JPS6455550A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS6455550A
JPS6455550A JP21156287A JP21156287A JPS6455550A JP S6455550 A JPS6455550 A JP S6455550A JP 21156287 A JP21156287 A JP 21156287A JP 21156287 A JP21156287 A JP 21156287A JP S6455550 A JPS6455550 A JP S6455550A
Authority
JP
Japan
Prior art keywords
formula
resist
weight average
methacrylic acid
ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21156287A
Other languages
Japanese (ja)
Other versions
JP2536540B2 (en
Inventor
Kenji Kamio
Yoji Tanaka
Hiroki Furubayashi
Hajime Kakumaru
Kazutaka Masaoka
Yoshitaka Minami
Noboru Sugasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP62211562A priority Critical patent/JP2536540B2/en
Publication of JPS6455550A publication Critical patent/JPS6455550A/en
Application granted granted Critical
Publication of JP2536540B2 publication Critical patent/JP2536540B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Abstract

PURPOSE:To preventing twining the peeled strip of a resist round the roll of a peeling machine by incorporating a film forming polymer composed of two kinds of alkaline soluble vinyl copolymers in the titled composition, thereby reducing minutely the peeled strip of the resist. CONSTITUTION:The titled composition contains the film forming polymer (A), an ethylenically unsatd. compd. (such as urethane acrylate), an org. halogen compd. (such as tribromomethyl phenyl sulfone) and a sensitizer capable of forming a free radical by an active ray. And, the polymer A is composed of a mixture of the alkaline soluble copolymer (a) which contains 20-40wt.% of methacrylic acid and 60-80wt.% of a monomer shown by the formula, and has the weight average mol.wt. of 70,000-150,000, and the alkaline solution copolymer (b) which contains 20-40wt.% of methacrylic acid and 60-80wt.% of a monomer shown by the formula and has the weight average mol.wt. of 10,000-40,000, and a glass transition temp. of 60-110 deg.C, in an amount of a ratio of (10/90)-(90/10) (wt. ratio). In the formula, R1 is H or methyl group, R2 is 1-12C alkyl group.
JP62211562A 1987-08-26 1987-08-26 Photosensitive resin composition Expired - Lifetime JP2536540B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62211562A JP2536540B2 (en) 1987-08-26 1987-08-26 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62211562A JP2536540B2 (en) 1987-08-26 1987-08-26 Photosensitive resin composition

Publications (2)

Publication Number Publication Date
JPS6455550A true JPS6455550A (en) 1989-03-02
JP2536540B2 JP2536540B2 (en) 1996-09-18

Family

ID=16607849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62211562A Expired - Lifetime JP2536540B2 (en) 1987-08-26 1987-08-26 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JP2536540B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5149776A (en) * 1989-11-17 1992-09-22 Mitsubishi Rayon Co., Ltd. Cross-linking hardenable resin composition, metal laminates thereof and metal surface processing method therewith
JPH05257281A (en) * 1991-06-12 1993-10-08 Mitsui Toatsu Chem Inc Photosensitive resin composition and photosensitive liquid composition and photosensitive film

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
JPS581142A (en) * 1981-06-25 1983-01-06 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive resin composition laminate
JPS6275633A (en) * 1985-09-30 1987-04-07 Hitachi Chem Co Ltd Photosensitive resin composition
JPS6344651A (en) * 1986-08-12 1988-02-25 Mitsubishi Chem Ind Ltd Photopolymerizable composition

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5619752A (en) * 1979-07-27 1981-02-24 Hitachi Chemical Co Ltd Photosensitive resin composition laminate
JPS581142A (en) * 1981-06-25 1983-01-06 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive resin composition laminate
JPS6275633A (en) * 1985-09-30 1987-04-07 Hitachi Chem Co Ltd Photosensitive resin composition
JPS6344651A (en) * 1986-08-12 1988-02-25 Mitsubishi Chem Ind Ltd Photopolymerizable composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5149776A (en) * 1989-11-17 1992-09-22 Mitsubishi Rayon Co., Ltd. Cross-linking hardenable resin composition, metal laminates thereof and metal surface processing method therewith
JPH05257281A (en) * 1991-06-12 1993-10-08 Mitsui Toatsu Chem Inc Photosensitive resin composition and photosensitive liquid composition and photosensitive film

Also Published As

Publication number Publication date
JP2536540B2 (en) 1996-09-18

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