CA965291A - Polymerization compositions and processes - Google Patents
Polymerization compositions and processesInfo
- Publication number
- CA965291A CA965291A CA133,755A CA133755A CA965291A CA 965291 A CA965291 A CA 965291A CA 133755 A CA133755 A CA 133755A CA 965291 A CA965291 A CA 965291A
- Authority
- CA
- Canada
- Prior art keywords
- processes
- polymerization compositions
- polymerization
- compositions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Polymerisation Methods In General (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11279771A | 1971-02-04 | 1971-02-04 |
Publications (1)
Publication Number | Publication Date |
---|---|
CA965291A true CA965291A (en) | 1975-04-01 |
Family
ID=22345895
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CA133,755A Expired CA965291A (en) | 1971-02-04 | 1972-02-02 | Polymerization compositions and processes |
Country Status (23)
Country | Link |
---|---|
JP (2) | JPS5538961B1 (en) |
AU (1) | AU461461B2 (en) |
BE (1) | BE778729A (en) |
BG (1) | BG26673A3 (en) |
CA (1) | CA965291A (en) |
CH (1) | CH592322A5 (en) |
DD (1) | DD101035A5 (en) |
DE (1) | DE2205146C2 (en) |
DK (2) | DK142623B (en) |
ES (1) | ES399317A1 (en) |
FI (1) | FI57429C (en) |
FR (1) | FR2124974A5 (en) |
GB (1) | GB1361298A (en) |
HK (1) | HK28382A (en) |
IL (1) | IL38677A (en) |
IT (1) | IT949005B (en) |
LU (1) | LU64712A1 (en) |
NL (1) | NL176021C (en) |
NO (1) | NO141804C (en) |
PL (1) | PL83391B1 (en) |
RO (1) | RO64896A (en) |
SE (1) | SE390218B (en) |
ZA (1) | ZA72345B (en) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1056189A (en) * | 1974-04-23 | 1979-06-12 | Ernst Leberzammer | Polymeric binders for aqueous processable photopolymer compositions |
ZA757984B (en) * | 1974-10-04 | 1976-12-29 | Dynachem Corp | Polymers for aqueous processed photoresists |
JPS5917414B2 (en) * | 1975-10-07 | 1984-04-21 | 村上スクリ−ン (株) | Photosensitive composition and photosensitive film for screen plates |
JPS5944615B2 (en) * | 1976-02-16 | 1984-10-31 | 富士写真フイルム株式会社 | Photosensitive resin composition and metal image forming material using the same |
SU941918A1 (en) * | 1976-08-10 | 1982-07-07 | Предприятие П/Я Г-4444 | Dry film protoresist material |
US4239849A (en) | 1978-06-19 | 1980-12-16 | Dynachem Corporation | Polymers for aqueous processed photoresists |
WO1980001321A1 (en) * | 1978-12-25 | 1980-06-26 | N Smirnova | Dry film photoresist |
DE3034343A1 (en) * | 1979-02-21 | 1981-04-09 | Panelgraphic Corp | RADIATION CURABLE CELLULOSIC POLYACRYLIC ABRASION RESISTANT COATING |
JPS5619752A (en) * | 1979-07-27 | 1981-02-24 | Hitachi Chemical Co Ltd | Photosensitive resin composition laminate |
EP0152889B1 (en) * | 1984-02-18 | 1987-09-16 | BASF Aktiengesellschaft | Photosensitive recording material |
DD250593A1 (en) * | 1984-04-03 | 1987-10-14 | Wolfen Filmfab Veb | PHOTOPOLYMERIZABLE MATERIAL |
DE3504254A1 (en) | 1985-02-08 | 1986-08-14 | Basf Ag, 6700 Ludwigshafen | LIGHT SENSITIVE RECORDING ELEMENT |
DE3619129A1 (en) * | 1986-06-06 | 1987-12-10 | Basf Ag | LIGHT SENSITIVE RECORDING ELEMENT |
DE3841025A1 (en) * | 1988-12-06 | 1990-06-07 | Hoechst Ag | POLYMERIZABLE MIXTURE BY RADIATION AND RECORDING MATERIAL MADE THEREOF |
JP2613462B2 (en) * | 1988-12-28 | 1997-05-28 | コニカ株式会社 | Image forming material and image forming method |
JP2515885Y2 (en) * | 1990-09-28 | 1996-10-30 | アンリツ株式会社 | Display of measuring device |
DE19638032A1 (en) * | 1996-09-18 | 1998-03-19 | Du Pont Deutschland | Photopolymerizable mixture with lower oxygen sensitivity for the production of color proofs |
US7052824B2 (en) | 2000-06-30 | 2006-05-30 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
US20100209843A1 (en) | 2009-02-16 | 2010-08-19 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA614181A (en) * | 1961-02-07 | J. Mcgraw William | Photopolymerizable compositions, elements and processes | |
US2893868A (en) * | 1955-08-22 | 1959-07-07 | Du Pont | Polymerizable compositions |
NL218803A (en) * | 1956-07-09 | |||
GB835849A (en) * | 1957-04-26 | 1960-05-25 | Du Pont | Photopolymerisable compositions and uses thereof |
US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
-
1972
- 1972-01-18 ZA ZA720345A patent/ZA72345B/en unknown
- 1972-01-25 NO NO177/72A patent/NO141804C/en unknown
- 1972-01-27 AU AU38392/72A patent/AU461461B2/en not_active Expired
- 1972-01-29 ES ES399317A patent/ES399317A1/en not_active Expired
- 1972-01-31 BE BE778729A patent/BE778729A/en not_active IP Right Cessation
- 1972-01-31 IL IL38677A patent/IL38677A/en unknown
- 1972-01-31 FR FR7203150A patent/FR2124974A5/fr not_active Expired
- 1972-02-01 CH CH142672A patent/CH592322A5/xx not_active IP Right Cessation
- 1972-02-01 SE SE7201145A patent/SE390218B/en unknown
- 1972-02-01 RO RO7269624A patent/RO64896A/en unknown
- 1972-02-02 FI FI271/72A patent/FI57429C/en active
- 1972-02-02 GB GB481472A patent/GB1361298A/en not_active Expired
- 1972-02-02 LU LU64712A patent/LU64712A1/xx unknown
- 1972-02-02 JP JP1214572A patent/JPS5538961B1/ja active Pending
- 1972-02-02 CA CA133,755A patent/CA965291A/en not_active Expired
- 1972-02-03 PL PL1972153265A patent/PL83391B1/pl unknown
- 1972-02-03 DE DE2205146A patent/DE2205146C2/en not_active Expired - Lifetime
- 1972-02-03 IT IT67324/72A patent/IT949005B/en active
- 1972-02-03 DK DK48172AA patent/DK142623B/en not_active IP Right Cessation
- 1972-02-04 BG BG7219648A patent/BG26673A3/xx unknown
- 1972-02-04 NL NLAANVRAGE7201460,A patent/NL176021C/en not_active IP Right Cessation
- 1972-12-08 DD DD167452A patent/DD101035A5/xx unknown
-
1973
- 1973-01-03 DK DK1773A patent/DK144184C/en active
-
1982
- 1982-06-24 HK HK283/82A patent/HK28382A/en unknown
- 1982-11-26 JP JP57207462A patent/JPS58144824A/en active Granted
Also Published As
Publication number | Publication date |
---|---|
DK142623C (en) | 1981-08-03 |
DK144184C (en) | 1982-06-14 |
HK28382A (en) | 1982-07-02 |
NL176021C (en) | 1987-07-16 |
IL38677A (en) | 1974-12-31 |
PL83391B1 (en) | 1975-12-31 |
DK144184B (en) | 1982-01-04 |
NO141804B (en) | 1980-02-04 |
AU3839272A (en) | 1973-08-02 |
GB1361298A (en) | 1974-07-24 |
RO64896A (en) | 1980-01-15 |
SE390218B (en) | 1976-12-06 |
JPS5538961B1 (en) | 1980-10-07 |
DE2205146A1 (en) | 1972-11-23 |
JPS58144824A (en) | 1983-08-29 |
AU461461B2 (en) | 1975-05-12 |
NL7201460A (en) | 1972-08-08 |
BG26673A3 (en) | 1979-05-15 |
BE778729A (en) | 1972-07-31 |
FI57429B (en) | 1980-04-30 |
FR2124974A5 (en) | 1972-09-22 |
NO141804C (en) | 1980-05-14 |
IT949005B (en) | 1973-06-11 |
LU64712A1 (en) | 1973-09-04 |
NL176021B (en) | 1984-09-03 |
ES399317A1 (en) | 1974-12-16 |
CH592322A5 (en) | 1977-10-31 |
DK142623B (en) | 1980-12-01 |
FI57429C (en) | 1980-08-11 |
IL38677A0 (en) | 1972-03-28 |
JPH0136924B2 (en) | 1989-08-03 |
DD101035A5 (en) | 1973-10-12 |
ZA72345B (en) | 1973-03-28 |
DE2205146C2 (en) | 1990-03-08 |
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