ES2326266T3 - Baño de electrodeposicion acido y metodo para la deposicion electrolitica de depositos de niquel satinados. - Google Patents
Baño de electrodeposicion acido y metodo para la deposicion electrolitica de depositos de niquel satinados. Download PDFInfo
- Publication number
- ES2326266T3 ES2326266T3 ES03730051T ES03730051T ES2326266T3 ES 2326266 T3 ES2326266 T3 ES 2326266T3 ES 03730051 T ES03730051 T ES 03730051T ES 03730051 T ES03730051 T ES 03730051T ES 2326266 T3 ES2326266 T3 ES 2326266T3
- Authority
- ES
- Spain
- Prior art keywords
- group
- polyether
- nickel
- hydrogen
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000002253 acid Substances 0.000 title claims abstract description 23
- 230000008021 deposition Effects 0.000 title claims abstract description 21
- 238000004070 electrodeposition Methods 0.000 title claims description 24
- 238000000034 method Methods 0.000 title claims description 21
- 238000000151 deposition Methods 0.000 title claims description 20
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 143
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 71
- 229920000570 polyether Polymers 0.000 claims abstract description 34
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 28
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 20
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 11
- 150000003868 ammonium compounds Chemical class 0.000 claims abstract description 5
- 239000003792 electrolyte Substances 0.000 claims description 32
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- -1 dimethyl siloxan ether Chemical compound 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 11
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims description 10
- 150000002500 ions Chemical class 0.000 claims description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 150000002148 esters Chemical class 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 229920001515 polyalkylene glycol Polymers 0.000 claims description 6
- 150000001721 carbon Chemical group 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 125000004429 atom Chemical group 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 229920001223 polyethylene glycol Polymers 0.000 claims description 3
- 229920001451 polypropylene glycol Polymers 0.000 claims 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims 1
- UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 claims 1
- 229920001521 polyalkylene glycol ether Polymers 0.000 claims 1
- 238000007747 plating Methods 0.000 abstract description 14
- 239000000080 wetting agent Substances 0.000 abstract description 10
- 238000001914 filtration Methods 0.000 abstract description 8
- 238000001816 cooling Methods 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 230000000694 effects Effects 0.000 description 13
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 7
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 6
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 5
- 125000002091 cationic group Chemical group 0.000 description 5
- 230000001788 irregular Effects 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 125000003827 glycol group Chemical group 0.000 description 3
- 150000002815 nickel Chemical class 0.000 description 3
- 229910001453 nickel ion Inorganic materials 0.000 description 3
- 239000013618 particulate matter Substances 0.000 description 3
- 229940081974 saccharin Drugs 0.000 description 3
- 235000019204 saccharin Nutrition 0.000 description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000013543 active substance Substances 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical compound NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000006172 buffering agent Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- NVIVJPRCKQTWLY-UHFFFAOYSA-N cobalt nickel Chemical compound [Co][Ni][Co] NVIVJPRCKQTWLY-UHFFFAOYSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000003906 humectant Substances 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000002663 nebulization Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002891 organic anions Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B35/00—Supplying, feeding, arranging or orientating articles to be packaged
- B65B35/10—Feeding, e.g. conveying, single articles
- B65B35/24—Feeding, e.g. conveying, single articles by endless belts or chains
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10222962A DE10222962A1 (de) | 2002-05-23 | 2002-05-23 | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
| DE10222962 | 2002-05-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2326266T3 true ES2326266T3 (es) | 2009-10-06 |
Family
ID=29432252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES03730051T Expired - Lifetime ES2326266T3 (es) | 2002-05-23 | 2003-05-15 | Baño de electrodeposicion acido y metodo para la deposicion electrolitica de depositos de niquel satinados. |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US7361262B2 (enExample) |
| EP (1) | EP1513967B1 (enExample) |
| JP (1) | JP4382656B2 (enExample) |
| KR (1) | KR100977435B1 (enExample) |
| CN (1) | CN1656255B (enExample) |
| AT (1) | ATE435317T1 (enExample) |
| AU (1) | AU2003240657A1 (enExample) |
| BR (1) | BR0311213B1 (enExample) |
| CA (1) | CA2484534C (enExample) |
| DE (2) | DE10222962A1 (enExample) |
| ES (1) | ES2326266T3 (enExample) |
| MX (1) | MXPA04011604A (enExample) |
| MY (1) | MY140082A (enExample) |
| RU (1) | RU2311497C2 (enExample) |
| TW (1) | TWI298089B (enExample) |
| WO (1) | WO2003100137A2 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060096868A1 (en) * | 2004-11-10 | 2006-05-11 | Siona Bunce | Nickel electroplating bath designed to replace monovalent copper strike solutions |
| ATE507327T1 (de) * | 2006-01-06 | 2011-05-15 | Enthone | Elektrolyt und verfahren zur abscheidung einer matten metallschicht |
| ES2615337T3 (es) * | 2008-07-08 | 2017-06-06 | Enthone, Inc. | Electrolito y método para depositar una capa metálica mate |
| US7951600B2 (en) | 2008-11-07 | 2011-05-31 | Xtalic Corporation | Electrodeposition baths, systems and methods |
| CN102289160B (zh) * | 2011-08-24 | 2012-11-21 | 绵阳艾萨斯电子材料有限公司 | 光致蚀刻剂用显影液及其制备方法与应用 |
| JP2013129902A (ja) * | 2011-12-22 | 2013-07-04 | Om Sangyo Kk | めっき品及びその製造方法 |
| US10246778B2 (en) | 2013-08-07 | 2019-04-02 | Macdermid Acumen, Inc. | Electroless nickel plating solution and method |
| CN103484901A (zh) * | 2013-09-27 | 2014-01-01 | 昆山纯柏精密五金有限公司 | 一种五金件的镀镍工艺 |
| RU2583569C1 (ru) * | 2014-12-10 | 2016-05-10 | Федеральное государственное бюджетное учреждение науки Иркутский институт химии им. А.Е. Фаворского Сибирского отделения Российской академии наук | Способ получения блестящих никелевых покрытий |
| JP6410640B2 (ja) * | 2015-03-02 | 2018-10-24 | 株式会社Ｊｃｕ | サテンニッケルめっき浴およびサテンニッケルめっき方法 |
| CN104789997A (zh) * | 2015-04-27 | 2015-07-22 | 南京宁美表面技术有限公司 | 珍珠镍电镀用添加剂、珍珠镍电镀溶液及电镀方法 |
| EP3372709A4 (en) * | 2015-11-06 | 2019-06-19 | JCU Corporation | NICKELING ADDITIVE AND SATIN NICKELING BATH THEREWITH |
| CN105350034B (zh) * | 2015-11-25 | 2017-11-17 | 广东致卓环保科技有限公司 | 珍珠镍电镀添加剂及其应用 |
| CN105603470A (zh) * | 2016-03-31 | 2016-05-25 | 奕东电子(常熟)有限公司 | 一种沙丁镍溶液及其镀镍工艺 |
| JP6774212B2 (ja) * | 2016-04-20 | 2020-10-21 | 株式会社Ｊｃｕ | 多孔質直管状鉄族元素めっき皮膜形成用電気めっき浴およびこれを用いた多孔質直管状鉄族元素めっき皮膜の形成方法 |
| CN109112583B (zh) * | 2018-10-29 | 2019-12-10 | 清远信和汽车部件有限公司 | 一种珍珠镍电镀工艺 |
| CN110714212B (zh) * | 2019-10-12 | 2021-04-30 | 常州大学 | 一种水溶液体系中由氯化镍一步法制备超疏水镍薄膜的方法 |
| CN111850623A (zh) * | 2020-05-08 | 2020-10-30 | 德锡化学(山东)有限公司 | 一种用于获得绒面镍层的电镀液及电镀工艺 |
| US20250137156A1 (en) * | 2023-10-26 | 2025-05-01 | Macdermid Enthone Inc. | Boric acid-free satin nickel |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1621085C3 (de) * | 1967-05-16 | 1980-02-14 | Henkel Kgaa, 4000 Duesseldorf | Saures galvanisches Bad zur Abscheidung satinglanzender Nickelniederschlage |
| US3839165A (en) * | 1967-08-26 | 1974-10-01 | Henkel & Cie Gmbh | Nickel electroplating method |
| US3697391A (en) * | 1970-07-17 | 1972-10-10 | M & T Chemicals Inc | Electroplating processes and compositions |
| DE2327881B2 (de) * | 1973-06-01 | 1978-06-22 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge |
| SU475874A1 (ru) * | 1973-07-24 | 1977-12-05 | Ордена Трудового Красного Знамени Институт Химии И Химической Технологии Ан Литовской Сср | Электролит дл нанесени никелевого покрыти с внедренными инертными частицами |
| JPS5855236B2 (ja) * | 1975-07-17 | 1983-12-08 | ソニー株式会社 | 酸性Ｎｉ電気メッキ浴 |
| JPS56152988A (en) * | 1980-04-30 | 1981-11-26 | Nobuyuki Koura | Nickel satin finish plating bath of heavy ruggedness |
| US6306466B1 (en) | 1981-04-01 | 2001-10-23 | Surface Technology, Inc. | Stabilizers for composite electroless plating |
| JPS6012434B2 (ja) | 1981-08-21 | 1985-04-01 | 荏原ユ−ジライト株式会社 | 亜鉛−ニツケル合金電気めつき液 |
| US4546423A (en) | 1982-02-23 | 1985-10-08 | Tokyo Shibaura Denki Kabushiki Kaisha | Multiple inverters with overcurrent and shoot-through protection |
| SU1468980A1 (ru) * | 1987-04-23 | 1989-03-30 | Минский радиотехнический институт | Электролит дл осаждени покрытий сплавом олово-никель |
| DE3736171A1 (de) * | 1987-10-26 | 1989-05-03 | Collardin Gmbh Gerhard | Verbessertes verfahren zur abscheidung satinglaenzender nickelniederschlaege |
| DE19540011C2 (de) * | 1995-10-27 | 1998-09-10 | Lpw Chemie Gmbh | Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen |
| US5788822A (en) * | 1996-05-15 | 1998-08-04 | Elf Atochem North America, Inc. | High current density semi-bright and bright zinc sulfur-acid salt electrogalvanizing process and composition |
| JP3687722B2 (ja) | 1999-01-12 | 2005-08-24 | 上村工業株式会社 | 無電解複合めっき液及び無電解複合めっき方法 |
| US6306275B1 (en) * | 2000-03-31 | 2001-10-23 | Lacks Enterprises, Inc. | Method for controlling organic micelle size in nickel-plating solution |
| DE10025552C1 (de) * | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
-
2002
- 2002-05-23 DE DE10222962A patent/DE10222962A1/de not_active Ceased
-
2003
- 2003-05-15 EP EP03730051A patent/EP1513967B1/en not_active Expired - Lifetime
- 2003-05-15 JP JP2004507574A patent/JP4382656B2/ja not_active Expired - Lifetime
- 2003-05-15 CA CA2484534A patent/CA2484534C/en not_active Expired - Lifetime
- 2003-05-15 US US10/515,412 patent/US7361262B2/en not_active Expired - Lifetime
- 2003-05-15 KR KR1020047018940A patent/KR100977435B1/ko not_active Expired - Lifetime
- 2003-05-15 MX MXPA04011604A patent/MXPA04011604A/es active IP Right Grant
- 2003-05-15 DE DE60328188T patent/DE60328188D1/de not_active Expired - Lifetime
- 2003-05-15 AU AU2003240657A patent/AU2003240657A1/en not_active Abandoned
- 2003-05-15 RU RU2004137798/02A patent/RU2311497C2/ru active
- 2003-05-15 AT AT03730051T patent/ATE435317T1/de not_active IP Right Cessation
- 2003-05-15 CN CN038117312A patent/CN1656255B/zh not_active Expired - Lifetime
- 2003-05-15 ES ES03730051T patent/ES2326266T3/es not_active Expired - Lifetime
- 2003-05-15 WO PCT/EP2003/005134 patent/WO2003100137A2/en not_active Ceased
- 2003-05-15 BR BRPI0311213-6A patent/BR0311213B1/pt active IP Right Grant
- 2003-05-22 MY MYPI20031899A patent/MY140082A/en unknown
- 2003-05-23 TW TW092114025A patent/TWI298089B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW200400282A (en) | 2004-01-01 |
| AU2003240657A1 (en) | 2003-12-12 |
| TWI298089B (en) | 2008-06-21 |
| MXPA04011604A (es) | 2005-03-07 |
| WO2003100137A2 (en) | 2003-12-04 |
| RU2004137798A (ru) | 2005-10-10 |
| WO2003100137A3 (en) | 2005-01-20 |
| JP2006508238A (ja) | 2006-03-09 |
| CN1656255A (zh) | 2005-08-17 |
| JP4382656B2 (ja) | 2009-12-16 |
| DE10222962A1 (de) | 2003-12-11 |
| CA2484534A1 (en) | 2003-12-04 |
| RU2311497C2 (ru) | 2007-11-27 |
| ATE435317T1 (de) | 2009-07-15 |
| AU2003240657A8 (en) | 2003-12-12 |
| KR100977435B1 (ko) | 2010-08-24 |
| US7361262B2 (en) | 2008-04-22 |
| BR0311213B1 (pt) | 2012-08-21 |
| CN1656255B (zh) | 2010-06-16 |
| EP1513967A2 (en) | 2005-03-16 |
| CA2484534C (en) | 2011-09-27 |
| KR20050012749A (ko) | 2005-02-02 |
| US20050150774A1 (en) | 2005-07-14 |
| MY140082A (en) | 2009-11-30 |
| EP1513967B1 (en) | 2009-07-01 |
| BR0311213A (pt) | 2007-04-27 |
| DE60328188D1 (de) | 2009-08-13 |
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