FI57429C - Fotopolymeriserbar komposition innefattande ett additionspolymeriserbart material ett initiatorsystem foer additionspolymerisationen en inhibitor foer termisk additionspolymerisation och ett polymert bindemedel - Google Patents

Fotopolymeriserbar komposition innefattande ett additionspolymeriserbart material ett initiatorsystem foer additionspolymerisationen en inhibitor foer termisk additionspolymerisation och ett polymert bindemedel Download PDF

Info

Publication number
FI57429C
FI57429C FI271/72A FI27172A FI57429C FI 57429 C FI57429 C FI 57429C FI 271/72 A FI271/72 A FI 271/72A FI 27172 A FI27172 A FI 27172A FI 57429 C FI57429 C FI 57429C
Authority
FI
Finland
Prior art keywords
ett
mixture according
foer
mixture
addition
Prior art date
Application number
FI271/72A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Other versions
FI57429B (fi
Inventor
Richard Edmund Beaupre
Michael Nicholas Gilano
Melvin Alan Lipson
Original Assignee
Dynachem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dynachem Corp filed Critical Dynachem Corp
Publication of FI57429B publication Critical patent/FI57429B/fi
Application granted granted Critical
Publication of FI57429C publication Critical patent/FI57429C/fi

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/0073Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0076Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12Using specific substances
    • H05K2203/122Organic non-polymeric compounds, e.g. oil, wax or thiol
    • H05K2203/124Heterocyclic organic compounds, e.g. azole, furan
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/064Photoresists
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/389Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Laminated Bodies (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
FI271/72A 1971-02-04 1972-02-02 Fotopolymeriserbar komposition innefattande ett additionspolymeriserbart material ett initiatorsystem foer additionspolymerisationen en inhibitor foer termisk additionspolymerisation och ett polymert bindemedel FI57429C (fi)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11279771A 1971-02-04 1971-02-04
US11279771 1971-02-04

Publications (2)

Publication Number Publication Date
FI57429B FI57429B (fi) 1980-04-30
FI57429C true FI57429C (fi) 1980-08-11

Family

ID=22345895

Family Applications (1)

Application Number Title Priority Date Filing Date
FI271/72A FI57429C (fi) 1971-02-04 1972-02-02 Fotopolymeriserbar komposition innefattande ett additionspolymeriserbart material ett initiatorsystem foer additionspolymerisationen en inhibitor foer termisk additionspolymerisation och ett polymert bindemedel

Country Status (23)

Country Link
JP (2) JPS5538961B1 (da)
AU (1) AU461461B2 (da)
BE (1) BE778729A (da)
BG (1) BG26673A3 (da)
CA (1) CA965291A (da)
CH (1) CH592322A5 (da)
DD (1) DD101035A5 (da)
DE (1) DE2205146C2 (da)
DK (2) DK142623B (da)
ES (1) ES399317A1 (da)
FI (1) FI57429C (da)
FR (1) FR2124974A5 (da)
GB (1) GB1361298A (da)
HK (1) HK28382A (da)
IL (1) IL38677A (da)
IT (1) IT949005B (da)
LU (1) LU64712A1 (da)
NL (1) NL176021C (da)
NO (1) NO141804C (da)
PL (1) PL83391B1 (da)
RO (1) RO64896A (da)
SE (1) SE390218B (da)
ZA (1) ZA72345B (da)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA1056189A (en) * 1974-04-23 1979-06-12 Ernst Leberzammer Polymeric binders for aqueous processable photopolymer compositions
ZA757984B (en) * 1974-10-04 1976-12-29 Dynachem Corp Polymers for aqueous processed photoresists
JPS5917414B2 (ja) * 1975-10-07 1984-04-21 村上スクリ−ン (株) スクリ−ン版用感光性組成物及び感光膜
JPS5944615B2 (ja) * 1976-02-16 1984-10-31 富士写真フイルム株式会社 感光性樹脂組成物及びそれを用いた金属画像形成材料
SU941918A1 (ru) * 1976-08-10 1982-07-07 Предприятие П/Я Г-4444 Сухой пленочный фоторезист
US4239849A (en) 1978-06-19 1980-12-16 Dynachem Corporation Polymers for aqueous processed photoresists
JPS55501072A (da) * 1978-12-25 1980-12-04
DE3034343A1 (de) * 1979-02-21 1981-04-09 Panelgraphic Corp Radiation curable cellulosic polyacrylic abrasion resistant coating
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
DE3560654D1 (en) * 1984-02-18 1987-10-22 Basf Ag Photosensitive recording material
DD250593A1 (de) * 1984-04-03 1987-10-14 Wolfen Filmfab Veb Fotopolymerisierbares material
DE3504254A1 (de) 1985-02-08 1986-08-14 Basf Ag, 6700 Ludwigshafen Lichtempfindliches aufzeichnungselement
DE3619129A1 (de) * 1986-06-06 1987-12-10 Basf Ag Lichtempfindliches aufzeichnungselement
DE3841025A1 (de) * 1988-12-06 1990-06-07 Hoechst Ag Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
JP2613462B2 (ja) * 1988-12-28 1997-05-28 コニカ株式会社 画像形成材料及び画像形成方法
JP2515885Y2 (ja) * 1990-09-28 1996-10-30 アンリツ株式会社 測定装置の表示部
DE19638032A1 (de) * 1996-09-18 1998-03-19 Du Pont Deutschland Photopolymerisierbares Gemisch mit geringerer Sauerstoffempfindlichkeit zur Herstellung von Farbprüfdrucken
US7052824B2 (en) 2000-06-30 2006-05-30 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning
US20100209843A1 (en) 2009-02-16 2010-08-19 E. I. Du Pont De Nemours And Company Process for thick film circuit patterning

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA614181A (en) * 1961-02-07 J. Mcgraw William Photopolymerizable compositions, elements and processes
US2893868A (en) * 1955-08-22 1959-07-07 Du Pont Polymerizable compositions
NL218803A (da) * 1956-07-09
GB835849A (en) * 1957-04-26 1960-05-25 Du Pont Photopolymerisable compositions and uses thereof
US3458311A (en) * 1966-06-27 1969-07-29 Du Pont Photopolymerizable elements with solvent removable protective layers
US3469982A (en) * 1968-09-11 1969-09-30 Jack Richard Celeste Process for making photoresists

Also Published As

Publication number Publication date
AU461461B2 (en) 1975-05-12
JPS58144824A (ja) 1983-08-29
RO64896A (ro) 1980-01-15
DE2205146A1 (de) 1972-11-23
SE390218B (sv) 1976-12-06
LU64712A1 (da) 1973-09-04
NL176021B (nl) 1984-09-03
IL38677A0 (en) 1972-03-28
NL176021C (nl) 1987-07-16
PL83391B1 (da) 1975-12-31
AU3839272A (en) 1973-08-02
NO141804C (no) 1980-05-14
FR2124974A5 (da) 1972-09-22
DD101035A5 (da) 1973-10-12
BG26673A3 (bg) 1979-05-15
BE778729A (fr) 1972-07-31
DE2205146C2 (de) 1990-03-08
IT949005B (it) 1973-06-11
HK28382A (en) 1982-07-02
ES399317A1 (es) 1974-12-16
ZA72345B (en) 1973-03-28
CH592322A5 (da) 1977-10-31
DK142623C (da) 1981-08-03
DK142623B (da) 1980-12-01
DK144184C (da) 1982-06-14
JPH0136924B2 (da) 1989-08-03
NO141804B (no) 1980-02-04
CA965291A (en) 1975-04-01
NL7201460A (da) 1972-08-08
IL38677A (en) 1974-12-31
FI57429B (fi) 1980-04-30
JPS5538961B1 (da) 1980-10-07
GB1361298A (en) 1974-07-24
DK144184B (da) 1982-01-04

Similar Documents

Publication Publication Date Title
FI57429C (fi) Fotopolymeriserbar komposition innefattande ett additionspolymeriserbart material ett initiatorsystem foer additionspolymerisationen en inhibitor foer termisk additionspolymerisation och ett polymert bindemedel
US3953309A (en) Polymerization compositions and processes having polymeric binding agents
US4239849A (en) Polymers for aqueous processed photoresists
US4064287A (en) Process for treating selected areas of a surface with solder
CA1213092A (en) Flexible, fast processing, photopolymerizable composition
DE2602410C2 (de) Photopolymerisierbares Material
KR870000679B1 (ko) 감광성수지조성물 및 감광성수지조성물 적층체
EP0706091B2 (en) Liquid photoimageable resist
EP0024391A1 (en) Contrast colorant for photopolymerizable compositions
JPH033212B2 (da)
JPS645691B2 (da)
JPS60208748A (ja) 感光性樹脂組成物及びこれを用いた積層体
US5077175A (en) Plasticized polyvinyl alcohol release layer for a flexographic printing plate
AU613519B2 (en) A plasticized polyvinyl alcohol release layer for a flexographic printing plate
US4230790A (en) Photopolymerizable compositions useful in dry film photoresist
EP0497819B1 (en) A release layer for an aqueous or semi-aqueous processible flexographic printing plate
US3146106A (en) Preparation of printing plates
JPS60240715A (ja) 感光性樹脂組成物
DK145357B (da) Laminat til fremstilling af trykkeplader eller fotoreservager
JPS6380252A (ja) 画像形成材料
JPS6398651A (ja) 感光性樹脂組成物及びこれを用いた感光性積層体
JPH07209873A (ja) 光重合性化合物用汚染防止剤
JPS62208044A (ja) 新規なる光重合性積層体
JPS59113432A (ja) 光重合性組成物
JPH08137102A (ja) 金属表面保護樹脂組成物、これを用いた積層体及び印刷回路板の製造法