JPS5888142A - Glass etchant for high temperature use and etching of glass using said etchant - Google Patents
Glass etchant for high temperature use and etching of glass using said etchantInfo
- Publication number
- JPS5888142A JPS5888142A JP18712881A JP18712881A JPS5888142A JP S5888142 A JPS5888142 A JP S5888142A JP 18712881 A JP18712881 A JP 18712881A JP 18712881 A JP18712881 A JP 18712881A JP S5888142 A JPS5888142 A JP S5888142A
- Authority
- JP
- Japan
- Prior art keywords
- fluoride
- glass
- ammonium
- metal
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 40
- 238000005530 etching Methods 0.000 title 1
- 239000000126 substance Substances 0.000 claims abstract description 26
- 239000007787 solid Substances 0.000 claims abstract description 16
- 229910001512 metal fluoride Inorganic materials 0.000 claims abstract description 14
- 150000003839 salts Chemical class 0.000 claims abstract description 12
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims abstract description 7
- 239000000945 filler Substances 0.000 claims abstract description 6
- 229920000620 organic polymer Polymers 0.000 claims abstract description 6
- 239000003381 stabilizer Substances 0.000 claims abstract description 6
- 230000004907 flux Effects 0.000 claims abstract description 5
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- IRPGOXJVTQTAAN-UHFFFAOYSA-N 2,2,3,3,3-pentafluoropropanal Chemical compound FC(F)(F)C(F)(F)C=O IRPGOXJVTQTAAN-UHFFFAOYSA-N 0.000 claims abstract 2
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminum fluoride Inorganic materials F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 claims abstract 2
- 239000003518 caustics Substances 0.000 claims description 26
- 238000000034 method Methods 0.000 claims description 19
- 238000010438 heat treatment Methods 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 7
- 239000003795 chemical substances by application Substances 0.000 claims description 6
- 239000004606 Fillers/Extenders Substances 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 3
- 239000002131 composite material Substances 0.000 claims 4
- 229910021561 transition metal fluoride Inorganic materials 0.000 claims 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract description 8
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 7
- 239000007789 gas Substances 0.000 abstract description 6
- -1 (NH4)3AlF6 Chemical compound 0.000 abstract description 5
- 229910000040 hydrogen fluoride Inorganic materials 0.000 abstract description 4
- 238000013329 compounding Methods 0.000 abstract description 3
- 239000004902 Softening Agent Substances 0.000 abstract description 2
- 229910020027 (NH4)3AlF6 Inorganic materials 0.000 abstract 1
- 239000000654 additive Substances 0.000 abstract 1
- 239000003085 diluting agent Substances 0.000 abstract 1
- 229910052723 transition metal Inorganic materials 0.000 abstract 1
- 150000003624 transition metals Chemical class 0.000 abstract 1
- 230000007797 corrosion Effects 0.000 description 10
- 238000005260 corrosion Methods 0.000 description 10
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 7
- 231100001010 corrosive Toxicity 0.000 description 7
- 238000007639 printing Methods 0.000 description 6
- 239000000976 ink Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 description 2
- 239000004927 clay Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000002529 flux (metallurgy) Substances 0.000 description 2
- 238000007646 gravure printing Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 150000004760 silicates Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- 238000010023 transfer printing Methods 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 1
- RMSOEGBYNWXXBG-UHFFFAOYSA-N 1-chloronaphthalen-2-ol Chemical compound C1=CC=CC2=C(Cl)C(O)=CC=C21 RMSOEGBYNWXXBG-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910021583 Cobalt(III) fluoride Inorganic materials 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 244000043261 Hevea brasiliensis Species 0.000 description 1
- 229910021569 Manganese fluoride Inorganic materials 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 101000650578 Salmonella phage P22 Regulatory protein C3 Proteins 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- 101001040920 Triticum aestivum Alpha-amylase inhibitor 0.28 Proteins 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 150000001278 adipic acid derivatives Chemical class 0.000 description 1
- 229910052936 alkali metal sulfate Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- GUNJVIDCYZYFGV-UHFFFAOYSA-K antimony trifluoride Chemical compound F[Sb](F)F GUNJVIDCYZYFGV-UHFFFAOYSA-K 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical group [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- BRCWHGIUHLWZBK-UHFFFAOYSA-K bismuth;trifluoride Chemical compound F[Bi](F)F BRCWHGIUHLWZBK-UHFFFAOYSA-K 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical class OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 229920006026 co-polymeric resin Polymers 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- YCYBZKSMUPTWEE-UHFFFAOYSA-L cobalt(ii) fluoride Chemical compound F[Co]F YCYBZKSMUPTWEE-UHFFFAOYSA-L 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- CTNMMTCXUUFYAP-UHFFFAOYSA-L difluoromanganese Chemical compound F[Mn]F CTNMMTCXUUFYAP-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000010017 direct printing Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 235000019197 fats Nutrition 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- CUPFNGOKRMWUOO-UHFFFAOYSA-N hydron;difluoride Chemical compound F.F CUPFNGOKRMWUOO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- YAFKGUAJYKXPDI-UHFFFAOYSA-J lead tetrafluoride Chemical compound F[Pb](F)(F)F YAFKGUAJYKXPDI-UHFFFAOYSA-J 0.000 description 1
- ZPPSOOVFTBGHBI-UHFFFAOYSA-N lead(2+);oxido(oxo)borane Chemical compound [Pb+2].[O-]B=O.[O-]B=O ZPPSOOVFTBGHBI-UHFFFAOYSA-N 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 1
- LNDHQUDDOUZKQV-UHFFFAOYSA-J molybdenum tetrafluoride Chemical compound F[Mo](F)(F)F LNDHQUDDOUZKQV-UHFFFAOYSA-J 0.000 description 1
- 229920003052 natural elastomer Polymers 0.000 description 1
- 229920001194 natural rubber Polymers 0.000 description 1
- 238000007645 offset printing Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- AOLPZAHRYHXPLR-UHFFFAOYSA-I pentafluoroniobium Chemical compound F[Nb](F)(F)(F)F AOLPZAHRYHXPLR-UHFFFAOYSA-I 0.000 description 1
- NFVUDQKTAWONMJ-UHFFFAOYSA-I pentafluorovanadium Chemical compound [F-].[F-].[F-].[F-].[F-].[V+5] NFVUDQKTAWONMJ-UHFFFAOYSA-I 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- OEKDNFRQVZLFBZ-UHFFFAOYSA-K scandium fluoride Chemical compound F[Sc](F)F OEKDNFRQVZLFBZ-UHFFFAOYSA-K 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229920003051 synthetic elastomer Polymers 0.000 description 1
- 239000005061 synthetic rubber Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 150000003505 terpenes Chemical class 0.000 description 1
- 235000007586 terpenes Nutrition 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- YUOWTJMRMWQJDA-UHFFFAOYSA-J tin(iv) fluoride Chemical compound [F-].[F-].[F-].[F-].[Sn+4] YUOWTJMRMWQJDA-UHFFFAOYSA-J 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- BYMUNNMMXKDFEZ-UHFFFAOYSA-K trifluorolanthanum Chemical compound F[La](F)F BYMUNNMMXKDFEZ-UHFFFAOYSA-K 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 1
- 235000019871 vegetable fat Nutrition 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
スの腐蝕方法に関し、更に詳しくは乾式加熱によって腐
蝕を行なうための腐蝕剤とそれを用いた高温加熱による
ガラスの腐蝕方法に係るものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for corroding glass, and more particularly to a corrosive agent for corroding glass by dry heating and a method for corroding glass by high-temperature heating using the corrosive agent.
従来ガラス板やがフス容器等のガラス製品の表面の任意
の部分tこ、艶消し処理や彫刻をする場合tこは、一般
にフリ化水素酸溶液とフッ化力vtyウムと硫酸との混
合物もしくはフッ化永素アンモニウム溶液等を用いる所
謂湿式の腐蝕方法をこよっている。従って作業上フッ酸
等の毒性、腐蝕性の強い溶液等を取り扱わねばならない
ので作業者の健康を損なう危険度が高く、而もその廃液
処理も大変で美大な処理費を必要とする等の欠点を有す
る。Conventionally, any part of the surface of a glass product such as a glass plate or a fume container is treated with a hydrofluoric acid solution, a mixture of fluorinated hydrogen and sulfuric acid, or A so-called wet corrosion method using an ammonium fluoride solution is used. Therefore, during work, highly toxic and corrosive solutions such as hydrofluoric acid must be handled, which poses a high risk of harming the health of the workers.In addition, disposal of the waste liquid is difficult and requires enormous processing costs. It has its drawbacks.
このため近年この湿式腐蝕法は公害問題からも次第かこ
減少の傾向にあり、粗雑な表面を作るサンドプラスト法
等が多く用いられている現状である。For this reason, in recent years, this wet corrosion method has been on the decline due to pollution problems, and sandplast methods that produce rough surfaces are now being used more frequently.
本発明者はかかる現況に一mみ、これら従来の湿式腐蝕
方法が有する諸欠点を改良せんとして橋々研究を重ねた
結果、比較的安定な毒性の少ない腐蝕剤を混入した固体
皮膜化可能なインキを用いてガラス表面に該腐蝕剤の固
体皮膜を形成し、これを適当な温度で乾式加熱すること
によってガラスを腐蝕すれば、前記従来法の諸欠点が解
決できることを見出し、かかる知見に基づいて本発明を
完成するに至った。In view of the current situation, the present inventor has conducted extensive research in an attempt to improve the various drawbacks of these conventional wet corrosion methods, and has found that it is possible to form a solid film containing a relatively stable and less toxic corrosive agent. It was discovered that the various drawbacks of the conventional methods can be solved by forming a solid film of the corrosive agent on the glass surface using ink and dry heating it at an appropriate temperature to corrode the glass, and based on this knowledge, As a result, the present invention was completed.
即ち本発明は、金属フッ化物と77化アンモニウムとよ
りなる物質と、該物質と反応しない有機高分子物質との
混合物を必須成分とし、必要により増量剤、充填剤、安
定剤,融剤、軟化剤よりなる群から選ばれた少なくとも
一つの第三物質を含有せしめてなり、高温分解性の固体
皮膜を形成しうるものであることを特徴とする高温用ガ
ラス腐蝕剤及び核腐練剤の固体皮膜をガラス表面に形成
せしめ,而る後、l(1〜560℃で加熱処理すること
を特徴とするガラスの腐蝕方法を提供するものである。That is, the present invention has as essential components a mixture of a substance consisting of a metal fluoride and ammonium 77ide, and an organic polymeric substance that does not react with the substance, and if necessary, an extender, a filler, a stabilizer, a flux, and a softener. A solid glass corrosive agent and nuclear corrosive agent for high temperature use, characterized in that it contains at least one third substance selected from the group consisting of agents, and is capable of forming a high-temperature decomposable solid film. The present invention provides a method for corroding glass, characterized in that a film is formed on the glass surface and then heat treated at 1 to 560°C.
本発明をjl!に詳#に説明する。先ず第1の発明であ
る高温用ガラス腐蝕剤について説明すると。The present invention! This will be explained in detail. First, the first invention, a high-temperature glass corrosive agent, will be explained.
該腐蝕剤に使用する金属フッ化物としては,第8族金属
フツ化物と遷移金一一化物をあげる.この第8 表金l
Eフフ化物には、ツウ化アルミニウム、フッ化セリウム
、フッ化インジウム、フッ化スカンジウム等が適し、こ
の中量も重要なものはフ。Examples of metal fluorides used in the corrosive agent include Group 8 metal fluorides and transition gold monomonides. This 8th cover metal l
Suitable E-fluorides include aluminum tulfide, cerium fluoride, indium fluoride, and scandium fluoride, and the intermediate amount is also important.
化アルミニウムである。aluminum chloride.
次#CIII移金属プッ化物としては、フッ化バナジウ
ム、フッ化りロム、フ1化マンガン、ツウ化鉄、フッ化
コバルト、フッ化ニフケル、フッ化鋼、フヮ化ジVコン
、フッ化ニオビウム、フッ化モリブデン、フグ化イヴト
リウム、フッ化セリウム、フリ化ランタン、フッ化タン
タν、フリ化タングステン、フリ化アンチモン、ツブ化
ビスマス、フッ化スズ、フッ化鉛等の単独又は複合物も
しくはこれらの含酸素化合物である。次に金属フッ化物
とフッ化アンモニウムとよりなる物質とは上起の金属フ
ッ化物とフッ化アンモニウムの複合物、混合物、複塩又
は錨環であり、中でも水に不溶性の複塩又は錯塩が適す
る。Next #CIII transfer metal fluorides include vanadium fluoride, fluoride fluoride, manganese fluoride, iron trouside, cobalt fluoride, nifkel fluoride, fluoride steel, divinium fluoride, and niobium fluoride. , molybdenum fluoride, ibuturium fluoride, cerium fluoride, lanthanum fluoride, tanta fluoride, tungsten fluoride, antimony fluoride, bismuth fluoride, tin fluoride, lead fluoride, etc., singly or in combination, or a combination thereof. It is an oxygen-containing compound. Next, the substance consisting of a metal fluoride and ammonium fluoride is a compound, a mixture, a double salt, or an anchor ring of the above metal fluoride and ammonium fluoride, and among them, water-insoluble double salts or complex salts are suitable. .
これらの中で工業的に重要なものは、(NH4)sAI
Fa(NH4)2COF4、(NH4)2NiF4、(
NH4)2MnF4、(NH41BOrF6(NH4)
2ZrF6、(NH4)3Zr%, (liH4)3V
F6、(NH4)3FeF6NH4BiF4等の錯塩で
ある。Among these, the industrially important one is (NH4)sAI
Fa(NH4)2COF4, (NH4)2NiF4, (
NH4)2MnF4, (NH41BOrF6(NH4)
2ZrF6, (NH4)3Zr%, (liH4)3V
It is a complex salt such as F6, (NH4)3FeF6NH4BiF4.
次いでこれらをインキ化するためかー、これらにバイン
ダーとしての有機高分子物質を混合する。Next, in order to form these into ink, an organic polymer substance as a binder is mixed with them.
この有機高分子物質には前記金属フッ化物とフッ化アン
モニウムとよりなる物質と反応しないものを用いる必要
がある.従うて使用できる高分子物質としては、非水溶
性のものがよく、例えばポlJjL化ビニル、ポリ塊化
ビニリデン、塩化ビニV一醋酸ビニル共重合樹膿、ポリ
スチレン、アクリル系*脂、メタアクリル系lIIIB
、エポキシ系樹脂、ウレタン系樹脂、尿素系樹脂、フェ
ノール樹脂、ポリアクリロニトリル%A. B. 8.
樹脂、メラミン系樹脂、ボリエンテV系*脂,石油樹脂
、クマロンインデン11m、テルペンm ni、ポリオ
レフィン、ボリアミド、シェラツク、セルロース系11
Ml.ボリ酢酸ビニル、含フツ素樹脂、合成ゴム、天
然ゴム、ジエン系樹脂、植物m脂ワックス類等があげら
れる。This organic polymer material must be one that does not react with the metal fluoride and ammonium fluoride material. Therefore, the polymeric substances that can be used are preferably water-insoluble ones, such as polyvinyl vinyl, polyvinylidene agglomerate, vinyl chloride V vinyl monoacetate copolymer resin, polystyrene, acrylic resin, methacrylic resin, etc. lIIIB
, epoxy resin, urethane resin, urea resin, phenol resin, polyacrylonitrile%A. B. 8.
Resin, melamine resin, Voliente V* fat, petroleum resin, coumaron indene 11m, terpene m ni, polyolefin, polyamide, shellac, cellulose 11
Ml. Examples include polyvinyl acetate, fluorine-containing resins, synthetic rubber, natural rubber, diene resins, vegetable fat waxes, and the like.
これらの有機高分子物質は種類に広じて適宜の溶剤を用
いて溶解し、次いで腐蝕剤と一緒に混練し、使用態様に
応じて各種の粘度に調合してインキ化するが、場合によ
ってはこの中に更に増量剤、充填剤、安定剤、融剤、軟
化剤等の第三物質を適宜添加する。A wide variety of these organic polymer substances are dissolved using appropriate solvents, and then kneaded with corrosives to form inks with various viscosities depending on the usage. Further, third substances such as extenders, fillers, stabilizers, fluxes, and softeners are added as appropriate.
この増量剤、充填剤としては、不溶性珪酸塩、難溶性リ
ン酸塩、アルカリ土類金属炭酸塩、ホウ酸鉛、ホウ酸亜
鉛、酸化コバルト、酸化亜鉛、酸化マンガン、酸化アル
ミニウム、酸化鉄、酸化ニグケu、酸化クロム、酸化ジ
ルコン、モリブデン酸塩、硫酸バリウム、珪砂、粘土、
白土、滑石、黒鉛、カーポンプフック等が使用できる。These extenders and fillers include insoluble silicates, poorly soluble phosphates, alkaline earth metal carbonates, lead borate, zinc borate, cobalt oxide, zinc oxide, manganese oxide, aluminum oxide, iron oxide, and Nigke u, chromium oxide, zircon oxide, molybdate, barium sulfate, silica sand, clay,
White clay, talc, graphite, car pump hooks, etc. can be used.
又安定剤としては、鉛塩、金属石ケン、有機酸鉛塩、有
機錫、アミン、エポオキシド等が用いられる。融剤とし
ては、アルカリ金属或いは鉛の珪酸塩、アルカリ金属或
いはアルカリ土類金属のリン酸塩、アルカリ金属のタン
グステン酸塩、同モリブデン酸塩、同次酸塩、ホウ酸化
合物、アルカリ金属硫酸塩等が使用できる。As the stabilizer, lead salts, metal soaps, organic acid lead salts, organic tins, amines, epoxides, etc. are used. As fluxes, silicates of alkali metals or lead, phosphates of alkali metals or alkaline earth metals, tungstates of alkali metals, molybdates, diacids, boric acid compounds, alkali metal sulfates. etc. can be used.
更に軟化剤については、高沸点有機化合物例えハ、フタ
ル酸エステル、リン酸エステル、アジピン酸エステル等
が使用できる。Furthermore, as for the softening agent, high boiling point organic compounds such as phthalic acid esters, phosphoric acid esters, adipic acid esters, etc. can be used.
本発明による腐蝕剤は上述の如き構成のインキ状物であ
り、又これを目的物であるガラス製品の表面に塗布乾燥
するときは容易に固体皮膜化できるものであると共に、
これを高温で、例えばs60℃〜550℃で加熱すれば
、上記固体皮膜が分解し、フッ化水素ガス等(発生ガス
中に含まれるものはHF%SiF、、1[4Fである)
が発生し、それによってガラス表面を容易に腐蝕加工す
ることができる。The corrosive agent according to the present invention is an ink-like material having the above-mentioned structure, and when it is applied to the surface of the target glass product and dried, it can be easily formed into a solid film, and
If this is heated at a high temperature, e.g. 60°C to 550°C, the solid film will be decomposed and hydrogen fluoride gas etc. (The generated gas will contain HF%SiF, 1 [4F).
occurs, which can easily corrode the glass surface.
次に本発明の第2の発明であるガラスの腐蝕方法につい
て説明すると、先ず前記したインキ状のS&蟲用ガフン
腐蝕剤を適宜の塗布手段、例えば直接印刷法、浸漬法%
転写印刷済、吹付は法、各種コーチング法等を用い、全
面又は任意の部分命こ設けた後これを乾燥すると腐蝕剤
の固体皮膜が形成される。Next, to explain the method for corroding glass, which is the second invention of the present invention, firstly, the above-mentioned ink-like S&C corrosive agent is applied by an appropriate coating method, such as a direct printing method or a dipping method.
A solid film of corrosive agent is formed by applying a coating on the entire surface or any desired part using transfer printing, spraying or various coating methods, and then drying it.
この腐蝕剤の固体皮膜をガラス製品の表面に、文字、■
柄等部分的に設けたい場合には、前記印刷法や転写印刷
法を用いればよいが、その他、ガラス製品の表[ICあ
らかじめ腐蝕すべき部分を残して耐)、化物レジスト膜
を設けておき、これにv4蝕剤を全面塗布してもよい。A solid film of this corrosive agent is applied to the surface of glass products such as letters, ■
If you want to apply it partially, such as a pattern, you can use the printing method or transfer printing method described above, but you can also apply a chemical resist film to the surface of the glass product (leave the parts that should be corroded in advance), or apply a chemical resist film. , You may apply V4 corrosion agent to the entire surface.
次いでこのように表面IC腐蝕剤の固体皮膜が形成され
たが−yス製品を高温度、この場合250℃〜660℃
の範囲で加熱することケこよって初めて上記固体皮膜中
のfg41i!il剤が熱分解を生起し、それによって
フッ化水素ガス等を発生してガラス表面を腐蝕すること
ができる。The product, thus forming a solid film of surface IC etchant, is then heated to a high temperature, in this case from 250°C to 660°C.
The fg41i in the solid film is only heated in the range of ! The il agent causes thermal decomposition, thereby generating hydrogen fluoride gas and the like, which can corrode the glass surface.
なお上記熱処理温度は250℃以下では腐蝕剤が安定で
あり殆んど熱分解しないので腐蝕効果が得られず、又5
50℃以上では腐蝕剤の急速な熱分解と同時に7フ化水
素ガス等の急激な揮散逃逸が起こり腐蝕効果が少なくな
ってしまう、従−て本発明においては腐蝕のための熱処
理温度としては腐蝕剤の種類とか量によるが一般的には
gsoC〜550℃の範囲内で適宜選択するこ2が必要
である。Note that if the above heat treatment temperature is 250°C or lower, the corrosive agent is stable and hardly thermally decomposed, so no corrosion effect can be obtained;
At temperatures above 50°C, rapid thermal decomposition of the corrosive agent and rapid volatilization and escape of hydrogen 7 fluoride gas occur, reducing the corrosion effect. Therefore, in the present invention, the heat treatment temperature for corrosion is Although it depends on the type and amount of the agent, it is generally necessary to select it appropriately within the range of gsoC to 550°C.
父上記熱処理後、腐蝕されたガラス表面に腐蝕剤の残滓
が存しても、これらはバインダーの消失した不安定な層
となっているため、水洗又は拭きとり等を行なえば容T
oC除去することができる。Even if there are residues of the corrosive agent on the surface of the corroded glass after the heat treatment described above, these are an unstable layer with no binder, so they can be removed by washing with water or wiping.
oC can be removed.
本発明は以上のような構成よりなるインキ状化において
は従来のフヴ酸の相き腐蝕性を有しないので作業者に与
える危険性は殆んどなく、而も腐蝕機構も固体皮膜の加
熱処理といった乾式腐蝕によっているところから従来の
如き廃液処理を必要とせず、必要ならば唯加熱処理時に
発生するフッ化水素ガス等の除虫操作を行えば全書の必
配も十分解消し得るものである。そして適切な高温ガラ
ス腐蝕剤を撰択してガラス上に固体皮膜をつくらせ、こ
れを熱分解するときは、少量のフッ素化合物で最大のガ
ラス腐蝕効果が得られる。The present invention does not have the corrosive properties of conventional fuvic acid when forming an ink having the above structure, so there is almost no danger to workers, and the corrosion mechanism is based on the heating of the solid film. Since the process is based on dry corrosion, there is no need for conventional waste liquid treatment, and if necessary, the need for distributing all books can be completely eliminated by simply removing the hydrogen fluoride gas generated during heat treatment. be. When a suitable high-temperature glass corrosive agent is selected to form a solid film on the glass and then thermally decomposed, the maximum glass corrosive effect can be obtained with a small amount of fluorine compound.
又この腐蝕剤は200℃以下では安定であるのでその取
り扱いや保存が便利であるばかりではなく、各種の印刷
機、印刷手段に適用した場合、その印刷版を損なうこと
が殆んどないので、各種の印刷方法、例えば、グラビヤ
印刷、凸版印刷、オフセット印刷、フレキソ印刷、スク
リーン印刷等への適用が可能であり、従うて腐蝕部分の
パターン化、濃淡化が容易に得られ、ぼかし図柄や連続
階調図柄等も現出しつるところの産業上利用価値の大き
なものである。In addition, this corrosive is stable at temperatures below 200°C, so it is not only convenient to handle and store, but when applied to various printing machines and printing methods, it hardly damages the printing plates. It can be applied to various printing methods such as gravure printing, letterpress printing, offset printing, flexo printing, screen printing, etc. Therefore, patterning and shading of corroded areas can be easily obtained, blurred designs and continuous Gradation patterns and the like also appear and are of great industrial value.
次に本発明の実施例について説明する。なお、実施例は
単なる例示であって、本発明の腐蝕剤及び腐蝕方法を侮
辱限定するものではない。Next, examples of the present invention will be described. Note that the Examples are merely illustrative and do not necessarily limit the corrosive agent and the corrosive method of the present invention.
実施例 l
下表に示す各物質を夫々示した配合比によって配合して
ペイントシェーカー内に入れ、約1時間混練してインキ
状化した高温用がブス腐蝕剤を得た。Example 1 The substances listed in the table below were mixed at the compounding ratios shown, placed in a paint shaker, and kneaded for about 1 hour to obtain an ink-like high-temperature corrosion agent.
実施例 2
実施例1の表に示した各物質の代わりに下表に示したも
のを夫々示した配合比によって配合してホモジナイザー
内に入れ、約2時間混練してインキ状化した高温用ガラ
ス腐蝕剤を得た。Example 2 In place of each substance shown in the table of Example 1, the substances shown in the table below were mixed at the compounding ratio shown, put into a homogenizer, and kneaded for about 2 hours to form an ink. A caustic agent was obtained.
実施例 8
!!施例8と同様にして下表のものをホモジナイザー内
に入れ、約2時間混練してインキ状化した高温用ガラス
腐蝕剤を得た。Example 8! ! In the same manner as in Example 8, the materials shown in the table below were placed in a homogenizer and kneaded for about 2 hours to obtain an ink-formed high-temperature glass corrosive agent.
実施例 番
実施例1で作製したインキ状化した腐蝕剤な、スクリー
ン印刷法によってガラス製のコツプの外周l11iに水
玉柄に印刷して設け、これを自然乾燥して得た約50μ
の厚さの固体皮膜からなる腐蝕剤が水玉柄に形成された
ガラスコツプを、焼成炉中に入れ、600℃で16分間
加熱処理し更に表面の残滓を拭きとった結果、外周面に
艶消し状の不透明化した水玉柄が形成されたガラスコツ
プが得られた。Example No. The ink-formed corrosive agent prepared in Example 1 was printed in a polka dot pattern on the outer periphery l11i of a glass cup by screen printing method, and this was air-dried to obtain about 50 μm.
A glass pot with a polka dot pattern formed with a corrosive solid film with a thickness of A glass tip on which an opaque polka dot pattern was formed was obtained.
実施例 5 実施例2で作製したインキ状化した腐蝕剤を。Example 5 The ink-formed corrosive agent prepared in Example 2.
グラビヤ印刷機にてあらかじめ26μのボリエステルフ
ィVム上にアクリに樹111!l成物からなる剥離層を
設けたベースフィVムの該剥離層面上に、部分的に散在
した花柄に印刷し乾燥して厚さ10μの固定皮膜を形成
し次いでその上にこブチラール樹脂60部をトνエン(
溶剤)30部に溶解した溶液を塗布乾燥して感熱接着剤
層を設けて転写材を作製した。Tree 111 is printed on a 26μ polyester film in advance using a gravure printing machine! On the surface of the release layer of a base film provided with a release layer made of a 60% butyral resin, partially scattered floral patterns are printed and dried to form a fixed film with a thickness of 10 μm. part to ν(
A transfer material was prepared by applying and drying a solution dissolved in 30 parts of solvent to form a heat-sensitive adhesive layer.
次に該転写材を用いて加熱ローM式転写機により、転写
材上の腐蝕剤を厚さ6■のガラス板の表面に一転写し、
而る後、これを焼成炉中心入れ、450℃で80分間加
熱処理を行ない、表面の残滓を水洗して除去した結果、
表面に艶消し状の花柄が散在したガラス板が得られた。Next, using the transfer material, the corrosive agent on the transfer material was transferred onto the surface of a glass plate with a thickness of 6 cm using a heated row M type transfer machine,
After that, this was placed in the center of the firing furnace and heated at 450°C for 80 minutes, and the residue on the surface was removed by washing with water.
A glass plate with matte floral patterns scattered on its surface was obtained.
特許出願人 日本写真印刷株式会社patent applicant Nissha Printing Co., Ltd.
Claims (1)
、該物質と反応しない有機高分子物質との混合物を必須
成分とし、必要により増量剤、充填剤、安定剤、融剤、
軟化剤よりなる群から選ばれた少なくとも一つの第三物
質を含有せしめてなり、高温分解性の固体皮膜を形成し
つるものであることを特徴とする高温用ガラス腐蝕剤。 2 金属フッ化物とフッ化アンモニウムとよりなる物質
が、7ブ化アMミニウムとフグ化アンモニウムとの複合
物もしくは錯塩である特許請求の範囲第1項記載の高1
用ガラス腐蝕剤。 8金属7ツ化物とフッ化アンモニウムとよりなる物質が
、遷移金属フッ化物とフグ化アンモニウムとの複合物も
しくは錯塩である特許請求の範囲第1項記載の高温用ガ
フス腐蝕剤。 4 金属フッ化物とフグ化アンモニウムとよすする物質
と、該物質と反応しない有機高分子物質との混合物を必
須成分とし、必要により増量剤、充填剤、安定剤。融剤
、軟化剤よりなる群カ為ら選ばれた少なくとも一つの第
三物質を含有せしめてなる高温用ガラス腐蝕剤の固体皮
膜をガラス表面に形成せしめ、而る後、860℃〜56
0′ctこおいて加熱処理することを特徴とするガラス
の腐蝕方法。 5金属フツ化物とフッ化アンモニウムとよりな! 物質
カ、フッ化アルミニウムとフグ化アンモニウムとの複合
物もしくは錯塩である特許請求の範囲第4J]記載のガ
ラスの腐蝕方法。 6 金属フッ化物とフグ化アンモニウムとよりなる物質
が、遷移金属フッ化物とフッ化アンモニウムとの複合物
もしくは錯塩である特許請求の範囲第1項記載のガラス
の腐蝕方法。[Scope of Claims] The essential components are a mixture of metal fluoride, ammonium fufluoride, and an organic polymer substance that does not react with the substance, and optionally an extender, a filler, a stabilizer, and a flux. ,
A high-temperature glass corrosive agent, characterized in that it contains at least one third substance selected from the group consisting of softeners, and forms a solid film that is decomposable at high temperatures. 2. The high 1 compound according to claim 1, wherein the substance consisting of a metal fluoride and ammonium fluoride is a composite or complex salt of ammonium heptabutide and ammonium fugide.
Glass caustic agent. 2. The high-temperature gaff corrosive according to claim 1, wherein the substance consisting of an 8-metal heptadide and ammonium fluoride is a composite or complex salt of a transition metal fluoride and ammonium fuginate. 4. A mixture of metal fluorides, ammonium fufluoride, and organic polymeric substances that do not react with the substances as essential components, and as necessary, extenders, fillers, and stabilizers. A solid film of a high-temperature glass corrosive agent containing at least one third substance selected from the group consisting of fluxing agents and softeners is formed on the glass surface, and then heated at 860°C to 56°C.
A method for corroding glass, characterized by heat treatment at 0'ct. 5 Metal fluorides and ammonium fluoride and more! The method for corroding glass according to claim 4J, wherein the substance is a composite or complex salt of aluminum fluoride and ammonium fugide. 6. The method for corroding glass according to claim 1, wherein the substance consisting of a metal fluoride and ammonium fluoride is a composite or complex salt of a transition metal fluoride and ammonium fluoride.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18712881A JPS5888142A (en) | 1981-11-20 | 1981-11-20 | Glass etchant for high temperature use and etching of glass using said etchant |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18712881A JPS5888142A (en) | 1981-11-20 | 1981-11-20 | Glass etchant for high temperature use and etching of glass using said etchant |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5888142A true JPS5888142A (en) | 1983-05-26 |
Family
ID=16200602
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18712881A Pending JPS5888142A (en) | 1981-11-20 | 1981-11-20 | Glass etchant for high temperature use and etching of glass using said etchant |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5888142A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62235235A (en) * | 1986-04-03 | 1987-10-15 | Nippon Kayaku Co Ltd | Method for protecting glass device from hydrofluoric acid |
WO2000040518A1 (en) * | 1998-12-30 | 2000-07-13 | Alliedsignal Inc. | Hf etching and oxide scale removal |
KR20020041880A (en) * | 2000-11-29 | 2002-06-05 | 이을규 | Glass cleaning or etching composition and treatment method for alternative using hydrogen fluoride |
JP2003531807A (en) * | 2000-04-28 | 2003-10-28 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | Etching paste for inorganic surface |
JP2007031198A (en) * | 2005-07-26 | 2007-02-08 | Narumi China Corp | Ceramic product, and method for etching the same |
US7629257B2 (en) | 2001-10-10 | 2009-12-08 | Merck Patentgesellschaft | Combined etching and doping substances |
US7651830B2 (en) | 2007-06-01 | 2010-01-26 | 3M Innovative Properties Company | Patterned photoacid etching and articles therefrom |
-
1981
- 1981-11-20 JP JP18712881A patent/JPS5888142A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62235235A (en) * | 1986-04-03 | 1987-10-15 | Nippon Kayaku Co Ltd | Method for protecting glass device from hydrofluoric acid |
WO2000040518A1 (en) * | 1998-12-30 | 2000-07-13 | Alliedsignal Inc. | Hf etching and oxide scale removal |
US6670281B2 (en) | 1998-12-30 | 2003-12-30 | Honeywell International Inc. | HF etching and oxide scale removal |
JP2003531807A (en) * | 2000-04-28 | 2003-10-28 | メルク パテント ゲゼルシャフト ミット ベシュレンクテル ハフトング | Etching paste for inorganic surface |
KR20020041880A (en) * | 2000-11-29 | 2002-06-05 | 이을규 | Glass cleaning or etching composition and treatment method for alternative using hydrogen fluoride |
US7629257B2 (en) | 2001-10-10 | 2009-12-08 | Merck Patentgesellschaft | Combined etching and doping substances |
US8148191B2 (en) | 2001-10-10 | 2012-04-03 | Merck Patent Gmbh | Combined etching and doping media |
JP2007031198A (en) * | 2005-07-26 | 2007-02-08 | Narumi China Corp | Ceramic product, and method for etching the same |
US7651830B2 (en) | 2007-06-01 | 2010-01-26 | 3M Innovative Properties Company | Patterned photoacid etching and articles therefrom |
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