JPS6410234A - Photopolymerizable negative type resist - Google Patents

Photopolymerizable negative type resist

Info

Publication number
JPS6410234A
JPS6410234A JP16596487A JP16596487A JPS6410234A JP S6410234 A JPS6410234 A JP S6410234A JP 16596487 A JP16596487 A JP 16596487A JP 16596487 A JP16596487 A JP 16596487A JP S6410234 A JPS6410234 A JP S6410234A
Authority
JP
Japan
Prior art keywords
resist
titled
photopolymerizable
group
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16596487A
Other languages
Japanese (ja)
Inventor
Shigeki Shimizu
Toshiyoshi Urano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP16596487A priority Critical patent/JPS6410234A/en
Publication of JPS6410234A publication Critical patent/JPS6410234A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To obtain the titled resist having the excellent anti-etching and resist peeling properties, by incorporating a photopolymerizable polymer having a polyfunctional ethylenic unsatd. group at a side chain or an end group in a combination with a specified high polymer having a prescribed mol.wt., in the titled resist. CONSTITUTION:The titled resist contains a photopolymerizable composition composed of the photopolymerizable polymer having the polyfunctional ethylenic unsatd. group at the side chain or the end group, and a copolymer which has a structural unit composed of methacrylic acid and the structural unit composed of methyl methacrylate and a weight average mol.wt. of 10,000-500,000, and the compd. which has a b.p. of >=100 deg.C, at a normal pressure, and contains >=2 polymerizable end ethylenic groups, and a photopolymerizable initiator capable of activating by an active ray. The titled resist can be developed with an aqueous alkaline solution or said solution contg. a small amount of an org. solvent, and the sensitivity and the anti-etching and the resist peeling properties of the titled resist are improved.
JP16596487A 1987-07-02 1987-07-02 Photopolymerizable negative type resist Pending JPS6410234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16596487A JPS6410234A (en) 1987-07-02 1987-07-02 Photopolymerizable negative type resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16596487A JPS6410234A (en) 1987-07-02 1987-07-02 Photopolymerizable negative type resist

Publications (1)

Publication Number Publication Date
JPS6410234A true JPS6410234A (en) 1989-01-13

Family

ID=15822355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16596487A Pending JPS6410234A (en) 1987-07-02 1987-07-02 Photopolymerizable negative type resist

Country Status (1)

Country Link
JP (1) JPS6410234A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0584780A2 (en) * 1992-08-28 1994-03-02 Hitachi, Ltd. Process for producing printed wiring board

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0584780A2 (en) * 1992-08-28 1994-03-02 Hitachi, Ltd. Process for producing printed wiring board
EP0584780A3 (en) * 1992-08-28 1995-08-02 Hitachi Ltd Process for producing printed wiring board.

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