GB1361298A - Photopolymerizable compositions and their use - Google Patents
Photopolymerizable compositions and their useInfo
- Publication number
- GB1361298A GB1361298A GB481472A GB481472A GB1361298A GB 1361298 A GB1361298 A GB 1361298A GB 481472 A GB481472 A GB 481472A GB 481472 A GB481472 A GB 481472A GB 1361298 A GB1361298 A GB 1361298A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vinyl
- weight
- alkyl
- meth
- styrene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
1361298 Photopolymerizable compositions DYNACHEM CORP 2 Feb 1972 [4 Feb 1971] 4814/72 Heading C3P [Also in Division G2] Photopolymerizable compositions comprise (A) from 10 to 60 parts by weight of an addition polymerizable material comprising one or more non-gaseous compounds having a boiling point above 100 C. at atmospheric pressure and containing at least two terminal ethylenic groups, (B) 0À001 to 10 parts by weight of a photo-initiated free-radical generating polymerization initiator, (C) 0À001 to 5 parts by weight of a thermal addition polymerization inhibitor and (D) 40 to 90 parts by weight of a binding agent which is a polymer of (i) at least one non-acidic vinyl compound of the formula wherein R is H, C 1 to C 6 alkyl or halogen and X is H and Y is OOCR 1 , OR 1 , OCR 1 , COOR 1 , CN, CH = CH 2 , or Cl; or X is methyl and Y is COOR 1 , CN, CH = CH 2 or or X and Y are both Cl, and wherein R 1 is C 1 to C 12 alkyl, phenyl or benzyl, and R 3 and R 4 are the same or different and are H, C 1 to C 12 alkyl or benzyl; and (ii) at least one α,#-unsaturated carboxylic acid having 3 to 15 carbon atoms, the proportions of (i) and (ii) being such that the binding agent is soluble in an aqueous solution containing 0À01 to 10% by weight of a watersoluble base. The compositions may additionally contain dyes, pigments, plasticizers and adhesion promoters. The polymerizable material (A) may be, for example, a poly(meth)acrylate ester of a glycol, polyglycol or other polyhydroxy compound, a poly(meth)acrylamide compound, #-methacrylamidoethyl methacrylate or a divinyl ester of a dicarboxylic or disulphonic acid. The binding agent (D) may be, for example, a copolymer of (i) styrene, alphamethylstyrene, p-methylstyrene, p-t-butylstyrene, a vinyl carboxylate ester, vinyl chloride, vinylidene chloride, methyl(meth)acrylate, (meth)acrylonitrile, methacrylamide, an N- alkylacrylamide, a vinyl alkyl ketone or a vinyl alkyl ether with (ii) acrylic, methacrylic, cinnamic, crotonic, sorbic, itaconic, propiolic acid, maleic or fumaric acid, or a half-ester of itaconic, maleic or fumaric acid. Specified binding agents are styrene/acrylic acid copolymer, styrene/ methacrylic acid copolymer, styrene/monobutyl maleate copolymer and vinyl acetate/crotonic acid copolymer. The initiator (B) may be a quinone compound, such as anthraquinone and derivatives thereof, as well as compounds such as diacetyl, benzil, benzoin and benzoin ethers, pivaloin and silver persulphate. Suitable inhibitors (C) include phenols, copper resinate, naphthylamines, cuprous chloride, phenothiazine, pyridine, nitrobenzenes, p-toluquinone, chloranil and aromatic phosphites. The compositions are useful in the production of printing plates, photoresistors and printed circuits (see Division G2).
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11279771A | 1971-02-04 | 1971-02-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1361298A true GB1361298A (en) | 1974-07-24 |
Family
ID=22345895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB481472A Expired GB1361298A (en) | 1971-02-04 | 1972-02-02 | Photopolymerizable compositions and their use |
Country Status (23)
Country | Link |
---|---|
JP (2) | JPS5538961B1 (en) |
AU (1) | AU461461B2 (en) |
BE (1) | BE778729A (en) |
BG (1) | BG26673A3 (en) |
CA (1) | CA965291A (en) |
CH (1) | CH592322A5 (en) |
DD (1) | DD101035A5 (en) |
DE (1) | DE2205146C2 (en) |
DK (2) | DK142623B (en) |
ES (1) | ES399317A1 (en) |
FI (1) | FI57429C (en) |
FR (1) | FR2124974A5 (en) |
GB (1) | GB1361298A (en) |
HK (1) | HK28382A (en) |
IL (1) | IL38677A (en) |
IT (1) | IT949005B (en) |
LU (1) | LU64712A1 (en) |
NL (1) | NL176021C (en) |
NO (1) | NO141804C (en) |
PL (1) | PL83391B1 (en) |
RO (1) | RO64896A (en) |
SE (1) | SE390218B (en) |
ZA (1) | ZA72345B (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2645113A1 (en) * | 1975-10-07 | 1977-04-14 | Murakami Screen Kk | PHOTO-SENSITIVE COMPOSITION FOR PRESSURE SCREENS |
DE2602410A1 (en) * | 1974-10-04 | 1977-07-28 | Dynachem Corp | PROCESS FOR PREPARING A PHOTO ETCH BASE AND PHOTOPOLYMERIZABLE DIMENSIONS FOR IT |
WO1980001321A1 (en) * | 1978-12-25 | 1980-06-26 | N Smirnova | Dry film photoresist |
US4239849A (en) | 1978-06-19 | 1980-12-16 | Dynachem Corporation | Polymers for aqueous processed photoresists |
GB2198741A (en) * | 1984-04-03 | 1988-06-22 | Wolfen Filmfab Veb | Photopolymerisable materials |
US5053317A (en) * | 1988-12-06 | 1991-10-01 | Hoechst Aktiengesellschaft | Radiation-polymerizable mixture and copying material produced comprising polyurethane-polyurea polymer |
US7741013B2 (en) | 2000-06-30 | 2010-06-22 | E.I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
WO2010094017A1 (en) | 2009-02-16 | 2010-08-19 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1056189A (en) * | 1974-04-23 | 1979-06-12 | Ernst Leberzammer | Polymeric binders for aqueous processable photopolymer compositions |
JPS5944615B2 (en) * | 1976-02-16 | 1984-10-31 | 富士写真フイルム株式会社 | Photosensitive resin composition and metal image forming material using the same |
SU941918A1 (en) * | 1976-08-10 | 1982-07-07 | Предприятие П/Я Г-4444 | Dry film protoresist material |
DE3034343A1 (en) * | 1979-02-21 | 1981-04-09 | Panelgraphic Corp | RADIATION CURABLE CELLULOSIC POLYACRYLIC ABRASION RESISTANT COATING |
JPS5619752A (en) * | 1979-07-27 | 1981-02-24 | Hitachi Chemical Co Ltd | Photosensitive resin composition laminate |
EP0152889B1 (en) * | 1984-02-18 | 1987-09-16 | BASF Aktiengesellschaft | Photosensitive recording material |
DE3504254A1 (en) | 1985-02-08 | 1986-08-14 | Basf Ag, 6700 Ludwigshafen | LIGHT SENSITIVE RECORDING ELEMENT |
DE3619129A1 (en) * | 1986-06-06 | 1987-12-10 | Basf Ag | LIGHT SENSITIVE RECORDING ELEMENT |
JP2613462B2 (en) * | 1988-12-28 | 1997-05-28 | コニカ株式会社 | Image forming material and image forming method |
JP2515885Y2 (en) * | 1990-09-28 | 1996-10-30 | アンリツ株式会社 | Display of measuring device |
DE19638032A1 (en) * | 1996-09-18 | 1998-03-19 | Du Pont Deutschland | Photopolymerizable mixture with lower oxygen sensitivity for the production of color proofs |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA614181A (en) * | 1961-02-07 | J. Mcgraw William | Photopolymerizable compositions, elements and processes | |
US2893868A (en) * | 1955-08-22 | 1959-07-07 | Du Pont | Polymerizable compositions |
NL218803A (en) * | 1956-07-09 | |||
GB835849A (en) * | 1957-04-26 | 1960-05-25 | Du Pont | Photopolymerisable compositions and uses thereof |
US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
-
1972
- 1972-01-18 ZA ZA720345A patent/ZA72345B/en unknown
- 1972-01-25 NO NO177/72A patent/NO141804C/en unknown
- 1972-01-27 AU AU38392/72A patent/AU461461B2/en not_active Expired
- 1972-01-29 ES ES399317A patent/ES399317A1/en not_active Expired
- 1972-01-31 IL IL38677A patent/IL38677A/en unknown
- 1972-01-31 BE BE778729A patent/BE778729A/en not_active IP Right Cessation
- 1972-01-31 FR FR7203150A patent/FR2124974A5/fr not_active Expired
- 1972-02-01 RO RO7269624A patent/RO64896A/en unknown
- 1972-02-01 SE SE7201145A patent/SE390218B/en unknown
- 1972-02-01 CH CH142672A patent/CH592322A5/xx not_active IP Right Cessation
- 1972-02-02 JP JP1214572A patent/JPS5538961B1/ja active Pending
- 1972-02-02 CA CA133,755A patent/CA965291A/en not_active Expired
- 1972-02-02 LU LU64712A patent/LU64712A1/xx unknown
- 1972-02-02 FI FI271/72A patent/FI57429C/en active
- 1972-02-02 GB GB481472A patent/GB1361298A/en not_active Expired
- 1972-02-03 DE DE2205146A patent/DE2205146C2/en not_active Expired - Lifetime
- 1972-02-03 DK DK48172AA patent/DK142623B/en not_active IP Right Cessation
- 1972-02-03 IT IT67324/72A patent/IT949005B/en active
- 1972-02-03 PL PL1972153265A patent/PL83391B1/pl unknown
- 1972-02-04 BG BG7219648A patent/BG26673A3/xx unknown
- 1972-02-04 NL NLAANVRAGE7201460,A patent/NL176021C/en not_active IP Right Cessation
- 1972-12-08 DD DD167452A patent/DD101035A5/xx unknown
-
1973
- 1973-01-03 DK DK1773A patent/DK144184C/en active
-
1982
- 1982-06-24 HK HK283/82A patent/HK28382A/en unknown
- 1982-11-26 JP JP57207462A patent/JPS58144824A/en active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2602410A1 (en) * | 1974-10-04 | 1977-07-28 | Dynachem Corp | PROCESS FOR PREPARING A PHOTO ETCH BASE AND PHOTOPOLYMERIZABLE DIMENSIONS FOR IT |
DE2645113A1 (en) * | 1975-10-07 | 1977-04-14 | Murakami Screen Kk | PHOTO-SENSITIVE COMPOSITION FOR PRESSURE SCREENS |
US4239849A (en) | 1978-06-19 | 1980-12-16 | Dynachem Corporation | Polymers for aqueous processed photoresists |
WO1980001321A1 (en) * | 1978-12-25 | 1980-06-26 | N Smirnova | Dry film photoresist |
GB2198741A (en) * | 1984-04-03 | 1988-06-22 | Wolfen Filmfab Veb | Photopolymerisable materials |
US5053317A (en) * | 1988-12-06 | 1991-10-01 | Hoechst Aktiengesellschaft | Radiation-polymerizable mixture and copying material produced comprising polyurethane-polyurea polymer |
US7741013B2 (en) | 2000-06-30 | 2010-06-22 | E.I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
WO2010094017A1 (en) | 2009-02-16 | 2010-08-19 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
Also Published As
Publication number | Publication date |
---|---|
DE2205146C2 (en) | 1990-03-08 |
IL38677A (en) | 1974-12-31 |
AU3839272A (en) | 1973-08-02 |
DK142623C (en) | 1981-08-03 |
ZA72345B (en) | 1973-03-28 |
NL176021C (en) | 1987-07-16 |
RO64896A (en) | 1980-01-15 |
HK28382A (en) | 1982-07-02 |
CA965291A (en) | 1975-04-01 |
IT949005B (en) | 1973-06-11 |
IL38677A0 (en) | 1972-03-28 |
JPH0136924B2 (en) | 1989-08-03 |
DK142623B (en) | 1980-12-01 |
SE390218B (en) | 1976-12-06 |
NL7201460A (en) | 1972-08-08 |
NO141804B (en) | 1980-02-04 |
DK144184B (en) | 1982-01-04 |
JPS5538961B1 (en) | 1980-10-07 |
JPS58144824A (en) | 1983-08-29 |
BG26673A3 (en) | 1979-05-15 |
CH592322A5 (en) | 1977-10-31 |
LU64712A1 (en) | 1973-09-04 |
FI57429B (en) | 1980-04-30 |
DK144184C (en) | 1982-06-14 |
AU461461B2 (en) | 1975-05-12 |
ES399317A1 (en) | 1974-12-16 |
FR2124974A5 (en) | 1972-09-22 |
DE2205146A1 (en) | 1972-11-23 |
NO141804C (en) | 1980-05-14 |
DD101035A5 (en) | 1973-10-12 |
NL176021B (en) | 1984-09-03 |
BE778729A (en) | 1972-07-31 |
FI57429C (en) | 1980-08-11 |
PL83391B1 (en) | 1975-12-31 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
414F | Notice of opposition given (sect. 14/1949) | ||
414A | Case decided by the comptroller ** specification amended (sect. 14/1949) | ||
SP | Amendment (slips) printed | ||
PS | Patent sealed [section 19, patents act 1949] | ||
PE20 | Patent expired after termination of 20 years |