HK1087195A1 - Run-off path to collect liquid for an immersion lithography apparatus - Google Patents
Run-off path to collect liquid for an immersion lithography apparatusInfo
- Publication number
- HK1087195A1 HK1087195A1 HK06107409.4A HK06107409A HK1087195A1 HK 1087195 A1 HK1087195 A1 HK 1087195A1 HK 06107409 A HK06107409 A HK 06107409A HK 1087195 A1 HK1087195 A1 HK 1087195A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- run
- path
- lithography apparatus
- immersion lithography
- collect liquid
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US46211403P | 2003-04-10 | 2003-04-10 | |
| PCT/US2004/009993 WO2004093160A2 (fr) | 2003-04-10 | 2004-04-01 | Trajet de ruissellement permettant de recueillir un liquide dans un appareil de lithographie a immersion |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK1087195A1 true HK1087195A1 (en) | 2006-10-06 |
Family
ID=33299911
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK06107409.4A HK1087195A1 (en) | 2003-04-10 | 2006-06-30 | Run-off path to collect liquid for an immersion lithography apparatus |
| HK16101898.3A HK1214000A1 (zh) | 2003-04-10 | 2016-02-19 | 用於浸沒式光刻裝置的收集液體的溢流路徑 |
| HK18114938.6A HK1255862A1 (zh) | 2003-04-10 | 2018-11-22 | 用於沉浸光刻裝置的收集液體的溢出通道 |
Family Applications After (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK16101898.3A HK1214000A1 (zh) | 2003-04-10 | 2016-02-19 | 用於浸沒式光刻裝置的收集液體的溢流路徑 |
| HK18114938.6A HK1255862A1 (zh) | 2003-04-10 | 2018-11-22 | 用於沉浸光刻裝置的收集液體的溢出通道 |
Country Status (7)
| Country | Link |
|---|---|
| US (4) | US7397532B2 (fr) |
| EP (3) | EP1611482B1 (fr) |
| JP (1) | JP4488005B2 (fr) |
| KR (1) | KR101129213B1 (fr) |
| CN (1) | CN1771463A (fr) |
| HK (3) | HK1087195A1 (fr) |
| WO (1) | WO2004093160A2 (fr) |
Families Citing this family (150)
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| US7948604B2 (en) | 2002-12-10 | 2011-05-24 | Nikon Corporation | Exposure apparatus and method for producing device |
| CN100446179C (zh) | 2002-12-10 | 2008-12-24 | 株式会社尼康 | 曝光设备和器件制造法 |
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-
2004
- 2004-04-01 JP JP2006509567A patent/JP4488005B2/ja not_active Expired - Lifetime
- 2004-04-01 EP EP04759084.9A patent/EP1611482B1/fr not_active Expired - Lifetime
- 2004-04-01 EP EP15163158.7A patent/EP2921905B1/fr not_active Expired - Lifetime
- 2004-04-01 WO PCT/US2004/009993 patent/WO2004093160A2/fr active Application Filing
- 2004-04-01 CN CNA2004800096742A patent/CN1771463A/zh active Pending
- 2004-04-01 KR KR1020057019304A patent/KR101129213B1/ko active IP Right Grant
- 2004-04-01 EP EP17202526.4A patent/EP3352010A1/fr not_active Withdrawn
-
2005
- 2005-09-27 US US11/235,323 patent/US7397532B2/en not_active Expired - Fee Related
-
2006
- 2006-06-30 HK HK06107409.4A patent/HK1087195A1/xx not_active IP Right Cessation
-
2008
- 2008-06-03 US US12/155,377 patent/US8243253B2/en not_active Expired - Fee Related
-
2012
- 2012-07-06 US US13/543,238 patent/US9007561B2/en not_active Expired - Fee Related
-
2015
- 2015-03-09 US US14/642,030 patent/US20150177628A1/en not_active Abandoned
-
2016
- 2016-02-19 HK HK16101898.3A patent/HK1214000A1/zh not_active IP Right Cessation
-
2018
- 2018-11-22 HK HK18114938.6A patent/HK1255862A1/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US20150177628A1 (en) | 2015-06-25 |
| EP2921905A1 (fr) | 2015-09-23 |
| WO2004093160A2 (fr) | 2004-10-28 |
| KR20050120796A (ko) | 2005-12-23 |
| HK1214000A1 (zh) | 2016-07-15 |
| JP2006523027A (ja) | 2006-10-05 |
| EP2921905B1 (fr) | 2017-12-27 |
| US20060023181A1 (en) | 2006-02-02 |
| US20120268726A1 (en) | 2012-10-25 |
| US7397532B2 (en) | 2008-07-08 |
| US20080239261A1 (en) | 2008-10-02 |
| EP1611482A4 (fr) | 2008-10-15 |
| US8243253B2 (en) | 2012-08-14 |
| WO2004093160A3 (fr) | 2005-02-24 |
| CN1771463A (zh) | 2006-05-10 |
| HK1255862A1 (zh) | 2019-08-30 |
| EP1611482B1 (fr) | 2015-06-03 |
| EP1611482A2 (fr) | 2006-01-04 |
| EP3352010A1 (fr) | 2018-07-25 |
| US9007561B2 (en) | 2015-04-14 |
| KR101129213B1 (ko) | 2012-03-27 |
| JP4488005B2 (ja) | 2010-06-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20200401 |