DK144184C - Fremgangsmaade til fremstilling af en fotoreservage - Google Patents
Fremgangsmaade til fremstilling af en fotoreservageInfo
- Publication number
- DK144184C DK144184C DK1773A DK1773A DK144184C DK 144184 C DK144184 C DK 144184C DK 1773 A DK1773 A DK 1773A DK 1773 A DK1773 A DK 1773A DK 144184 C DK144184 C DK 144184C
- Authority
- DK
- Denmark
- Prior art keywords
- reserve
- photo
- preparing
- procedure
- photo reserve
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0076—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the composition of the mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax, thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Laminated Bodies (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11279771A | 1971-02-04 | 1971-02-04 | |
| US11279771 | 1971-02-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DK144184B DK144184B (da) | 1982-01-04 |
| DK144184C true DK144184C (da) | 1982-06-14 |
Family
ID=22345895
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK48172AA DK142623B (da) | 1971-02-04 | 1972-02-03 | Fotopolymeriserbar blanding indeholdende polymert bindemiddel. |
| DK1773A DK144184C (da) | 1971-02-04 | 1973-01-03 | Fremgangsmaade til fremstilling af en fotoreservage |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DK48172AA DK142623B (da) | 1971-02-04 | 1972-02-03 | Fotopolymeriserbar blanding indeholdende polymert bindemiddel. |
Country Status (23)
| Country | Link |
|---|---|
| JP (2) | JPS5538961B1 (da) |
| AU (1) | AU461461B2 (da) |
| BE (1) | BE778729A (da) |
| BG (1) | BG26673A3 (da) |
| CA (1) | CA965291A (da) |
| CH (1) | CH592322A5 (da) |
| DD (1) | DD101035A5 (da) |
| DE (1) | DE2205146C2 (da) |
| DK (2) | DK142623B (da) |
| ES (1) | ES399317A1 (da) |
| FI (1) | FI57429C (da) |
| FR (1) | FR2124974A5 (da) |
| GB (1) | GB1361298A (da) |
| HK (1) | HK28382A (da) |
| IL (1) | IL38677A (da) |
| IT (1) | IT949005B (da) |
| LU (1) | LU64712A1 (da) |
| NL (1) | NL176021C (da) |
| NO (1) | NO141804C (da) |
| PL (1) | PL83391B1 (da) |
| RO (1) | RO64896A (da) |
| SE (1) | SE390218B (da) |
| ZA (1) | ZA72345B (da) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA1056189A (en) * | 1974-04-23 | 1979-06-12 | Ernst Leberzammer | Polymeric binders for aqueous processable photopolymer compositions |
| ZA757984B (en) * | 1974-10-04 | 1976-12-29 | Dynachem Corp | Polymers for aqueous processed photoresists |
| JPS5917414B2 (ja) * | 1975-10-07 | 1984-04-21 | 村上スクリ−ン （株） | スクリ−ン版用感光性組成物及び感光膜 |
| JPS5944615B2 (ja) * | 1976-02-16 | 1984-10-31 | 富士写真フイルム株式会社 | 感光性樹脂組成物及びそれを用いた金属画像形成材料 |
| SU941918A1 (ru) * | 1976-08-10 | 1982-07-07 | Предприятие П/Я Г-4444 | Сухой пленочный фоторезист |
| US4239849A (en) | 1978-06-19 | 1980-12-16 | Dynachem Corporation | Polymers for aqueous processed photoresists |
| WO1980001321A1 (en) * | 1978-12-25 | 1980-06-26 | N Smirnova | Dry film photoresist |
| DE3034343A1 (de) * | 1979-02-21 | 1981-04-09 | Panelgraphic Corp | Radiation curable cellulosic polyacrylic abrasion resistant coating |
| JPS5619752A (en) * | 1979-07-27 | 1981-02-24 | Hitachi Chemical Co Ltd | Photosensitive resin composition laminate |
| DE3560654D1 (en) * | 1984-02-18 | 1987-10-22 | Basf Ag | Photosensitive recording material |
| DD250593A1 (de) * | 1984-04-03 | 1987-10-14 | Wolfen Filmfab Veb | Fotopolymerisierbares material |
| DE3504254A1 (de) | 1985-02-08 | 1986-08-14 | Basf Ag, 6700 Ludwigshafen | Lichtempfindliches aufzeichnungselement |
| DE3619129A1 (de) * | 1986-06-06 | 1987-12-10 | Basf Ag | Lichtempfindliches aufzeichnungselement |
| DE3841025A1 (de) * | 1988-12-06 | 1990-06-07 | Hoechst Ag | Durch strahlung polymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| JP2613462B2 (ja) * | 1988-12-28 | 1997-05-28 | コニカ株式会社 | 画像形成材料及び画像形成方法 |
| JP2515885Y2 (ja) * | 1990-09-28 | 1996-10-30 | アンリツ株式会社 | 測定装置の表示部 |
| DE19638032A1 (de) * | 1996-09-18 | 1998-03-19 | Du Pont Deutschland | Photopolymerisierbares Gemisch mit geringerer Sauerstoffempfindlichkeit zur Herstellung von Farbprüfdrucken |
| US7052824B2 (en) | 2000-06-30 | 2006-05-30 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
| US20100209843A1 (en) | 2009-02-16 | 2010-08-19 | E. I. Du Pont De Nemours And Company | Process for thick film circuit patterning |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA614181A (en) * | 1961-02-07 | J. Mcgraw William | Photopolymerizable compositions, elements and processes | |
| US2893868A (en) * | 1955-08-22 | 1959-07-07 | Du Pont | Polymerizable compositions |
| NL218803A (da) * | 1956-07-09 | |||
| GB835849A (en) * | 1957-04-26 | 1960-05-25 | Du Pont | Photopolymerisable compositions and uses thereof |
| US3458311A (en) * | 1966-06-27 | 1969-07-29 | Du Pont | Photopolymerizable elements with solvent removable protective layers |
| US3469982A (en) * | 1968-09-11 | 1969-09-30 | Jack Richard Celeste | Process for making photoresists |
-
1972
- 1972-01-18 ZA ZA720345A patent/ZA72345B/xx unknown
- 1972-01-25 NO NO177/72A patent/NO141804C/no unknown
- 1972-01-27 AU AU38392/72A patent/AU461461B2/en not_active Expired
- 1972-01-29 ES ES399317A patent/ES399317A1/es not_active Expired
- 1972-01-31 FR FR7203150A patent/FR2124974A5/fr not_active Expired
- 1972-01-31 BE BE778729A patent/BE778729A/xx not_active IP Right Cessation
- 1972-01-31 IL IL38677A patent/IL38677A/xx unknown
- 1972-02-01 RO RO7269624A patent/RO64896A/ro unknown
- 1972-02-01 CH CH142672A patent/CH592322A5/xx not_active IP Right Cessation
- 1972-02-01 SE SE7201145A patent/SE390218B/xx unknown
- 1972-02-02 FI FI271/72A patent/FI57429C/fi active
- 1972-02-02 CA CA133,755A patent/CA965291A/en not_active Expired
- 1972-02-02 JP JP1214572A patent/JPS5538961B1/ja active Pending
- 1972-02-02 LU LU64712A patent/LU64712A1/xx unknown
- 1972-02-02 GB GB481472A patent/GB1361298A/en not_active Expired
- 1972-02-03 PL PL1972153265A patent/PL83391B1/pl unknown
- 1972-02-03 IT IT67324/72A patent/IT949005B/it active
- 1972-02-03 DE DE2205146A patent/DE2205146C2/de not_active Expired - Lifetime
- 1972-02-03 DK DK48172AA patent/DK142623B/da not_active IP Right Cessation
- 1972-02-04 NL NLAANVRAGE7201460,A patent/NL176021C/xx not_active IP Right Cessation
- 1972-02-04 BG BG7219648A patent/BG26673A3/xx unknown
- 1972-12-08 DD DD167452A patent/DD101035A5/xx unknown
-
1973
- 1973-01-03 DK DK1773A patent/DK144184C/da active
-
1982
- 1982-06-24 HK HK283/82A patent/HK28382A/xx unknown
- 1982-11-26 JP JP57207462A patent/JPS58144824A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0136924B2 (da) | 1989-08-03 |
| NO141804B (no) | 1980-02-04 |
| AU461461B2 (en) | 1975-05-12 |
| DK142623C (da) | 1981-08-03 |
| RO64896A (ro) | 1980-01-15 |
| NL176021C (nl) | 1987-07-16 |
| CA965291A (en) | 1975-04-01 |
| CH592322A5 (da) | 1977-10-31 |
| SE390218B (sv) | 1976-12-06 |
| DD101035A5 (da) | 1973-10-12 |
| FI57429B (fi) | 1980-04-30 |
| IL38677A (en) | 1974-12-31 |
| ZA72345B (en) | 1973-03-28 |
| LU64712A1 (da) | 1973-09-04 |
| NL176021B (nl) | 1984-09-03 |
| JPS5538961B1 (da) | 1980-10-07 |
| ES399317A1 (es) | 1974-12-16 |
| NO141804C (no) | 1980-05-14 |
| BE778729A (fr) | 1972-07-31 |
| FR2124974A5 (da) | 1972-09-22 |
| GB1361298A (en) | 1974-07-24 |
| DE2205146C2 (de) | 1990-03-08 |
| IT949005B (it) | 1973-06-11 |
| BG26673A3 (da) | 1979-05-15 |
| PL83391B1 (da) | 1975-12-31 |
| HK28382A (en) | 1982-07-02 |
| DK144184B (da) | 1982-01-04 |
| IL38677A0 (en) | 1972-03-28 |
| FI57429C (fi) | 1980-08-11 |
| NL7201460A (da) | 1972-08-08 |
| DE2205146A1 (de) | 1972-11-23 |
| DK142623B (da) | 1980-12-01 |
| AU3839272A (en) | 1973-08-02 |
| JPS58144824A (ja) | 1983-08-29 |
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