HK1076197A1 - Replication and transfer of microstructures and nanostructures - Google Patents

Replication and transfer of microstructures and nanostructures

Info

Publication number
HK1076197A1
HK1076197A1 HK05109963.9A HK05109963A HK1076197A1 HK 1076197 A1 HK1076197 A1 HK 1076197A1 HK 05109963 A HK05109963 A HK 05109963A HK 1076197 A1 HK1076197 A1 HK 1076197A1
Authority
HK
Hong Kong
Prior art keywords
nanostructures
microstructures
replication
transfer
Prior art date
Application number
HK05109963.9A
Other languages
English (en)
Chinese (zh)
Inventor
Charles D Schaper
Original Assignee
Univ Leland Stanford Junior
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Leland Stanford Junior filed Critical Univ Leland Stanford Junior
Publication of HK1076197A1 publication Critical patent/HK1076197A1/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/44—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles
    • B29C33/52—Moulds or cores; Details thereof or accessories therefor with means for, or specially constructed to facilitate, the removal of articles, e.g. of undercut articles soluble or fusible
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
    • B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
    • B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
    • B81C1/0046—Surface micromachining, i.e. structuring layers on the substrate using stamping, e.g. imprinting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B82B3/0004—Apparatus specially adapted for the manufacture or treatment of nanostructural devices or systems or methods for manufacturing the same
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Mechanical Engineering (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
HK05109963.9A 2002-09-17 2005-11-08 Replication and transfer of microstructures and nanostructures HK1076197A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/246,379 US6849558B2 (en) 2002-05-22 2002-09-17 Replication and transfer of microstructures and nanostructures
PCT/US2003/029040 WO2004027460A2 (en) 2002-09-17 2003-09-17 Replication and transfer of microstructures and nanostructures

Publications (1)

Publication Number Publication Date
HK1076197A1 true HK1076197A1 (en) 2006-01-06

Family

ID=32028953

Family Applications (1)

Application Number Title Priority Date Filing Date
HK05109963.9A HK1076197A1 (en) 2002-09-17 2005-11-08 Replication and transfer of microstructures and nanostructures

Country Status (8)

Country Link
US (3) US6849558B2 (de)
EP (2) EP1540716B1 (de)
JP (3) JP4671690B2 (de)
KR (1) KR100700238B1 (de)
CN (3) CN100446192C (de)
AU (1) AU2003278818A1 (de)
HK (1) HK1076197A1 (de)
WO (1) WO2004027460A2 (de)

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JP2008311674A (ja) 2008-12-25
CN101398617A (zh) 2009-04-01
AU2003278818A8 (en) 2004-04-08
JP2005539396A (ja) 2005-12-22
US7981814B2 (en) 2011-07-19
EP2177950B1 (de) 2013-03-27
US6849558B2 (en) 2005-02-01
WO2004027460A2 (en) 2004-04-01
CN101231473A (zh) 2008-07-30
CN100446192C (zh) 2008-12-24
CN101231473B (zh) 2011-09-14
US20100044837A1 (en) 2010-02-25
US7345002B2 (en) 2008-03-18
JP2009218616A (ja) 2009-09-24
EP1540716A4 (de) 2008-12-24
KR20050019128A (ko) 2005-02-28
JP5102809B2 (ja) 2012-12-19
EP2177950A1 (de) 2010-04-21
EP1540716A2 (de) 2005-06-15
CN101398617B (zh) 2014-02-26
AU2003278818A1 (en) 2004-04-08
JP4671690B2 (ja) 2011-04-20
EP1540716B1 (de) 2014-11-05
JP5525707B2 (ja) 2014-06-18
US20060035164A1 (en) 2006-02-16
CN1659691A (zh) 2005-08-24
US20030219992A1 (en) 2003-11-27
KR100700238B1 (ko) 2007-03-26

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