ES2645700T3 - Procedimiento para definir y reproducir estructuras en materiales conductores - Google Patents
Procedimiento para definir y reproducir estructuras en materiales conductores Download PDFInfo
- Publication number
- ES2645700T3 ES2645700T3 ES10182946.3T ES10182946T ES2645700T3 ES 2645700 T3 ES2645700 T3 ES 2645700T3 ES 10182946 T ES10182946 T ES 10182946T ES 2645700 T3 ES2645700 T3 ES 2645700T3
- Authority
- ES
- Spain
- Prior art keywords
- pattern
- substrate
- master electrode
- define
- procedure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
- H05K3/205—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using a pattern electroplated or electroformed on a metallic carrier
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/14—Etching locally
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/07—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process being removed electrolytically
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/0117—Pattern shaped electrode used for patterning, e.g. plating or etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Electroplating Methods And Accessories (AREA)
- Micromachines (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Weting (AREA)
- Printing Methods (AREA)
- Cell Electrode Carriers And Collectors (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Un procedimiento de reproducción de un patrón electromecánico para la producción de micro o nanoestructuras de un material electroconductor en un sustrato (9), a través del cual se reproduce un patrón de grabado, definido por un material con un patrón aislante eléctricamente, comprendiendo dicho procedimiento el uso de un proceso electroquímico para transferir dicho patrón en el sustrato (9), dicho proceso electroquímico que comprende la disolución de un material en una superficie anódica y la deposición del material en una superficie catódica caracterizado por colocar un electrodo maestro (8) que comprende una paca de contraelectrodo (1) y una capa aislante de patrón (3) del material aislante del patrón, en estrecha colaboración con el sustrato (9) de forma que el patrón queda definido por el uso del electrodo maestro (8), y dicha disolución y deposición de material se realiza en las celdas locales de grabado (12, 14) que se forma en las cavidades, delimitado por la capa aislante de patrón (3) del electrodo maestro (8) y el sustrato (9), siendo el sustrato (9) dicha superficie anódica y siendo el electrodo maestro (8) dicha superficie catódica y siendo las celdas locales de grabado dichas cavidades (12).
Description
Claims (1)
-
imagen1
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0102144A SE523309E (sv) | 2001-06-15 | 2001-06-15 | Metod, elektrod och apparat för att skapa mikro- och nanostrukturer i ledande material genom mönstring med masterelektrod och elektrolyt |
SE0102144 | 2001-06-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2645700T3 true ES2645700T3 (es) | 2017-12-07 |
Family
ID=20284507
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES02739042T Expired - Lifetime ES2397919T3 (es) | 2001-06-15 | 2002-06-17 | Procedimiento y electrodo para definir y reproducir estructuras en materiales conductores |
ES10182946.3T Expired - Lifetime ES2645700T3 (es) | 2001-06-15 | 2002-06-17 | Procedimiento para definir y reproducir estructuras en materiales conductores |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES02739042T Expired - Lifetime ES2397919T3 (es) | 2001-06-15 | 2002-06-17 | Procedimiento y electrodo para definir y reproducir estructuras en materiales conductores |
Country Status (13)
Country | Link |
---|---|
US (4) | US7790009B2 (es) |
EP (2) | EP1404899B1 (es) |
JP (2) | JP4546078B2 (es) |
KR (1) | KR101250685B1 (es) |
CN (1) | CN1294296C (es) |
CA (1) | CA2462098C (es) |
DK (1) | DK1404899T3 (es) |
ES (2) | ES2397919T3 (es) |
HK (1) | HK1072083A1 (es) |
PT (1) | PT1404899E (es) |
RU (1) | RU2296820C2 (es) |
SE (1) | SE523309E (es) |
WO (1) | WO2002103085A1 (es) |
Families Citing this family (68)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU6531600A (en) | 1999-08-27 | 2001-03-26 | Lex Kosowsky | Current carrying structure using voltage switchable dielectric material |
US7825491B2 (en) | 2005-11-22 | 2010-11-02 | Shocking Technologies, Inc. | Light-emitting device using voltage switchable dielectric material |
US7416634B2 (en) | 2002-03-25 | 2008-08-26 | Matvice Ehf | Method and apparatus for processing nanoscopic structures |
US8294025B2 (en) | 2002-06-08 | 2012-10-23 | Solarity, Llc | Lateral collection photovoltaics |
WO2005070167A2 (en) * | 2004-01-12 | 2005-08-04 | The Regents Of The University Of California | Nanoscale electric lithography |
GB0416600D0 (en) * | 2004-07-24 | 2004-08-25 | Univ Newcastle | A process for manufacturing micro- and nano-devices |
GB0416952D0 (en) * | 2004-07-30 | 2004-09-01 | Renishaw Plc | Scale making method |
FR2885913B1 (fr) * | 2005-05-18 | 2007-08-10 | Centre Nat Rech Scient | Element composite comprenant un substrat conducteur et un revetement metallique nanostructure. |
KR101147087B1 (ko) * | 2005-06-28 | 2012-05-17 | 엘지디스플레이 주식회사 | 평판표시소자의 제조방법 |
JP2009516388A (ja) | 2005-11-18 | 2009-04-16 | レプリソールス テクノロジーズ アーベー | 多層構造の形成方法 |
KR20080084812A (ko) | 2005-11-22 | 2008-09-19 | 쇼킹 테크놀로지스 인코포레이티드 | 과전압 보호를 위해 전압 변환가능 재료를 포함하는 반도체디바이스 |
FR2898138B1 (fr) | 2006-03-03 | 2008-05-16 | Commissariat Energie Atomique | Procede de structuration electrochimique d'un materiau conducteur ou semi-conducteur, et dispositif de mise en oeuvre. |
EP1835339B1 (fr) * | 2006-03-15 | 2012-05-16 | Rolex S.A. | Procédé de fabrication par technologie de type liga d'une structure métallique monocouche ou multicouche, et structure obtenue |
DE102006013362A1 (de) * | 2006-03-16 | 2007-09-27 | Siemens Ag | Verfahren zum Herstellen einer elektrischen Komponente mit einer Nanonadelstruktur |
US7981325B2 (en) | 2006-07-29 | 2011-07-19 | Shocking Technologies, Inc. | Electronic device for voltage switchable dielectric material having high aspect ratio particles |
US20080029405A1 (en) * | 2006-07-29 | 2008-02-07 | Lex Kosowsky | Voltage switchable dielectric material having conductive or semi-conductive organic material |
EP2084748A4 (en) | 2006-09-24 | 2011-09-28 | Shocking Technologies Inc | FORMULATIONS FOR A VOLTAGE-SWITCHABLE DIELECTRIC MATERIAL WITH A DEVICED VOLTAGE CONTACT BEHAVIOR AND METHOD OF MANUFACTURING THEREOF |
JP4694519B2 (ja) * | 2007-02-28 | 2011-06-08 | 富士通株式会社 | マイクロ構造体およびマイクロ構造体製造方法 |
CN100545648C (zh) * | 2007-05-15 | 2009-09-30 | 中国科学院长春应用化学研究所 | 一种微盘电极或微盘阵列电极的制备方法 |
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US9157141B2 (en) | 2007-08-24 | 2015-10-13 | Schlumberger Technology Corporation | Conditioning ferrous alloys into cracking susceptible and fragmentable elements for use in a well |
CH704572B1 (fr) * | 2007-12-31 | 2012-09-14 | Nivarox Sa | Procédé de fabrication d'une microstructure métallique et microstructure obtenue selon ce procédé. |
US8206614B2 (en) | 2008-01-18 | 2012-06-26 | Shocking Technologies, Inc. | Voltage switchable dielectric material having bonded particle constituents |
US8203421B2 (en) | 2008-04-14 | 2012-06-19 | Shocking Technologies, Inc. | Substrate device or package using embedded layer of voltage switchable dielectric material in a vertical switching configuration |
KR100894710B1 (ko) * | 2008-06-27 | 2009-04-24 | (주) 월드비젼 | 윈도우 일체형 터치스크린 및 이의 제조방법 |
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KR20110088571A (ko) * | 2008-11-14 | 2011-08-03 | 레플리서러스 그룹 에스에이에스 | 전도성 기판 도금 시스템 및 기판 홀더 |
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US5947027A (en) | 1998-09-08 | 1999-09-07 | Motorola, Inc. | Printing apparatus with inflatable means for advancing a substrate towards the stamping surface |
DE19935558B4 (de) * | 1999-07-30 | 2010-11-25 | Nawotec Gmbh | Verfahren zur Erzeugung von Strukturen in einem Substrat im Nanometerbereich |
JP3441058B2 (ja) * | 1999-12-03 | 2003-08-25 | 理化学研究所 | キャピラリーゲル電気泳動用マイクロチップおよびその製造方法 |
SE515607C2 (sv) | 1999-12-10 | 2001-09-10 | Obducat Ab | Anordning och metod vid tillverkning av strukturer |
KR100500684B1 (ko) * | 1999-12-29 | 2005-07-12 | 비오이 하이디스 테크놀로지 주식회사 | 4-마스크 공정을 이용한 액정 디스플레이의 제조 방법 |
KR20010105994A (ko) * | 2000-05-20 | 2001-11-29 | 구자홍 | 디스크 드라이버의 트레이 |
-
2001
- 2001-06-15 SE SE0102144A patent/SE523309E/xx not_active IP Right Cessation
-
2002
- 2002-06-17 ES ES02739042T patent/ES2397919T3/es not_active Expired - Lifetime
- 2002-06-17 PT PT2739042T patent/PT1404899E/pt unknown
- 2002-06-17 CA CA2462098A patent/CA2462098C/en not_active Expired - Lifetime
- 2002-06-17 DK DK02739042.6T patent/DK1404899T3/da active
- 2002-06-17 KR KR1020037016336A patent/KR101250685B1/ko active IP Right Grant
- 2002-06-17 RU RU2003136088/02A patent/RU2296820C2/ru not_active IP Right Cessation
- 2002-06-17 JP JP2003505393A patent/JP4546078B2/ja not_active Expired - Fee Related
- 2002-06-17 EP EP02739042A patent/EP1404899B1/en not_active Expired - Lifetime
- 2002-06-17 ES ES10182946.3T patent/ES2645700T3/es not_active Expired - Lifetime
- 2002-06-17 WO PCT/SE2002/001179 patent/WO2002103085A1/en active Application Filing
- 2002-06-17 CN CNB028119266A patent/CN1294296C/zh not_active Expired - Fee Related
- 2002-06-17 EP EP10182946.3A patent/EP2322694B1/en not_active Expired - Lifetime
-
2003
- 2003-12-15 US US10/734,223 patent/US7790009B2/en not_active Expired - Fee Related
-
2005
- 2005-06-13 HK HK05104929A patent/HK1072083A1/xx not_active IP Right Cessation
-
2007
- 2007-03-09 US US11/716,166 patent/US20070151858A1/en not_active Abandoned
-
2009
- 2009-06-15 JP JP2009142804A patent/JP2009235578A/ja active Pending
-
2010
- 2010-05-27 US US12/801,219 patent/US20110000784A1/en not_active Abandoned
-
2012
- 2012-03-12 US US13/417,808 patent/US8741113B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
SE523309E (sv) | 2010-03-02 |
RU2003136088A (ru) | 2005-05-10 |
US20070151858A1 (en) | 2007-07-05 |
RU2296820C2 (ru) | 2007-04-10 |
JP2009235578A (ja) | 2009-10-15 |
US20120228128A1 (en) | 2012-09-13 |
SE0102144L (sv) | 2002-12-19 |
EP1404899A1 (en) | 2004-04-07 |
CA2462098A1 (en) | 2002-12-27 |
US8741113B2 (en) | 2014-06-03 |
SE523309C2 (sv) | 2004-04-13 |
KR101250685B1 (ko) | 2013-04-03 |
EP2322694A1 (en) | 2011-05-18 |
HK1072083A1 (en) | 2005-08-12 |
ES2397919T3 (es) | 2013-03-12 |
US20110000784A1 (en) | 2011-01-06 |
KR20040028781A (ko) | 2004-04-03 |
EP1404899B1 (en) | 2012-10-31 |
EP2322694B1 (en) | 2017-08-02 |
US20040154828A1 (en) | 2004-08-12 |
JP4546078B2 (ja) | 2010-09-15 |
SE0102144D0 (sv) | 2001-06-15 |
JP2004530050A (ja) | 2004-09-30 |
CN1294296C (zh) | 2007-01-10 |
DK1404899T3 (da) | 2013-02-04 |
CA2462098C (en) | 2014-01-14 |
WO2002103085A1 (en) | 2002-12-27 |
CN1555428A (zh) | 2004-12-15 |
US7790009B2 (en) | 2010-09-07 |
PT1404899E (pt) | 2013-01-28 |
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