JPS5619752A - Photosensitive resin composition laminate - Google Patents

Photosensitive resin composition laminate

Info

Publication number
JPS5619752A
JPS5619752A JP9657079A JP9657079A JPS5619752A JP S5619752 A JPS5619752 A JP S5619752A JP 9657079 A JP9657079 A JP 9657079A JP 9657079 A JP9657079 A JP 9657079A JP S5619752 A JPS5619752 A JP S5619752A
Authority
JP
Japan
Prior art keywords
resin composition
photosensitive resin
composition laminate
laminate
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9657079A
Other languages
Japanese (ja)
Other versions
JPH033212B2 (en
Inventor
Hajime Kakumaru
Nobuyuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP9657079A priority Critical patent/JPS5619752A/en
Priority to GB8023351A priority patent/GB2059982B/en
Priority to DE19803028136 priority patent/DE3028136A1/en
Publication of JPS5619752A publication Critical patent/JPS5619752A/en
Publication of JPH033212B2 publication Critical patent/JPH033212B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
JP9657079A 1979-07-27 1979-07-27 Photosensitive resin composition laminate Granted JPS5619752A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP9657079A JPS5619752A (en) 1979-07-27 1979-07-27 Photosensitive resin composition laminate
GB8023351A GB2059982B (en) 1979-07-27 1980-07-17 Photosentisive composition and photosensitive laminate developable with aqueous alkali
DE19803028136 DE3028136A1 (en) 1979-07-27 1980-07-24 LIGHT SENSITIVE DIMENSION AND LIGHT SENSITIVE ELEMENT THEREFORE

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9657079A JPS5619752A (en) 1979-07-27 1979-07-27 Photosensitive resin composition laminate

Publications (2)

Publication Number Publication Date
JPS5619752A true JPS5619752A (en) 1981-02-24
JPH033212B2 JPH033212B2 (en) 1991-01-18

Family

ID=14168654

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9657079A Granted JPS5619752A (en) 1979-07-27 1979-07-27 Photosensitive resin composition laminate

Country Status (3)

Country Link
JP (1) JPS5619752A (en)
DE (1) DE3028136A1 (en)
GB (1) GB2059982B (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS581142A (en) * 1981-06-25 1983-01-06 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive resin composition laminate
JPS6455550A (en) * 1987-08-26 1989-03-02 Hitachi Chemical Co Ltd Photosensitive resin composition
JPH01159637A (en) * 1987-12-16 1989-06-22 Daicel Chem Ind Ltd Photosensitive curable composition
JPH01219734A (en) * 1988-02-27 1989-09-01 Nippon Synthetic Chem Ind Co Ltd:The Photosensitive resin composition, dry film using same and image forming method
JPH02161440A (en) * 1988-12-15 1990-06-21 Daicel Chem Ind Ltd Photopolymerizable composition
JPH02161439A (en) * 1988-12-15 1990-06-21 Daicel Chem Ind Ltd Photosensitizer and photopolymerizable composition

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3120052A1 (en) * 1981-05-20 1982-12-09 Hoechst Ag, 6000 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION AND COPYING MATERIAL MADE THEREOF
JPS5888741A (en) * 1981-11-20 1983-05-26 Hitachi Chem Co Ltd Photosensitive resin composition and its laminate
US4752553A (en) * 1982-04-01 1988-06-21 M&T Chemicals Inc. High resolution solder mask photopolymers for screen coating over circuit traces
DE3223104A1 (en) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt PHOTOPOLYMERIZABLE MIXTURE AND PHOTOPOLYMERIZABLE COPY MATERIAL MADE THEREOF
DE3427519A1 (en) * 1984-07-26 1986-02-06 Hoechst Ag, 6230 Frankfurt POLYMERIZABLE MIXTURE BY RADIATION, MIXED POLYMERISATE CONTAINED therein, AND METHOD FOR PRODUCING THE MIXED POLYMER ISATE
JPS6318692A (en) * 1986-07-11 1988-01-26 日立化成工業株式会社 Manufacture of printed wiring board
US5182187A (en) * 1988-02-24 1993-01-26 Hoechst Aktiengesellschaft Radiation-polymerizable composition and recording material prepared from this composition
US4985343A (en) * 1989-02-09 1991-01-15 Mitsubishi Rayon Co., Ltd. Crosslinking-curable resin composition
KR20000029685A (en) * 1996-07-30 2000-05-25 와까바야시 구니히꾀 Manufacture of laminated film and printed wiring board
US20210379621A1 (en) * 2020-06-09 2021-12-09 University Of North Texas Fluorinated polymers for corrosion protection of metal

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48100201A (en) * 1972-04-04 1973-12-18
JPS498281A (en) * 1972-05-11 1974-01-24
JPS50147323A (en) * 1974-04-23 1975-11-26

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA923358A (en) * 1969-08-01 1973-03-27 Fuji Photo Film Co. Light-sensitive stencil printing material
ZA72345B (en) * 1971-02-04 1973-03-28 Dynachem Corp Polymerization compositions and processes
JPS51123140A (en) * 1975-04-19 1976-10-27 Nippon Paint Co Ltd Photosensitive compositions and processing method thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS48100201A (en) * 1972-04-04 1973-12-18
JPS498281A (en) * 1972-05-11 1974-01-24
JPS50147323A (en) * 1974-04-23 1975-11-26

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS581142A (en) * 1981-06-25 1983-01-06 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive resin composition laminate
JPS6455550A (en) * 1987-08-26 1989-03-02 Hitachi Chemical Co Ltd Photosensitive resin composition
JPH01159637A (en) * 1987-12-16 1989-06-22 Daicel Chem Ind Ltd Photosensitive curable composition
JPH01219734A (en) * 1988-02-27 1989-09-01 Nippon Synthetic Chem Ind Co Ltd:The Photosensitive resin composition, dry film using same and image forming method
JPH02161440A (en) * 1988-12-15 1990-06-21 Daicel Chem Ind Ltd Photopolymerizable composition
JPH02161439A (en) * 1988-12-15 1990-06-21 Daicel Chem Ind Ltd Photosensitizer and photopolymerizable composition

Also Published As

Publication number Publication date
JPH033212B2 (en) 1991-01-18
GB2059982B (en) 1983-05-18
GB2059982A (en) 1981-04-29
DE3028136A1 (en) 1981-02-12
DE3028136C2 (en) 1989-02-16

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