JPS62180356A - Photopolymerizable composition - Google Patents
Photopolymerizable compositionInfo
- Publication number
- JPS62180356A JPS62180356A JP2332586A JP2332586A JPS62180356A JP S62180356 A JPS62180356 A JP S62180356A JP 2332586 A JP2332586 A JP 2332586A JP 2332586 A JP2332586 A JP 2332586A JP S62180356 A JPS62180356 A JP S62180356A
- Authority
- JP
- Japan
- Prior art keywords
- compsn
- initiator
- photopolymerizable
- photopolymerizable composition
- photopolymn
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims description 25
- 239000003999 initiator Substances 0.000 claims abstract description 8
- 229920000620 organic polymer Polymers 0.000 claims abstract description 7
- 239000002491 polymer binding agent Substances 0.000 claims abstract description 7
- 229920001169 thermoplastic Polymers 0.000 claims abstract description 7
- 239000004416 thermosoftening plastic Substances 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims description 18
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 1
- REYJJPSVUYRZGE-UHFFFAOYSA-N Octadecylamine Chemical compound CCCCCCCCCCCCCCCCCCN REYJJPSVUYRZGE-UHFFFAOYSA-N 0.000 abstract description 11
- 238000007747 plating Methods 0.000 abstract description 7
- 239000000178 monomer Substances 0.000 abstract description 4
- 229920002554 vinyl polymer Polymers 0.000 abstract description 3
- FJLUATLTXUNBOT-UHFFFAOYSA-N 1-Hexadecylamine Chemical compound CCCCCCCCCCCCCCCCN FJLUATLTXUNBOT-UHFFFAOYSA-N 0.000 abstract description 2
- 229920002125 Sokalan® Polymers 0.000 abstract description 2
- 229920001577 copolymer Polymers 0.000 abstract description 2
- 239000004584 polyacrylic acid Substances 0.000 abstract description 2
- 229920000642 polymer Polymers 0.000 abstract description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 abstract description 2
- 239000000654 additive Substances 0.000 abstract 1
- 230000000996 additive effect Effects 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 230000004304 visual acuity Effects 0.000 abstract 1
- 238000011156 evaluation Methods 0.000 description 13
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 4
- NJWGQARXZDRHCD-UHFFFAOYSA-N 2-methylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(C)=CC=C3C(=O)C2=C1 NJWGQARXZDRHCD-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 239000002318 adhesion promoter Substances 0.000 description 3
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- -1 heterocyclic nitrogen-containing compound Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229920006267 polyester film Polymers 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical group C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- LAWOZCWGWDVVSG-UHFFFAOYSA-N dioctylamine Chemical compound CCCCCCCCNCCCCCCCC LAWOZCWGWDVVSG-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- PYGSKMBEVAICCR-UHFFFAOYSA-N hexa-1,5-diene Chemical group C=CCCC=C PYGSKMBEVAICCR-UHFFFAOYSA-N 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 125000005395 methacrylic acid group Chemical group 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 150000005846 sugar alcohols Polymers 0.000 description 2
- CGXVUIBINWTLNT-UHFFFAOYSA-N 1,2,3-tris(ethenoxy)propane Chemical compound C=COCC(OC=C)COC=C CGXVUIBINWTLNT-UHFFFAOYSA-N 0.000 description 1
- ZXHDVRATSGZISC-UHFFFAOYSA-N 1,2-bis(ethenoxy)ethane Chemical compound C=COCCOC=C ZXHDVRATSGZISC-UHFFFAOYSA-N 0.000 description 1
- YNSNJGRCQCDRDM-UHFFFAOYSA-N 1-chlorothioxanthen-9-one Chemical compound S1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl YNSNJGRCQCDRDM-UHFFFAOYSA-N 0.000 description 1
- HSKPJQYAHCKJQC-UHFFFAOYSA-N 1-ethylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2CC HSKPJQYAHCKJQC-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- NLGDWWCZQDIASO-UHFFFAOYSA-N 2-hydroxy-1-(7-oxabicyclo[4.1.0]hepta-1,3,5-trien-2-yl)-2-phenylethanone Chemical compound OC(C(=O)c1cccc2Oc12)c1ccccc1 NLGDWWCZQDIASO-UHFFFAOYSA-N 0.000 description 1
- BMTZEAOGFDXDAD-UHFFFAOYSA-M 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholin-4-ium;chloride Chemical compound [Cl-].COC1=NC(OC)=NC([N+]2(C)CCOCC2)=N1 BMTZEAOGFDXDAD-UHFFFAOYSA-M 0.000 description 1
- PTKWYSNDTXDBIZ-UHFFFAOYSA-N 9,10-dioxoanthracene-1,2-disulfonic acid Chemical compound C1=CC=C2C(=O)C3=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C3C(=O)C2=C1 PTKWYSNDTXDBIZ-UHFFFAOYSA-N 0.000 description 1
- YYVYAPXYZVYDHN-UHFFFAOYSA-N 9,10-phenanthroquinone Chemical compound C1=CC=C2C(=O)C(=O)C3=CC=CC=C3C2=C1 YYVYAPXYZVYDHN-UHFFFAOYSA-N 0.000 description 1
- 239000004709 Chlorinated polyethylene Substances 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- MIAUJDCQDVWHEV-UHFFFAOYSA-N benzene-1,2-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1S(O)(=O)=O MIAUJDCQDVWHEV-UHFFFAOYSA-N 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- GSEZYWGNEACOIW-UHFFFAOYSA-N bis(2-aminophenyl)methanone Chemical compound NC1=CC=CC=C1C(=O)C1=CC=CC=C1N GSEZYWGNEACOIW-UHFFFAOYSA-N 0.000 description 1
- AJCHRUXIDGEWDK-UHFFFAOYSA-N bis(ethenyl) butanedioate Chemical compound C=COC(=O)CCC(=O)OC=C AJCHRUXIDGEWDK-UHFFFAOYSA-N 0.000 description 1
- JZQAAQZDDMEFGZ-UHFFFAOYSA-N bis(ethenyl) hexanedioate Chemical compound C=COC(=O)CCCCC(=O)OC=C JZQAAQZDDMEFGZ-UHFFFAOYSA-N 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- TWOFDIYIPNBWBG-UHFFFAOYSA-N n-benzyldodecan-1-amine Chemical compound CCCCCCCCCCCCNCC1=CC=CC=C1 TWOFDIYIPNBWBG-UHFFFAOYSA-N 0.000 description 1
- POEXGBJOTYTYPW-UHFFFAOYSA-N n-dodecyl-4-methylaniline Chemical compound CCCCCCCCCCCCNC1=CC=C(C)C=C1 POEXGBJOTYTYPW-UHFFFAOYSA-N 0.000 description 1
- LQKYCMRSWKQVBQ-UHFFFAOYSA-N n-dodecylaniline Chemical compound CCCCCCCCCCCCNC1=CC=CC=C1 LQKYCMRSWKQVBQ-UHFFFAOYSA-N 0.000 description 1
- SEGJNMCIMOLEDM-UHFFFAOYSA-N n-methyloctan-1-amine Chemical compound CCCCCCCCNC SEGJNMCIMOLEDM-UHFFFAOYSA-N 0.000 description 1
- YZMHQCWXYHARLS-UHFFFAOYSA-N naphthalene-1,2-disulfonic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC=C21 YZMHQCWXYHARLS-UHFFFAOYSA-N 0.000 description 1
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は新規な光重合性組成物に関するものであり、更
に詳しくは、金属との密着性(付着性または接着性)が
改善された光重合性組成物に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a novel photopolymerizable composition, and more particularly, to a photopolymerizable composition with improved adhesion (adhesiveness or adhesion) to metals. The present invention relates to a polymerizable composition.
光重合性組成物から形成された被膜と基材との間の密着
性を改善するために、従来から多くの提案がなされてい
る。即ちプリント配線板の製造において用いられるドラ
イフィルムフォトレジストは、溶液型の7オトレジスト
に比較して金属表面への密着性が弱く、エツチングある
いはメッキの際に種々の好ましくない現象が発生する。Many proposals have been made to improve the adhesion between a coating formed from a photopolymerizable composition and a substrate. That is, dry film photoresists used in the manufacture of printed wiring boards have weaker adhesion to metal surfaces than solution-type photoresists, and various undesirable phenomena occur during etching or plating.
たとえば、エツチング液のスプレ一時におけるアンダー
カットおよびメッキ液の浸漬時によるレジスト界面への
メッキ液の浸み込み等の現象が生じ、その結果、期待す
る配線が得られないことがしばしば経験される。For example, phenomena such as undercutting during spraying of an etching solution and penetration of the plating solution into the resist interface when immersed in a plating solution occur, and as a result, it is often experienced that the expected wiring cannot be obtained.
これらの問題を解決するために、感光性樹脂層中に種々
の化合物を添加することによシ、密着性の改善を目的と
して従来種々の提案がなされている。(例えば特公昭5
0−9177号、特公昭57−49894号、特公昭5
7−26285、特公昭54−5292号、特公昭55
−22481号、特開昭51−64919号、特開昭5
1−64920号、特公昭57−46053号、特公昭
57−46054号、特公昭57−21697号、特公
昭57−40500号等参照)
〔発明が解決しようとする問題点〕
しかし、これら従来提案された化合物は、特にフォトレ
ジストとして使用された場合には次のような欠点を示す
のである。例えば密着促進剤として公知であるベンズイ
ミダゾール、ベンゾトリアゾールなどの複素環窒素含有
化合物を含む光重合性組成物を用いた場合、現像後の基
板の銅露出面の赤変などが見られ、メッキ、エツチング
等の後加工に好ましくない影響を与える。あるいは、密
着促進剤の添加量増加に伴い、感度低下を起こすなどの
悪影響を与える。In order to solve these problems, various proposals have been made to improve adhesion by adding various compounds to the photosensitive resin layer. (For example, Tokuko Sho 5
No. 0-9177, Special Publication No. 57-49894, Special Publication No. 57
7-26285, Special Publication No. 54-5292, Special Publication No. 55
-22481, JP-A-51-64919, JP-A-5
(See Japanese Patent Publication No. 1-64920, Japanese Patent Publication No. 57-46053, Japanese Patent Publication No. 57-46054, Japanese Patent Publication No. 57-21697, Japanese Patent Publication No. 57-40500, etc.) [Problems to be solved by the invention] However, these conventional proposals These compounds exhibit the following drawbacks, especially when used as photoresists. For example, when a photopolymerizable composition containing a heterocyclic nitrogen-containing compound such as benzimidazole or benzotriazole, which is known as an adhesion promoter, is used, red discoloration of the exposed copper surface of the substrate after development is observed, and plating and It has an unfavorable effect on post-processing such as etching. Alternatively, an increase in the amount of adhesion promoter added may have an adverse effect such as a decrease in sensitivity.
また、近年プリント配線の高密度化が望まれ、そのため
に、原版の再現性が良く、高解像力であり、かつテンテ
ィングの信頼性の高いドライフィルムフォトレジストが
必要となってきておシ、柔軟で密着力が良く、感光した
場合のラチチュードが広く、解像力が良く、現像工程の
変動に対しても安定なものであることが望まれている。In addition, in recent years, there has been a desire for higher density printed wiring, which has created a need for dry film photoresists that have good original reproducibility, high resolution, and reliable tenting. It is desired to have good adhesion, wide latitude when exposed to light, good resolution, and stability against fluctuations in the development process.
本発明の目的は、光重合性組成物の被覆材に対する上記
のような問題点がなく、シかも金属面・\の密着性が改
善され原版に対する忠実な画線像を再現し、高解像力を
発現しうる光重合性組成物を提供することにある。The purpose of the present invention is to eliminate the above-mentioned problems with coating materials of photopolymerizable compositions, improve adhesion to metal surfaces, reproduce faithful image images to the original, and achieve high resolution. The object of the present invention is to provide a photopolymerizable composition that can be
本発明者等は、次のような光重合性組成物を用いること
でこれらの目的が達成されることを見出し、本発明を完
成するに到った。The present inventors have discovered that these objects can be achieved by using the following photopolymerizable composition, and have completed the present invention.
即ち、本発明は、熱可塑性有機重合体バインダー、分子
中に少なくとも2個のエチレン性不飽和二重結合を有す
る付加重合性不飽和化合物および光重合開始剤を主成分
とし、かつ下記一般式(I)で表される化合物を添加し
てなる光重合性組成物を提供するものである。That is, the present invention mainly comprises a thermoplastic organic polymer binder, an addition polymerizable unsaturated compound having at least two ethylenically unsaturated double bonds in the molecule, and a photopolymerization initiator, and has the following general formula ( The present invention provides a photopolymerizable composition containing a compound represented by I).
R2
R,−N−H(I)
(ここでR1は水素原子、アルキル基又は芳香族誘導体
置換基、鳥は炭素数が4以上のアルキル基である。)
本発明の上記一般式(I)で表わされる密着性及び耐メ
ッキ性に改善を与える化合物の具体例としては、オクタ
デシルアミン、ヘキサデシルアミン。R2 R, -N-H (I) (Here, R1 is a hydrogen atom, an alkyl group or an aromatic derivative substituent, and "Bird" is an alkyl group having 4 or more carbon atoms.) The above general formula (I) of the present invention Specific examples of compounds that improve adhesion and plating resistance represented by are octadecylamine and hexadecylamine.
オクチルアミン、N−オクチル−N−メチルアミン、シ
クロヘキシルアミン、ジシクロヘキシルアミン、ジ−n
−オクチルアミン、N−シクロオキシル−N−ドデシル
アミン、N−フェニル−N−ドテシルアミン、N−(4
−メチルフェニル)−N−)”デシルアミン、N−ベン
ジル−N−ドデシルアミンなどが挙げられる。Octylamine, N-octyl-N-methylamine, cyclohexylamine, dicyclohexylamine, di-n
-octylamine, N-cyclooxyl-N-dodecylamine, N-phenyl-N-dodecylamine, N-(4
-methylphenyl)-N-)"decylamine, N-benzyl-N-dodecylamine, and the like.
また、上記化合物の含有量は、光重合性組成物の全重量
(乾燥残分)基準で、好ましくは0. OO6〜6.0
重量%であシ、さらに好ましくは0.03〜2.5重量
%である。Further, the content of the above compound is preferably 0.5% based on the total weight (dry residue) of the photopolymerizable composition. OO6~6.0
It is preferably 0.03 to 2.5% by weight, preferably 0.03 to 2.5% by weight.
本発明の光重合性組成物に好適に用いられる熱可塑性有
機重合体バインダーとしては、例えばポリメチルメタク
リレート、ポリスチレン、塩素化ポリエチレン、ポリ塩
化ビニル、ポリビニルアセテート、ポリビニルアルコー
ル、ポリビニルフチシール。ポリアクリル酸等のビニル
モノマーの重合物及び共重合体が例示される。その使用
量としては、光重合性組成物の全重量(乾燥残分)基準
で、好ましくは0.1〜80重量%であシ、さらに好ま
しくは35〜70重量%である。Thermoplastic organic polymer binders suitably used in the photopolymerizable composition of the present invention include, for example, polymethyl methacrylate, polystyrene, chlorinated polyethylene, polyvinyl chloride, polyvinyl acetate, polyvinyl alcohol, and polyvinyl futhysil. Examples include polymers and copolymers of vinyl monomers such as polyacrylic acid. The amount used is preferably 0.1 to 80% by weight, more preferably 35 to 70% by weight, based on the total weight (dry residue) of the photopolymerizable composition.
本発明の光重合性組成物に好適に用いられる付加重合性
不飽和化合物は分子中に少なくとも2個のエチレン性不
飽和二重結合を有するものであり、付加重合しうるもの
であれば良く、これらは1種又は2種以上の化合物を使
用することができる。例えば、アクリル酸エステル、メ
タクリル酸エステル、アクリルアミド、メタクリルアミ
ド、アリル化合物、ビニルエーテル化合物等が挙げられ
る。具体的には、アクリル酸エステル、メタクリル酸エ
ステルとしては、多価アルコールのポリアクリレート及
びポリメタクリレート(ここで言うポリアクリレート等
とはジアクリレート以上の化合物である。)であり、多
価アルコールとじては、ポリエチレングリコール、ポリ
プロピレングリコール、ネオペンチルグリコール、トリ
メチロールプロパン、ペンタエリスリトール、ブタンジ
オール、トリメチロールエタンなどである。アクリルア
ミド、メタクリルアミドとしては、メチレンビスアクリ
ルアミド、同メタクリルアミドの他に、エチレンジアミ
ン、ヘキサメチレンジアミンなどのポリアクリルアミド
、ポリメタクリルアミドが挙げられる。アリル化合物と
しては、7タル酸、アジピン酸、マロン酸等のジアリル
エステル。The addition-polymerizable unsaturated compound suitably used in the photopolymerizable composition of the present invention has at least two ethylenically unsaturated double bonds in the molecule and may be any compound that can be addition-polymerized. One or more kinds of these compounds can be used. Examples include acrylic esters, methacrylic esters, acrylamide, methacrylamide, allyl compounds, vinyl ether compounds, and the like. Specifically, acrylic esters and methacrylic esters include polyhydric alcohols such as polyacrylate and polymethacrylate (polyacrylate and the like referred to here are compounds that are higher than diacrylate); Examples include polyethylene glycol, polypropylene glycol, neopentyl glycol, trimethylolpropane, pentaerythritol, butanediol, and trimethylolethane. Examples of acrylamide and methacrylamide include methylenebisacrylamide and methacrylamide, as well as polyacrylamide and polymethacrylamide such as ethylenediamine and hexamethylenediamine. Examples of allyl compounds include diallyl esters such as 7-talic acid, adipic acid, and malonic acid.
ジアリルアミド、あるいはアントラキノンジスルホン酸
、ベンゼンジスルホン酸、ナフタレンジスルホン酸のジ
アリルエステル、ジアリルアミド等がある。ビニルエー
テル化合物としては前記多価アルコールのポリビニルエ
ーテル、例工ばエチレングリコールジビニルエーテル、
グリセロールトリビニルエーテルなどがある。ビニルエ
ステル化合物としては、ジビニルサクシネート、ジビニ
ルアジペート、ジビニル7タレートなどが挙げられる。Examples include diallylamide, diallyl esters of anthraquinone disulfonic acid, benzenedisulfonic acid, and naphthalene disulfonic acid, and diallylamide. Examples of vinyl ether compounds include polyvinyl ethers of the above-mentioned polyhydric alcohols, such as ethylene glycol divinyl ether,
Examples include glycerol trivinyl ether. Examples of the vinyl ester compound include divinyl succinate, divinyl adipate, and divinyl heptatalate.
これらの中で、テトラエチレングリコールジアクリレー
ト、同メタクリレート等のグリコールエステル、ペンタ
エリスリトールトリアクリレート。Among these, glycol esters such as tetraethylene glycol diacrylate and methacrylate, and pentaerythritol triacrylate.
同メタクリレート、トリメチロールプロパントリアクリ
レート、同メタクリレート等のアクリル系多官能性モノ
マーが好ましい。Acrylic polyfunctional monomers such as methacrylate, trimethylolpropane triacrylate, and methacrylate are preferred.
付加重合性不飽和化合物の含有量は、光重合性組成物の
全重量(乾燥残分)基準で、好ましくは約10〜90重
量%であシ、さらに好ましくは約20〜55重量%であ
る。The content of the addition polymerizable unsaturated compound is preferably about 10 to 90% by weight, more preferably about 20 to 55% by weight, based on the total weight (dry residue) of the photopolymerizable composition. .
本発明の組成物に好適に用いられる光重合開始剤として
は、エチレン性不飽和化合物の重合に適する開始剤が良
く、アクリル系多官能性モノマーに対しては、アントラ
キノン、2−メチルアントラキノン、2−エチルアント
ラキノン等のアントラキノン誘導体、ベンゾイン、ベン
ゾインエーテル、ペンゾインイングロビルエーテル等の
ベンゾインアルキルエーテル、ベンゾフェノ/、アセト
7二ノン、フェナントレンキノン、オキシムエステル、
アミノフェニルケトン、チオキサントン等が単独あるい
は組み合わせて使用される。The photopolymerization initiator preferably used in the composition of the present invention is an initiator suitable for polymerizing ethylenically unsaturated compounds, and for acrylic polyfunctional monomers, anthraquinone, 2-methylanthraquinone, 2-methylanthraquinone, - anthraquinone derivatives such as ethyl anthraquinone, benzoin, benzoin ether, benzoin alkyl ether such as penzoin inglobil ether, benzopheno/, aceto7dinone, phenanthrenequinone, oxime ester,
Aminophenyl ketone, thioxanthone, etc. are used alone or in combination.
光重合開始剤又は光重合開始剤系の含有量は好ましくは
光重合性組成物の総重量(乾燥残分)基準で0.006
〜6. Oi量チであシ、さらに好ましくは0.06〜
3,0重量%である。The content of the photoinitiator or photoinitiator system is preferably 0.006 based on the total weight (dry residue) of the photopolymerizable composition.
~6. Oi amount is preferably 0.06~
It is 3.0% by weight.
本発明の光重合性組成物は、上述の如く熱可塑性有機重
合体バインダー、エチレン性不飽和化合物、光重合開始
剤および密着性を改善する化合物を必須成分とするが、
必要に応じて熱重合禁止剤やレジストを確認しやすくす
るために染料、顔料。As mentioned above, the photopolymerizable composition of the present invention contains as essential components a thermoplastic organic polymer binder, an ethylenically unsaturated compound, a photopolymerization initiator, and a compound that improves adhesion.
Dyes and pigments to make it easier to check thermal polymerization inhibitors and resist if necessary.
可塑剤などを使用してもよい。A plasticizer or the like may also be used.
本発明の光重合性組成物は、フォトレジストの形成に有
用な組成物であるが、必ずしもこの用途に限定されるも
のではなく、Uvインキ、ソルダーレジスト、印刷版、
紫外線硬化塗料、紫外線硬化接着剤などにも応用できる
。The photopolymerizable composition of the present invention is a composition useful for forming photoresists, but is not necessarily limited to this use, and can be used for UV inks, solder resists, printing plates, etc.
It can also be applied to UV-curable paints, UV-curable adhesives, etc.
以下、実施例および比較例を示して、本発明を更に説明
する。The present invention will be further explained below by showing Examples and Comparative Examples.
実施例および比較例においては、以下の手法で解像力、
硬化後の密着性、耐メツキ性評価を行なった。In Examples and Comparative Examples, resolution and
Adhesion and plating resistance after curing were evaluated.
(光重合性層の作成)
溶媒に溶解した光重合性組成物をポリエステルフィルム
上に塗布し、75℃で15分間乾燥して50μの厚さの
光重合性層を得た。(Preparation of Photopolymerizable Layer) A photopolymerizable composition dissolved in a solvent was applied onto a polyester film and dried at 75° C. for 15 minutes to obtain a photopolymerizable layer with a thickness of 50 μm.
(解像力) この光重合性層を銅板に加圧、加熱積層した。(resolution) This photopolymerizable layer was laminated on a copper plate under pressure and heating.
得られた積層体に細線パターンマスクを使用し、超高圧
水銀ランプにより、数水準の露光量で露光した。次に、
クロロセンで現像を行ない、レジストの細線が形成され
たそのレジスト幅を読むことで解像力を求めた。The obtained laminate was exposed to light at several levels of exposure using an ultra-high pressure mercury lamp using a thin line pattern mask. next,
Development was performed with chlorocene, and the resolution was determined by reading the width of the resist where fine lines were formed.
(硬化後の密着性評価)
上記で得たポリエステルフィルムに塗布された厚さ50
μmの光重合性層全銅張9積層板に加圧。(Evaluation of adhesion after curing) The thickness of the polyester film obtained above was 50
Pressure is applied to a full copper-clad 9-layer laminate with a photopolymerizable layer of μm.
加熱積層した。この積層体に細線ノくターンマスクを使
用し、超高圧水銀ランプによシ2水準の露光量(60、
100−J/ca )で露光した。次にりo。Laminated by heating. Using a fine-line turn mask on this laminate, an ultra-high-pressure mercury lamp was applied to two levels of exposure (60,
100-J/ca). Next ri o.
センで現像を行なった。得られたレジストバターン基板
を水酸化カリウム水溶液(pH10,60℃)に1時間
浸漬し、風乾させた。その後、レジストパターン基板の
状態変化(レジスト表面での色変化、形成された細線部
におけるアルカリ水溶液の浸み込み、銅界面におけるレ
ジストのハガレなど)を観察することで、密着性の評価
を行なった。I developed it using a sen. The obtained resist pattern substrate was immersed in a potassium hydroxide aqueous solution (pH 10, 60° C.) for 1 hour and air-dried. After that, adhesion was evaluated by observing changes in the state of the resist pattern substrate (color change on the resist surface, penetration of alkaline aqueous solution into the formed fine lines, peeling of the resist at the copper interface, etc.). .
実施例1
光重合性組成物として、下記に示す化合物を主成分に用
い、配合した光重合性組成物を、メチルエチルケトンに
溶解させ、ポリエステルフィルム上に厚さ50μmに塗
布し、前記解像力、硬化後の密着評価の手順に従い評価
を行なった。Example 1 As a photopolymerizable composition, the compound shown below was used as the main component, and the blended photopolymerizable composition was dissolved in methyl ethyl ketone and applied to a thickness of 50 μm on a polyester film. The evaluation was performed according to the procedure for adhesion evaluation.
トリアクリレート 31.2 #テトラエチ
レンクリコール
ジアクリレート 25.0 #クロロチオ
キサントン 021オクタデシルアミン
0.91実施例2
オクタデシルアミンの代わりにヘキサ7” シ/L/ア
ミン(0,8mfit部)を用いる他は、実施例1と同
様な手順で評価を行なった。Triacrylate 31.2 #Tetraethylene glycol diacrylate 25.0 #Chlorothioxanthone 021 Octadecylamine 0.91 Example 2 Except for using hexa7”/L/amine (0.8 mfit part) instead of octadecylamine The evaluation was carried out in the same manner as in Example 1.
実施例3
オクタデシルアミンの代わシにN−オクチル−N−1f
ルア ミン(0,4重量部)を用いる他は、実施例1と
同様な手順で評価を行なった。Example 3 N-octyl-N-1f instead of octadecylamine
Evaluation was carried out in the same manner as in Example 1, except that ruamine (0.4 parts by weight) was used.
実施例4
オクタデシルアミンの代わシにシクロヘキシルアミン(
0,3重量部)を用いる他は、実施例1と同様な手順で
評価を行なった。Example 4 Cyclohexylamine (
Evaluation was carried out in the same manner as in Example 1, except that 0.3 parts by weight) was used.
実施例5
オクタデシルアミンの代わりにジシクロヘキシルアミン
(0,6重量部)を用いる他は、実施例1と同様な手順
で評価を行なった。Example 5 Evaluation was carried out in the same manner as in Example 1, except that dicyclohexylamine (0.6 parts by weight) was used instead of octadecylamine.
実施例6
オクタデシルアミンの代わりにジ−n−オクチルアミン
(1,8重量部)を用いる他は、実施例1と同様な手順
で評価を行なった。Example 6 Evaluation was carried out in the same manner as in Example 1, except that di-n-octylamine (1.8 parts by weight) was used instead of octadecylamine.
実施例7
オクタデシルアミンの代わりにN−シクロヘキシル−N
−ドデシルアミン(0,9重量部)を用いる他は、実施
例1と同様な手順で評価を行なった。Example 7 N-cyclohexyl-N instead of octadecylamine
Evaluation was carried out in the same manner as in Example 1, except that -dodecylamine (0.9 parts by weight) was used.
実施例8
オクタデシルアミンの代わシにN−7エニルーN−ドデ
シルアミン(0,9重量部)を用いる他は、実施例1と
同様な手順で評価を行なった。Example 8 Evaluation was carried out in the same manner as in Example 1, except that N-7enyl-N-dodecylamine (0.9 parts by weight) was used instead of octadecylamine.
実施例9
オクタデシルアミンの代わりにN−(4−メチルフェニ
ル)−N−ドデシルアミン(o、9it部)を用いる他
は、実施例1と同様な手順で評価を行なった。Example 9 Evaluation was carried out in the same manner as in Example 1, except that N-(4-methylphenyl)-N-dodecylamine (o, 9 it parts) was used instead of octadecylamine.
実施例10
オクタデシルアミンの代わりにN−ベンジル−N −ド
ア” ジルアミン(0,9重量部)を用いる他は、実施
例1と同様な手順で評価を行なった。Example 10 Evaluation was carried out in the same manner as in Example 1, except that N-benzyl-N-doa'zylamine (0.9 parts by weight) was used instead of octadecylamine.
比較例1
光重合性組成物として、密着促進剤を使用しない他は、
実施例1と同様な手順で評価を行なった。Comparative Example 1 Except for not using an adhesion promoter as a photopolymerizable composition,
Evaluation was performed using the same procedure as in Example 1.
実施例1〜10.比較例1の結果をまとめて表1に示す
。Examples 1-10. The results of Comparative Example 1 are summarized in Table 1.
Claims (1)
個のエチレン性不飽和二重結合を有する付加重合性不飽
和化合物および光重合開始剤を主成分とし、かつ下記一
般式( I )で表される化合物を添加してなる光重合性
組成物。 ▲数式、化学式、表等があります▼( I ) (ここでR_1は水素原子、アルキル基又は芳香族誘導
体置換基、R_2は炭素数が4以上のアルキル基である
。)[Claims] Thermoplastic organic polymer binder, containing at least two
1. A photopolymerizable composition comprising as main components an addition-polymerizable unsaturated compound having ethylenically unsaturated double bonds and a photopolymerization initiator, and to which a compound represented by the following general formula (I) is added. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ (I) (Here, R_1 is a hydrogen atom, an alkyl group, or an aromatic derivative substituent, and R_2 is an alkyl group having 4 or more carbon atoms.)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2332586A JPS62180356A (en) | 1986-02-05 | 1986-02-05 | Photopolymerizable composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2332586A JPS62180356A (en) | 1986-02-05 | 1986-02-05 | Photopolymerizable composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS62180356A true JPS62180356A (en) | 1987-08-07 |
Family
ID=12107431
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2332586A Pending JPS62180356A (en) | 1986-02-05 | 1986-02-05 | Photopolymerizable composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62180356A (en) |
-
1986
- 1986-02-05 JP JP2332586A patent/JPS62180356A/en active Pending
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