HK1219173A1 - 半導體器件 - Google Patents
半導體器件Info
- Publication number
- HK1219173A1 HK1219173A1 HK16107155.8A HK16107155A HK1219173A1 HK 1219173 A1 HK1219173 A1 HK 1219173A1 HK 16107155 A HK16107155 A HK 16107155A HK 1219173 A1 HK1219173 A1 HK 1219173A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- semiconductor device
- semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/20—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising resistance and either capacitance or inductance, e.g. phase-shift oscillator
- H03B5/24—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising resistance and either capacitance or inductance, e.g. phase-shift oscillator active element in amplifier being semiconductor device
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5228—Resistive arrangements or effects of, or between, wiring layers
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- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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- H01L24/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
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- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0629—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with diodes, or resistors, or capacitors
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- H01L2924/0001—Technical content checked by a classifier
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Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2010/071264 WO2012073307A1 (ja) | 2010-11-29 | 2010-11-29 | 半導体装置 |
Publications (1)
Publication Number | Publication Date |
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HK1219173A1 true HK1219173A1 (zh) | 2017-03-24 |
Family
ID=46171295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK16107155.8A HK1219173A1 (zh) | 2010-11-29 | 2016-06-21 | 半導體器件 |
Country Status (7)
Country | Link |
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US (2) | US9252793B2 (zh) |
JP (1) | JP5539537B2 (zh) |
KR (2) | KR101730784B1 (zh) |
CN (2) | CN103229291B (zh) |
HK (1) | HK1219173A1 (zh) |
TW (1) | TWI548085B (zh) |
WO (1) | WO2012073307A1 (zh) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5539537B2 (ja) * | 2010-11-29 | 2014-07-02 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP6344163B2 (ja) * | 2014-09-03 | 2018-06-20 | 株式会社デンソー | シャント抵抗器 |
CN104316676B (zh) * | 2014-11-05 | 2016-08-03 | 长兴电子材料(昆山)有限公司 | 一种用于环氧模塑料的模流痕检测的模具 |
US20160218062A1 (en) * | 2015-01-23 | 2016-07-28 | Texas Instruments Incorporated | Thin film resistor integration in copper damascene metallization |
US9570571B1 (en) * | 2015-11-18 | 2017-02-14 | International Business Machines Corporation | Gate stack integrated metal resistors |
JP6800815B2 (ja) * | 2017-06-27 | 2020-12-16 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
TWI759207B (zh) * | 2018-06-19 | 2022-03-21 | 日商新唐科技日本股份有限公司 | 半導體裝置 |
CN114823664A (zh) | 2018-06-19 | 2022-07-29 | 新唐科技日本株式会社 | 半导体装置 |
US10784193B2 (en) | 2018-07-27 | 2020-09-22 | Texas Instruments Incorporated | IC with thin film resistor with metal walls |
JP7015754B2 (ja) * | 2018-08-30 | 2022-02-03 | ルネサスエレクトロニクス株式会社 | 半導体装置 |
JP2020150037A (ja) * | 2019-03-11 | 2020-09-17 | キオクシア株式会社 | 半導体装置およびその製造方法 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS5434787A (en) * | 1977-08-24 | 1979-03-14 | Hitachi Ltd | Formation of resistance of semiconductor integrated circuit |
JPS5688350A (en) | 1979-12-19 | 1981-07-17 | Toshiba Corp | Semiconductor device |
JPS57139955A (en) * | 1981-02-24 | 1982-08-30 | Nec Corp | Integrated circuit device |
JPS6079766A (ja) * | 1983-10-05 | 1985-05-07 | Nec Corp | R−2rはしご形抵抗回路 |
JPS6232637A (ja) | 1985-08-05 | 1987-02-12 | Mitsubishi Electric Corp | 半導体装置 |
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-
2010
- 2010-11-29 JP JP2012546590A patent/JP5539537B2/ja active Active
- 2010-11-29 KR KR1020167028848A patent/KR101730784B1/ko active IP Right Grant
- 2010-11-29 WO PCT/JP2010/071264 patent/WO2012073307A1/ja active Application Filing
- 2010-11-29 CN CN201080070396.7A patent/CN103229291B/zh active Active
- 2010-11-29 US US13/990,030 patent/US9252793B2/en active Active
- 2010-11-29 KR KR1020137013705A patent/KR101668623B1/ko active IP Right Grant
- 2010-11-29 CN CN201510660740.2A patent/CN105185781B/zh active Active
-
2011
- 2011-09-20 TW TW100133828A patent/TWI548085B/zh active
-
2015
- 2015-11-17 US US14/943,836 patent/US9503018B2/en active Active
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- 2016-06-21 HK HK16107155.8A patent/HK1219173A1/zh unknown
Also Published As
Publication number | Publication date |
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US9252793B2 (en) | 2016-02-02 |
CN105185781A (zh) | 2015-12-23 |
US9503018B2 (en) | 2016-11-22 |
KR20160124916A (ko) | 2016-10-28 |
TWI548085B (zh) | 2016-09-01 |
JP5539537B2 (ja) | 2014-07-02 |
KR101668623B1 (ko) | 2016-10-24 |
JPWO2012073307A1 (ja) | 2014-05-19 |
WO2012073307A1 (ja) | 2012-06-07 |
TW201222812A (en) | 2012-06-01 |
KR20140053817A (ko) | 2014-05-08 |
US20160142011A1 (en) | 2016-05-19 |
US20130314165A1 (en) | 2013-11-28 |
CN103229291A (zh) | 2013-07-31 |
CN105185781B (zh) | 2018-06-22 |
KR101730784B1 (ko) | 2017-04-26 |
CN103229291B (zh) | 2015-11-25 |
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