BR0102319B1 - monoacil-alquilfosfinas organometálicas, processos para sua preparação, composição fotocurável, processo para fotopo-limerização dos referidos compostos, uso da referida composição, substrato revestido, bem como processo para produção fotográfica de imagens em relevo. - Google Patents

monoacil-alquilfosfinas organometálicas, processos para sua preparação, composição fotocurável, processo para fotopo-limerização dos referidos compostos, uso da referida composição, substrato revestido, bem como processo para produção fotográfica de imagens em relevo.

Info

Publication number
BR0102319B1
BR0102319B1 BRPI0102319-5A BR0102319A BR0102319B1 BR 0102319 B1 BR0102319 B1 BR 0102319B1 BR 0102319 A BR0102319 A BR 0102319A BR 0102319 B1 BR0102319 B1 BR 0102319B1
Authority
BR
Brazil
Prior art keywords
composition
alkylphosphines
monoacyl
photopolymerization
organometallic
Prior art date
Application number
BRPI0102319-5A
Other languages
English (en)
Other versions
BR0102319A (pt
Inventor
Jean-Pierre Wolf
Gebhard Hug
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BR0102319A publication Critical patent/BR0102319A/pt
Publication of BR0102319B1 publication Critical patent/BR0102319B1/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
    • C07F9/02—Phosphorus compounds
    • C07F9/547—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom
    • C07F9/655—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms
    • C07F9/65502—Heterocyclic compounds, e.g. containing phosphorus as a ring hetero atom having oxygen atoms, with or without sulfur, selenium, or tellurium atoms, as the only ring hetero atoms the oxygen atom being part of a three-membered ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397—Phosphine oxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/10—Printing inks based on artificial resins
    • C09D11/101—Inks specially adapted for printing processes involving curing by wave energy or particle radiation, e.g. with UV-curing following the printing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/60—Preparations for dentistry comprising organic or organo-metallic additives
    • A61K6/62—Photochemical radical initiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0384—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the main chain of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
BRPI0102319-5A 2000-06-08 2001-06-08 monoacil-alquilfosfinas organometálicas, processos para sua preparação, composição fotocurável, processo para fotopo-limerização dos referidos compostos, uso da referida composição, substrato revestido, bem como processo para produção fotográfica de imagens em relevo. BR0102319B1 (pt)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH11332000 2000-06-08

Publications (2)

Publication Number Publication Date
BR0102319A BR0102319A (pt) 2002-05-28
BR0102319B1 true BR0102319B1 (pt) 2012-05-29

Family

ID=4559286

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0102319-5A BR0102319B1 (pt) 2000-06-08 2001-06-08 monoacil-alquilfosfinas organometálicas, processos para sua preparação, composição fotocurável, processo para fotopo-limerização dos referidos compostos, uso da referida composição, substrato revestido, bem como processo para produção fotográfica de imagens em relevo.

Country Status (15)

Country Link
US (3) US6737549B2 (pt)
JP (2) JP4850353B2 (pt)
KR (1) KR100829076B1 (pt)
CN (1) CN1198831C (pt)
BE (1) BE1014218A5 (pt)
BR (1) BR0102319B1 (pt)
CA (1) CA2349829A1 (pt)
DE (1) DE10127171A1 (pt)
ES (1) ES2194584B1 (pt)
FR (1) FR2810041B1 (pt)
GB (1) GB2365430B (pt)
IT (1) ITMI20011201A1 (pt)
MX (1) MXPA01005780A (pt)
NL (1) NL1018251C2 (pt)
TW (1) TWI268932B (pt)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
BR0113872A (pt) * 2000-09-14 2003-07-22 Ciba Sc Holding Ag Fotoiniciadores de óxido de acilfosfina em resinas de moldagem de metacrilato
EP1423757B1 (en) 2001-08-21 2009-04-29 Ciba Holding Inc. Bathochromic mono- and bis-acylphosphine oxides and sulfides and their use as photoinitiators
CA2467576A1 (en) * 2001-11-20 2003-05-30 Jean-Pierre Wolf Multimer forms of acylphosphines and their derivatives
WO2003096387A2 (en) 2002-05-08 2003-11-20 Phoseon Technology, Inc. High efficiency solid-state light source and methods of use and manufacture
DE60322388D1 (de) * 2002-06-11 2008-09-04 Ciba Holding Inc Multimere formen von mono- und bis-acylphosphinoxiden
MXPA05012091A (es) * 2003-05-23 2006-02-08 Ciba Sc Holding Ag Recubrimientos superficiales fuertemente adherentes.
US7819550B2 (en) 2003-10-31 2010-10-26 Phoseon Technology, Inc. Collection optics for led array with offset hemispherical or faceted surfaces
WO2005091392A1 (en) 2004-03-18 2005-09-29 Phoseon Technology, Inc. Micro-reflectors on a substrate for high-density led array
JP5148283B2 (ja) * 2004-11-23 2013-02-20 チバ ホールディング インコーポレーテッド アシルホスファン及びその誘導体の製造方法
US20060160917A1 (en) 2004-12-21 2006-07-20 Seiko Epson Corporation Ink composition
KR101288758B1 (ko) 2004-12-30 2013-07-23 포세온 테크날러지 인코퍼레이티드 산업 공정에서 광원을 사용하는 시스템 및 방법
GB2422678B (en) * 2005-01-25 2009-03-11 Photocentric Ltd Method of making a photopolymer plate
US8115213B2 (en) 2007-02-08 2012-02-14 Phoseon Technology, Inc. Semiconductor light sources, systems, and methods
EP2107347B1 (en) * 2008-04-04 2016-08-31 Sensirion AG Flow detector with a housing
DE202008009068U1 (de) * 2008-04-07 2008-09-18 Sächsische Walzengravur GmbH Tiefdruck- oder Prägeform als Sleeve oder Zylinder
DE102008029195A1 (de) * 2008-06-19 2009-12-24 Koenig & Bauer Aktiengesellschaft Druckplatte zum Aufspannen auf einem Plattenzylinder einer Rotationsdruckmaschine
US8653737B2 (en) 2009-04-14 2014-02-18 Phoseon Technology, Inc. Controller for semiconductor lighting device
US8678612B2 (en) 2009-04-14 2014-03-25 Phoseon Technology, Inc. Modular light source
US8465172B2 (en) 2009-12-17 2013-06-18 Phoseon Technology, Inc. Lighting module with diffractive optical element
US8669697B2 (en) 2010-03-11 2014-03-11 Phoseon Technology, Inc. Cooling large arrays with high heat flux densities
US8591078B2 (en) 2010-06-03 2013-11-26 Phoseon Technology, Inc. Microchannel cooler for light emitting diode light fixtures
KR101555800B1 (ko) * 2010-06-30 2015-09-24 디에스엠 아이피 어셋츠 비.브이. D1479 안정한 액체 비스(아실)포스핀 광 개시제 및 방사선 경화성 조성물에서 이의 용도
US9357592B2 (en) 2010-11-18 2016-05-31 Phoseon Technology, Inc. Light source temperature monitor and control
GB201021603D0 (en) * 2010-12-21 2011-02-02 Fujifilm Imaging Colorants Ltd Inks & printing process
US8872137B2 (en) 2011-09-15 2014-10-28 Phoseon Technology, Inc. Dual elliptical reflector with a co-located foci for curing optical fibers
US9126432B2 (en) 2011-09-20 2015-09-08 Phoseon Technology, Inc. Differential Ultraviolet curing using external optical elements
EP2766762B1 (en) 2011-10-12 2019-07-17 Phoseon Technology, Inc. Multiple light collection and lens combinations with co-located foci for curing optical fibers
US8823279B2 (en) 2011-10-27 2014-09-02 Phoseon Technology, Inc. Smart FET circuit
US8931928B2 (en) 2011-11-01 2015-01-13 Phoseon Technology, Inc. Removable window frame for lighting module
US8851715B2 (en) 2012-01-13 2014-10-07 Phoseon Technology, Inc. Lamp ventilation system
US8888336B2 (en) 2012-02-29 2014-11-18 Phoseon Technology, Inc. Air deflectors for heat management in a lighting module
US8678622B2 (en) 2012-04-27 2014-03-25 Phoseon Technology, Inc. Wrap-around window for lighting module
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
CN105284797A (zh) * 2014-07-14 2016-02-03 国家电网公司 一种微胶囊型缓释驱鸟合剂的制备方法
US10781228B2 (en) 2017-02-06 2020-09-22 Hewlett-Packard Development Company, L.P. Fusing agent including a metal bis(dithiolene) complex
EP3519157B1 (en) 2017-02-06 2022-11-09 Hewlett-Packard Development Company, L.P. 3d printing
US11383433B2 (en) 2017-04-17 2022-07-12 Hewlett-Packard Development Company, L.P. Fusing agent(s)
EP3409680B1 (en) * 2017-05-30 2021-01-06 IGM Group B.V. Synthesis of bis(acyl)phosphines by activation of unreactive metal phosphides
TWI782066B (zh) 2017-08-03 2022-11-01 德商漢高股份有限及兩合公司 可固化的聚矽氧光學透明黏著劑及其用途
WO2019037016A1 (en) * 2017-08-24 2019-02-28 Henkel IP & Holding GmbH SILICONE POLYMER PHOTO-INITIATOR AND USES THEREOF
CN111527170B (zh) 2017-12-27 2022-12-09 汉高股份有限及两合公司 光学透明的压敏粘合剂及其用途
EP3861002B1 (en) * 2018-10-01 2023-11-29 Dow Toray Co., Ltd. Organosilicon compound, method for producing thereof, and use thereof
EP3686252A1 (en) * 2019-01-24 2020-07-29 Agfa-Gevaert Nv Radiation curable inkjet ink for manufacturing printed circuit boards

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2830927A1 (de) * 1978-07-14 1980-01-31 Basf Ag Acylphosphinoxidverbindungen und ihre verwendung
DE2909994A1 (de) * 1979-03-14 1980-10-02 Basf Ag Acylphosphinoxidverbindungen, ihre herstellung und verwendung
DE2909992A1 (de) * 1979-03-14 1980-10-02 Basf Ag Photopolymerisierbare aufzeichnungsmassen, insbesondere zur herstellung von druckplatten und reliefformen
DE3020092A1 (de) 1980-05-27 1981-12-10 Basf Ag, 6700 Ludwigshafen Acylphosphinverbindungen und ihre verwendung
DE3034697A1 (de) * 1980-09-15 1982-05-06 Basf Ag, 6700 Ludwigshafen Acylphosphinsulfidverbindungen, ihre herstellung und verwendung
DE3139984A1 (de) 1981-10-08 1983-04-28 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von acylphosphinoxiden
DE3443221A1 (de) * 1984-11-27 1986-06-05 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Bisacylphosphinoxide, ihre herstellung und verwendung
KR0168316B1 (ko) * 1989-08-04 1999-03-30 시바 스페셜티 케미칼스 홀딩 인코포레이티드 모노-및 디-아실포스핀 옥사이드
US5218009A (en) 1989-08-04 1993-06-08 Ciba-Geigy Corporation Mono- and di-acylphosphine oxides
DE59010615D1 (de) * 1989-08-04 1997-02-06 Ciba Geigy Ag Mono- und Diacylphosphinoxide
EP0495752B1 (de) * 1991-01-14 1995-03-01 Ciba-Geigy Ag Bisacylphosphinsulfide
US5368985A (en) 1991-01-14 1994-11-29 Ciba-Geigy Corporation Bisacylphosphine sulfides
EP0495751A1 (de) 1991-01-14 1992-07-22 Ciba-Geigy Ag Bisacylphosphine
GB9104050D0 (en) * 1991-02-27 1991-04-17 Ciba Geigy Ag Compounds
RU2091385C1 (ru) * 1991-09-23 1997-09-27 Циба-Гейги АГ Бисацилфосфиноксиды, состав и способ нанесения покрытий
ES2059261B1 (es) 1992-10-08 1995-11-16 Ciba Geigy Ag Alquil-bisacilfosfinoxidos.
ZA941879B (en) * 1993-03-18 1994-09-19 Ciba Geigy Curing compositions containing bisacylphosphine oxide photoinitiators
TW381106B (en) 1994-09-02 2000-02-01 Ciba Sc Holding Ag Alkoxyphenyl-substituted bisacylphosphine oxides
AU682793B2 (en) 1994-09-08 1997-10-16 Ciba Specialty Chemicals Holding Inc. Novel acylphosphine oxides
US5744511A (en) * 1995-04-19 1998-04-28 Tokuyama Corporation Visible ray polymerization initiator and visible ray polymerizable composition
SE520727C2 (sv) * 1996-03-04 2003-08-19 Ciba Sc Holding Ag Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar
SG53043A1 (en) 1996-08-28 1998-09-28 Ciba Geigy Ag Molecular complex compounds as photoinitiators
JPH11199610A (ja) * 1998-01-16 1999-07-27 Showa Denko Kk 光硬化性組成物及び組成物中のビスアシルホスフィンオキサイド系化合物の安定化方法
IT1309578B1 (it) 1998-02-27 2002-01-24 Ciba Sc Holding Ag Composizione fotoinduribile pigmentata.
DE19812859A1 (de) * 1998-03-24 1999-09-30 Basf Ag Photoinitiatorgemische
ES2180347T5 (es) * 1998-11-30 2007-04-01 Ciba Specialty Chemicals Holding Inc. Procedimiento para la preparacion de acilfosfinas y derivados.
ATE253082T1 (de) 1999-12-08 2003-11-15 Ciba Sc Holding Ag Neues photoinitiatorsystem aus phosphinoxidverbindungen und wenig gefärbte härtbare zusammensetzungen
JP2001200007A (ja) * 2000-01-19 2001-07-24 Shin Etsu Chem Co Ltd 光硬化性樹脂組成物及び光ファイバー用被覆材
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates

Also Published As

Publication number Publication date
US6969733B2 (en) 2005-11-29
ES2194584B1 (es) 2005-03-16
US20020026049A1 (en) 2002-02-28
KR20010111021A (ko) 2001-12-15
NL1018251A1 (nl) 2001-12-14
FR2810041B1 (fr) 2009-04-17
BE1014218A5 (fr) 2003-06-03
ITMI20011201A1 (it) 2002-12-07
FR2810041A1 (fr) 2001-12-14
US20030139485A1 (en) 2003-07-24
CN1329005A (zh) 2002-01-02
US7026017B2 (en) 2006-04-11
MXPA01005780A (es) 2008-02-26
CA2349829A1 (en) 2001-12-08
JP2002069085A (ja) 2002-03-08
GB0112580D0 (en) 2001-07-18
ES2194584A1 (es) 2003-11-16
JP2011251965A (ja) 2011-12-15
BR0102319A (pt) 2002-05-28
KR100829076B1 (ko) 2008-05-14
NL1018251C2 (nl) 2002-02-18
US20030130370A1 (en) 2003-07-10
GB2365430B (en) 2002-08-28
DE10127171A1 (de) 2001-12-13
CN1198831C (zh) 2005-04-27
GB2365430A (en) 2002-02-20
JP4850353B2 (ja) 2012-01-11
TWI268932B (en) 2006-12-21
US6737549B2 (en) 2004-05-18

Similar Documents

Publication Publication Date Title
BR0102319B1 (pt) monoacil-alquilfosfinas organometálicas, processos para sua preparação, composição fotocurável, processo para fotopo-limerização dos referidos compostos, uso da referida composição, substrato revestido, bem como processo para produção fotográfica de imagens em relevo.
BR9807502B1 (pt) compostos orgÂnicos, processo para sua preparaÇço, bem como composiÇço e aplicaÇço dos mesmos.
BR0009780B1 (pt) processo para preparar um complexo de cisplatina
TW200604609A (en) Method for manufacturing a master, master, method for manufacturing optical elements and optical element
BR0103931B1 (pt) processo para formar um revestimento contendo alumÍnio.
BR9804378B1 (pt) compostos, processo para sua produção e uso.
DE60237515D1 (de) Laserspektraltechnik für einen lithographischen prozess
ATE556074T1 (de) Neue imidazoä1,5-aüpyridinderivate, verfahren zu deren herstellung und pharmazeutische zusammensetzungen, die diese enthalten
DE602004021120D1 (de) Photopolymerisierbare zusammensetzung.
BR0111020B1 (pt) composição de revestimento fotoativável, processo para produção de uma camada de revestimento, e, uso de uma composição de revestimento.
BR9911129B1 (pt) n-alquiluretanos (i) de fructanos, seu uso, bem como sua composiÇço e processo para sua produÇço.
BRPI0508969A (pt) compostos orgánicos
DOP2002000433A (es) 2-tio-3,5-diciano-4-fenil-6-aminopiridinas substituidas y su uso
BR0017030B8 (pt) derivados de tiazolilamida, processo para sua preparação, composição farmacêutica que os compreende e uso dos mesmos
SG146614A1 (en) Lithographic apparatus and device manufacturing method using multiple exposures and multiple exposure types
AR021708A1 (es) Proceso para elaborar un recubrimiento antiadherente.
BRPI0415203A (pt) pentanóis reestruturados, um processo para sua produção e seu uso como agentes antiinflamatórios
BR0013316A (pt) Derivados substituìdos de 2-dialquilaminoalquilbifenila, seu processo de fabricação e seu uso.
BR0211391B1 (pt) processo para preparaÇço de 4-aminodifenilaminas.
DE502004004729D1 (de) Verfahren zur Herstellung von zwei überlagernden Mikrostrukturen
FR2798130B1 (fr) Compose, composition organique pour film anti-reflechissant et procede de formation d'un motif de film anti-reflechissant
FR2798129B1 (fr) Compose, composition organique pour film anti-reflechissant et procede de formation d'un motif de film anti-reflechissant
BR0215161B1 (pt) processo para aplicar um revestimento.
DE60118742D1 (de) Arzneistoffabgabesystem für wasser schwerlösliche arzneimittel
BR0211085B1 (pt) processo para a produÇço de Éteres, tipicamente thf.

Legal Events

Date Code Title Description
B06A Patent application procedure suspended [chapter 6.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 29/05/2012, OBSERVADAS AS CONDICOES LEGAIS.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE 13A., 14A. E 15A. ANUIDADE(S)

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)