FI931253A0 - Nya oniumborater eller borater av en organometallkomplex, som aer katjoniska polymerationsinitiatorer - Google Patents
Nya oniumborater eller borater av en organometallkomplex, som aer katjoniska polymerationsinitiatorerInfo
- Publication number
- FI931253A0 FI931253A0 FI931253A FI931253A FI931253A0 FI 931253 A0 FI931253 A0 FI 931253A0 FI 931253 A FI931253 A FI 931253A FI 931253 A FI931253 A FI 931253A FI 931253 A0 FI931253 A0 FI 931253A0
- Authority
- FI
- Finland
- Prior art keywords
- borater
- polymerationinitiatorer
- organometallkomplex
- nya
- eller
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/72—Complexes of boron halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
- C07F5/02—Boron compounds
- C07F5/022—Boron compounds without C-boron linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F4/00—Polymerisation catalysts
- C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
- C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
- C08F4/52—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides selected from boron, aluminium, gallium, indium, thallium or rare earths
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/22—Di-epoxy compounds
- C08G59/24—Di-epoxy compounds carbocyclic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Polymerization Catalysts (AREA)
- Epoxy Resins (AREA)
- Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9203440A FR2688783A1 (fr) | 1992-03-23 | 1992-03-23 | Nouveaux borates d'onium ou de complexe organometallique amorceurs cationiques de polymerisation. |
FR9203440 | 1992-03-23 |
Publications (3)
Publication Number | Publication Date |
---|---|
FI931253A0 true FI931253A0 (fi) | 1993-03-22 |
FI931253A FI931253A (fi) | 1993-09-24 |
FI110187B FI110187B (fi) | 2002-12-13 |
Family
ID=9427943
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI931253A FI110187B (fi) | 1992-03-23 | 1993-03-22 | Uudet oniumboraatit tai organometallikompleksin boraatit, jotka ovat kationisia polymerointi-initiaattoreita |
Country Status (9)
Country | Link |
---|---|
US (4) | US5468902A (fi) |
EP (1) | EP0562897B1 (fi) |
JP (1) | JP2557782B2 (fi) |
AU (1) | AU660218B2 (fi) |
CA (1) | CA2092135C (fi) |
DE (1) | DE69325537T2 (fi) |
ES (1) | ES2133368T3 (fi) |
FI (1) | FI110187B (fi) |
FR (1) | FR2688783A1 (fi) |
Families Citing this family (114)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6147184A (en) * | 1992-03-23 | 2000-11-14 | Rhone-Poulenc Chimie | Onium borates/borates of organometallic complexes and cationic initiation of polymerization therewith |
DE69331777T2 (de) * | 1992-06-23 | 2002-08-29 | Dow Chemical Co | Verfahren zur herstellung von tetrakisfluorophenylborat |
FR2702485B1 (fr) * | 1993-03-10 | 1995-04-14 | Rhone Poulenc Chimie | Compositions à base de polyorganosiloxanes réticulables par voie cationique et leur utilisation dans le domaine de l'antiadhérence papier, de la protection des fibres optiques et des circuits imprimés. |
US5514728A (en) * | 1993-07-23 | 1996-05-07 | Minnesota Mining And Manufacturing Company | Catalysts and initiators for polymerization |
FR2724660B1 (fr) * | 1994-09-16 | 1997-01-31 | Rhone Poulenc Chimie | Amorceurs de reticulation, par voie cationique, de polymeres a groupements organofonctionnels, compositions a base de polyorganosiloxanes reticulables et contenant ces amorceurs et application desdites compositions en antiadherence |
FR2727416A1 (fr) * | 1994-11-24 | 1996-05-31 | Rhone Poulenc Chimie | Nouveaux amorceurs cationiques thermoactivables, de polymerisation et/ou de reticulation et compositions monomeres et/ou polymeres fonctionnels les mettant en oeuvre |
US5744511A (en) * | 1995-04-19 | 1998-04-28 | Tokuyama Corporation | Visible ray polymerization initiator and visible ray polymerizable composition |
AU717137B2 (en) * | 1995-11-24 | 2000-03-16 | Ciba Specialty Chemicals Holding Inc. | Borate coinitiators for photopolymerization |
TW466256B (en) | 1995-11-24 | 2001-12-01 | Ciba Sc Holding Ag | Borate photoinitiator compounds and compositions comprising the same |
JP3937466B2 (ja) * | 1995-12-28 | 2007-06-27 | 東洋インキ製造株式会社 | 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物および硬化性組成物 |
US6274752B1 (en) | 1996-02-20 | 2001-08-14 | Northwestern University | Organo-Lewis acid as cocatalyst for cationic homogeneous Ziegler-Natta olefin polymerizations |
US5856256A (en) * | 1996-02-20 | 1999-01-05 | Northwestern University | Organo-Lewis acid as cocatalyst for cationic homogeneous Ziegler-Natta olefin polymerizations |
US6291695B1 (en) | 1996-02-20 | 2001-09-18 | Northwestern University | Organo-Lewis acids of enhanced utility, uses thereof, and products based thereon |
US5703137A (en) * | 1996-03-14 | 1997-12-30 | Rhone-Poulenc Chimie | Initiators for the cationic crosslinking of polymers containing organofunctional groups |
WO1997035893A1 (en) * | 1996-03-27 | 1997-10-02 | The Dow Chemical Company | Highly soluble olefin polymerization catalyst activator |
TW460509B (en) | 1996-07-12 | 2001-10-21 | Ciba Sc Holding Ag | Curing process for cationically photocurable formulations |
FR2757529B1 (fr) * | 1996-12-24 | 1999-03-05 | Rhodia Chimie Sa | Compositions stables a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adherents |
FR2766490B1 (fr) * | 1997-07-23 | 1999-10-08 | Rhodia Chimie Sa | Nouveaux systemes amorceurs de polymerisation et/ou de reticulation comprenant un borate d'onium et une benzophenone |
FR2766491B1 (fr) * | 1997-07-23 | 1999-10-08 | Rhodia Chimie Sa | Nouveaux systemes amorceurs de polymerisation et/ou de reticulation comprenant un borate d'onium et une benzophenone |
US6002044A (en) * | 1997-11-12 | 1999-12-14 | Showa Denko K.K. | Production method of borate compounds |
US6022643A (en) * | 1997-12-08 | 2000-02-08 | Brookhaven Science Associates | Boron compounds as anion binding agents for nonaqueous battery electrolytes |
FR2784025B1 (fr) | 1998-10-02 | 2002-10-31 | Rhodia Chimie Sa | Composition dentaire a base d'une silicone fonctionnalisee reticulable/polymerisable par voie cationique |
FR2784024B1 (fr) * | 1998-10-02 | 2002-10-31 | Rhodia Chimie Sa | Composition dentaire a base d'une silicone fonctionnalisee reticulable/polymerisable par voie cationique en presence d'un borate d'un complexe organometallique |
US6587628B1 (en) | 1999-11-22 | 2003-07-01 | 3M Innovative Properties Company | Optical fiber with improved strength in high humidity/high temperature environments |
US6162950A (en) * | 1999-12-03 | 2000-12-19 | Albemarle Corporation | Preparation of alkali metal tetrakis(F aryl)borates |
US6169208B1 (en) | 1999-12-03 | 2001-01-02 | Albemarle Corporation | Process for producing a magnesium di[tetrakis(Faryl)borate] and products therefrom |
US6377102B2 (en) * | 2000-02-29 | 2002-04-23 | Texas Instruments Incorporated | Load equalization in digital delay interpolators |
WO2002046263A1 (de) * | 2000-12-08 | 2002-06-13 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Harzformulierung, verfahren zu ihrer härtung und ihre verwendung |
FR2818553B1 (fr) * | 2000-12-22 | 2003-02-07 | Rhodia Chimie Sa | Composition dentaire a base d'une silicone fonctionnalisee reticulaire et/ou polymerisable par voie thermique |
US6895156B2 (en) | 2001-10-09 | 2005-05-17 | 3M Innovative Properties Company | Small diameter, high strength optical fiber |
FR2833484B1 (fr) * | 2001-12-18 | 2004-12-10 | Rhodia Chimie Sa | Composition dentaire a base de solution de silice colloidale en phase continue silicone |
US6649716B2 (en) | 2001-12-18 | 2003-11-18 | Sunoco, Inc. (R&M) | Polymerization of alpha-methylstyrene |
US6918984B2 (en) * | 2002-06-24 | 2005-07-19 | Loctite (R&D) Limited | Photocurable adhesive compositions, reaction products of which have low halide ion content |
US20050059752A1 (en) | 2002-07-12 | 2005-03-17 | Rhodia Chimie | Stable, cationically polymerizable/crosslinkable dental compositions having high filler contents |
EP1532487A1 (en) | 2002-08-30 | 2005-05-25 | Toyo Gosei Co., Ltd. | Radiation-sensitive negative-type resist composition for pattern formation and pattern formation method |
US6831200B2 (en) * | 2002-10-03 | 2004-12-14 | Albemarle Corporation | Process for producing tetrakis(Faryl)borate salts |
EP1583740B1 (en) * | 2002-12-23 | 2010-05-26 | STX Aprilis, Inc. | Fluoroarylsulfonium photoacid generators |
US20050003216A1 (en) | 2003-06-30 | 2005-01-06 | Jean-Marc Frances | Microparticle containing silicone release coatings having improved anti-block and release properties |
WO2005089355A2 (en) * | 2004-03-16 | 2005-09-29 | Cornell Research Foundation, Inc. | Environmentally friendly photoacid generators (pags) with no perfluorooctyl sulfonates (pfos) |
JP5095208B2 (ja) * | 2004-05-28 | 2012-12-12 | サンアプロ株式会社 | 新規なオニウムおよび遷移金属錯体のフッ素化アルキルフルオロリン酸塩 |
KR100698917B1 (ko) | 2004-06-22 | 2007-03-22 | 미쓰이 가가쿠 가부시키가이샤 | 이온성 화합물 및 그것을 함유하는 수지 조성물과 그 용도 |
US7498123B2 (en) * | 2005-03-03 | 2009-03-03 | Exciton, Inc. | Infrared dye compositions |
JP2007051193A (ja) | 2005-08-17 | 2007-03-01 | Fujifilm Corp | インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版 |
US7618683B2 (en) | 2006-01-12 | 2009-11-17 | Fujifilm Corporation | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate |
DE102006005103A1 (de) * | 2006-02-04 | 2007-08-09 | Merck Patent Gmbh | Oxonium- und Sulfoniumsalze |
WO2007124092A2 (en) * | 2006-04-21 | 2007-11-01 | Cornell Research Foundation, Inc. | Photoacid generator compounds and compositions |
US7524614B2 (en) * | 2006-05-26 | 2009-04-28 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
US8030401B1 (en) | 2006-08-03 | 2011-10-04 | Henkel Corporation | Photoinitiated cationic epoxy compositions |
JO3598B1 (ar) | 2006-10-10 | 2020-07-05 | Infinity Discovery Inc | الاحماض والاسترات البورونية كمثبطات اميد هيدروليز الحامض الدهني |
US7714037B1 (en) | 2006-12-15 | 2010-05-11 | Henkel Corporation | Photoinitiated cationic epoxy compositions and articles exhibiting low color |
GB2450975B (en) | 2007-07-12 | 2010-02-24 | Ciba Holding Inc | Yellow radiation curing inks |
US7705064B2 (en) * | 2007-07-23 | 2010-04-27 | Henkel Corporation | Photosensitive compounds, photopolymerizable compositions including the same, and methods of making and using the same |
CN101842409B (zh) | 2007-11-01 | 2013-05-01 | 株式会社Adeka | 盐化合物、阳离子聚合引发剂及阳离子聚合性组合物 |
JP4901889B2 (ja) * | 2008-02-18 | 2012-03-21 | ソニーケミカル&インフォメーションデバイス株式会社 | 磁性シート組成物、磁性シート、及び磁性シートの製造方法 |
JP5101343B2 (ja) | 2008-03-03 | 2012-12-19 | 株式会社ダイセル | 微細構造物の製造方法 |
US8163461B2 (en) * | 2008-04-09 | 2012-04-24 | Cornell Research Foundation, Inc. | Photoacid generator compounds and compositions |
CA2721060A1 (en) | 2008-04-09 | 2009-10-15 | Infinity Pharmaceuticals, Inc. | Inhibitors of fatty acid amide hydrolase |
US8309633B2 (en) * | 2008-07-17 | 2012-11-13 | Henkel Ireland Ltd. | Low temperature, cationically curable compositions with improved cure speed and toughness |
JP5444702B2 (ja) | 2008-12-05 | 2014-03-19 | デクセリアルズ株式会社 | 新規なスルホニウムボレート錯体 |
US8188161B1 (en) | 2009-01-23 | 2012-05-29 | Henkel Corporation | Anaerobic cure systems for anaerobic curable compositions, and anaerobic curable compositions containing same |
WO2010128649A1 (ja) | 2009-05-08 | 2010-11-11 | 株式会社日本触媒 | ジアリールヨードニウム塩混合物とその製造方法、並びにジアリールヨードニウム化合物の製造方法 |
JP5485583B2 (ja) * | 2009-05-08 | 2014-05-07 | 株式会社日本触媒 | ジアリールヨードニウム化合物の製造方法 |
WO2010140547A1 (ja) * | 2009-06-02 | 2010-12-09 | 山本化成株式会社 | ヨードニウム系光重合開始剤、その製造方法およびこれを含有してなる光硬化性組成物 |
KR101650800B1 (ko) | 2009-10-01 | 2016-08-24 | 히타치가세이가부시끼가이샤 | 유기 일렉트로닉스용 재료, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 및 그것을 사용한 표시 소자, 조명 장치, 표시 장치 |
EP2495234B1 (en) | 2009-10-26 | 2018-06-06 | Adeka Corporation | Aromatic sulfonium salt compound |
JP5717959B2 (ja) | 2009-11-17 | 2015-05-13 | 株式会社Adeka | 芳香族スルホニウム塩化合物 |
CN102666073B (zh) * | 2009-12-17 | 2015-07-22 | 帝斯曼知识产权资产管理有限公司 | 基于基材的加成法制造工艺 |
CA2788587C (en) | 2010-02-03 | 2020-03-10 | Infinity Pharmaceuticals, Inc. | Fatty acid amide hydrolase inhibitors |
JP2011184506A (ja) | 2010-03-05 | 2011-09-22 | Shin-Etsu Chemical Co Ltd | 放射線硬化性シリコーン組成物 |
FR2957604A1 (fr) | 2010-03-22 | 2011-09-23 | Bluestar Silicones France | Composition silicone reticulable pour la realisation de revetements anti-adherents pour supports souples et additif promoteur d'accrochage contenu dans cette composition |
KR101485470B1 (ko) | 2010-04-22 | 2015-01-22 | 히타치가세이가부시끼가이샤 | 유기 일렉트로닉스 재료, 중합 개시제 및 열중합 개시제, 잉크 조성물, 유기 박막 및 그 제조 방법, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 조명 장치, 표시 소자, 및 표시 장치 |
KR102156990B1 (ko) * | 2010-07-14 | 2020-09-16 | 닛뽄 가야쿠 가부시키가이샤 | 감광성 수지 조성물 및 이의 경화물 |
JP5494417B2 (ja) | 2010-10-28 | 2014-05-14 | 信越化学工業株式会社 | 放射線硬化性シリコーン組成物 |
WO2012176126A1 (en) | 2011-06-21 | 2012-12-27 | Basf Se | Printing diffraction gratings on paper and board |
US9011983B2 (en) | 2011-07-29 | 2015-04-21 | Ideon Llc | Process for curing a composition by electron beam radiation, and by gas-generated plasma and ultraviolet radiation |
WO2013186167A2 (en) | 2012-06-14 | 2013-12-19 | Basf Se | Method for manufacturing security elements and holograms |
JP5899068B2 (ja) | 2012-06-28 | 2016-04-06 | 東京応化工業株式会社 | 厚膜用ポジ型レジスト組成物、厚膜レジストパターンの製造方法、接続端子の製造方法 |
BR112015005323A2 (pt) | 2012-09-17 | 2017-07-04 | Basf Se | elemento de segurança, método para formar um elemento de segurança, produto de segurança, e, uso de um elemento de segurança |
FR2996227A1 (fr) * | 2012-10-02 | 2014-04-04 | Bluestar Silicones France | Composition de resine organique reticulable/polymerisable par voie cationique comprenant un borate de iodonium et degageant une odeur acceptable |
PL2912075T3 (pl) | 2012-10-02 | 2017-06-30 | Bluestar Silicones France Sas | Kompozycja sieciowalna/polimeryzowalna kationowo, zawierająca boran jodoniowy i wydzielająca dopuszczalny zapach |
JP6428600B2 (ja) | 2013-03-08 | 2018-11-28 | 日立化成株式会社 | イオン性化合物を含有する処理液、有機エレクトロニクス素子、及び有機エレクトロニクス素子の製造方法 |
US10252561B2 (en) | 2013-05-21 | 2019-04-09 | Basf Se | Security elements and method for their manufacture |
BR112016006911B1 (pt) | 2013-10-04 | 2022-01-11 | Basf Se | Método para formar um revestimento liso de superfície decorativa, produto de papel ou papelão, e, uso de um produto de papel ou papelão |
KR20160119062A (ko) | 2014-02-06 | 2016-10-12 | 가부시키가이샤 아데카 | 담지체 및 광전 변환 소자 |
EP2915822A1 (en) | 2014-03-06 | 2015-09-09 | Université de Haute Alsace | Light induced free radical and/or cationic photopolymerization method |
CN104497277A (zh) * | 2014-11-26 | 2015-04-08 | 南京凯泰化工科技有限公司 | 一种自由基光引发剂及其制备方法 |
EP3277884A1 (en) | 2015-03-30 | 2018-02-07 | Basf Se | High gloss metal effect papers and boards |
EP3288517B1 (de) | 2015-04-29 | 2019-07-17 | BSN Medical GmbH | Medizinische badevorrichtung |
BR112017023057B1 (pt) | 2015-04-29 | 2023-03-28 | Bsn Medical Gmbh | Processo para preparação de no e processo cosmético |
US10604659B2 (en) | 2015-06-08 | 2020-03-31 | Dsm Ip Assets B.V. | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication |
KR102115684B1 (ko) | 2015-09-25 | 2020-05-26 | 엘켐 실리콘즈 프랑스 에스에이에스 | 가요성 기판을 위한 비점착성 코팅의 제조를 위한 가교결합가능한 실리콘 조성물, 및 이 조성물 중에 함유된 부착-촉진성 첨가제 |
EP3341793B1 (en) | 2015-10-01 | 2021-05-26 | DSM IP Assets B.V. | Liquid, hybrid uv/vis radiation curable resin compositions for additive fabrication |
JP6603127B2 (ja) | 2015-12-29 | 2019-11-06 | サンアプロ株式会社 | 感光性組成物 |
FR3052784A1 (fr) | 2016-06-21 | 2017-12-22 | Bluestar Silicones France | Procede de lutte contre l'apparition de brouillard dans un dispositif a cylindres lors de l'enduction de supports flexibles avec une composition silicone liquide reticulable |
TWI794411B (zh) | 2018-02-16 | 2023-03-01 | 日商Adeka股份有限公司 | 自由基聚合起始劑、含有其之組成物、其硬化物、其製造方法,及化合物 |
EP3784499A1 (en) | 2018-04-25 | 2021-03-03 | Basf Se | Process for the production of strongly adherent (embossed) films on flexible substrates |
WO2020064522A1 (en) | 2018-09-24 | 2020-04-02 | Basf Se | Photocurable composition for use in 3d printing |
CN112639034A (zh) | 2018-09-24 | 2021-04-09 | 巴斯夫欧洲公司 | 用于3d打印的可uv固化组合物 |
MX2021004736A (es) | 2018-10-25 | 2021-06-04 | Basf Se | Composiciones, que comprenden nanoplaquetas de plata. |
EP3898861B1 (fr) | 2018-12-20 | 2023-01-25 | Elkem Silicones France SAS | Procédé de lutte contre l'apparition de brouillard dans un dispositif a cylindres lors de l'enduction de supports flexibles avec une composition silicone liquide réticulable |
EP3680263A1 (en) | 2019-01-14 | 2020-07-15 | Basf Se | Limonene-based (meth)acrylates for use in 3d printing |
EP3680274A1 (en) | 2019-01-14 | 2020-07-15 | Basf Se | Hydroxyurethane (meth)acrylate prepolymers for use in 3d printing |
CN113302064A (zh) | 2019-01-21 | 2021-08-24 | 巴斯夫欧洲公司 | 安全元件 |
CN113272087B (zh) | 2019-01-29 | 2024-04-19 | 巴斯夫欧洲公司 | 安全元件 |
AU2020269835A1 (en) | 2019-05-06 | 2022-01-06 | Basf Se | Compositions, comprising silver nanoplatelets |
KR20220053612A (ko) | 2019-09-30 | 2022-04-29 | 후지필름 가부시키가이샤 | 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법, 및 전자 디바이스의 제조 방법 |
JP2023500370A (ja) | 2019-11-07 | 2023-01-05 | ビーエーエスエフ ソシエタス・ヨーロピア | 3d印刷で使用するための水洗可能な組成物 |
JPWO2021095711A1 (fi) | 2019-11-14 | 2021-05-20 | ||
EP4130878A4 (en) | 2020-03-30 | 2023-09-27 | FUJIFILM Corporation | ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ACTIVE LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION FOR MANUFACTURING A PHOTO-MASK, AND METHOD FOR MANUFACTURING A PHOTO-MASK |
WO2021213942A1 (en) | 2020-04-23 | 2021-10-28 | Basf Se | Compositions, comprising platelet-shaped transition metal particles |
CN114401975A (zh) | 2020-06-12 | 2022-04-26 | 三亚普罗股份有限公司 | 新型鎓盐和光产酸剂 |
EP4261214A4 (en) | 2020-12-14 | 2024-06-05 | San Apro Ltd | PHOTOACID GENERATOR AND PHOTOSENSITIVE COMPOSITION THEREOF |
WO2022129348A1 (fr) | 2020-12-16 | 2022-06-23 | Elkem Silicones France Sas | Composition silicone biocide applicable sur des surfaces |
WO2023170132A1 (en) | 2022-03-10 | 2023-09-14 | Basf Se | Casting lacquer for screen printing |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US506674A (en) * | 1893-10-17 | Paper-fastener | ||
US4378277A (en) * | 1974-05-08 | 1983-03-29 | Minnesota Mining & Manufacturing Company | Photopolymerizable epoxy-containing compositions |
US4238619A (en) * | 1979-06-06 | 1980-12-09 | General Electric Company | Method for making aryl onium salts of group via elements |
US5153157A (en) * | 1987-01-30 | 1992-10-06 | Exxon Chemical Patents Inc. | Catalyst system of enhanced productivity |
SE8901048D0 (sv) * | 1989-03-23 | 1989-03-23 | Becker Wilhelm Ab | Polymerisationsinitiator |
CA2024830A1 (en) * | 1989-09-29 | 1991-03-30 | Richard E. Campbell, Jr. | Process for preparation of syndiotactic vinyl aromatic polymers |
US4992571A (en) * | 1989-10-31 | 1991-02-12 | General Electric Company | Method for making octyloxy substituted diphenyl iodonium hexafluoro metalloid salts |
US5084586A (en) * | 1990-02-12 | 1992-01-28 | Minnesota Mining And Manufacturing Company | Novel initiators for cationic polymerization |
JP2545006B2 (ja) * | 1990-07-03 | 1996-10-16 | ザ ダウ ケミカル カンパニー | 付加重合触媒 |
EP0504418B2 (en) * | 1990-10-05 | 2001-06-13 | Idemitsu Kosan Company Limited | Process for producing cycloolefin polymer and cycloolefin copolymers |
EP0490269B1 (en) * | 1990-12-10 | 1996-02-28 | Idemitsu Kosan Company Limited | Graft copolymer and process for producing the same |
JP2840462B2 (ja) * | 1990-12-28 | 1998-12-24 | 出光興産株式会社 | スチレン系重合体の製造方法及びその触媒 |
FR2688790B1 (fr) * | 1992-03-23 | 1994-05-13 | Rhone Poulenc Chimie | Compositions a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adhesifs. |
US5514728A (en) * | 1993-07-23 | 1996-05-07 | Minnesota Mining And Manufacturing Company | Catalysts and initiators for polymerization |
-
1992
- 1992-03-23 FR FR9203440A patent/FR2688783A1/fr not_active Withdrawn
-
1993
- 1993-03-08 EP EP93400590A patent/EP0562897B1/fr not_active Expired - Lifetime
- 1993-03-08 DE DE69325537T patent/DE69325537T2/de not_active Expired - Lifetime
- 1993-03-08 ES ES93400590T patent/ES2133368T3/es not_active Expired - Lifetime
- 1993-03-10 JP JP5075031A patent/JP2557782B2/ja not_active Expired - Lifetime
- 1993-03-12 AU AU35170/93A patent/AU660218B2/en not_active Expired
- 1993-03-22 FI FI931253A patent/FI110187B/fi not_active IP Right Cessation
- 1993-03-22 CA CA002092135A patent/CA2092135C/fr not_active Expired - Lifetime
- 1993-03-23 US US08/035,838 patent/US5468902A/en not_active Expired - Lifetime
-
1995
- 1995-03-08 US US08/400,970 patent/US5550265A/en not_active Expired - Lifetime
-
1996
- 1996-04-18 US US08/634,228 patent/US5668192A/en not_active Expired - Lifetime
-
1997
- 1997-05-06 US US08/851,713 patent/US6153661A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
FR2688783A1 (fr) | 1993-09-24 |
EP0562897B1 (fr) | 1999-07-07 |
DE69325537D1 (de) | 1999-08-12 |
JP2557782B2 (ja) | 1996-11-27 |
EP0562897A1 (fr) | 1993-09-29 |
AU660218B2 (en) | 1995-06-15 |
JPH06184170A (ja) | 1994-07-05 |
FI110187B (fi) | 2002-12-13 |
US5550265A (en) | 1996-08-27 |
US6153661A (en) | 2000-11-28 |
ES2133368T3 (es) | 1999-09-16 |
US5468902A (en) | 1995-11-21 |
AU3517093A (en) | 1993-09-30 |
CA2092135C (fr) | 1999-11-30 |
CA2092135A1 (fr) | 1993-09-24 |
US5668192A (en) | 1997-09-16 |
FI931253A (fi) | 1993-09-24 |
DE69325537T2 (de) | 1999-11-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
FI931253A0 (fi) | Nya oniumborater eller borater av en organometallkomplex, som aer katjoniska polymerationsinitiatorer | |
FI932412A (fi) | Aminoquinolinderivat som aer substituerade med en arylgrupp eller aromatisk heterocyklisk grupp och hiv-motaemne | |
FI864678A0 (fi) | Haolprofila skumplastplattor- och stycken, deras framstaellning och anvaendning som isolerings- och/eller torkningsplattor. | |
FI872573A0 (fi) | Foerfarande foer framstaellning av doerrar eller andra panelelement, som har en reliefyta, saerskilt imiterade paneldoerrar, och foerfarande foer framstaellning av deras ytskivdel. | |
FI905513A0 (fi) | Kombinationer av foereningar isolerade fraon gurkmeja-arter, vilka aer anvaendbara som anti-inflammatoriska aemnen. | |
FI903008A0 (fi) | Elektrisk fjaerrstyrningsanordning som aer analog eller av kopplingstyp. | |
FI862520A0 (fi) | Foerfarande foer framstaellning av nya tienopyridoner, vilka aer terapeutiskt anvaendbara saosom antihypertoniska laekemedel. | |
FI905663A0 (fi) | Foerfarande foer erhaollande av pyridazinderivat, vilka aer anvaendbara som lignder av acetylkolinaktiga receptorer. | |
FI911606A0 (fi) | Foerfarande foer framstaellning av nya foereningar, som inhiberar trombocytaggregation. | |
FI891146A0 (fi) | Mundstycke, som aer laett att rena, foer dispersionsvatten. | |
FI894491A (fi) | Nya substituerade tienopyraner, vilka aer anvaendbara som antihypertensiva medel. | |
FI900865A0 (fi) | Elektroniskt behandlingsfoerfarande foer kontanta medel eller andra data som skall skyddas. | |
FI861050A0 (fi) | Stenvals foer maskiner som framstaeller papper, kartong eller liknande. | |
FI900464A0 (fi) | Nya aryl- eller heteroaryl-1-alkyl- pyrrol-2-karboxyl, syrafoereningar, vilka aer anvaendbara vid behandling av tillstaond som associeras med interleukin i. | |
FI895458A0 (fi) | Rtv-1k-massor som aer lagringsdugliga i torra foerhaollanden. | |
FI863417A (fi) | Foerfarande foer framstaellning av indoler eller indolderivat som aer kopplade via 4-, 5-, 6- eller 7-staellningen, ifraogavarande indoler eller indolderivat samt deras anvaendning. | |
FI881917A (fi) | Foerfarande foer automatisk eliminering av en grupp foeremaol som skall behandlas, varav minst en aer misslyckad eller bristfaellig, anordning foer genomfoerande av foerfarandet samt en med anordningen foersedd maskin foer behandling av behaollare. | |
FI934236A0 (fi) | Anordning foer oeppning av ett foenster eller en doerr, foeretraedesvis av glidtyp | |
FI934911A (fi) | Rullmaskin foer upprullning av materialbanor, isynnerhet av papper eller kartong | |
FI890387A0 (fi) | Nya proteiner som haerletts ur maenniskans a2-plasmininhibitor eller liknande proteiner. | |
FI905325A0 (fi) | Foerfarande foer framstaellning av benzylpyrrolidinderivat vilka aer aktiva som dopamin-agonister. | |
FI863644A (fi) | Foerfarande foer framstaellning av byggnadselement som aer speciellt laempade foer anvaendning som tegelfasader. | |
FI921903A0 (fi) | Aminsalter av alkylerade fenoler eller alkylerade naftoler innehaollande svavel som multifunktionaliska antioxidations- och slitningsminskande tillsatsmedel. | |
FI871666A0 (fi) | Saett foer montering av haollar- och saekerhetsdetaljer pao ett underlag, saerskilt en takbelaeggning, som aer svaor- eller otillgaenglig fraon motsatta sidan. | |
FI885116A0 (fi) | Foerfarande och anordning foer tillfoersel av kemikalier i en vaetska eller suspension som skall behandlas. |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MA | Patent expired |