HK1148827A1 - Pellicle frame and lithographic pellicle - Google Patents

Pellicle frame and lithographic pellicle

Info

Publication number
HK1148827A1
HK1148827A1 HK11102986.9A HK11102986A HK1148827A1 HK 1148827 A1 HK1148827 A1 HK 1148827A1 HK 11102986 A HK11102986 A HK 11102986A HK 1148827 A1 HK1148827 A1 HK 1148827A1
Authority
HK
Hong Kong
Prior art keywords
pellicle
quadrilateral
lithographic
pellicle frame
frame
Prior art date
Application number
HK11102986.9A
Other languages
English (en)
Inventor
Toru Shirasaki
David Mushell
Kishore Chakracorty
Grace Ng
Original Assignee
Shinetsu Chemical Co
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co, Intel Corp filed Critical Shinetsu Chemical Co
Publication of HK1148827A1 publication Critical patent/HK1148827A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
HK11102986.9A 2009-06-24 2011-03-24 Pellicle frame and lithographic pellicle HK1148827A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009149776A JP5481106B2 (ja) 2009-06-24 2009-06-24 ペリクルフレーム及びリソグラフィ用ペリクル

Publications (1)

Publication Number Publication Date
HK1148827A1 true HK1148827A1 (en) 2011-09-16

Family

ID=42666394

Family Applications (1)

Application Number Title Priority Date Filing Date
HK11102986.9A HK1148827A1 (en) 2009-06-24 2011-03-24 Pellicle frame and lithographic pellicle

Country Status (7)

Country Link
US (1) US8221944B2 (zh)
EP (1) EP2267526B1 (zh)
JP (1) JP5481106B2 (zh)
KR (1) KR101780063B1 (zh)
CN (1) CN101930165B (zh)
HK (1) HK1148827A1 (zh)
TW (1) TWI476510B (zh)

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EP2689284A4 (en) 2011-03-22 2014-08-20 Bayer Ip Gmbh ELECTROACTIVE POLYMER ACTUATOR LENS SYSTEM
EP2828901B1 (en) 2012-03-21 2017-01-04 Parker Hannifin Corporation Roll-to-roll manufacturing processes for producing self-healing electroactive polymer devices
JP5746661B2 (ja) * 2012-05-08 2015-07-08 信越化学工業株式会社 ペリクルの製造方法
JP5746662B2 (ja) * 2012-05-11 2015-07-08 信越化学工業株式会社 ペリクルフレーム
KR20150031285A (ko) * 2012-06-18 2015-03-23 바이엘 인텔렉쳐 프로퍼티 게엠베하 연신 공정을 위한 연신 프레임
US9590193B2 (en) 2012-10-24 2017-03-07 Parker-Hannifin Corporation Polymer diode
JP5999843B2 (ja) * 2013-06-18 2016-09-28 信越化学工業株式会社 リソグラフィ用ペリクルとその製造方法及び管理方法
JP6156998B2 (ja) * 2013-10-22 2017-07-05 信越化学工業株式会社 ペリクル
EP3062149B1 (en) 2013-10-23 2018-04-25 Nippon Light Metal Company, Ltd. Pellicle frame and process for producing the same
JP6304884B2 (ja) 2014-09-22 2018-04-04 信越化学工業株式会社 ペリクルの貼り付け方法
JP6274079B2 (ja) * 2014-11-04 2018-02-07 日本軽金属株式会社 ペリクル用支持枠および製造方法
US9395621B2 (en) * 2014-11-17 2016-07-19 Globalfoundries Singapore Pte. Ltd. Pellicles and devices comprising a photomask and the pellicle
JP6293041B2 (ja) 2014-12-01 2018-03-14 信越化学工業株式会社 ペリクルフレームおよびこれを用いたペリクル
JP6460778B2 (ja) * 2014-12-25 2019-01-30 日本特殊陶業株式会社 ペリクル枠およびペリクル枠の製造方法
JP6347741B2 (ja) 2014-12-25 2018-06-27 信越化学工業株式会社 ペリクル
JP6491472B2 (ja) * 2014-12-25 2019-03-27 日本特殊陶業株式会社 ペリクル枠およびペリクル枠の製造方法
JP6519190B2 (ja) 2015-01-16 2019-05-29 日本軽金属株式会社 ペリクル用支持枠
JP2016139103A (ja) * 2015-01-29 2016-08-04 日本軽金属株式会社 ペリクル用支持枠
CN107003602B (zh) * 2015-02-24 2021-03-12 三井化学株式会社 防护膜组件膜、防护膜组件框体、防护膜组件及其制造方法
JP6632057B2 (ja) * 2016-01-07 2020-01-15 信越化学工業株式会社 ペリクル
JP6532428B2 (ja) * 2016-05-26 2019-06-19 信越化学工業株式会社 ペリクル
JP6288599B1 (ja) * 2016-07-12 2018-03-07 日本軽金属株式会社 ペリクル枠及びペリクル
US10948816B2 (en) 2016-07-12 2021-03-16 Nippon Light Metal Company, Ltd. Pellicle frame and pellicle
JP6706575B2 (ja) 2016-12-22 2020-06-10 信越化学工業株式会社 ペリクルフレーム及びこれを用いたペリクル
JP7357432B2 (ja) * 2017-10-10 2023-10-06 信越化学工業株式会社 Ｅｕｖ用ペリクルフレーム、ペリクル、ペリクル付露光原版、露光方法、及び半導体の製造方法
KR20200071080A (ko) * 2017-10-27 2020-06-18 에이에스엠엘 네델란즈 비.브이. 펠리클 프레임 및 펠리클 조립체
KR20210146491A (ko) * 2020-05-26 2021-12-06 삼성디스플레이 주식회사 이송 복합체 및 이를 포함하는 이송 모듈

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JP5134436B2 (ja) * 2008-05-27 2013-01-30 信越化学工業株式会社 リソグラフィ用ペリクル
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JP5411595B2 (ja) * 2009-06-24 2014-02-12 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル
JP5411596B2 (ja) * 2009-06-24 2014-02-12 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル

Also Published As

Publication number Publication date
JP2011007934A (ja) 2011-01-13
US20100330466A1 (en) 2010-12-30
CN101930165B (zh) 2013-05-15
EP2267526A3 (en) 2013-01-16
US8221944B2 (en) 2012-07-17
JP5481106B2 (ja) 2014-04-23
TWI476510B (zh) 2015-03-11
EP2267526A2 (en) 2010-12-29
KR101780063B1 (ko) 2017-09-19
EP2267526B1 (en) 2020-07-08
TW201111906A (en) 2011-04-01
KR20100138821A (ko) 2010-12-31
CN101930165A (zh) 2010-12-29

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210629