FR2810041B1 - Monoacylalkylphosphines organometalliques, leur preparation et leur utilisation comme produits de depart dans la preparation de phosphines, leur oxydes et leurs sulfures - Google Patents
Monoacylalkylphosphines organometalliques, leur preparation et leur utilisation comme produits de depart dans la preparation de phosphines, leur oxydes et leurs sulfuresInfo
- Publication number
- FR2810041B1 FR2810041B1 FR0107438A FR0107438A FR2810041B1 FR 2810041 B1 FR2810041 B1 FR 2810041B1 FR 0107438 A FR0107438 A FR 0107438A FR 0107438 A FR0107438 A FR 0107438A FR 2810041 B1 FR2810041 B1 FR 2810041B1
- Authority
- FR
- France
- Prior art keywords
- preparation
- monoacylalkylphosphines
- phosphins
- sulfides
- organometallic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 150000003568 thioethers Chemical class 0.000 title 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/02—Phosphorus compounds
- C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
- C07F9/655—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms
- C07F9/65502—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms the oxygen atom being part of a three-membered ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/51—Phosphorus bound to oxygen
- C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
- C08K5/5397—Phosphine oxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/02—Printing inks
- C09D11/10—Printing inks based on artificial resins
- C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K6/00—Preparations for dentistry
- A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
- A61K6/62—Photochemical radical initiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Molecular Biology (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Wood Science & Technology (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Polymerization Catalysts (AREA)
- Paints Or Removers (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH11332000 | 2000-06-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2810041A1 FR2810041A1 (fr) | 2001-12-14 |
FR2810041B1 true FR2810041B1 (fr) | 2009-04-17 |
Family
ID=4559286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0107438A Expired - Fee Related FR2810041B1 (fr) | 2000-06-08 | 2001-06-07 | Monoacylalkylphosphines organometalliques, leur preparation et leur utilisation comme produits de depart dans la preparation de phosphines, leur oxydes et leurs sulfures |
Country Status (15)
Country | Link |
---|---|
US (3) | US6737549B2 (fr) |
JP (2) | JP4850353B2 (fr) |
KR (1) | KR100829076B1 (fr) |
CN (1) | CN1198831C (fr) |
BE (1) | BE1014218A5 (fr) |
BR (1) | BR0102319B1 (fr) |
CA (1) | CA2349829A1 (fr) |
DE (1) | DE10127171A1 (fr) |
ES (1) | ES2194584B1 (fr) |
FR (1) | FR2810041B1 (fr) |
GB (1) | GB2365430B (fr) |
IT (1) | ITMI20011201A1 (fr) |
MX (1) | MXPA01005780A (fr) |
NL (1) | NL1018251C2 (fr) |
TW (1) | TWI268932B (fr) |
Families Citing this family (44)
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GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
US20030164580A1 (en) * | 2000-09-14 | 2003-09-04 | Karsten Rinker | Acylphosphine oxide photoinitiators in methacrylate casting resins |
US7148382B2 (en) | 2001-08-21 | 2006-12-12 | Ciba Specialty Chemicals Corporation | Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators |
MXPA04004729A (es) * | 2001-11-20 | 2004-07-30 | Ciba Sc Holding Ag | Formas multimericas de acilfosfinas y sus derivados. |
JP2005524989A (ja) | 2002-05-08 | 2005-08-18 | フォーセン テクノロジー インク | 高効率固体光源及びその使用方法及びその製造方法 |
JP2005529167A (ja) * | 2002-06-11 | 2005-09-29 | チバ スペシャルティ ケミカルズ ホールディング インコーポレーテッド | モノ−およびビス−アシルホスフィンオキサイドのマルチマー形態 |
CA2522898A1 (fr) * | 2003-05-23 | 2004-12-02 | Ciba Specialty Chemicals Holding Inc. | Revetements de surface a forte adherence |
EP1678442B8 (fr) | 2003-10-31 | 2013-06-26 | Phoseon Technology, Inc. | Module lumineux à DEL et procédé de fabrication |
WO2005091392A1 (fr) | 2004-03-18 | 2005-09-29 | Phoseon Technology, Inc. | Micro-reflecteurs montes sur un substrat et destines a un reseau del haute densite |
US9281001B2 (en) | 2004-11-08 | 2016-03-08 | Phoseon Technology, Inc. | Methods and systems relating to light sources for use in industrial processes |
ATE496928T1 (de) * | 2004-11-23 | 2011-02-15 | Basf Se | Bisacylphosphane und ihre verwendung als photoinitiatoren, verfahren zur herstellung von acylphosphanen |
US20060160917A1 (en) | 2004-12-21 | 2006-07-20 | Seiko Epson Corporation | Ink composition |
GB2422678B (en) * | 2005-01-25 | 2009-03-11 | Photocentric Ltd | Method of making a photopolymer plate |
US8115213B2 (en) | 2007-02-08 | 2012-02-14 | Phoseon Technology, Inc. | Semiconductor light sources, systems, and methods |
EP2107347B1 (fr) * | 2008-04-04 | 2016-08-31 | Sensirion AG | Détecteur de flux avec boîtier |
DE102008018704B4 (de) * | 2008-04-07 | 2013-11-28 | Sächsische Walzengravur GmbH | Tiefdruck-oder Prägeform als Sleeve oder Zylinder |
DE102008029195A1 (de) * | 2008-06-19 | 2009-12-24 | Koenig & Bauer Aktiengesellschaft | Druckplatte zum Aufspannen auf einem Plattenzylinder einer Rotationsdruckmaschine |
US8653737B2 (en) | 2009-04-14 | 2014-02-18 | Phoseon Technology, Inc. | Controller for semiconductor lighting device |
US8678612B2 (en) | 2009-04-14 | 2014-03-25 | Phoseon Technology, Inc. | Modular light source |
US8465172B2 (en) | 2009-12-17 | 2013-06-18 | Phoseon Technology, Inc. | Lighting module with diffractive optical element |
US8669697B2 (en) | 2010-03-11 | 2014-03-11 | Phoseon Technology, Inc. | Cooling large arrays with high heat flux densities |
US8591078B2 (en) | 2010-06-03 | 2013-11-26 | Phoseon Technology, Inc. | Microchannel cooler for light emitting diode light fixtures |
BR112012029161B1 (pt) * | 2010-06-30 | 2019-09-24 | Dsm Ip Assets B.V. | Composição curável por radiação para fibra ótica, composição de revestimento de fibra ótica e composição curável por radiação |
US9357592B2 (en) | 2010-11-18 | 2016-05-31 | Phoseon Technology, Inc. | Light source temperature monitor and control |
GB201021603D0 (en) * | 2010-12-21 | 2011-02-02 | Fujifilm Imaging Colorants Ltd | Inks & printing process |
US8872137B2 (en) | 2011-09-15 | 2014-10-28 | Phoseon Technology, Inc. | Dual elliptical reflector with a co-located foci for curing optical fibers |
US9126432B2 (en) | 2011-09-20 | 2015-09-08 | Phoseon Technology, Inc. | Differential Ultraviolet curing using external optical elements |
JP6017573B2 (ja) | 2011-10-12 | 2016-11-02 | フォセオン テクノロジー, インコーポレイテッドPhoseon Technology, Inc. | 光ファイバーを硬化するための共同設置焦点を有する多重光収集とレンズの組合せ |
US8823279B2 (en) | 2011-10-27 | 2014-09-02 | Phoseon Technology, Inc. | Smart FET circuit |
US8931928B2 (en) | 2011-11-01 | 2015-01-13 | Phoseon Technology, Inc. | Removable window frame for lighting module |
US8851715B2 (en) | 2012-01-13 | 2014-10-07 | Phoseon Technology, Inc. | Lamp ventilation system |
US8888336B2 (en) | 2012-02-29 | 2014-11-18 | Phoseon Technology, Inc. | Air deflectors for heat management in a lighting module |
US8678622B2 (en) | 2012-04-27 | 2014-03-25 | Phoseon Technology, Inc. | Wrap-around window for lighting module |
DE102012212429A1 (de) | 2012-07-16 | 2014-01-16 | Voco Gmbh | Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials |
CN105284797A (zh) * | 2014-07-14 | 2016-02-03 | 国家电网公司 | 一种微胶囊型缓释驱鸟合剂的制备方法 |
CN110023058B (zh) | 2017-02-06 | 2021-08-10 | 惠普发展公司,有限责任合伙企业 | 3d打印 |
CN110177678B (zh) | 2017-02-06 | 2021-08-27 | 惠普发展公司,有限责任合伙企业 | 包含金属双(二硫醇烯)配合物的熔合剂 |
CN110267797B (zh) | 2017-04-17 | 2021-07-30 | 惠普发展公司,有限责任合伙企业 | 熔合剂 |
EP3409680B1 (fr) * | 2017-05-30 | 2021-01-06 | IGM Group B.V. | Synthèse de bis (acyle) phosphines par l'activation de phosphures métalliques non réactives |
TWI782066B (zh) | 2017-08-03 | 2022-11-01 | 德商漢高股份有限及兩合公司 | 可固化的聚矽氧光學透明黏著劑及其用途 |
JP2020531594A (ja) * | 2017-08-24 | 2020-11-05 | スージョウ・レインボー・マテリアルズ・カンパニー・リミテッドSuzhou Rainbow Materials Co., Ltd. | シリコーン高分子光開始剤およびその使用 |
KR20230148381A (ko) | 2017-12-27 | 2023-10-24 | 헨켈 아게 운트 코. 카게아아 | 광학적으로 투명한 감압성 접착제 및 그의 용도 |
EP3861002B1 (fr) * | 2018-10-01 | 2023-11-29 | Dow Toray Co., Ltd. | Composé d'organosilicium, son procédé de production et son utilisation |
EP3686252A1 (fr) * | 2019-01-24 | 2020-07-29 | Agfa-Gevaert Nv | Encre de jet d'encre durcissable par rayonnement pour la fabrication de cartes de circuit imprimé |
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GB9104050D0 (en) * | 1991-02-27 | 1991-04-17 | Ciba Geigy Ag | Compounds |
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ZA941879B (en) | 1993-03-18 | 1994-09-19 | Ciba Geigy | Curing compositions containing bisacylphosphine oxide photoinitiators |
TW381106B (en) | 1994-09-02 | 2000-02-01 | Ciba Sc Holding Ag | Alkoxyphenyl-substituted bisacylphosphine oxides |
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US5744511A (en) * | 1995-04-19 | 1998-04-28 | Tokuyama Corporation | Visible ray polymerization initiator and visible ray polymerizable composition |
CH691970A5 (de) | 1996-03-04 | 2001-12-14 | Ciba Sc Holding Ag | Alkylphenylbisacylphosphinoxide und Photoinitiatormischungen. |
SG53043A1 (en) | 1996-08-28 | 1998-09-28 | Ciba Geigy Ag | Molecular complex compounds as photoinitiators |
JPH11199610A (ja) * | 1998-01-16 | 1999-07-27 | Showa Denko Kk | 光硬化性組成物及び組成物中のビスアシルホスフィンオキサイド系化合物の安定化方法 |
IT1309578B1 (it) | 1998-02-27 | 2002-01-24 | Ciba Sc Holding Ag | Composizione fotoinduribile pigmentata. |
DE19812859A1 (de) * | 1998-03-24 | 1999-09-30 | Basf Ag | Photoinitiatorgemische |
US6888031B1 (en) * | 1998-11-30 | 2005-05-03 | Ciba Specialty Chemicals Corporation | Process for the preparation of acylphosphines, acyl oxides and acyl sulfides |
DE60006210T2 (de) | 1999-12-08 | 2004-07-15 | Ciba Specialty Chemicals Holding Inc. | Neues Photoinitiatorsystem aus Phosphinoxidverbindungen und wenig gefärbte härtbare Zusammensetzungen |
JP2001200007A (ja) * | 2000-01-19 | 2001-07-24 | Shin Etsu Chem Co Ltd | 光硬化性樹脂組成物及び光ファイバー用被覆材 |
GB2360283B (en) * | 2000-02-08 | 2002-08-21 | Ciba Sc Holding Ag | Monoacylarylphosphines and acylphosphine oxides and sulphides |
GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
-
2001
- 2001-05-24 GB GB0112580A patent/GB2365430B/en not_active Expired - Fee Related
- 2001-05-31 US US09/871,373 patent/US6737549B2/en not_active Expired - Fee Related
- 2001-06-05 DE DE10127171A patent/DE10127171A1/de not_active Withdrawn
- 2001-06-06 TW TW090113664A patent/TWI268932B/zh not_active IP Right Cessation
- 2001-06-06 CA CA002349829A patent/CA2349829A1/fr not_active Abandoned
- 2001-06-07 BE BE2001/0389A patent/BE1014218A5/fr not_active IP Right Cessation
- 2001-06-07 CN CNB011208988A patent/CN1198831C/zh not_active Expired - Fee Related
- 2001-06-07 FR FR0107438A patent/FR2810041B1/fr not_active Expired - Fee Related
- 2001-06-07 KR KR1020010031746A patent/KR100829076B1/ko not_active IP Right Cessation
- 2001-06-07 ES ES200101326A patent/ES2194584B1/es not_active Expired - Fee Related
- 2001-06-07 IT IT2001MI001201A patent/ITMI20011201A1/it unknown
- 2001-06-08 MX MXPA01005780A patent/MXPA01005780A/es active IP Right Grant
- 2001-06-08 BR BRPI0102319-5A patent/BR0102319B1/pt not_active IP Right Cessation
- 2001-06-08 JP JP2001174045A patent/JP4850353B2/ja not_active Expired - Fee Related
- 2001-06-08 NL NL1018251A patent/NL1018251C2/nl not_active IP Right Cessation
-
2002
- 2002-10-25 US US10/280,819 patent/US7026017B2/en not_active Expired - Fee Related
- 2002-10-25 US US10/280,820 patent/US6969733B2/en not_active Expired - Fee Related
-
2011
- 2011-06-15 JP JP2011133344A patent/JP2011251965A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
GB2365430B (en) | 2002-08-28 |
NL1018251C2 (nl) | 2002-02-18 |
ITMI20011201A1 (it) | 2002-12-07 |
GB2365430A (en) | 2002-02-20 |
ES2194584B1 (es) | 2005-03-16 |
CN1198831C (zh) | 2005-04-27 |
BE1014218A5 (fr) | 2003-06-03 |
CN1329005A (zh) | 2002-01-02 |
TWI268932B (en) | 2006-12-21 |
NL1018251A1 (nl) | 2001-12-14 |
US20030130370A1 (en) | 2003-07-10 |
US20020026049A1 (en) | 2002-02-28 |
CA2349829A1 (fr) | 2001-12-08 |
US6737549B2 (en) | 2004-05-18 |
JP2011251965A (ja) | 2011-12-15 |
KR100829076B1 (ko) | 2008-05-14 |
US7026017B2 (en) | 2006-04-11 |
JP4850353B2 (ja) | 2012-01-11 |
DE10127171A1 (de) | 2001-12-13 |
FR2810041A1 (fr) | 2001-12-14 |
JP2002069085A (ja) | 2002-03-08 |
ES2194584A1 (es) | 2003-11-16 |
BR0102319B1 (pt) | 2012-05-29 |
MXPA01005780A (es) | 2008-02-26 |
US20030139485A1 (en) | 2003-07-24 |
KR20010111021A (ko) | 2001-12-15 |
US6969733B2 (en) | 2005-11-29 |
GB0112580D0 (en) | 2001-07-18 |
BR0102319A (pt) | 2002-05-28 |
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