste and method for preparing thereof, method of forming a pattern using the same
JP2011124603A (en) * 2011-02-09 2011-06-23 Sharp Corp Method for manufacturing rear-side junction type solar cell
CN102775071A (en) * 2011-05-09 2012-11-14 代芳 Manufacture technology for surface-coarsened glass fiber
JP2014529365A (en) * 2011-07-18 2014-11-06 メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフツングMerck Patent Gesellschaft mit beschraenkter Haftung Construction of antistatic and antireflection coatings and corresponding stacked layers
CN102955596B (en) * 2011-08-20 2016-04-06 宸鸿科技(厦门)有限公司 Protective seam disposal route and device thereof
US8951434B2 (en) 2012-05-10 2015-02-10 Corning Incorporated Glass etching media and methods
CN102800380A (en) * 2012-08-21 2012-11-28 海南汉能光伏有限公司 Slurry and preparation method thereof as well as peripheral membrane removal method for solar cells
KR20150073163A (en) * 2012-10-16 2015-06-30 히타치가세이가부시끼가이샤 Etching material
JP5888202B2 (en) * 2012-10-16 2016-03-16 日立化成株式会社 Liquid composition
KR101921788B1 (en) * 2012-11-02 2018-11-23 코닝 인코포레이티드 Methods to texture opaque, colored and translucent materials
KR20140086669A (en) * 2012-12-28 2014-07-08 동우 화인켐 주식회사 Etchant composition for metal oxide layer
KR101536001B1 (en) * 2014-04-30 2015-07-13 주식회사 지앤티 Producing method for translucent or opaque glass
CN104150782A (en) * 2014-07-18 2014-11-19 张家港市德力特新材料有限公司 Method for preparing glass for display screen
TWI546371B (en) * 2014-11-10 2016-08-21 盟智科技股份有限公司 Polishing slurry composition
JP2016086187A (en) * 2016-02-01 2016-05-19 日立化成株式会社 Method for removing sin film
CN106242307A (en) * 2016-08-11 2016-12-21 京东方科技集团股份有限公司 For strengthening the method at the edge of goods, glass and display device
CN106630658B (en) * 2016-12-31 2018-11-20 江苏来德福汽车部件有限公司 Glass substrate of liquid crystal display thinning technique pretreatment compositions
CN106587649B (en) * 2016-12-31 2019-03-22 深圳迈辽技术转移中心有限公司 TFT glass substrate thinning technique pretreating agent
US10632783B1 (en) 2017-04-25 2020-04-28 Ysidro C. Chacon Method for adhering embellishments to a glass substrate
US11186771B2 (en) * 2017-06-05 2021-11-30 Versum Materials Us, Llc Etching solution for selectively removing silicon nitride during manufacture of a semiconductor device
US10870799B2 (en) * 2017-08-25 2020-12-22 Versum Materials Us, Llc Etching solution for selectively removing tantalum nitride over titanium nitride during manufacture of a semiconductor device
US11142830B2 (en) 2019-02-08 2021-10-12 The Boeing Company Method of surface micro-texturing with a subtractive agent
US11136673B2 (en) 2019-02-08 2021-10-05 The Boeing Company Method of surface micro-texturing with a subtractive agent
CN114620939B (en) * 2020-12-09 2023-03-14 Oppo广东移动通信有限公司 Shell assembly, preparation method thereof and electronic equipment
CN116040949B (en) * 2021-10-28 2024-06-18 比亚迪股份有限公司 Glass etching liquid, glass with nut patterns and production method thereof
CN116040952B (en) * 2021-10-28 2024-06-18 比亚迪股份有限公司 Glass etching liquid, glass with crystal-shining pattern and production method thereof
CN115124249B (en) * 2022-01-20 2024-01-23 佛山犀马精细化工有限公司 Fluorite-shaped fingerprint-resistant and flashing-effect etching molding process for glass substrate
WO2024127794A1 (en) * 2022-12-13 2024-06-20 株式会社ダイセル Surface treatment agent and method for manufacturing etched silicon substrate
CN115881969B (en) * 2023-02-07 2023-05-16 四川大学 Boron-nitrogen doped porous carbon-based negative electrode active material, and preparation method and application thereof

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US283423A (en) * 1883-08-21 Bekgke
US1470772A (en) * 1922-08-21 1923-10-16 Henry L Greenbaum Paste for etching glass
US2067925A (en) * 1934-03-07 1937-01-19 Clayton-Kennedy Nance Composition for etching and etching transfers
US2903345A (en) * 1957-11-15 1959-09-08 American Cyanamid Co Etching of barium glass
US3810784A (en) * 1969-10-09 1974-05-14 Owens Corning Fiberglass Corp Reversible shear thinning gel coated glass fiber strand
DE2557079C2 (en) * 1975-12-18 1984-05-24 Ibm Deutschland Gmbh, 7000 Stuttgart Method for producing a masking layer
US4097309A (en) * 1977-01-31 1978-06-27 The Boeing Company Thermally isolated solar cell construction
DE2929589A1 (en) * 1979-07-04 1981-01-22 Bbc Brown Boveri & Cie METHOD FOR PRODUCING AN OPTICALLY TRANSPARENT AND ELECTRICALLY CONDUCTIVE FILM PATTERN
DD153360A1 (en) * 1980-10-01 1982-01-06 Heinz Schicht MATTRESS PASTE FOR GLASS
US4376673A (en) * 1981-02-19 1983-03-15 Pennwalt Corporation Method for etching dental porcelain
JPS5888142A (en) * 1981-11-20 1983-05-26 Nissha Printing Co Ltd Glass etchant for high temperature use and etching of glass using said etchant
JPS5888143A (en) * 1981-11-20 1983-05-26 Nissha Printing Co Ltd Preparation of colored glass product having uneven surface
US4578407A (en) * 1982-03-31 1986-03-25 Gaf Corporation Thixotropic rust removal coating and process
US4781792A (en) * 1985-05-07 1988-11-01 Hogan James V Method for permanently marking glass
DE3601834A1 (en) * 1986-01-20 1987-07-23 Schering Ag METHOD FOR ADHESIVE METALIZATION OF CERAMIC MATERIALS
US4761244A (en) * 1987-01-27 1988-08-02 Olin Corporation Etching solutions containing ammonium fluoride and an alkyl polyaccharide surfactant
DE3725346A1 (en) * 1987-07-30 1989-02-09 Nukem Gmbh METHOD FOR REUSE OF SILICON BASE MATERIAL OF A METAL ISOLATOR SEMICONDUCTOR (MIS) INVERSION LAYER SOLAR CELL
US4921626A (en) * 1989-08-23 1990-05-01 Automark Corporation Glass etching composition and method of making
JP2890988B2 (en) * 1992-08-17 1999-05-17 日立化成工業株式会社 Peeling composition and peeling method
US6084175A (en) * 1993-05-20 2000-07-04 Amoco/Enron Solar Front contact trenches for polycrystalline photovoltaic devices and semi-conductor devices with buried contacts
US6552414B1 (en) * 1996-12-24 2003-04-22 Imec Vzw Semiconductor device with selectively diffused regions
WO1998030652A1 (en) * 1997-01-09 1998-07-16 Henkel Corporation Acid deoxidizing/etching composition and process suitable for vertical aluminum surfaces
US5965465A (en) * 1997-09-18 1999-10-12 International Business Machines Corporation Etching of silicon nitride
US6670281B2 (en) * 1998-12-30 2003-12-30 Honeywell International Inc. HF etching and oxide scale removal
US6337029B1 (en) * 1999-01-21 2002-01-08 Xim Products Method and composition for etching glass ceramic and porcelain surfaces
DE19910816A1 (en) * 1999-03-11 2000-10-05 Merck Patent Gmbh Doping pastes for producing p, p + and n, n + regions in semiconductors
AU4314600A (en) * 1999-04-27 2000-11-10 Hiroshi Miwa Glass etching composition and method for frosting using the same

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