ES2583103T3 - Placas de impresión sensibles a IR revelables en prensa que utilizan resinas ligantes que tienen segmentos de óxido de polietileno - Google Patents
Placas de impresión sensibles a IR revelables en prensa que utilizan resinas ligantes que tienen segmentos de óxido de polietileno Download PDFInfo
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- ES2583103T3 ES2583103T3 ES03718373.8T ES03718373T ES2583103T3 ES 2583103 T3 ES2583103 T3 ES 2583103T3 ES 03718373 T ES03718373 T ES 03718373T ES 2583103 T3 ES2583103 T3 ES 2583103T3
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- polyethylene oxide
- sensitive
- block
- binding agent
- press
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- 239000011230 binding agent Substances 0.000 title abstract description 6
- 229920003171 Poly (ethylene oxide) Polymers 0.000 title abstract 8
- 229920005989 resin Polymers 0.000 title 1
- 239000011347 resin Substances 0.000 title 1
- 229920000578 graft copolymer Polymers 0.000 abstract description 9
- 150000001875 compounds Chemical class 0.000 abstract description 6
- 239000000203 mixture Substances 0.000 abstract description 6
- 239000002245 particle Substances 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 abstract 2
- 229920001400 block copolymer Polymers 0.000 abstract 1
- 239000005267 main chain polymer Substances 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 8
- 230000002209 hydrophobic effect Effects 0.000 description 7
- 239000000178 monomer Substances 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- -1 glycidyloxy Chemical group 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 229910052736 halogen Inorganic materials 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 125000002877 alkyl aryl group Chemical group 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- CDSULTPOCMWJCM-UHFFFAOYSA-N 4h-chromene-2,3-dione Chemical compound C1=CC=C2OC(=O)C(=O)CC2=C1 CDSULTPOCMWJCM-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- ZVEMLYIXBCTVOF-UHFFFAOYSA-N 1-(2-isocyanatopropan-2-yl)-3-prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC(C(C)(C)N=C=O)=C1 ZVEMLYIXBCTVOF-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical class NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical class C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical class CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 229920001567 vinyl ester resin Chemical class 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004711 α-olefin Chemical class 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/494—Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
- G03C1/498—Photothermographic systems, e.g. dry silver
- G03C1/49836—Additives
- G03C1/49863—Inert additives, e.g. surfactants, binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/08—Developable by water or the fountain solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Printing Plates And Materials Therefor (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Graft Or Block Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
Abstract
Una placa de impresión litográfica de trabajo negativo que comprende (a) un sustrato y (b) aplicada al sustrato una capa de trabajo negativo que comprende una composición polimerizable que comprende (i) un compuesto polimerizable, y (ii) un agente ligante polimérico; en donde el agente ligante polimérico comprende segmentos de óxido de polietileno y se selecciona de por lo menos un copolímero de injerto que comprende un polímero de cadena principal y cadenas laterales de óxido de polietileno, un copolímero en bloque que tiene por lo menos un bloque de óxido de polietileno y por lo menos un bloque de óxido de no polietileno, y una combinación de los mismos; en donde los segmentos de óxido de polietileno de las cadenas laterales de óxido de polietileno o el bloque de óxido de polietileno tienen un peso molecular promedio en número que varía de 500 a 10.000; en donde la composición polimerizable comprende partículas separadas del agente ligante polimérico que se encuentran suspendidas en la composición polimerizable; y en donde la proporción de peso del compuesto polimerizable y el agente ligante polimérico varía de 5:95 a 95:5.
Description
o
en donde cada uno de R7, R8, R9 y R10 es hidrógeno; R3 puede ser H o alquilo; y n es de aproximadamente 12 a
5 aproximadamente 250. El segmento hidrofóbico en W puede ser -R12 -, -O-R12—0-, -R3N-R12 -NR3-, —OOC-R12-O-o -OOC-R12 —O-, en donde cada R12 puede ser en forma independiente un alquileno lineal, ramificado o cíclico de 6 a 120 átomos de carbono, un haloalquileno de 6 a 120 átomos de carbono, un arileno de 6 a 120 átomos de carbono, un alcarileno de 6 a 120 átomos de carbono o un aralquileno de 6 a 120 átomos de carbono; y R3 puede ser H o alquilo.
10 El segmento hidrofílico en Y puede ser H, R15, OH, OR16, COOH, COOR16, O2CR16, un segmento representado por la fórmula:
R14
15 en donde cada uno de R7, R8, R9 Y R10 es hidrógeno; R3 puede ser H o alquilo; en donde cada R13, , R15 Y R16 puede ser en forma independiente H o alquilo de 1 a 5 átomos de carbono y n es de aproximadamente 12 a aproximadamente 250. El segmento hidrofóbico en Y puede ser un alquilo lineal, ramificado o cíclico de 6 a 120 átomos de carbono, un haloalquilo de 6 a 120 átomos de carbono, un arilo de 6 a 120 átomos de carbono, un alcarilo de 6 a 120 átomos de carbono, un aralquilo de 6 a 120 átomos de carbono, OR17, COOR17 u O2CR17, en donde R17
20 es un alquilo de 6 a 20 átomos de carbono.
En una realización preferida, el copolímero de injerto comprende unidades de repetición representadas por la fórmula:
en donde cada uno de R1 y R2 puede ser en forma independiente H, alquilo, arilo, aralquilo, alcarilo, COOR5, R6CO, 25 halógeno o ciano;
en donde Q puede ser uno de:
8
El copolímero de injerto que tiene segmentos hidrofóbicos y/o hidrofílicos se pueden preparar por medio de un proceso que comprende los pasos de
- (A)
- poner en contacto los siguientes componentes para producir un copolímero de injerto polimerizable:
- (i)
- un compuesto representado por la fórmula:
en donde W se selecciona del grupo que consiste en: un segmento hidrofílico y un segmento hidrofóbico e Y se selecciona del grupo que consiste en: un segmento hidrofílico y un segmento hidrofóbico, con la condición de que cuando W es un segmento hidrofílico, Y se seleccione del grupo que consiste en: un segmento hidrofílico y un segmento hidrofóbico, con la condición adicional de que cuando W es hidrofóbico, Y sea un segmento hidrofílico, y
10 (ii) un monómero polimerizable seleccionado del grupo que consiste en compuestos representado por la fórmula:
en donde cada R1 se selecciona en forma independiente del grupo que consiste en H, alquilo, arilo, aralquilo,
15 alcarilo, COOR5, R6CO, halógeno y ciano; R4 se selecciona del grupo que consiste en H, alquilo, halógeno, ciano, nitro, alcoxi, alcoxicarbonilo, acilo y una combinación de los mismos; y X es glicidiloxi o un grupo saliente seleccionado entre el grupo que consiste en: halógeno, alcoxi o ariloxi, para producir un monómero de injerto polimerizable; y
(B) la copolimerización del monómero de injerto polimerizable y uno o más comonómeros a una temperatura y
20 durante un periodo de tiempo suficiente para producir el copolímero de injerto. Cuando sea necesario, la etapa de contacto se lleva a cabo en presencia de un catalizador.
Preferiblemente, el comonómero es uno o más de los siguientes: estireno, estireno sustituido, alfa-metilestireno, éster de acrilato, éster de metacrilato, acrilonitrilo, acrilamida, metacrilamida, haluro de vinilo, éster de vinilo, éter de vinilo y una alfa-olefina.
25 El monómero polimerizable preferido puede ser cualquier monómero que sea capaz de reaccionar con H-W-Y e incluya monómeros polimerizables, tales como, m-isopropenil-α, isocianato de α-dimetilbencilo, cloruro de acriloilo y cloruro de metacriloilo. La reacción se lleva a cabo típicamente en presencia de un catalizador, que es preferiblemente una base, un compuesto de estaño o una mezcla de los mismos. En una reacción que admite un catalizador ácido, se puede utilizar un catalizador ácido tal como un ácido de Lewis o prótico.
30 Preferiblemente, los compuestos representados por la fórmula H-W-Y pueden ser uno o más de los compuestos representado por la fórmula:
11
5
10
15
20
poliacrílico, se aplicó la solución descrita en la Tabla 2 para proporcionar un peso de recubrimiento seco de 1,3 g/m2.
- Tabla 2. Composición del Ejemplo 5 (formulación en partes en peso)
- Componente
- Partes en peso
- Porcentaje
- Producto de reacción de DESMODUR®
- 2,44
- N100 con acrilato de hidroxietilo y triacrilato de pentaeritritol
- Copolímero de injerto 1
- 2,22
- Sartomer 3551
- 0,51
- Cloruro de difenilyodonio2
- 0,29
- Ácido anilino-N,N-diacético
- 0,23
- Cetocumarina 934
- 0,06
- Byk 3073
- 0,02
- n-Propanol
- 75,38
- Agua
- 18,85
1 Sartomer 355 es un monómero acrílico multifuncional disponible a través de Sartomer Co., Inc. 2 Cloruro de difenilyodonio de Aldrich. 3 Byk 307 es un polisiloxano modificado disponible a través de Byk Chemie. 4 Cetocumarina 93 tiene la siguiente estructura:
Luego se sobrerrecubrió el recubrimiento resultante de acuerdo con lo descrito en el Ejemplo 3 para proporcionar un peso de recubrimiento seco de 2 g/m2. Se reflejó la placa resultante en un Simulador Solar Oriel de 1000 W modelo #81291 (Oriel Instruments, Stratford, CT) equipada con un filtro de ejecución 530 durante 5 segundos a 4 mW/cm2.
Se procesó la placa en una pileta con agua y una solución de 30% Varn 142W/30% Varn Par, luego se montó directamente en una prensa AB Dick. La placa imprimió más de 500 copias de impresiones de buena calidad.
Ejemplo 6: Síntesis del Copolímero de injerto 2:
Se cargaron agua desionizada (314,8 g) y dodecilsulfato de sodio (2,0 g) en un matraz de 4 bocas de un litro bajo atmósfera de nitrógeno y se calentaron a 70°C. Se añadieron una premezcla de persulfato de amonio (0,65 g) y agua desionizada (20 g) a 70°C en 15 minutos. Se añadieron una premezcla de estireno (79,5 g), el Macrómero 1 (10 g) y ácido acrílico (7,9 g) en 3 horas a 70°C. Una hora y media más tarde, se halló que los % de no volátiles fueron de 22,5% frente a 23% (teórico). Se enfrió la mezcla de reacción a temperatura ambiente con agua. Se añadió una solución de hidróxido de amonio (8 g) a temperatura ambiente para estabilizar el látex.
Ejemplo 7: Preparación de una placa de impresión sensible a IR
Se repitió el Ejemplo 3 excepto que no se aplicó sobrerrecubrimiento y se reemplazó el Copolímero de injerto 1 por el Copolímero de injerto 2 para ilustrar el efecto del número de ácido ligante. La Figura 1 muestra un análisis de escaneo de microscopio electrónico (`SEM’) del recubrimiento resultante. De acuerdo con lo mostrado en la Figura 1, el recubrimiento comprende partículas separadas. El diámetro de las partículas es hasta aproximadamente 60 nm.
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PCT/US2003/011358 WO2003087939A2 (en) | 2002-04-10 | 2003-04-10 | On-press developable ir sensitive printing plates using binder resins having polyethylene oxide segments |
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- 2003-04-10 RU RU2004132874/04A patent/RU2300792C2/ru active
- 2003-04-10 WO PCT/US2003/011358 patent/WO2003087939A2/en active Application Filing
- 2003-04-10 KR KR1020047015922A patent/KR100953771B1/ko active IP Right Grant
- 2003-04-10 ES ES03718373.8T patent/ES2583103T3/es not_active Expired - Lifetime
- 2003-04-10 BR BR0309165-1A patent/BR0309165A/pt not_active Application Discontinuation
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- 2003-04-10 CN CNB038094916A patent/CN100495207C/zh not_active Expired - Lifetime
- 2003-04-10 AU AU2003221914A patent/AU2003221914B2/en not_active Ceased
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2005
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2013
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KR100953771B1 (ko) | 2010-04-21 |
JP5480412B2 (ja) | 2014-04-23 |
BR0309165A (pt) | 2005-01-25 |
KR20040106325A (ko) | 2004-12-17 |
HK1079578A1 (en) | 2006-04-07 |
US20050170286A1 (en) | 2005-08-04 |
CN100495207C (zh) | 2009-06-03 |
CN1650233A (zh) | 2005-08-03 |
EP1493058A2 (en) | 2005-01-05 |
JP2005522362A (ja) | 2005-07-28 |
EP1493058B1 (en) | 2016-06-22 |
US20030064318A1 (en) | 2003-04-03 |
ZA200408146B (en) | 2005-11-30 |
JP2013107399A (ja) | 2013-06-06 |
US7258964B2 (en) | 2007-08-21 |
JP2009234268A (ja) | 2009-10-15 |
JP5270463B2 (ja) | 2013-08-21 |
AU2003221914B2 (en) | 2008-03-06 |
RU2300792C2 (ru) | 2007-06-10 |
CA2479515A1 (en) | 2003-10-23 |
WO2003087939A3 (en) | 2004-03-04 |
RU2004132874A (ru) | 2005-06-10 |
US6899994B2 (en) | 2005-05-31 |
AU2003221914A2 (en) | 2003-10-27 |
WO2003087939A2 (en) | 2003-10-23 |
AU2003221914A1 (en) | 2003-10-27 |
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