JPS6424247A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS6424247A
JPS6424247A JP18137087A JP18137087A JPS6424247A JP S6424247 A JPS6424247 A JP S6424247A JP 18137087 A JP18137087 A JP 18137087A JP 18137087 A JP18137087 A JP 18137087A JP S6424247 A JPS6424247 A JP S6424247A
Authority
JP
Japan
Prior art keywords
compd
titled composition
polymer
formula
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18137087A
Other languages
Japanese (ja)
Inventor
Yoji Tanaka
Kazutaka Masaoka
Hajime Kakumaru
Daisuke Makino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP18137087A priority Critical patent/JPS6424247A/en
Publication of JPS6424247A publication Critical patent/JPS6424247A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To improve the workability of the titled composition, without twisting around a peeling roll of an automatic peeling machine by incorporating a specified ethylenic unsatd. compd., a polymer capable of giving a film forming property and contg. carboxylic group, and a photopolymerization initiator and/or its precursor in the titled composition. CONSTITUTION:The compd. shown by formula I is incorporated in the titled composition in an amount of 20-90pts.wt. based on 100pts.wt. of the total amount of said compd. and the polymer, and said polymer is incorporated in the titled composition in an amount of 10-80pts.wt. based on 100pts.wt. of the total amount of the polymer and the compd. shown by formula I, and the org. halogen compd. and the photopolymerization initiator or its precursor are incorporated in the titled composition in an amount of 0.1-10pts.wt. based on 100pts.wt. of the total amount of the compd. shown by formula I and said polymer respectively. In formula I, (l), (m) and (n) are an integer of 0-2, R1 and R2 are each hydrogen atom or methyl group. Thus, the peeled piece of the titled composition is easily removed.
JP18137087A 1987-07-21 1987-07-21 Photosensitive resin composition Pending JPS6424247A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18137087A JPS6424247A (en) 1987-07-21 1987-07-21 Photosensitive resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18137087A JPS6424247A (en) 1987-07-21 1987-07-21 Photosensitive resin composition

Publications (1)

Publication Number Publication Date
JPS6424247A true JPS6424247A (en) 1989-01-26

Family

ID=16099539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18137087A Pending JPS6424247A (en) 1987-07-21 1987-07-21 Photosensitive resin composition

Country Status (1)

Country Link
JP (1) JPS6424247A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6555290B1 (en) 1995-04-19 2003-04-29 Hitachi Chemical Co., Ltd. Photosensitive resin composition and photosensitive element using the same
WO2009081925A1 (en) * 2007-12-25 2009-07-02 Asahi Kasei E-Materials Corporation Layered photosensitive-resin product
JP2010197831A (en) * 2009-02-26 2010-09-09 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element using the composition, method for forming resist pattern and method for manufacturing printed wiring board

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6555290B1 (en) 1995-04-19 2003-04-29 Hitachi Chemical Co., Ltd. Photosensitive resin composition and photosensitive element using the same
WO2009081925A1 (en) * 2007-12-25 2009-07-02 Asahi Kasei E-Materials Corporation Layered photosensitive-resin product
JP2010197831A (en) * 2009-02-26 2010-09-09 Hitachi Chem Co Ltd Photosensitive resin composition and photosensitive element using the composition, method for forming resist pattern and method for manufacturing printed wiring board

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