DE69325537D1 - Borate mit Kationen aus der Gruppe von Onium oder organometallischen Komplexen, als kationische Polymerisationsinitiatoren - Google Patents

Borate mit Kationen aus der Gruppe von Onium oder organometallischen Komplexen, als kationische Polymerisationsinitiatoren

Info

Publication number
DE69325537D1
DE69325537D1 DE69325537T DE69325537T DE69325537D1 DE 69325537 D1 DE69325537 D1 DE 69325537D1 DE 69325537 T DE69325537 T DE 69325537T DE 69325537 T DE69325537 T DE 69325537T DE 69325537 D1 DE69325537 D1 DE 69325537D1
Authority
DE
Germany
Prior art keywords
borates
onium
cations
group
polymerization initiators
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69325537T
Other languages
English (en)
Other versions
DE69325537T2 (de
Inventor
Frederic Castellanos
Jacques Cavezzan
Jean-Pierre Fouassier
Christian Priou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rhodia Chimie SAS
Original Assignee
Rhodia Chimie SAS
Rhone Poulenc Chimie SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rhodia Chimie SAS, Rhone Poulenc Chimie SA filed Critical Rhodia Chimie SAS
Application granted granted Critical
Publication of DE69325537D1 publication Critical patent/DE69325537D1/de
Publication of DE69325537T2 publication Critical patent/DE69325537T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/72—Complexes of boron halides
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00—Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02—Boron compounds
    • C07F5/022—Boron compounds without C-boron linkages
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F4/00—Polymerisation catalysts
    • C08F4/42—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors
    • C08F4/44—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides
    • C08F4/52—Metals; Metal hydrides; Metallo-organic compounds; Use thereof as catalyst precursors selected from light metals, zinc, cadmium, mercury, copper, silver, gold, boron, gallium, indium, thallium, rare earths or actinides selected from boron, aluminium, gallium, indium, thallium or rare earths
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/22—Di-epoxy compounds
    • C08G59/24—Di-epoxy compounds carbocyclic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Polymerization Catalysts (AREA)
  • Epoxy Resins (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE69325537T 1992-03-23 1993-03-08 Borate mit Kationen aus der Gruppe von Onium oder organometallischen Komplexen, als kationische Polymerisationsinitiatoren Expired - Lifetime DE69325537T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9203440A FR2688783A1 (fr) 1992-03-23 1992-03-23 Nouveaux borates d'onium ou de complexe organometallique amorceurs cationiques de polymerisation.

Publications (2)

Publication Number Publication Date
DE69325537D1 true DE69325537D1 (de) 1999-08-12
DE69325537T2 DE69325537T2 (de) 1999-11-18

Family

ID=9427943

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69325537T Expired - Lifetime DE69325537T2 (de) 1992-03-23 1993-03-08 Borate mit Kationen aus der Gruppe von Onium oder organometallischen Komplexen, als kationische Polymerisationsinitiatoren

Country Status (9)

Country Link
US (4) US5468902A (de)
EP (1) EP0562897B1 (de)
JP (1) JP2557782B2 (de)
AU (1) AU660218B2 (de)
CA (1) CA2092135C (de)
DE (1) DE69325537T2 (de)
ES (1) ES2133368T3 (de)
FI (1) FI110187B (de)
FR (1) FR2688783A1 (de)

Families Citing this family (114)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6147184A (en) * 1992-03-23 2000-11-14 Rhone-Poulenc Chimie Onium borates/borates of organometallic complexes and cationic initiation of polymerization therewith
WO1994000459A1 (en) * 1992-06-23 1994-01-06 Idemitsu Kosan Co., Ltd. Process for producing tetrakisfluorophenylborate
FR2702485B1 (fr) * 1993-03-10 1995-04-14 Rhone Poulenc Chimie Compositions à base de polyorganosiloxanes réticulables par voie cationique et leur utilisation dans le domaine de l'antiadhérence papier, de la protection des fibres optiques et des circuits imprimés.
US5514728A (en) * 1993-07-23 1996-05-07 Minnesota Mining And Manufacturing Company Catalysts and initiators for polymerization
FR2724660B1 (fr) * 1994-09-16 1997-01-31 Rhone Poulenc Chimie Amorceurs de reticulation, par voie cationique, de polymeres a groupements organofonctionnels, compositions a base de polyorganosiloxanes reticulables et contenant ces amorceurs et application desdites compositions en antiadherence
FR2727416A1 (fr) * 1994-11-24 1996-05-31 Rhone Poulenc Chimie Nouveaux amorceurs cationiques thermoactivables, de polymerisation et/ou de reticulation et compositions monomeres et/ou polymeres fonctionnels les mettant en oeuvre
US5744511A (en) * 1995-04-19 1998-04-28 Tokuyama Corporation Visible ray polymerization initiator and visible ray polymerizable composition
TW466256B (en) 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
AU717137B2 (en) * 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
JP3937466B2 (ja) * 1995-12-28 2007-06-27 東洋インキ製造株式会社 感エネルギー線酸発生剤、感エネルギー線酸発生剤組成物および硬化性組成物
US6291695B1 (en) 1996-02-20 2001-09-18 Northwestern University Organo-Lewis acids of enhanced utility, uses thereof, and products based thereon
US5856256A (en) * 1996-02-20 1999-01-05 Northwestern University Organo-Lewis acid as cocatalyst for cationic homogeneous Ziegler-Natta olefin polymerizations
US6274752B1 (en) 1996-02-20 2001-08-14 Northwestern University Organo-Lewis acid as cocatalyst for cationic homogeneous Ziegler-Natta olefin polymerizations
US5703137A (en) * 1996-03-14 1997-12-30 Rhone-Poulenc Chimie Initiators for the cationic crosslinking of polymers containing organofunctional groups
ATE194629T1 (de) * 1996-03-27 2000-07-15 Dow Chemical Co Hochlösliches aktivierungsmittel für olefinpolymerisationskatalysator
TW460509B (en) 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
FR2757529B1 (fr) * 1996-12-24 1999-03-05 Rhodia Chimie Sa Compositions stables a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adherents
FR2766491B1 (fr) * 1997-07-23 1999-10-08 Rhodia Chimie Sa Nouveaux systemes amorceurs de polymerisation et/ou de reticulation comprenant un borate d'onium et une benzophenone
FR2766490B1 (fr) * 1997-07-23 1999-10-08 Rhodia Chimie Sa Nouveaux systemes amorceurs de polymerisation et/ou de reticulation comprenant un borate d'onium et une benzophenone
US6002044A (en) * 1997-11-12 1999-12-14 Showa Denko K.K. Production method of borate compounds
US6022643A (en) * 1997-12-08 2000-02-08 Brookhaven Science Associates Boron compounds as anion binding agents for nonaqueous battery electrolytes
FR2784025B1 (fr) * 1998-10-02 2002-10-31 Rhodia Chimie Sa Composition dentaire a base d'une silicone fonctionnalisee reticulable/polymerisable par voie cationique
FR2784024B1 (fr) * 1998-10-02 2002-10-31 Rhodia Chimie Sa Composition dentaire a base d'une silicone fonctionnalisee reticulable/polymerisable par voie cationique en presence d'un borate d'un complexe organometallique
US6587628B1 (en) 1999-11-22 2003-07-01 3M Innovative Properties Company Optical fiber with improved strength in high humidity/high temperature environments
US6162950A (en) * 1999-12-03 2000-12-19 Albemarle Corporation Preparation of alkali metal tetrakis(F aryl)borates
US6169208B1 (en) 1999-12-03 2001-01-02 Albemarle Corporation Process for producing a magnesium di[tetrakis(Faryl)borate] and products therefrom
US6377102B2 (en) * 2000-02-29 2002-04-23 Texas Instruments Incorporated Load equalization in digital delay interpolators
WO2002046263A1 (de) * 2000-12-08 2002-06-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Harzformulierung, verfahren zu ihrer härtung und ihre verwendung
FR2818553B1 (fr) * 2000-12-22 2003-02-07 Rhodia Chimie Sa Composition dentaire a base d'une silicone fonctionnalisee reticulaire et/ou polymerisable par voie thermique
US6895156B2 (en) 2001-10-09 2005-05-17 3M Innovative Properties Company Small diameter, high strength optical fiber
US6649716B2 (en) 2001-12-18 2003-11-18 Sunoco, Inc. (R&M) Polymerization of alpha-methylstyrene
FR2833484B1 (fr) * 2001-12-18 2004-12-10 Rhodia Chimie Sa Composition dentaire a base de solution de silice colloidale en phase continue silicone
US6918984B2 (en) * 2002-06-24 2005-07-19 Loctite (R&D) Limited Photocurable adhesive compositions, reaction products of which have low halide ion content
US20050059752A1 (en) 2002-07-12 2005-03-17 Rhodia Chimie Stable, cationically polymerizable/crosslinkable dental compositions having high filler contents
WO2004023213A1 (en) 2002-08-30 2004-03-18 Toyo Gosei Co., Ltd. Radiation-sensitive negative-type resist composition for pattern formation and pattern formation method
US6831200B2 (en) * 2002-10-03 2004-12-14 Albemarle Corporation Process for producing tetrakis(Faryl)borate salts
ATE469126T1 (de) * 2002-12-23 2010-06-15 Stx Aprilis Inc Fluorarylsulfonium fotosäure erzeugende verbindungen
US20050003216A1 (en) 2003-06-30 2005-01-06 Jean-Marc Frances Microparticle containing silicone release coatings having improved anti-block and release properties
WO2005089355A2 (en) * 2004-03-16 2005-09-29 Cornell Research Foundation, Inc. Environmentally friendly photoacid generators (pags) with no perfluorooctyl sulfonates (pfos)
CN1989145B (zh) * 2004-05-28 2010-06-23 三亚普罗株式会社 新颖的氟代烷基氟磷酸鎓盐和过渡金属络合物盐
KR100698917B1 (ko) * 2004-06-22 2007-03-22 미쓰이 가가쿠 가부시키가이샤 이온성 화합물 및 그것을 함유하는 수지 조성물과 그 용도
US7498123B2 (en) * 2005-03-03 2009-03-03 Exciton, Inc. Infrared dye compositions
JP2007051193A (ja) 2005-08-17 2007-03-01 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
US7618683B2 (en) 2006-01-12 2009-11-17 Fujifilm Corporation Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate
DE102006005103A1 (de) * 2006-02-04 2007-08-09 Merck Patent Gmbh Oxonium- und Sulfoniumsalze
WO2007124092A2 (en) 2006-04-21 2007-11-01 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
US7524614B2 (en) * 2006-05-26 2009-04-28 Eastman Kodak Company Negative-working radiation-sensitive compositions and imageable materials
US8030401B1 (en) 2006-08-03 2011-10-04 Henkel Corporation Photoinitiated cationic epoxy compositions
JO3598B1 (ar) 2006-10-10 2020-07-05 Infinity Discovery Inc الاحماض والاسترات البورونية كمثبطات اميد هيدروليز الحامض الدهني
US7714037B1 (en) 2006-12-15 2010-05-11 Henkel Corporation Photoinitiated cationic epoxy compositions and articles exhibiting low color
GB2450975B (en) 2007-07-12 2010-02-24 Ciba Holding Inc Yellow radiation curing inks
US7705064B2 (en) * 2007-07-23 2010-04-27 Henkel Corporation Photosensitive compounds, photopolymerizable compositions including the same, and methods of making and using the same
US8383862B2 (en) 2007-11-01 2013-02-26 Adeka Corporation Salt compound, cationic polymerization initiator and cationically polymerizable composition
JP4901889B2 (ja) * 2008-02-18 2012-03-21 ソニーケミカル＆インフォメーションデバイス株式会社 磁性シート組成物、磁性シート、及び磁性シートの製造方法
JP5101343B2 (ja) 2008-03-03 2012-12-19 株式会社ダイセル 微細構造物の製造方法
JP5637982B2 (ja) 2008-04-09 2014-12-10 インフィニティー ファーマシューティカルズ， インコーポレイテッド 脂肪酸アミド加水分解酵素の阻害剤
US8163461B2 (en) * 2008-04-09 2012-04-24 Cornell Research Foundation, Inc. Photoacid generator compounds and compositions
US8309633B2 (en) * 2008-07-17 2012-11-13 Henkel Ireland Ltd. Low temperature, cationically curable compositions with improved cure speed and toughness
JP5444702B2 (ja) * 2008-12-05 2014-03-19 デクセリアルズ株式会社 新規なスルホニウムボレート錯体
US8188161B1 (en) 2009-01-23 2012-05-29 Henkel Corporation Anaerobic cure systems for anaerobic curable compositions, and anaerobic curable compositions containing same
JP5485583B2 (ja) * 2009-05-08 2014-05-07 株式会社日本触媒 ジアリールヨードニウム化合物の製造方法
EP2428501B1 (de) * 2009-05-08 2018-12-12 Nippon Shokubai Co., Ltd. Diaryl-iodonium-salzmischung und herstellungsverfahren dafür sowie herstellungsverfahren für eine diaryl-iodonium-verbindung
JP5607044B2 (ja) * 2009-06-02 2014-10-15 山本化成株式会社 ヨードニウム系光重合開始剤、その製造方法およびこれを含有してなる光硬化性組成物
TWI498350B (zh) 2009-10-01 2015-09-01 Hitachi Chemical Co Ltd 有機電子用材料、有機電子元件、有機電激發光元件、及使用其之顯示元件、照明裝置、顯示裝置
EP2495234B1 (de) 2009-10-26 2018-06-06 Adeka Corporation Aromatische sulfoniumsalzverbindung
JP5717959B2 (ja) 2009-11-17 2015-05-13 株式会社Adeka 芳香族スルホニウム塩化合物
KR101833078B1 (ko) * 2009-12-17 2018-02-27 디에스엠 아이피 어셋츠 비.브이. 적층식 제작을 위한 발광 다이오드 경화성 액체 수지 조성물
EP2531511A1 (de) 2010-02-03 2012-12-12 Infinity Pharmaceuticals, Inc. Fettsäureamidhydrolase-hemmer
JP2011184506A (ja) 2010-03-05 2011-09-22 Shin-Etsu Chemical Co Ltd 放射線硬化性シリコーン組成物
FR2957604A1 (fr) 2010-03-22 2011-09-23 Bluestar Silicones France Composition silicone reticulable pour la realisation de revetements anti-adherents pour supports souples et additif promoteur d'accrochage contenu dans cette composition
KR20140108701A (ko) 2010-04-22 2014-09-12 히타치가세이가부시끼가이샤 유기 일렉트로닉스 재료, 중합 개시제 및 열중합 개시제, 잉크 조성물, 유기 박막 및 그 제조 방법, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 조명 장치, 표시 소자, 및 표시 장치
US8865392B2 (en) 2010-07-14 2014-10-21 Nippon Kayaku Kabushiki Kaisha Photosensitive resin composition and cured product thereof
JP5494417B2 (ja) 2010-10-28 2014-05-14 信越化学工業株式会社 放射線硬化性シリコーン組成物
CN103608183B (zh) 2011-06-21 2017-05-17 巴斯夫欧洲公司 在纸或纸板上印刷衍射光栅
WO2013019555A2 (en) 2011-07-29 2013-02-07 Ideon Llc A process for curing a composition by electron beam radiation, and by gas-generated plasma and ultraviolet radiation
JP6203253B2 (ja) 2012-06-14 2017-09-27 ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ セキュリティエレメント及びホログラムの製造方法
JP5899068B2 (ja) 2012-06-28 2016-04-06 東京応化工業株式会社 厚膜用ポジ型レジスト組成物、厚膜レジストパターンの製造方法、接続端子の製造方法
EP2895922B1 (de) 2012-09-17 2018-04-18 Basf Se Sicherheitselemente und verfahren zu ihrer herstellung
FR2996227A1 (fr) * 2012-10-02 2014-04-04 Bluestar Silicones France Composition de resine organique reticulable/polymerisable par voie cationique comprenant un borate de iodonium et degageant une odeur acceptable
US10131817B2 (en) 2012-10-02 2018-11-20 Elkem Silicones France Sas Cationically cross-linkable/polymerizable composition comprising an iodonium borate and releasing an acceptable odor
CN105027677B (zh) 2013-03-08 2018-05-25 日立化成株式会社 含有离子性化合物的处理液、有机电子元件和有机电子元件的制造方法
WO2014187750A1 (en) 2013-05-21 2014-11-27 Basf Se Security elements and method for their manufacture
US10494766B2 (en) 2013-10-04 2019-12-03 Basf Se High gloss metal effect papers
EP3104383A4 (de) 2014-02-06 2017-09-20 Adeka Corporation Träger und element zur photoelektrischen umwandlung
EP2915822A1 (de) 2014-03-06 2015-09-09 Université de Haute Alsace Lichtinduziertes freiradikalisches und/oder kationisches Photopolymerisationsverfahren
CN104497277A (zh) * 2014-11-26 2015-04-08 南京凯泰化工科技有限公司 一种自由基光引发剂及其制备方法
WO2016156286A1 (en) 2015-03-30 2016-10-06 Basf Se High gloss metal effect papers and boards
WO2016174192A1 (de) 2015-04-29 2016-11-03 Bsn Medical Gmbh Medizinische badevorrichtung
WO2016174043A1 (de) 2015-04-29 2016-11-03 Bsn Medical Gmbh Mehrstufiges verfahren zur no-herstellung
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
EP3353252B1 (de) 2015-09-25 2019-09-11 ELKEM SILICONES France SAS Vernetzbare silikonzusammensetzung zur herstellung von nichtklebrigen beschichtungen für flexible substrate und in dieser zusammensetzung enthaltenes haftförderndes additiv
EP3567428B1 (de) 2015-10-01 2021-06-23 DSM IP Assets B.V. Flüssige hybride uv/vis-strahlungshärtbare harzzusammensetzungen zur generativen fertigung
JP6603127B2 (ja) 2015-12-29 2019-11-06 サンアプロ株式会社 感光性組成物
FR3052784A1 (fr) 2016-06-21 2017-12-22 Bluestar Silicones France Procede de lutte contre l'apparition de brouillard dans un dispositif a cylindres lors de l'enduction de supports flexibles avec une composition silicone liquide reticulable
JP7372904B2 (ja) 2018-02-16 2023-11-01 株式会社Adeka ラジカル重合開始剤、これを含有する組成物、その硬化物、その製造方法、および化合物
US20210086545A1 (en) 2018-04-25 2021-03-25 Basf Se Process for the production of strongly adherent (embossed) films on flexible substrates
US11999865B2 (en) 2018-09-24 2024-06-04 Basf Se UV curable composition for use in 3D printing
WO2020064522A1 (en) 2018-09-24 2020-04-02 Basf Se Photocurable composition for use in 3d printing
MX2021004736A (es) 2018-10-25 2021-06-04 Basf Se Composiciones, que comprenden nanoplaquetas de plata.
JP7430727B2 (ja) 2018-12-20 2024-02-13 エルケム・シリコーンズ・フランス・エスアエス 架橋可能な液体シリコーン組成物による可撓性支持体のコーティング中のロールを含む装置におけるミスト形成の防止のための方法
EP3680274A1 (de) 2019-01-14 2020-07-15 Basf Se Hydroxyurethan-(meth)acrylatpräpolymere zur verwendung im 3d-druck
EP3680263A1 (de) 2019-01-14 2020-07-15 Basf Se Limonenbasierte (meth)acrylate zur verwendung im 3d-druck
AU2020210698A1 (en) 2019-01-21 2021-07-15 Basf Se Security element
EP3917703A1 (de) 2019-01-29 2021-12-08 Basf Se Sicherheitselement
US20220220284A1 (en) 2019-05-06 2022-07-14 Basf Se Compositions, comprising silver nanoplatelets
KR20220053612A (ko) 2019-09-30 2022-04-29 후지필름 가부시키가이샤 감활성광선성 또는 감방사선성 수지 조성물, 감활성광선성 또는 감방사선성막, 패턴 형성 방법, 및 전자 디바이스의 제조 방법
CN114641388A (zh) 2019-11-07 2022-06-17 巴斯夫欧洲公司 用于3d打印中的水洗性组合物
JPWO2021095711A1 (de) 2019-11-14 2021-05-20
EP4130878A4 (de) 2020-03-30 2023-09-27 FUJIFILM Corporation Aktiv-lichtempfindliche oder strahlungsempfindliche harzzusammensetzung, aktiv-lichtempfindlicher oder strahlungsempfindlicher film, musterbildungsverfahren, verfahren zum herstellen einer elektronischen vorrichtung, aktiv-lichtempfindliche oder strahlungsempfindliche harzzusammensetzung zum herstellen einer fotomaske, und verfahren zum herstellen einer fotomaske
CN115279518A (zh) 2020-04-23 2022-11-01 巴斯夫欧洲公司 包含片状过渡金属颗粒的组合物
KR20230024863A (ko) 2020-06-12 2023-02-21 산아프로 가부시키가이샤 신규 오늄염, 및 광산 발생제
US20240027901A1 (en) 2020-12-14 2024-01-25 San-Apro Ltd. Photoacid generator, and photosensitive composition using same
WO2022129348A1 (fr) 2020-12-16 2022-06-23 Elkem Silicones France Sas Composition silicone biocide applicable sur des surfaces
WO2023170132A1 (en) 2022-03-10 2023-09-14 Basf Se Casting lacquer for screen printing

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US506674A (en) * 1893-10-17 Paper-fastener
US4378277A (en) * 1974-05-08 1983-03-29 Minnesota Mining & Manufacturing Company Photopolymerizable epoxy-containing compositions
US4238619A (en) * 1979-06-06 1980-12-09 General Electric Company Method for making aryl onium salts of group via elements
US5153157A (en) * 1987-01-30 1992-10-06 Exxon Chemical Patents Inc. Catalyst system of enhanced productivity
SE8901048D0 (sv) * 1989-03-23 1989-03-23 Becker Wilhelm Ab Polymerisationsinitiator
CA2024830A1 (en) * 1989-09-29 1991-03-30 Richard E. Campbell, Jr. Process for preparation of syndiotactic vinyl aromatic polymers
US4992571A (en) * 1989-10-31 1991-02-12 General Electric Company Method for making octyloxy substituted diphenyl iodonium hexafluoro metalloid salts
US5084586A (en) * 1990-02-12 1992-01-28 Minnesota Mining And Manufacturing Company Novel initiators for cationic polymerization
JP2545006B2 (ja) * 1990-07-03 1996-10-16 ザ ダウ ケミカル カンパニー 付加重合触媒
WO1992006123A1 (en) * 1990-10-05 1992-04-16 Idemitsu Kosan Co., Ltd. Process for producing cycloolefin polymer, cycloolefin copolymer, and composition and molding prepared therefrom
DE69117457T2 (de) * 1990-12-10 1996-10-24 Idemitsu Kosan Co. Ltd., Tokio/Tokyo Pfropfcopolymer und Verfahren zu seiner Herstellung
JP2840462B2 (ja) * 1990-12-28 1998-12-24 出光興産株式会社 スチレン系重合体の製造方法及びその触媒
FR2688790B1 (fr) * 1992-03-23 1994-05-13 Rhone Poulenc Chimie Compositions a base de polyorganosiloxanes a groupements fonctionnels reticulables et leur utilisation pour la realisation de revetements anti-adhesifs.
US5514728A (en) * 1993-07-23 1996-05-07 Minnesota Mining And Manufacturing Company Catalysts and initiators for polymerization

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US5468902A (en) 1995-11-21
CA2092135A1 (fr) 1993-09-24
FI931253A (fi) 1993-09-24
FR2688783A1 (fr) 1993-09-24
DE69325537T2 (de) 1999-11-18
FI110187B (fi) 2002-12-13
EP0562897A1 (de) 1993-09-29
CA2092135C (fr) 1999-11-30
ES2133368T3 (es) 1999-09-16
AU3517093A (en) 1993-09-30
JP2557782B2 (ja) 1996-11-27
US5550265A (en) 1996-08-27
US5668192A (en) 1997-09-16
EP0562897B1 (de) 1999-07-07
AU660218B2 (en) 1995-06-15
JPH06184170A (ja) 1994-07-05
FI931253A0 (fi) 1993-03-22

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