JPS62235235A - Method for protecting glass device from hydrofluoric acid - Google Patents
Method for protecting glass device from hydrofluoric acidInfo
- Publication number
- JPS62235235A JPS62235235A JP7559986A JP7559986A JPS62235235A JP S62235235 A JPS62235235 A JP S62235235A JP 7559986 A JP7559986 A JP 7559986A JP 7559986 A JP7559986 A JP 7559986A JP S62235235 A JPS62235235 A JP S62235235A
- Authority
- JP
- Japan
- Prior art keywords
- glass
- hydrofluoric acid
- acid
- test piece
- glass device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 title claims abstract description 45
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims description 6
- 150000001875 compounds Chemical class 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 abstract description 13
- 238000005260 corrosion Methods 0.000 abstract description 6
- 230000007797 corrosion Effects 0.000 abstract description 6
- 229910011255 B2O3 Inorganic materials 0.000 abstract description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 abstract description 4
- JKWMSGQKBLHBQQ-UHFFFAOYSA-N diboron trioxide Chemical compound O=BOB=O JKWMSGQKBLHBQQ-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052796 boron Inorganic materials 0.000 abstract description 2
- 229910052719 titanium Inorganic materials 0.000 abstract description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 229910052593 corundum Inorganic materials 0.000 abstract 1
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 239000000203 mixture Substances 0.000 description 13
- 239000010936 titanium Substances 0.000 description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000003756 stirring Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- -1 tantalum Chemical class 0.000 description 5
- 229910002651 NO3 Inorganic materials 0.000 description 4
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000004809 Teflon Substances 0.000 description 3
- 229920006362 Teflon® Polymers 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 2
- KRZCOLNOCZKSDF-UHFFFAOYSA-N 4-fluoroaniline Chemical compound NC1=CC=C(F)C=C1 KRZCOLNOCZKSDF-UHFFFAOYSA-N 0.000 description 2
- RHMPLDJJXGPMEX-UHFFFAOYSA-N 4-fluorophenol Chemical compound OC1=CC=C(F)C=C1 RHMPLDJJXGPMEX-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 description 2
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 2
- 239000004327 boric acid Substances 0.000 description 2
- ILAHWRKJUDSMFH-UHFFFAOYSA-N boron tribromide Chemical compound BrB(Br)Br ILAHWRKJUDSMFH-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 238000012993 chemical processing Methods 0.000 description 2
- 239000012954 diazonium Substances 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- YBMRDBCBODYGJE-UHFFFAOYSA-N germanium dioxide Chemical compound O=[Ge]=O YBMRDBCBODYGJE-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- SKOWZLGOFVSKLB-UHFFFAOYSA-N hypodiboric acid Chemical compound OB(O)B(O)O SKOWZLGOFVSKLB-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical compound [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 235000010288 sodium nitrite Nutrition 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 238000001256 steam distillation Methods 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- OWALCRQILZGQDH-UHFFFAOYSA-N 1,3-dichloro-2,4-difluoro-5-nitrobenzene Chemical compound [O-][N+](=O)C1=CC(Cl)=C(F)C(Cl)=C1F OWALCRQILZGQDH-UHFFFAOYSA-N 0.000 description 1
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 1
- PWKNBLFSJAVFAB-UHFFFAOYSA-N 1-fluoro-2-nitrobenzene Polymers [O-][N+](=O)C1=CC=CC=C1F PWKNBLFSJAVFAB-UHFFFAOYSA-N 0.000 description 1
- HFHFGHLXUCOHLN-UHFFFAOYSA-N 2-fluorophenol Chemical compound OC1=CC=CC=C1F HFHFGHLXUCOHLN-UHFFFAOYSA-N 0.000 description 1
- SWKPKONEIZGROQ-UHFFFAOYSA-N 4-trifluoromethylbenzoic acid Chemical compound OC(=O)C1=CC=C(C(F)(F)F)C=C1 SWKPKONEIZGROQ-UHFFFAOYSA-N 0.000 description 1
- ZUGAOYSWHHGDJY-UHFFFAOYSA-K 5-hydroxy-2,8,9-trioxa-1-aluminabicyclo[3.3.2]decane-3,7,10-trione Chemical compound [Al+3].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O ZUGAOYSWHHGDJY-UHFFFAOYSA-K 0.000 description 1
- CYJRNFFLTBEQSQ-UHFFFAOYSA-N 8-(3-methyl-1-benzothiophen-5-yl)-N-(4-methylsulfonylpyridin-3-yl)quinoxalin-6-amine Chemical compound CS(=O)(=O)C1=C(C=NC=C1)NC=1C=C2N=CC=NC2=C(C=1)C=1C=CC2=C(C(=CS2)C)C=1 CYJRNFFLTBEQSQ-UHFFFAOYSA-N 0.000 description 1
- 101150097903 ATL3 gene Proteins 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 229910015845 BBr3 Inorganic materials 0.000 description 1
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 101100148273 Chlorobaculum tepidum (strain ATCC 49652 / DSM 12025 / NBRC 103806 / TLS) rub3 gene Proteins 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- 229910004742 Na2 O Inorganic materials 0.000 description 1
- 101100323029 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) alc-1 gene Proteins 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229910010068 TiCl2 Inorganic materials 0.000 description 1
- 229910003074 TiCl4 Inorganic materials 0.000 description 1
- 229910010386 TiI4 Inorganic materials 0.000 description 1
- 229910010388 TiMgO3 Inorganic materials 0.000 description 1
- 229910010320 TiS Inorganic materials 0.000 description 1
- 229910003092 TiS2 Inorganic materials 0.000 description 1
- 229910008159 Zr(SO4)2 Inorganic materials 0.000 description 1
- 229910007938 ZrBr4 Inorganic materials 0.000 description 1
- 229910007928 ZrCl2 Inorganic materials 0.000 description 1
- 229910008067 ZrI2 Inorganic materials 0.000 description 1
- HDYRYUINDGQKMC-UHFFFAOYSA-M acetyloxyaluminum;dihydrate Chemical compound O.O.CC(=O)O[Al] HDYRYUINDGQKMC-UHFFFAOYSA-M 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052910 alkali metal silicate Inorganic materials 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910000329 aluminium sulfate Inorganic materials 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 235000011128 aluminium sulphate Nutrition 0.000 description 1
- 229940009827 aluminum acetate Drugs 0.000 description 1
- KMJRBSYFFVNPPK-UHFFFAOYSA-K aluminum;dodecanoate Chemical compound [Al+3].CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O.CCCCCCCCCCCC([O-])=O KMJRBSYFFVNPPK-UHFFFAOYSA-K 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 229910052789 astatine Inorganic materials 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- ZCLVNIZJEKLGFA-UHFFFAOYSA-H bis(4,5-dioxo-1,3,2-dioxalumolan-2-yl) oxalate Chemical compound [Al+3].[Al+3].[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O.[O-]C(=O)C([O-])=O ZCLVNIZJEKLGFA-UHFFFAOYSA-H 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910000149 boron phosphate Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 230000031709 bromination Effects 0.000 description 1
- 238000005893 bromination reaction Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- XTHPWXDJESJLNJ-UHFFFAOYSA-N chlorosulfonic acid Substances OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000006900 dealkylation reaction Methods 0.000 description 1
- 238000005796 dehydrofluorination reaction Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 150000001989 diazonium salts Chemical class 0.000 description 1
- 238000006193 diazotization reaction Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- ZQDADDSPMCHZPX-UHFFFAOYSA-N ethyl 4-(trifluoromethyl)benzoate Chemical compound CCOC(=O)C1=CC=C(C(F)(F)F)C=C1 ZQDADDSPMCHZPX-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 150000002386 heptoses Chemical class 0.000 description 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229940071870 hydroiodic acid Drugs 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910012375 magnesium hydride Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- KTMKRRPZPWUYKK-UHFFFAOYSA-N methylboronic acid Chemical compound CB(O)O KTMKRRPZPWUYKK-UHFFFAOYSA-N 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000004812 organic fluorine compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- CMOAHYOGLLEOGO-UHFFFAOYSA-N oxozirconium;dihydrochloride Chemical compound Cl.Cl.[Zr]=O CMOAHYOGLLEOGO-UHFFFAOYSA-N 0.000 description 1
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 239000005307 potash-lime glass Substances 0.000 description 1
- 239000011698 potassium fluoride Substances 0.000 description 1
- 235000003270 potassium fluoride Nutrition 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000003223 protective agent Substances 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 1
- 238000006277 sulfonation reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- UBZYKBZMAMTNKW-UHFFFAOYSA-J titanium tetrabromide Chemical compound Br[Ti](Br)(Br)Br UBZYKBZMAMTNKW-UHFFFAOYSA-J 0.000 description 1
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 1
- NLLZTRMHNHVXJJ-UHFFFAOYSA-J titanium tetraiodide Chemical compound I[Ti](I)(I)I NLLZTRMHNHVXJJ-UHFFFAOYSA-J 0.000 description 1
- AUZMWGNTACEWDV-UHFFFAOYSA-L titanium(2+);dibromide Chemical compound Br[Ti]Br AUZMWGNTACEWDV-UHFFFAOYSA-L 0.000 description 1
- ZWYDDDAMNQQZHD-UHFFFAOYSA-L titanium(ii) chloride Chemical compound [Cl-].[Cl-].[Ti+2] ZWYDDDAMNQQZHD-UHFFFAOYSA-L 0.000 description 1
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 1
- WXRGABKACDFXMG-UHFFFAOYSA-N trimethylborane Chemical compound CB(C)C WXRGABKACDFXMG-UHFFFAOYSA-N 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910000568 zirconium hydride Inorganic materials 0.000 description 1
- ZXAUZSQITFJWPS-UHFFFAOYSA-J zirconium(4+);disulfate Chemical compound [Zr+4].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O ZXAUZSQITFJWPS-UHFFFAOYSA-J 0.000 description 1
- LSWWNKUULMMMIL-UHFFFAOYSA-J zirconium(iv) bromide Chemical compound Br[Zr](Br)(Br)Br LSWWNKUULMMMIL-UHFFFAOYSA-J 0.000 description 1
Landscapes
- Anti-Oxidant Or Stabilizer Compositions (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は7ツ酸が存在若しくは発生する化学反応又は処
理工程でフッ酸の腐食作用からガラス製装置を保護し、
工業的使用を可能とすることにある。[Detailed Description of the Invention] [Industrial Application Field] The present invention protects glass equipment from the corrosive effects of hydrofluoric acid in chemical reactions or processing steps in which hexafluoric acid is present or generated.
The purpose is to enable industrial use.
ガラス製の材質からなる化学反応装置、処理装置槽等で
フッ酸が存在若しくは発生する場合、フッ酸の腐食作用
からガラスを保護する有効な手段は知られていない。し
かし従来、この種の方法として特公昭57−26247
にはトリフロロメチルベンゼンの臭素化の際にシリカゲ
ルを添加すると装置の腐食が防止できるという記載があ
る。この方法ではガラスが長期的に使用出来る程確かな
効果がなく使用には問題がある。その原因とも関係する
が微量でも系内に水が存在すると、ガラスの腐食はいっ
そう激しくなる。USP、4401623には全く同様
の系で塩化カルシウムを添加する事を記述しているが、
これも同様であシ、工業的に実施する程満足いく効果を
得ることは出来ない。When hydrofluoric acid is present or generated in chemical reaction equipment, treatment equipment tanks, etc. made of glass, no effective means for protecting the glass from the corrosive action of hydrofluoric acid is known. However, conventionally, this type of method was
describes that adding silica gel during bromination of trifluoromethylbenzene can prevent corrosion of the equipment. This method has problems in its use, as the effect is not reliable enough to allow the glass to be used for a long period of time. This may be related to the cause, but if even a small amount of water is present in the system, the corrosion of glass becomes more severe. USP 4401623 describes adding calcium chloride in exactly the same system, but
This is also the same, and it is not possible to obtain a satisfactory effect to the extent that it is carried out industrially.
近年益々フッ素系有機化合物が医薬、農薬、高分子材料
等に用いられるようになった。そして、それら有機化合
物の製造技術の重要性も増大している。ある種の有機フ
ッ素化合物は取り扱う上で一部脱フフ化水素反応を起こ
し、発生したフッ酸は製造設備のガラス部分を腐食する
ことが知られている。例えば70ロアニリン類の酸性ジ
アゾ分解反応、トリフロロメチル基を有するエステル類
の加水分解反応、トリフロロメチル基又はフッ素原子を
有する化合1トロ化、・・ロゲン化、スルホン化反応、
フン素含有のフェノール、フェネトール等の臭化水素水
による脱アルキル化反応等において知られている。又、
不安定なフッ素W 子ヲ含tr O−フロロニトロベン
ゼン、ポリハロゲン化されたo−ニトロフロロベンゼン
等に含まれる水を脱水したシ有機溶剤中濃縮したシする
工程においても然りである。In recent years, fluorine-based organic compounds have been increasingly used in medicines, agricultural chemicals, polymeric materials, and the like. The importance of manufacturing technology for these organic compounds is also increasing. It is known that some organic fluorine compounds undergo a partial dehydrofluorination reaction when handled, and the generated hydrofluoric acid corrodes the glass parts of manufacturing equipment. For example, acidic diazolysis reaction of 70-roanilines, hydrolysis reaction of esters having a trifluoromethyl group, 1-tolation of compounds having a trifluoromethyl group or a fluorine atom,... rogenation, sulfonation reaction,
It is known for the dealkylation reaction of fluorine-containing phenol, phenetol, etc. with hydrogen bromide water. or,
The same applies to the step of concentrating water contained in unstable fluorine W molecules, such as trO-fluoronitrobenzene, polyhalogenated o-nitrofluorobenzene, etc., in a dehydrated organic solvent.
ところで化学工業においては耐薬品性の化学装置の材質
として頻繁に用いられるのはガラスである。通常ガラス
はガラスライニングの形で使用されることが多い。しか
しガラスの最も強力な腐食剤はフッ酸である。したがっ
てフッ酸が存在又は発生するような条件下ではガラス材
を使いこなすことは困難である。By the way, in the chemical industry, glass is frequently used as a material for chemical-resistant chemical equipment. Glass is usually used in the form of a glass lining. However, the most powerful corrosive agent for glass is hydrofluoric acid. Therefore, it is difficult to make full use of glass materials under conditions where hydrofluoric acid is present or generated.
そのためタンタル、モネル、バーステロイ系合金などの
高価な金属又は合金を使用しなければならない。したが
って、化学工業においてフン酸の腐食作用からガラスを
保護し使いこなすことは長年の念願であった。本発明者
らは検討を重ねた結果、フッ酸が存在しても何んら問題
なくガラス製材料からなる製造設本発明は周期律長11
A、■B族の元素又はそれらの化合物を系内に存在させ
ることを特徴とするフッ酸の腐食作用からガラス製装置
を保護する方法に関するものである。さらに詳しく述べ
るならば、例えばアルコール、エステル、ハロゲン化炭
化水素、エーテル、脂肪族炭化水素、ケトン、芳香族炭
化水素、脂肪族アミン、芳香族アミン、脂肪族カルボン
酸、芳香族カルボン酸、フェノール類、非プロトン性極
性溶媒といった有機媒体中或いは水、硫酸、塩酸、臭化
水素酸、ヨウ化水素酸、硝酸、クロルスルホン酸、リン
酸といった無機媒体或いはそれらの混合媒体中でフッ酸
が存在又は発生する化学反応又は処理工程でフッ酸から
ガラス製装置を保護するために周期律表[[A、 ■B
例えばB、 At、 Ga、 In、 Tl、 Ti、
Zrといった元素又はそれらの化合物を系内に存在させ
ることからなる。それらの化合物とは有機、無機いずれ
の化合物でも良く、媒体中で水、酸、塩基等と接触して
分解してもかまわない。具体例としては80%B4O5
、B2O3、次ホウ酸、次ホウ酸塩、ホウ酸、ホウ酸塩
、ベルオキソホウ酸塩、ホウ酸エステル、BPO4、B
As04、BCl31 BBr3、BI3% B2C1
4、B2Br4B2I4、B (OCOCH3)3、B
3 B O3、(CH3)3B 1(CH3)2BrB
、 CH3B(OH)2、CH3BBrz、phBct
z、phB(OH)2、BFe、 MT3R4、MBH
4、BHR2、BH2R(Rはアルキル基又はアリール
基、Mば1価の金属原子)
At(OCH2CH2CH2CH3)3、[:AtH3
)よ、MgH2・2AtH3、L i AtH4、At
203、リン酸アルミニウム、Az(oH)3、アルミ
ン酸塩、AtCl3、AtBr3、シュウ酸アルミニウ
ム、Atl3、Al2(SO4)3、クエン酸アルミニ
ウム、KAt(504)2・12H20゜At203・
3Si02、At(NO3)3、At203・B2O3
、At(SCN)3、At(CH3COO)3、ラウリ
ル酸アルミニウム、塩基性酢酸アルミニウム、AlC1
,3・NH4C1%AtNH4(SO4)z・12H2
0、AtNa (S 04 )2 ・12H20、AL
Zn(S04)4・24H20、AL2S3、AtH3
、AtR2X 、 AtRX2(R= 7 ルキル基又
はアリール基 X = CL%Br%I )
T i B2、TiH4、TielTi(OH)z、T
i 203、Ti(OH)3、Ti0z、TiCl2、
TiBr2、Ti I2、T i C13、[Ti (
OH)s)C23、TiBr3、Til3、TiCl4
、TiBr4% TiI4、Ti51Ti2S3、Ti
S2、Ti2(S04)3、T i P 207、Ti
(304)z、Ti(OCH3)4T1CaO3、Ti
(COO)3、Ti (COO)4、TiMgO3、
TiS、 TiS2、B2 T i 03、M[TiC
ts(OH2)]、丑臼÷皓←斜←→、 MTiCΔW
、1価の金属原子)
Z r02、Z ro2’ XH2O、ZrO3・2H
20、ZrC42、K4Zr04・4H20”2H20
、ZrBr4、ZrI2、ZrBrpsZrCL3、Z
rBr3、Zrl3、ZrCl2、ZrL、 Zr0C
L2”8H20% Zr203cL2、Zr(NO3)
4・5H20、Zro(NO3)2 ・2H20、Zr
(SO4)z、Zr(SO4)2・4H20,Zr0(
S04)、Zr0(H2PO4)2、ZrPz07、Z
rSiO4、Zr(CH3COO)4% Zr0(CH
3COO)z、Z r (IV)アセチルアセトネート
、ZrAt2、Z rB2、ZrC1zO1L−;−り
、ZrCL209、 ZrH2、MZrOa、(Mは1
価の金属原子)
であるが、それらに限定されるものではない。Therefore, expensive metals or alloys such as tantalum, monel, and barsteroid alloys must be used. Therefore, in the chemical industry, it has been a long-held desire to protect glass from the corrosive effects of hydronic acid. As a result of repeated studies, the present inventors have found that even in the presence of hydrofluoric acid, the present invention can be manufactured using glass materials without any problems, and the periodic law length is 11.
The present invention relates to a method for protecting a glass device from the corrosive action of hydrofluoric acid, characterized by the presence of elements of groups A and B or their compounds in the system. More specifically, examples include alcohols, esters, halogenated hydrocarbons, ethers, aliphatic hydrocarbons, ketones, aromatic hydrocarbons, aliphatic amines, aromatic amines, aliphatic carboxylic acids, aromatic carboxylic acids, and phenols. , in an organic medium such as an aprotic polar solvent, or in an inorganic medium such as water, sulfuric acid, hydrochloric acid, hydrobromic acid, hydroiodic acid, nitric acid, chlorosulfonic acid, phosphoric acid, or a mixed medium thereof. To protect glass equipment from hydrofluoric acid during chemical reactions or processing steps that occur, the periodic table [[A, ■B
For example, B, At, Ga, In, Tl, Ti,
It consists of making an element such as Zr or a compound thereof exist in the system. These compounds may be either organic or inorganic compounds, and may be decomposed by contact with water, acids, bases, etc. in a medium. A specific example is 80% B4O5
, B2O3, hypoboric acid, hypoborate, boric acid, borate, peroxoborate, borate ester, BPO4, B
As04, BCl31 BBr3, BI3% B2C1
4, B2Br4B2I4, B (OCOCH3)3, B
3B O3, (CH3)3B 1(CH3)2BrB
, CH3B(OH)2, CH3BBrz, phBct
z, phB(OH)2, BFe, MT3R4, MBH
4, BHR2, BH2R (R is an alkyl group or aryl group, M is a monovalent metal atom) At(OCH2CH2CH2CH3)3, [:AtH3
), MgH2・2AtH3, L i AtH4, At
203, aluminum phosphate, Az(oH)3, aluminate, AtCl3, AtBr3, aluminum oxalate, Atl3, Al2(SO4)3, aluminum citrate, KAt(504)2・12H20°At203・
3Si02, At(NO3)3, At203・B2O3
, At(SCN)3, At(CH3COO)3, aluminum laurate, basic aluminum acetate, AlC1
,3・NH4C1%AtNH4(SO4)z・12H2
0, AtNa (S 04 )2 ・12H20, AL
Zn(S04)4・24H20, AL2S3, AtH3
, AtR2X, AtRX2 (R = 7 alkyl group or aryl group X = CL%Br%I) T i B2, TiH4, TielTi(OH)z, T
i203, Ti(OH)3, Ti0z, TiCl2,
TiBr2, Ti I2, Ti C13, [Ti (
OH)s)C23, TiBr3, Til3, TiCl4
, TiBr4% TiI4, Ti51Ti2S3, Ti
S2, Ti2(S04)3, T i P 207, Ti
(304)z, Ti(OCH3)4T1CaO3, Ti
(COO)3, Ti (COO)4, TiMgO3,
TiS, TiS2, B2 Ti 03, M[TiC
ts(OH2)], Usu÷皓←oblique←→, MTiCΔW
, monovalent metal atom) Z r02, Z ro2' XH2O, ZrO3.2H
20, ZrC42, K4Zr04・4H20”2H20
, ZrBr4, ZrI2, ZrBrpsZrCL3, Z
rBr3, Zrl3, ZrCl2, ZrL, Zr0C
L2”8H20% Zr203cL2, Zr(NO3)
4・5H20, Zro(NO3)2 ・2H20, Zr
(SO4)z, Zr(SO4)2・4H20, Zr0(
S04), Zr0(H2PO4)2, ZrPz07, Z
rSiO4, Zr(CH3COO)4% Zr0(CH
3COO) z, Z r (IV) Acetylacetonate, ZrAt2, Z rB2, ZrC1zO1L-;-ri, ZrCL209, ZrH2, MZrOa, (M is 1
valent metal atoms), but are not limited to them.
又それらは単独、あるいは混合系で用いても良い。効果
を発揮する使用量は7ツ酸の量に関係する。通常、フッ
酸のモル数に対して05〜10倍で使用するのが良いが
、効果を高めるためにさらに多量に使用してもよい。添
加に際しては、系に溶解性のあるものを選ぶのが望まし
いが、溶解性が悪い場合は、粉砕して比表面積を大きく
し、系内を激しく攪拌し、フッ酸との接触効率を上げる
とよい。又水、アルコール、ベンゼン等の溶媒に溶解し
て加えてもよい。本発明が使用される系は前記々載の媒
体の如くであるが、工業上特別価値の高いものは、酸性
媒体中又はそれらの水溶液中での反応又は取シ扱いであ
る。酸としては、前記々載したもの等である。Moreover, they may be used alone or in a mixed system. The amount of effective use is related to the amount of heptose acid. Generally, it is preferable to use it in an amount of 0.5 to 10 times the number of moles of hydrofluoric acid, but it may be used in an even larger amount to enhance the effect. When adding it, it is desirable to choose a substance that is soluble in the system, but if the solubility is poor, grind it to increase the specific surface area and vigorously stir the system to increase the contact efficiency with hydrofluoric acid. good. Alternatively, it may be added after being dissolved in a solvent such as water, alcohol, or benzene. The systems in which the present invention is used include the media listed above, but those of particular industrial value are reactions or handling in acidic media or their aqueous solutions. Examples of the acid include those listed above.
ガラスについて述べると、本発明の方法で特に効果のあ
るガラスは、工業用として多用されている酸化物ガラス
(5i02、B2O3、GeO2、Ag2O3、Na2
O,5b203、BaO、Bi2O3、v205.5b
205、ZrO2、ZnO1Ti02など)である。そ
の中でもケイ酸又はケイ酸を含むガラス(ケイ酸アルカ
リガラス、ソーダ石灰ガラス、カリ石灰ガラス、バリウ
ムガラスA′嘩つケイ酸など)である。しかし硝酸塩ガ
ラス、塩化物ガラス、炭酸塩ガラスなど上記以外のもの
でもよい。例としては、パイレックス、テレックス(商
品名 ホウケイ酸ガラス)Vycor (商品名石英ガ
ラス)や金属表面にガラス層を焼き付けたホウロウ、グ
ラスライニング材(池袋琺瑯工業株式会社 GL−40
0等)などである。Regarding glasses, the glasses that are particularly effective in the method of the present invention include oxide glasses (5i02, B2O3, GeO2, Ag2O3, Na2
O,5b203,BaO,Bi2O3,v205.5b
205, ZrO2, ZnO1Ti02, etc.). Among them, silicic acid or glass containing silicic acid (alkali silicate glass, soda lime glass, potash lime glass, barium glass A' silicic acid, etc.). However, other materials such as nitrate glass, chloride glass, carbonate glass, etc. may also be used. Examples include Pyrex, Terex (product name borosilicate glass), Vycor (product name quartz glass), enamel with a glass layer baked onto the metal surface, and glass lining material (Ikebukuro Horo Kogyo Co., Ltd. GL-40).
0 etc.).
以下実施例を示す。尚実施例中のガラス試験片は、顕微
鏡スライドガラス〔マツナミガラス工業■製 JIS
R3703]を用いて行った。Examples are shown below. In addition, the glass test piece in the examples is a microscope slide glass [manufactured by Matsunami Glass Industry ■ JIS
R3703].
又%ばすべて重量%を示す。Also, all percentages indicate weight %.
実施例1
フッ化水素0.28gを含む25%硫酸20gを120
m1テフロン製のピンに加え、さらに粉末状のホウ酸1
.8gを加える。次にガラスの試験片を入れ、栓をし、
同温で1時間攪拌した後ガラス試験片を取シ、水洗、乾
燥後、腐食状況を観察したところ、試験片は変化が認め
られなかった。Example 1 120 g of 25% sulfuric acid containing 0.28 g of hydrogen fluoride
In addition to m1 Teflon pin, powdered boric acid1
.. Add 8g. Next, put a glass test piece in, close the stopper, and
After stirring at the same temperature for 1 hour, a glass test piece was taken out, washed with water, and dried, and the state of corrosion was observed, and no change was observed in the test piece.
実施例2
フッ化水素0.14gを含むエタノール、40gを12
0m1テフロン製のピンに加え、さらに粉末状の水酸化
アルミニウム1.0gを加える。Example 2 40 g of ethanol containing 0.14 g of hydrogen fluoride was added to 12
In addition to the 0ml Teflon pin, add 1.0g of powdered aluminum hydroxide.
そして60℃で3分攪拌処理する。これにガラス試験片
を入れて栓をし、同温度で1時間攪拌した後、以下実施
例1と同様に操作したところ、試験片は変化が認められ
なかった。Then, the mixture is stirred at 60° C. for 3 minutes. A glass test piece was put in the mixture, the mixture was capped, and the mixture was stirred at the same temperature for 1 hour, and then operated in the same manner as in Example 1. No change was observed in the test piece.
実施例3
フン化水素0.06 g含むキシレン30gを120m
1テフロン製のピンに加え、粉末状のZr(IV)アセ
チルアセトネート1.ogを加える。Example 3 120 m of 30 g of xylene containing 0.06 g of hydrogen fluoride
1. In addition to the Teflon pin, powdered Zr(IV) acetylacetonate 1. Add og.
そして室温で10分攪拌処理する。これにガラス試験片
を入れて栓をし、100℃で1時間攪拌した後、以下実
施例1と同様に操作したところ、試験片は変化が認めら
れなかった。Then, the mixture is stirred at room temperature for 10 minutes. A glass test piece was placed in the mixture, the mixture was stoppered, and the mixture was stirred at 100° C. for 1 hour, and then operated in the same manner as in Example 1. No change was observed in the test piece.
実施例4
実施例1でホウ酸の代わりに20%三塩化チタン10.
8gを加え、同様に操作したところ、試験片は変化が認
められなかった。Example 4 20% titanium trichloride instead of boric acid in Example 110.
When 8 g was added and the same operation was performed, no change was observed in the test piece.
えた実施例5から21までを表に示す。但し、ガラス保
護剤は完溶又は懸濁させて用いた。The obtained Examples 5 to 21 are shown in the table. However, the glass protective agent was used either completely dissolved or suspended.
以下同様に実施例22から25までを示す。Examples 22 to 25 will be similarly shown below.
但し、ガラス試験片の代わりに池袋琺瑯工業株式会社製
ガラスライニング(GL−400)試験棒を用いて行っ
た。However, instead of the glass test piece, a glass lining (GL-400) test rod manufactured by Ikebukuro Horo Kogyo Co., Ltd. was used.
実施例27
47%臭化水素酸250gとP−メトキシフロロベン9
フ60
gをフラスコに入れ、グラスライニングテストピースG
L−400(池袋琺瑯工業株式会社製)を付した後、加
熱還流下に11時間攪拌した。反応終了後室温まで冷却
し、ジクロロメタン50gで3回抽出した。濃縮してP
−フロロフェノール41.6gを得た。テストピースは
全く変化が認められなかった。Example 27 250 g of 47% hydrobromic acid and P-methoxyfluoroben 9
Put 60 g of glass lining test piece G into the flask.
After applying L-400 (manufactured by Ikebukuro Horo Kogyo Co., Ltd.), the mixture was stirred under heating and reflux for 11 hours. After the reaction was completed, the mixture was cooled to room temperature and extracted three times with 50 g of dichloromethane. Concentrate and P
-41.6 g of fluorophenol was obtained. No change was observed in the test piece.
同様に水酸化アルミニウムを加えず行った場合は、テス
トピースに激しい腐食が認められた。Similarly, when aluminum hydroxide was not added, severe corrosion was observed in the test piece.
実施例28
(1) 95%Pーフロロアニリン100gを濃硫酸
1 00gと水8 0 0mlからなる酸性水溶液中に
氷を加えながら滴加し、P−フロロアニリン硫酸塩のス
ラリーとした。これに30d%の亜硝酸ナトリウム水溶
液を氷を加え液温を7℃以下に保ち、約2時間で滴下し
た。その後同温で2時間攪拌することで、ジアゾ化は完
結した。スルファミン酸1.Ogを加え過剰の亜硝酸ソ
ーダを分解し、約1.2tのP−フロロアニリンジアゾ
ニウム塩を得た。Example 28 (1) 100 g of 95% P-fluoroaniline was added dropwise to an acidic aqueous solution consisting of 100 g of concentrated sulfuric acid and 800 ml of water while adding ice to form a slurry of P-fluoroaniline sulfate. A 30 d% sodium nitrite aqueous solution was added dropwise over about 2 hours while adding ice and keeping the liquid temperature below 7°C. Diazotization was then completed by stirring at the same temperature for 2 hours. Sulfamic acid 1. Excess sodium nitrite was decomposed by adding Og to obtain about 1.2 t of P-fluoroaniline diazonium salt.
(2) コンデンサーを付した1を四ツロフラスコに
硫酸銅・5水和物150g水150g水酸化アルミニウ
ム4.0gを加え、さらに実施例27と同じガラステス
トピースヲ付し、加熱攪拌した。(1)記載のジアゾニ
ウム塩を沸点下に一定速度で滴下し、約3時間で全量を
加えた。滴下とともにコンデンサーよりp−フロロフェ
ノールを含む水が留出した。留出水を約1.3を得た。(2) 150 g of copper sulfate pentahydrate, 150 g of water, and 4.0 g of aluminum hydroxide were added to a four-piece flask equipped with a condenser, and the same glass test piece as in Example 27 was added thereto, followed by heating and stirring. The diazonium salt described in (1) was added dropwise at a constant rate below the boiling point, and the entire amount was added in about 3 hours. Along with the dropping, water containing p-fluorophenol was distilled out from the condenser. Approximately 1.3 ml of distilled water was obtained.
これに塩化ナトリウム260 gを加え完溶させた後、
トルエン200m1で3回抽出し、P−70口フェノー
ル分を分析したところ、収率93%を得た。同反応を2
0回行った後、テストピースを取り出し観察したところ
、変化は認められなかった。参考として、水酸化アルミ
ニウムを加えずに同数回行った実験は、テストピースに
激しい腐食が認められた。After adding 260 g of sodium chloride to this and dissolving it completely,
When extracted three times with 200 ml of toluene and analyzed for P-70 phenol content, a yield of 93% was obtained. Same reaction 2
After performing the test 0 times, the test piece was taken out and observed, and no change was observed. For reference, in the same number of experiments conducted without adding aluminum hydroxide, severe corrosion was observed on the test pieces.
実施例29
実施例28で得たP−フロロフェノールトルエン溶液に
200メツシユ水酸化アルミニウム2,Ogを加え、さ
らに実施例27と同じガラステストピースを付したフラ
スコで精留した。精留は、塔頂温度60〜110℃で減
圧下に10時間を要した。精留後テストピースを取り出
し観察したところ、変化は全々認められなかった。Example 29 200 mesh aluminum hydroxide (2,0 g) was added to the P-fluorophenol toluene solution obtained in Example 28, and further rectified in a flask equipped with the same glass test piece as in Example 27. The rectification took 10 hours under reduced pressure at a tower top temperature of 60 to 110°C. After the rectification, the test piece was taken out and observed, and no changes were observed.
実施例30
ペンシトリフルオライド70g, AtBra25g
を2tフラスコに入れ、さらに実施例27と同じガラス
テストピースを付した。Example 30 Pencitrifluoride 70g, AtBra 25g
was placed in a 2t flask, and the same glass test piece as in Example 27 was attached.
40〜60℃の反応温度で攪拌下に臭素70gを約20
時間にわたって滴下反応させた。反応生成物は荷性ソー
ダ水溶液で中和した後水蒸気蒸留、ジクロルエタンで抽
出、濃縮、蒸留し、m−ブロモベンシトリフルオライド
27gを得た。反応終了後テストピースを取り出し観察
したところ、変化が認められなかった。About 20 g of bromine was added under stirring at a reaction temperature of 40 to 60°C.
The reaction was carried out dropwise over a period of time. The reaction product was neutralized with an aqueous sodium hydroxide solution, followed by steam distillation, extraction with dichloroethane, concentration, and distillation to obtain 27 g of m-bromobencytrifluoride. After the reaction was completed, the test piece was taken out and observed, and no change was observed.
実施例31
1tフラスコにボールミルで24時間粉砕したフッ化カ
リウム148g,スルホラン500m1, 2、3、4
、5−テトラクロルニトロベンゼン168gを加え、1
90℃×6時間還流した後、冷却、濾過した。F液は2
tフラスコに移し、水500m1,オキシ塩化ジルコニ
ウム2.0gを加え、さらに実施例27と同じテストピ
ースを付した。その後水蒸気蒸留を行い、3、5−ジク
ロル−2、4−ジフロロニトロベンゼン110gを含む
留出水約26を得た。テストピースは変化が認められな
かった。Example 31 148 g of potassium fluoride ground in a ball mill for 24 hours, 500 ml of sulfolane in a 1 t flask, 2, 3, 4
, 168 g of 5-tetrachloronitrobenzene was added, and 1
After refluxing at 90°C for 6 hours, the mixture was cooled and filtered. F liquid is 2
The mixture was transferred to a T flask, 500 ml of water and 2.0 g of zirconium oxychloride were added thereto, and the same test piece as in Example 27 was attached. Thereafter, steam distillation was performed to obtain about 26 g of distilled water containing 110 g of 3,5-dichloro-2,4-difluoronitrobenzene. No change was observed in the test piece.
実施例32
500mlフラスコにP−トリフロロメチル安息香酸エ
チル100g,20%硫酸3 0 0mlを加え、さら
に実施例27と同様にテストピースを付した。副生エタ
ノールを留去しながら10時間加熱攪拌した。このとき
、留出量にみあう水を反応系に補給した。冷却後析出し
た結晶を戸別、乾燥しP−トリフロロメチル安息香酸8
1.9gが得られた。テストピースは変化が認められな
かった。Example 32 100 g of ethyl P-trifluoromethylbenzoate and 300 ml of 20% sulfuric acid were added to a 500 ml flask, and a test piece was attached in the same manner as in Example 27. The mixture was heated and stirred for 10 hours while distilling off the by-product ethanol. At this time, the reaction system was replenished with water corresponding to the amount of distillation. After cooling, the precipitated crystals were dried individually and P-trifluoromethylbenzoic acid 8
1.9g was obtained. No change was observed in the test piece.
フン酸が存在又は発生する反応、処理工程において、ガ
ラス製装置を使用してもガラスには全く変化がないか、
極く僅かしか変化がなかった。Is there any change in the glass even if glass equipment is used in reactions or processing steps where hydronic acid is present or generated?
There were very few changes.
Claims (1)
を系内に存在させることを特徴とするフッ酸の腐食作用
からガラス製装置を保護する方法。1. A method for protecting glass equipment from the corrosive action of hydrofluoric acid, characterized by the presence of elements of groups IIIA and IVB of the periodic table or their compounds in the system.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61075599A JPH0694382B2 (en) | 1986-04-03 | 1986-04-03 | How to protect glass equipment from hydrofluoric acid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61075599A JPH0694382B2 (en) | 1986-04-03 | 1986-04-03 | How to protect glass equipment from hydrofluoric acid |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62235235A true JPS62235235A (en) | 1987-10-15 |
JPH0694382B2 JPH0694382B2 (en) | 1994-11-24 |
Family
ID=13580828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61075599A Expired - Fee Related JPH0694382B2 (en) | 1986-04-03 | 1986-04-03 | How to protect glass equipment from hydrofluoric acid |
Country Status (1)
Country | Link |
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JP (1) | JPH0694382B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117699742A (en) * | 2024-02-05 | 2024-03-15 | 上海联风气体有限公司 | Hydrofluoric acid regeneration method for photovoltaic waste acid |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5855346A (en) * | 1981-09-25 | 1983-04-01 | Nippon Sheet Glass Co Ltd | Treatment of surface of glass containing alkali metal |
JPS5869746A (en) * | 1981-10-06 | 1983-04-26 | シヨツト・オプチカル・ガラス・インコ−ポレイテツド | One body non-reflective surface of silicate glass |
JPS5888142A (en) * | 1981-11-20 | 1983-05-26 | Nissha Printing Co Ltd | Glass etchant for high temperature use and etching of glass using said etchant |
JPS58145674A (en) * | 1982-02-17 | 1983-08-30 | 日本写真印刷株式会社 | Manufacture of ceramic products with relief surface |
JPS6191042A (en) * | 1984-10-08 | 1986-05-09 | Toyota Motor Corp | Anti-fogging glass and its production |
-
1986
- 1986-04-03 JP JP61075599A patent/JPH0694382B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5855346A (en) * | 1981-09-25 | 1983-04-01 | Nippon Sheet Glass Co Ltd | Treatment of surface of glass containing alkali metal |
JPS5869746A (en) * | 1981-10-06 | 1983-04-26 | シヨツト・オプチカル・ガラス・インコ−ポレイテツド | One body non-reflective surface of silicate glass |
JPS5888142A (en) * | 1981-11-20 | 1983-05-26 | Nissha Printing Co Ltd | Glass etchant for high temperature use and etching of glass using said etchant |
JPS58145674A (en) * | 1982-02-17 | 1983-08-30 | 日本写真印刷株式会社 | Manufacture of ceramic products with relief surface |
JPS6191042A (en) * | 1984-10-08 | 1986-05-09 | Toyota Motor Corp | Anti-fogging glass and its production |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN117699742A (en) * | 2024-02-05 | 2024-03-15 | 上海联风气体有限公司 | Hydrofluoric acid regeneration method for photovoltaic waste acid |
Also Published As
Publication number | Publication date |
---|---|
JPH0694382B2 (en) | 1994-11-24 |
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