JPS62180355A - Photopolymerizable composition - Google Patents
Photopolymerizable compositionInfo
- Publication number
- JPS62180355A JPS62180355A JP2332486A JP2332486A JPS62180355A JP S62180355 A JPS62180355 A JP S62180355A JP 2332486 A JP2332486 A JP 2332486A JP 2332486 A JP2332486 A JP 2332486A JP S62180355 A JPS62180355 A JP S62180355A
- Authority
- JP
- Japan
- Prior art keywords
- compd
- photopolymerizable composition
- initiator
- polymer binder
- photopolymn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims description 23
- 239000003999 initiator Substances 0.000 claims abstract description 8
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 7
- 239000004416 thermosoftening plastic Substances 0.000 claims abstract description 7
- 229920000620 organic polymer Polymers 0.000 claims abstract description 6
- 239000002491 polymer binding agent Substances 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000003277 amino group Chemical group 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 150000002367 halogens Chemical class 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 1
- ACTKAGSPIFDCMF-UHFFFAOYSA-N 1,3-oxazol-2-amine Chemical compound NC1=NC=CO1 ACTKAGSPIFDCMF-UHFFFAOYSA-N 0.000 abstract description 11
- 239000000178 monomer Substances 0.000 abstract description 4
- IUHYFLKPKSFRCT-UHFFFAOYSA-N 5-phenyl-1,3-oxazol-2-amine Chemical compound O1C(N)=NC=C1C1=CC=CC=C1 IUHYFLKPKSFRCT-UHFFFAOYSA-N 0.000 abstract description 3
- 229920002125 Sokalan® Polymers 0.000 abstract description 2
- 229920001577 copolymer Polymers 0.000 abstract description 2
- 239000004584 polyacrylic acid Substances 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 2
- 229920002554 vinyl polymer Polymers 0.000 abstract description 2
- 239000000654 additive Substances 0.000 abstract 2
- 230000000996 additive effect Effects 0.000 abstract 2
- 230000004304 visual acuity Effects 0.000 abstract 1
- 238000011156 evaluation Methods 0.000 description 11
- -1 heterocyclic nitrogen-containing compound Chemical class 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000002318 adhesion promoter Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 150000004056 anthraquinones Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- UIJNXKDPFUQGEF-UHFFFAOYSA-N ethyl 2,5-dimethyl-1,3-oxazole-4-carboxylate Chemical compound CCOC(=O)C=1N=C(C)OC=1C UIJNXKDPFUQGEF-UHFFFAOYSA-N 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- FDDDEECHVMSUSB-UHFFFAOYSA-N sulfanilamide Chemical compound NC1=CC=C(S(N)(=O)=O)C=C1 FDDDEECHVMSUSB-UHFFFAOYSA-N 0.000 description 2
- 229940124530 sulfonamide Drugs 0.000 description 2
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical compound CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- XAAUYUMBCPRWED-NTMALXAHSA-N (nz)-n-[1-(4-methylphenyl)ethylidene]hydroxylamine Chemical compound O/N=C(/C)C1=CC=C(C)C=C1 XAAUYUMBCPRWED-NTMALXAHSA-N 0.000 description 1
- CGXVUIBINWTLNT-UHFFFAOYSA-N 1,2,3-tris(ethenoxy)propane Chemical compound C=COCC(OC=C)COC=C CGXVUIBINWTLNT-UHFFFAOYSA-N 0.000 description 1
- ZXHDVRATSGZISC-UHFFFAOYSA-N 1,2-bis(ethenoxy)ethane Chemical compound C=COCCOC=C ZXHDVRATSGZISC-UHFFFAOYSA-N 0.000 description 1
- MSAHTMIQULFMRG-UHFFFAOYSA-N 1,2-diphenyl-2-propan-2-yloxyethanone Chemical compound C=1C=CC=CC=1C(OC(C)C)C(=O)C1=CC=CC=C1 MSAHTMIQULFMRG-UHFFFAOYSA-N 0.000 description 1
- YNSNJGRCQCDRDM-UHFFFAOYSA-N 1-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl YNSNJGRCQCDRDM-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- VUPXKQHLZATXTR-UHFFFAOYSA-N 2,4-diphenyl-1,3-oxazole Chemical compound C=1OC(C=2C=CC=CC=2)=NC=1C1=CC=CC=C1 VUPXKQHLZATXTR-UHFFFAOYSA-N 0.000 description 1
- CNRNYORZJGVOSY-UHFFFAOYSA-N 2,5-diphenyl-1,3-oxazole Chemical compound C=1N=C(C=2C=CC=CC=2)OC=1C1=CC=CC=C1 CNRNYORZJGVOSY-UHFFFAOYSA-N 0.000 description 1
- YDOVPVLKADMTFE-UHFFFAOYSA-N 2-[2-[2-(2-hydroxyethoxy)ethoxy]ethoxy]ethanol;prop-2-enoic acid Chemical compound OC(=O)C=C.OCCOCCOCCOCCO YDOVPVLKADMTFE-UHFFFAOYSA-N 0.000 description 1
- LRNAEIGJXGBLMO-UHFFFAOYSA-N 2-ethyl-4,5-diphenyl-1,3-oxazole Chemical compound O1C(CC)=NC(C=2C=CC=CC=2)=C1C1=CC=CC=C1 LRNAEIGJXGBLMO-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- RQCBPOPQTLHDFC-UHFFFAOYSA-N 2-phenyl-1,3-oxazole Chemical compound C1=COC(C=2C=CC=CC=2)=N1 RQCBPOPQTLHDFC-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- PTKWYSNDTXDBIZ-UHFFFAOYSA-N 9,10-dioxoanthracene-1,2-disulfonic acid Chemical compound C1=CC=C2C(=O)C3=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C3C(=O)C2=C1 PTKWYSNDTXDBIZ-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000005396 acrylic acid ester group Chemical group 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- MIAUJDCQDVWHEV-UHFFFAOYSA-N benzene-1,2-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1S(O)(=O)=O MIAUJDCQDVWHEV-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- GSEZYWGNEACOIW-UHFFFAOYSA-N bis(2-aminophenyl)methanone Chemical compound NC1=CC=CC=C1C(=O)C1=CC=CC=C1N GSEZYWGNEACOIW-UHFFFAOYSA-N 0.000 description 1
- PIPBVABVQJZSAB-UHFFFAOYSA-N bis(ethenyl) benzene-1,2-dicarboxylate Chemical compound C=COC(=O)C1=CC=CC=C1C(=O)OC=C PIPBVABVQJZSAB-UHFFFAOYSA-N 0.000 description 1
- AJCHRUXIDGEWDK-UHFFFAOYSA-N bis(ethenyl) butanedioate Chemical compound C=COC(=O)CCC(=O)OC=C AJCHRUXIDGEWDK-UHFFFAOYSA-N 0.000 description 1
- JZQAAQZDDMEFGZ-UHFFFAOYSA-N bis(ethenyl) hexanedioate Chemical compound C=COC(=O)CCCCC(=O)OC=C JZQAAQZDDMEFGZ-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- LRQAQFQUJNFEDT-UHFFFAOYSA-N ethyl 5-phenyl-1,3-oxazole-2-carboxylate Chemical compound O1C(C(=O)OCC)=NC=C1C1=CC=CC=C1 LRQAQFQUJNFEDT-UHFFFAOYSA-N 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は新規な光重合性組成物に関するものであり、更
に詳しくは、金属との密着性(付着性または′接着性)
が改善された光重合性組成物に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a novel photopolymerizable composition, and more specifically, its adhesion to metals (adhesiveness or 'adhesion').
The present invention relates to a photopolymerizable composition with improved properties.
光重合性組成物から形成された被膜と基材との間の密着
性を改善するために、従来から多くの提案がなされてい
る。部ちプリント配線板の製造において用いられるドラ
イフィルムフォトレジストは、溶液型のフォトレジスト
に比軸して金属表面への密ff性が弱く、エツチングあ
るいはメッキの際に種々の好ましくない現象が発生する
。たとえば、エツチング液のスプレ一時におけるアンダ
ーカットおよびメッキ液の浸漬時によるレジスト界面へ
のメッキ液の浸み込み等の現象が生じ、その結果、期待
する配線が得られないことがしばしば経験される。Many proposals have been made to improve the adhesion between a coating formed from a photopolymerizable composition and a substrate. Dry film photoresists used in the manufacture of printed wiring boards have poor adhesiveness to metal surfaces compared to solution-type photoresists, and various undesirable phenomena occur during etching or plating. . For example, phenomena such as undercutting during spraying of an etching solution and penetration of the plating solution into the resist interface when immersed in a plating solution occur, and as a result, it is often experienced that the expected wiring cannot be obtained.
これらの問題を解決するために、感光性樹脂層中に種々
の化合物を添加することにより、密着性の改善を目的と
して従来種々の提案がなされている。(例えば特公昭5
0−9177号、特公昭57−49894号、特公昭5
7−26285号、特公昭54.−5292号、特公昭
55−22481号、才、〒開昭51−64919号、
特開昭51−6 ll 920号、特公昭57−460
53号、特公昭57−46054号、特公昭57−21
697号、特公昭57−40500号等参照)〔発明が
解決しようとする問題点〕
しかし、これら従来提案された化合物は、特にフォトレ
ジストとして使用された場合には次のような欠点を示す
のである。例えば密着促進剤として公知であるベンズイ
ミダゾール、ベンゾトリアゾールなどの複素環窒素含有
化合物を含む光重合性組成物を用いた場合、現像後の基
板の銅露出面の赤変などが見られ、メッキ、エツチング
等の後加工に好ましくない影響を与える。あるいは、密
/ど7促進剤の添加量増加に伴い、感度低下を起こすな
どの悪形響を与える。In order to solve these problems, various proposals have been made to improve adhesion by adding various compounds to the photosensitive resin layer. (For example, Tokuko Sho 5
No. 0-9177, Special Publication No. 57-49894, Special Publication No. 57
No. 7-26285, Special Publication No. 1983. -5292, Special Publication No. 55-22481, Sai, No. 51-64919,
Japanese Patent Publication No. 51-6 ll 920, Special Publication No. 57-460
No. 53, Special Publication No. 57-46054, Special Publication No. 57-21
697, Japanese Patent Publication No. 57-40500, etc.) [Problems to be Solved by the Invention] However, these conventionally proposed compounds exhibit the following drawbacks, especially when used as photoresists. be. For example, when a photopolymerizable composition containing a heterocyclic nitrogen-containing compound such as benzimidazole or benzotriazole, which is known as an adhesion promoter, is used, red discoloration of the exposed copper surface of the substrate after development is observed, and plating, It has an unfavorable effect on post-processing such as etching. Alternatively, an increase in the amount of the density/density promoter added may cause negative effects such as a decrease in sensitivity.
また、近年プリント配線の高密度化が望まれ、そのため
に、原版の再現性が良く、高解像力であり、かつテンテ
ィングの信頼性の高いドライフィルムフォトレジストが
必要となってきており、柔軟で密着力が良く、感光した
場合のラチチュードが広く、解像力が良く、現像工程の
変動に対しても安定なものであることが望まれている。In addition, in recent years, there has been a desire for higher density printed wiring, which has created a need for dry film photoresists that have good original reproducibility, high resolution, and reliable tenting. It is desired to have good adhesion, wide latitude when exposed to light, good resolution, and stability against fluctuations in the developing process.
本発明の目的は、光重合性組成物の被器材に対する上記
のような間m点がなく、シかも金属面への密着性が改善
され、原版に対する忠実な画線像を再現し、高解像力3
発現しうる光重合性組成物を提供することにある。The purpose of the present invention is to eliminate the above-mentioned gap between the photopolymerizable composition and the target material, to improve the adhesion to the metal surface, to reproduce a faithful image to the original plate, and to achieve high resolution. 3
The object of the present invention is to provide a photopolymerizable composition that can be
本発明者等は、次のような光重合性組成物登用いること
でこれらの目的が達成されることを見出し、本発明を完
成するに到った。The present inventors have discovered that these objects can be achieved by using the following photopolymerizable composition, and have completed the present invention.
即ち、本発明は、熱可塑性有機重合体バインダー、分子
中に少なくとも2個のエチレン性不飽和二重結合を有す
る付加重合性不飽和化合物および光重合開始剤を主成分
とし、かつ下記一般式(I)で表される化合物を添加し
てなる光重合性組成物を提供するものである。That is, the present invention mainly comprises a thermoplastic organic polymer binder, an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds in the molecule, and a photopolymerization initiator, and has the following general formula ( The present invention provides a photopolymerizable composition containing a compound represented by I).
(ここで、R1はアミン基、(モノあるいはジ)n換ア
ミン基、カルボン酸アルキルエステル基。(Here, R1 is an amine group, a (mono- or di)n-substituted amine group, or a carboxylic acid alkyl ester group.
アルキル基、芳香族誘導体置換基又はアリル誘導体箇換
基である。112.R3は水素原子、ハロゲン。It is an alkyl group, an aromatic derivative substituent, or an allyl derivative substituent. 112. R3 is a hydrogen atom or a halogen.
アルキル基又は芳香族誘導体置換基である。)本発明の
上記一般式(1)で表わされる密着性に改善を与える化
合物の具体例としては、2−アミノオキサゾール、2−
アミノ−5−フェニルオキサゾール、2.5−ジフェニ
ルオキサゾール゛、2.4.5−)リフェニルオキサゾ
ール、2−エチル−4,5−ジフェニルオキサゾール、
2−スチリル−5−7エニルオキサゾール、2−アセチ
ルアミノ−5−フェニルオキサゾール、2−ベンゾイル
アミノ−5−フェニルオキサゾール、N’−(4,5−
ジメチルオキサゾール−2−イル)スルファニルアミド
5−7エニルオキサゾールー2−カルボン酸エチルエス
テル、2.5−ジメチルオキサゾール−4−カルボン酸
エチルエステルなどが挙げられる。It is an alkyl group or an aromatic derivative substituent. ) Specific examples of compounds that improve adhesion represented by the above general formula (1) of the present invention include 2-aminoxazole, 2-
Amino-5-phenyloxazole, 2.5-diphenyloxazole, 2.4.5-)liphenyloxazole, 2-ethyl-4,5-diphenyloxazole,
2-styryl-5-7enyloxazole, 2-acetylamino-5-phenyloxazole, 2-benzoylamino-5-phenyloxazole, N'-(4,5-
Dimethyloxazole-2-yl)sulfanilamide 5-7enyloxazole-2-carboxylic acid ethyl ester, 2,5-dimethyloxazole-4-carboxylic acid ethyl ester, and the like.
また、上記化合物の含有jikは、光重合性組成物の全
車jil (乾・操残分)基準で、好ましくは0.00
6〜6.0重量%であり、ざらに好ましくは0.03〜
2.5重量%である。In addition, the content jik of the above compound is preferably 0.00 based on the total car jil (dry and residual amount) of the photopolymerizable composition.
6-6.0% by weight, preferably 0.03-6.0% by weight
It is 2.5% by weight.
本発明の光重合性組成物に好適に用いられる熱可塑性有
機用合体バインダーとしては、例えばポリメチルメタク
リレート、ポリスチレン、塩素化ポリエチレン、ポリ塩
化ビニル、ポリビニルアセテート、ポリビニルアルコー
ル、ポリビニルブチラール、ポリアクリル酸等のビニル
モノマーの重合物及び共重合体が例示される。その使用
量としては、光重合性組成物の全重量(乾燥残分)基準
で、好ましくは0.1〜80重量%であり、ざらに好ま
しくは35〜70重量%である。Examples of thermoplastic organic binders suitably used in the photopolymerizable composition of the present invention include polymethyl methacrylate, polystyrene, chlorinated polyethylene, polyvinyl chloride, polyvinyl acetate, polyvinyl alcohol, polyvinyl butyral, and polyacrylic acid. Polymers and copolymers of vinyl monomers are exemplified. The amount used is preferably 0.1 to 80% by weight, more preferably 35 to 70% by weight, based on the total weight (dry residue) of the photopolymerizable composition.
本発明の光重合性組成物に好適に用いられる付加重合性
不飽和化合物は分子中に少なくとも2個のエチレン性不
飽和二重結合を有するものであり、付加重合しつるもの
であれば良く、これらは1種又は2種以上の化合物を使
用することができる。The addition-polymerizable unsaturated compound suitably used in the photopolymerizable composition of the present invention has at least two ethylenically unsaturated double bonds in the molecule, and any compound capable of addition polymerization is sufficient. One or more kinds of these compounds can be used.
例えば、アクリル酸エステル、メタクリル酸エステル、
アクリルアミド、メタクリルアミド、アリル化合物、ビ
ニルエーテル化合物等が挙げられる。For example, acrylic ester, methacrylic ester,
Examples include acrylamide, methacrylamide, allyl compounds, and vinyl ether compounds.
具体的には、アクリル酸エステル、メククリル酸エステ
ルとしては、多価アルコールのポリアクリレート及びポ
リメタクリレート (ここで言うポリアクリレート等と
はジアクリレート以上の化合物である。)であり、多価
アルコールとしては、ポリエチレングリコール、ポリプ
ロピレングリフール、ネオペンチルグリコール、トリメ
チロールプロパン、ペンタエリスリトール、ブタンジオ
ール。Specifically, acrylic acid esters and meccrylic acid esters include polyhydric alcohols polyacrylate and polymethacrylate (polyacrylate and the like referred to here are compounds that are higher than diacrylate); , polyethylene glycol, polypropylene glycol, neopentyl glycol, trimethylolpropane, pentaerythritol, butanediol.
トリメチロールエタンなどである。アクリルアミド、メ
タクリルアミドとしては、メチレンビスアクリルアミド
、同メタクリルアミドの他に、エチレンジアミン、ヘキ
サメチレンジアミンなどのポリアクリルアミド、ポリメ
タクリルアミドが挙げられる。アリル化合物としては、
フタル酸、アジピン酸、マロン酸等のジアリルエステル
、ジアリルアミド、あるいはアントラキノンジスルホン
酸。Such as trimethylolethane. Examples of acrylamide and methacrylamide include methylenebisacrylamide and methacrylamide, as well as polyacrylamide and polymethacrylamide such as ethylenediamine and hexamethylenediamine. As an allyl compound,
Diallyl esters, diallylamides, such as phthalic acid, adipic acid, malonic acid, or anthraquinone disulfonic acid.
ベンゼンジスルホン酸、ナフタレンジスルホン酸のジア
リルエステル、ジアリルアミド等がある。Examples include diallyl esters and diallylamides of benzene disulfonic acid and naphthalene disulfonic acid.
ビニルエーテル化合物としては前記多価アルコールのポ
リビニルエーテル、例えばエチレングリコールジビニル
エーテル、グリセロールトリビニルエーテルなどがある
。ビニルエステル化合物としては、ジビニルサクシネー
ト、ジビニルアジペート、ジビニルフタレートなどが挙
げられる。Examples of vinyl ether compounds include polyvinyl ethers of the polyhydric alcohols, such as ethylene glycol divinyl ether and glycerol trivinyl ether. Examples of the vinyl ester compound include divinyl succinate, divinyl adipate, divinyl phthalate, and the like.
これらの中で、テトラエチレングリコールジアクリレー
ト、同メタクリレート等のグリコールエステル、ペンタ
エリスリトールトリアクリレート。Among these, glycol esters such as tetraethylene glycol diacrylate and methacrylate, and pentaerythritol triacrylate.
同メタクリレート、トリメチロールプロパントリアクリ
レート、同メタクリレート等のアクリル系多官能性モノ
マーが好ましい。Acrylic polyfunctional monomers such as methacrylate, trimethylolpropane triacrylate, and methacrylate are preferred.
付加重合性不飽和化合物の含有量は、光重合性組成物の
全車但(乾燥残分)基準で、好ましくは約10〜90重
量%であり、ざらに好ましくは約20〜55重量%であ
る。The content of the addition polymerizable unsaturated compound is preferably about 10 to 90% by weight, more preferably about 20 to 55% by weight, based on the total weight (dry residue) of the photopolymerizable composition. .
本発明の組成物に好適に用いられる光重合開始剤として
は、エチレン性不飽和化合物の重合に適する開始剤が良
く、アクリル系多官能性モノマーに対しては、アントラ
キノン、2−メチルアントラキノン、2−エチルアニ/
トラキノン等のアントラキノンxi体、 ベンゾイン、
ベンゾインエーテル、ベンゾインイソプロピルエーテル
等のベンゾインアルキルエーテル、ベンゾフェノン、ア
セトフェノン、フェナントレンキノン、オキシムエステ
ル、アミノフェニルケトン、チオキサントン等が単独あ
るいは組み合わせて使用される。The photopolymerization initiator preferably used in the composition of the present invention is an initiator suitable for polymerizing ethylenically unsaturated compounds, and for acrylic polyfunctional monomers, anthraquinone, 2-methylanthraquinone, 2-methylanthraquinone, -Ethylani/
Anthraquinone xi forms such as traquinone, benzoin,
Benzoin alkyl ethers such as benzoin ether and benzoin isopropyl ether, benzophenone, acetophenone, phenanthrenequinone, oxime ester, aminophenyl ketone, thioxanthone, etc. are used alone or in combination.
光重合開始剤又は光重合開始剤系の含有量は好ましくは
光重合性組成物の総重量(乾燥残分)基準でO,OO6
〜6.0重量%であり、ざらに好ましくは0.06〜3
.0重量%である。The content of the photoinitiator or photoinitiator system is preferably O, OO6 based on the total weight (dry residue) of the photopolymerizable composition.
-6.0% by weight, preferably 0.06-3
.. It is 0% by weight.
本発明の光重合性組成物は、上述の如く熱可塑性有機重
合体バインダー、エチレン性不飽和化合物、光重合開始
剤および密着性を改善する化合物を必須成分とするが、
必要に応じて熱重合禁止剤やレジストを確認しやすくす
るために染料、顔料。As mentioned above, the photopolymerizable composition of the present invention contains as essential components a thermoplastic organic polymer binder, an ethylenically unsaturated compound, a photopolymerization initiator, and a compound that improves adhesion.
Dyes and pigments to make it easier to check thermal polymerization inhibitors and resist if necessary.
可塑剤などを使用してもよい。A plasticizer or the like may also be used.
本発明の光重合性組成物は、フォトレジストの形成に有
用な組成物であるが、必ずしもこの用途に限定されるも
のではなく、UVインキ、ソルダーレジスト、印刷版、
紫外線硬化塗料、紫外線硬化接着剤などにも応用できる
。The photopolymerizable composition of the present invention is a composition useful for forming photoresists, but is not necessarily limited to this use, and can be used for UV inks, solder resists, printing plates, etc.
It can also be applied to UV-curable paints, UV-curable adhesives, etc.
以下、実施例および比較例を示して、本発明を更に説明
する。The present invention will be further explained below by showing Examples and Comparative Examples.
実施例および比較例においては、以下の手法で解像力、
硬化後の密着性評価を行った。In Examples and Comparative Examples, resolution and
Adhesion was evaluated after curing.
(光重合性層の作成)
溶媒に溶解した光重合性組成物をポリエステルフィルム
上に塗布し、75℃で15分間乾燥して50μmの厚ざ
の光重合性層を得た。(Preparation of photopolymerizable layer) A photopolymerizable composition dissolved in a solvent was applied onto a polyester film and dried at 75° C. for 15 minutes to obtain a photopolymerizable layer with a thickness of 50 μm.
(解像力) この光重合性層を銅板に加圧、加熱積層した。(resolution) This photopolymerizable layer was laminated on a copper plate under pressure and heating.
得られた積層体に細線パターンマスクを使用し、超高圧
水銀ランプにより、数水準の露光量で露光した。次に、
クロロセンで現像を行い、レジストの細線が形成された
そのレジスト幅を読むことで解像力を求めた。The obtained laminate was exposed to light at several levels of exposure using an ultra-high pressure mercury lamp using a thin line pattern mask. next,
The image was developed with chlorocene, and the resolution was determined by reading the width of the resist where fine lines were formed.
(硬化後の密着性評価)
上記で得たポリエステルフィルムに塗布された厚ぎ50
μmの光重合性層を銅張り積層板に加圧。(Evaluation of adhesion after curing) Thickness 50 coated on the polyester film obtained above
A µm photopolymerizable layer is pressed onto a copper-clad laminate.
加熱積層した。この積層体に、細線パターンマスりを使
用し、4召高圧水銀ランプにより2水帛の露光:”、′
C(60、100rrJ /ff1)で露光した。次に
クロロセンで現像を打った。得られたレジストパターン
ノ、を板を水酸化カリウム水溶液(pH10。Laminated by heating. This laminate was exposed to two layers of water using a fine line pattern mask using a four-layer high-pressure mercury lamp: ", '
C (60,100rrJ/ff1). Next, I developed it with chlorocene. The obtained resist pattern was coated with a potassium hydroxide aqueous solution (pH 10).
60℃)に1時間浸漬し、風乾ぎせた。その後、レジス
トパターン基板の状態変化(レジスト表面での色変化、
形成された細線部におけるアルカリ水溶液の浸み込み、
銅界面におけるレジストのハガレ、ブン状など)を観察
することで、密着性の評価を行った。60° C.) for 1 hour and air-dried. After that, changes in the state of the resist pattern substrate (color change on the resist surface,
Infiltration of alkaline aqueous solution into the formed thin line parts,
Adhesion was evaluated by observing resist peeling, bumps, etc. at the copper interface.
実施例1
光重合性組成物として、下記に示す化合物を主成分に用
い、配合した光重合性組成物を、メチルエチルケトンに
溶解ぎせ、ポリエステルフィルム上に厚15 Q lt
mに塗布し、前記解像力、硬化後の密着1件価の手順に
従い評価を行った。Example 1 A photopolymerizable composition using the compound shown below as the main component was dissolved in methyl ethyl ketone and deposited on a polyester film with a thickness of 15 Q lt.
The film was coated on a surface of 100 ml, and evaluated according to the above-mentioned procedure for resolution and adhesion value after curing.
ポリメタクリル酸メチル 100重量部(重計平均
分子滑70000 )
トリメチロールプロパン 31.2#1・IJアク
リレート
テトラエチレングリコール 25.0 重、’(Hf
i%ジアクリレート
p−メチルアセトフェノンオキシム 3,0〃−
〇−アセテート
クロロチオキサントン 0.2〃2−アミンオ
キサゾール 0.3〃実施例2
2−アミノオキサゾールの代わりに2−アミノ−5−フ
ェニルオキサゾール(0,4重量部)を用いる他は、実
施例1と同様な手順で評価を行った。Polymethyl methacrylate 100 parts by weight (weight average molecular weight 70,000) Trimethylolpropane 31.2#1/IJ acrylate tetraethylene glycol 25.0 parts by weight, '(Hf
i% diacrylate p-methylacetophenone oxime 3,0〃-
〇-acetate chlorothioxanthone 0.2〃2-amineoxazole 0.3〃Example 2 Example 1 except that 2-amino-5-phenyloxazole (0.4 parts by weight) was used instead of 2-aminoxazole. The evaluation was performed using the same procedure.
実施例3
2−アミノオキサゾールの代り2に2.57ジフエニル
オキサゾール(0,4重量部)を用いる他は、実施例1
と同様な手順で評価を行った。Example 3 Example 1 except that 2.57 diphenyloxazole (0.4 parts by weight) was used for 2 instead of 2-aminoxazole.
The evaluation was performed using the same procedure.
実施例4
2−アミノオキサゾールの代わりに、2.4.5−トリ
フェニルオキサゾール(0,8重量部)分用いる他は、
実施例1と同様な手順で評価を行った。Example 4 2.4.5-triphenyloxazole (0.8 parts by weight) was used instead of 2-aminoxazole.
Evaluation was performed using the same procedure as in Example 1.
実施例5
2−アミノオキサゾールの代わりに2−エチル−445
−〒・、シフ盛ニルオキサゾール(0,6重量部)を用
いる他は、実施例1と同様な手順で評価を行った。Example 5 2-ethyl-445 instead of 2-aminoxazole
Evaluation was carried out in the same manner as in Example 1, except that 0.6 parts by weight of Schifmori nyloxazole was used.
実施例6
2−アミノオキサゾールの代わりに2−スチリル−5−
フェニルオキサゾール(0,6重量部)を用いる他は、
実施例1と同様な手順で評価を行った。Example 6 2-styryl-5- instead of 2-aminoxazole
Besides using phenyloxazole (0.6 parts by weight),
Evaluation was performed using the same procedure as in Example 1.
実施例7
2−アミノオキサゾールの代わりに2−アセチルアミノ
−5−フェニルオキサゾール(0,4重!71部)′f
i:用いる池は、実施例1と同様な手順で評価3行った
。Example 7 2-acetylamino-5-phenyloxazole (0.4 parts! 71 parts)'f instead of 2-aminoxazole
i: The pond used was evaluated in the same manner as in Example 1.
実施例8
2−アミンオキサゾールの代わりに2−ベンゾイルアミ
ノ−5−7エニルオキサゾール(0,6m:11冒り1
)を用いる他は、実施例1と同様な手順で評価を行った
。Example 8 2-benzoylamino-5-7enyloxazole (0.6m:11
) was used, but the evaluation was performed in the same manner as in Example 1.
実施例9
2−アミノオキサゾールの代わりに、N′−(45−ジ
メチルオキサゾール−2−イル)スルファニルアミド(
0,7重量部)を用いる他は実施例1と同様な手順で評
価を行った。Example 9 Instead of 2-aminoxazole, N'-(45-dimethyloxazol-2-yl)sulfanilamide (
Evaluation was carried out in the same manner as in Example 1 except that 0.7 parts by weight) was used.
実施例10
2−アミノオキサゾールの代わりに5−フェニルオキサ
ゾール−2−カルボン酸エチルエステル(0,4重量部
)を用いる他は実施例1と同様な手順で評価を行った。Example 10 Evaluation was carried out in the same manner as in Example 1, except that 5-phenyloxazole-2-carboxylic acid ethyl ester (0.4 parts by weight) was used instead of 2-aminooxazole.
実施例11
2−アミノオキサゾールの代わりに2.5−ジメチルオ
キサゾール−4−カルボン酸エチルエステル(0,4重
量部)を用いる他は、実施例1と同様な手順で評価を行
った。Example 11 Evaluation was carried out in the same manner as in Example 1, except that 2,5-dimethyloxazole-4-carboxylic acid ethyl ester (0.4 parts by weight) was used instead of 2-aminoxazole.
比校例1
光重合性組成物として、密着促進剤を使用しない他は、
実施例1と同様な手順で評価を行った。Ratio Example 1 Except for not using an adhesion promoter as a photopolymerizable composition,
Evaluation was performed using the same procedure as in Example 1.
実施例1〜11.比1咬例1の結果をまとめて表1に示
す。Examples 1-11. Table 1 summarizes the results of ratio 1 bite case 1.
Claims (1)
個のエチレン性不飽和二重結合を有する付加重合性不飽
和化合物および光重合開始剤を主成分とし、かつ下記一
般式( I )で表される化合物を添加してなる光重合性
組成物。 ▲数式、化学式、表等があります▼( I ) (ここで、R_1はアミノ基、(モノあるいはジ)置換
アミノ基、カルボン酸アルキルエステル基、アルキル基
、芳香族誘導体置換基又は、アリル誘導体置換基である
。R_2、R_3は水素原子、ハロゲン、アルキル基又
は芳香族誘導体置換基である。)[Claims] Thermoplastic organic polymer binder, containing at least two
1. A photopolymerizable composition comprising as main components an addition-polymerizable unsaturated compound having ethylenically unsaturated double bonds and a photopolymerization initiator, and to which a compound represented by the following general formula (I) is added. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I) (Here, R_1 is an amino group, a (mono- or di-)substituted amino group, a carboxylic acid alkyl ester group, an alkyl group, an aromatic derivative substituent, or an allyl derivative substituent. (R_2 and R_3 are hydrogen atoms, halogens, alkyl groups, or aromatic derivative substituents.)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2332486A JPS62180355A (en) | 1986-02-05 | 1986-02-05 | Photopolymerizable composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2332486A JPS62180355A (en) | 1986-02-05 | 1986-02-05 | Photopolymerizable composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62180355A true JPS62180355A (en) | 1987-08-07 |
Family
ID=12107406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2332486A Pending JPS62180355A (en) | 1986-02-05 | 1986-02-05 | Photopolymerizable composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62180355A (en) |
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WO2004074930A2 (en) * | 2003-02-21 | 2004-09-02 | Kodak Polychrome Graphics Gmbh | Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
JP2006249154A (en) * | 2005-03-08 | 2006-09-21 | Fuji Photo Film Co Ltd | Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate |
JP2006267463A (en) * | 2005-03-23 | 2006-10-05 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board |
JP2007171406A (en) * | 2005-12-20 | 2007-07-05 | Fujifilm Corp | Method for making lithographic printing plate and lithographic printing original plate |
JP2007519032A (en) * | 2003-12-05 | 2007-07-12 | コダック ポリクロウム グラフィクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | Radiation sensitive composition and imageable element based thereon |
US7611818B2 (en) | 2003-11-19 | 2009-11-03 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board |
-
1986
- 1986-02-05 JP JP2332486A patent/JPS62180355A/en active Pending
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WO2004074930A2 (en) * | 2003-02-21 | 2004-09-02 | Kodak Polychrome Graphics Gmbh | Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
WO2004074930A3 (en) * | 2003-02-21 | 2005-02-03 | Kodak Polychrome Graphics Gmbh | Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
JP2006519405A (en) * | 2003-02-21 | 2006-08-24 | コダック ポリクロウム グラフィクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | Radiation-sensitive composition comprising an oxazole derivative and an imageable element based on the composition |
US7442486B2 (en) | 2003-02-21 | 2008-10-28 | Eastman Kodak Company | Radiation-sensitive compositions comprising oxazole derivatives and imageable elements based thereon |
US7611818B2 (en) | 2003-11-19 | 2009-11-03 | Hitachi Chemical Company, Ltd. | Photosensitive resin composition, photosensitive element, resist pattern forming method and process for manufacturing printed circuit board |
JP2007519032A (en) * | 2003-12-05 | 2007-07-12 | コダック ポリクロウム グラフィクス ゲゼルシャフト ミット ベシュレンクテル ハフツング | Radiation sensitive composition and imageable element based thereon |
JP2006249154A (en) * | 2005-03-08 | 2006-09-21 | Fuji Photo Film Co Ltd | Ink composition, inkjet recording method, printed material, method of producing planographic printing plate, and planographic printing plate |
JP4619832B2 (en) * | 2005-03-08 | 2011-01-26 | 富士フイルム株式会社 | Ink composition for ink jet recording, ink jet recording method, printed matter, lithographic printing plate preparation method and lithographic printing plate |
JP2006267463A (en) * | 2005-03-23 | 2006-10-05 | Hitachi Chem Co Ltd | Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for manufacturing printed wiring board |
JP2007171406A (en) * | 2005-12-20 | 2007-07-05 | Fujifilm Corp | Method for making lithographic printing plate and lithographic printing original plate |
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