DE10222962A1 - Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge - Google Patents
Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender NickelniederschlägeInfo
- Publication number
- DE10222962A1 DE10222962A1 DE10222962A DE10222962A DE10222962A1 DE 10222962 A1 DE10222962 A1 DE 10222962A1 DE 10222962 A DE10222962 A DE 10222962A DE 10222962 A DE10222962 A DE 10222962A DE 10222962 A1 DE10222962 A1 DE 10222962A1
- Authority
- DE
- Germany
- Prior art keywords
- bath electrolyte
- electrolyte according
- nickel
- satin
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 118
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 59
- 230000008021 deposition Effects 0.000 title claims abstract description 27
- 239000003792 electrolyte Substances 0.000 title claims description 53
- 238000000034 method Methods 0.000 title claims description 16
- 230000002378 acidificating effect Effects 0.000 title claims description 8
- 229920000570 polyether Polymers 0.000 claims abstract description 35
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 28
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 25
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- -1 Perfluorobutylsulfonamido Chemical group 0.000 claims description 16
- 150000003856 quaternary ammonium compounds Chemical group 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 10
- 239000001257 hydrogen Substances 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
- 229920001515 polyalkylene glycol Polymers 0.000 claims description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- 125000000217 alkyl group Chemical group 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims description 5
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 239000002202 Polyethylene glycol Substances 0.000 claims description 3
- 150000002431 hydrogen Chemical class 0.000 claims description 3
- 229920001223 polyethylene glycol Polymers 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 6
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims 1
- 239000005977 Ethylene Substances 0.000 claims 1
- 229910001429 cobalt ion Inorganic materials 0.000 claims 1
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims 1
- 229920001451 polypropylene glycol Polymers 0.000 claims 1
- 239000000080 wetting agent Substances 0.000 abstract description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 13
- 238000001914 filtration Methods 0.000 abstract description 8
- 238000007747 plating Methods 0.000 abstract description 7
- 238000001816 cooling Methods 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 239000002253 acid Substances 0.000 abstract description 2
- 150000003868 ammonium compounds Chemical class 0.000 abstract description 2
- 238000000151 deposition Methods 0.000 description 23
- 230000000694 effects Effects 0.000 description 12
- 125000003827 glycol group Chemical group 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical class C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
- 239000011148 porous material Substances 0.000 description 4
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 4
- 229910052709 silver Inorganic materials 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- 241000080590 Niso Species 0.000 description 3
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 3
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 229940081974 saccharin Drugs 0.000 description 3
- 235000019204 saccharin Nutrition 0.000 description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 206010000496 acne Diseases 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 229910001420 alkaline earth metal ion Inorganic materials 0.000 description 2
- 150000008051 alkyl sulfates Chemical class 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002815 nickel Chemical class 0.000 description 2
- 229910001453 nickel ion Inorganic materials 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- SLRMQYXOBQWXCR-UHFFFAOYSA-N 2154-56-5 Chemical compound [CH2]C1=CC=CC=C1 SLRMQYXOBQWXCR-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 235000013162 Cocos nucifera Nutrition 0.000 description 1
- 244000060011 Cocos nucifera Species 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- 241001295925 Gegenes Species 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
- RVGRUAULSDPKGF-UHFFFAOYSA-N Poloxamer Chemical class C1CO1.CC1CO1 RVGRUAULSDPKGF-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- WRUAHXANJKHFIL-UHFFFAOYSA-N benzene-1,3-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(S(O)(=O)=O)=C1 WRUAHXANJKHFIL-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000004313 glare Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000005226 mechanical processes and functions Effects 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002891 organic anions Chemical class 0.000 description 1
- 229940083254 peripheral vasodilators imidazoline derivative Drugs 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 230000001376 precipitating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 150000003455 sulfinic acids Chemical class 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 238000012549 training Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B35/00—Supplying, feeding, arranging or orientating articles to be packaged
- B65B35/10—Feeding, e.g. conveying, single articles
- B65B35/24—Feeding, e.g. conveying, single articles by endless belts or chains
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Priority Applications (17)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10222962A DE10222962A1 (de) | 2002-05-23 | 2002-05-23 | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
| KR1020047018940A KR100977435B1 (ko) | 2002-05-23 | 2003-05-15 | 산 도금조 및 새틴 니켈 증착물의 전해 증착 방법 |
| CA2484534A CA2484534C (en) | 2002-05-23 | 2003-05-15 | Acid plating bath and method for the electolytic deposition of satin nickel deposits |
| US10/515,412 US7361262B2 (en) | 2002-05-23 | 2003-05-15 | Acid plating bath and method for the electrolytic deposition of satin nickel deposits |
| MXPA04011604A MXPA04011604A (es) | 2002-05-23 | 2003-05-15 | Bano de recubrimiento electrolitico acido para deposicion electrolitica de depositos de niquel satinado. |
| CN038117312A CN1656255B (zh) | 2002-05-23 | 2003-05-15 | 用于电解沉积缎纹镍沉积物的酸电镀浴及方法 |
| BRPI0311213-6A BR0311213B1 (pt) | 2002-05-23 | 2003-05-15 | banho de revestimento ácido para a deposição eletrolìtica de depósitos de nìquel acetinados e método para a deposição eletrolìtica de um depósito de nìquel acetinado sobre um substrato. |
| ES03730051T ES2326266T3 (es) | 2002-05-23 | 2003-05-15 | Baño de electrodeposicion acido y metodo para la deposicion electrolitica de depositos de niquel satinados. |
| EP03730051A EP1513967B1 (en) | 2002-05-23 | 2003-05-15 | Acid plating bath and method for the electolytic deposition of satin nickel deposits |
| AU2003240657A AU2003240657A1 (en) | 2002-05-23 | 2003-05-15 | Acid plating bath and method for the electolytic deposition of satin nickel deposits |
| DE60328188T DE60328188D1 (de) | 2002-05-23 | 2003-05-15 | Saures plattierungsbad und verfahren zum elektrolytischen absetzen von satinierten nickelabsetzungen |
| RU2004137798/02A RU2311497C2 (ru) | 2002-05-23 | 2003-05-15 | Кислый электролит и способ электролитического нанесения сатинированных никелевых покрытий |
| PCT/EP2003/005134 WO2003100137A2 (en) | 2002-05-23 | 2003-05-15 | Acid plating bath and method for the electolytic deposition of satin nickel deposits |
| JP2004507574A JP4382656B2 (ja) | 2002-05-23 | 2003-05-15 | 酸めっき浴およびサテンニッケル皮膜の電解析出法 |
| AT03730051T ATE435317T1 (de) | 2002-05-23 | 2003-05-15 | Saures plattierungsbad und verfahren zum elektrolytischen absetzen von satinierten nickelabsetzungen |
| MYPI20031899A MY140082A (en) | 2002-05-23 | 2003-05-22 | Acid plating bath and method for the electrolytic deposition of satin nickel deposits |
| TW092114025A TWI298089B (en) | 2002-05-23 | 2003-05-23 | Acid plating bath and method for the electrolytic deposition of satin nickel deposits |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10222962A DE10222962A1 (de) | 2002-05-23 | 2002-05-23 | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10222962A1 true DE10222962A1 (de) | 2003-12-11 |
Family
ID=29432252
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10222962A Ceased DE10222962A1 (de) | 2002-05-23 | 2002-05-23 | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
| DE60328188T Expired - Lifetime DE60328188D1 (de) | 2002-05-23 | 2003-05-15 | Saures plattierungsbad und verfahren zum elektrolytischen absetzen von satinierten nickelabsetzungen |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60328188T Expired - Lifetime DE60328188D1 (de) | 2002-05-23 | 2003-05-15 | Saures plattierungsbad und verfahren zum elektrolytischen absetzen von satinierten nickelabsetzungen |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US7361262B2 (enExample) |
| EP (1) | EP1513967B1 (enExample) |
| JP (1) | JP4382656B2 (enExample) |
| KR (1) | KR100977435B1 (enExample) |
| CN (1) | CN1656255B (enExample) |
| AT (1) | ATE435317T1 (enExample) |
| AU (1) | AU2003240657A1 (enExample) |
| BR (1) | BR0311213B1 (enExample) |
| CA (1) | CA2484534C (enExample) |
| DE (2) | DE10222962A1 (enExample) |
| ES (1) | ES2326266T3 (enExample) |
| MX (1) | MXPA04011604A (enExample) |
| MY (1) | MY140082A (enExample) |
| RU (1) | RU2311497C2 (enExample) |
| TW (1) | TWI298089B (enExample) |
| WO (1) | WO2003100137A2 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060096868A1 (en) * | 2004-11-10 | 2006-05-11 | Siona Bunce | Nickel electroplating bath designed to replace monovalent copper strike solutions |
| ATE507327T1 (de) * | 2006-01-06 | 2011-05-15 | Enthone | Elektrolyt und verfahren zur abscheidung einer matten metallschicht |
| ES2615337T3 (es) * | 2008-07-08 | 2017-06-06 | Enthone, Inc. | Electrolito y método para depositar una capa metálica mate |
| US7951600B2 (en) | 2008-11-07 | 2011-05-31 | Xtalic Corporation | Electrodeposition baths, systems and methods |
| CN102289160B (zh) * | 2011-08-24 | 2012-11-21 | 绵阳艾萨斯电子材料有限公司 | 光致蚀刻剂用显影液及其制备方法与应用 |
| JP2013129902A (ja) * | 2011-12-22 | 2013-07-04 | Om Sangyo Kk | めっき品及びその製造方法 |
| US10246778B2 (en) | 2013-08-07 | 2019-04-02 | Macdermid Acumen, Inc. | Electroless nickel plating solution and method |
| CN103484901A (zh) * | 2013-09-27 | 2014-01-01 | 昆山纯柏精密五金有限公司 | 一种五金件的镀镍工艺 |
| RU2583569C1 (ru) * | 2014-12-10 | 2016-05-10 | Федеральное государственное бюджетное учреждение науки Иркутский институт химии им. А.Е. Фаворского Сибирского отделения Российской академии наук | Способ получения блестящих никелевых покрытий |
| JP6410640B2 (ja) * | 2015-03-02 | 2018-10-24 | 株式会社Jcu | サテンニッケルめっき浴およびサテンニッケルめっき方法 |
| CN104789997A (zh) * | 2015-04-27 | 2015-07-22 | 南京宁美表面技术有限公司 | 珍珠镍电镀用添加剂、珍珠镍电镀溶液及电镀方法 |
| EP3372709A4 (en) * | 2015-11-06 | 2019-06-19 | JCU Corporation | NICKELING ADDITIVE AND SATIN NICKELING BATH THEREWITH |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1621085A1 (de) * | 1967-05-16 | 1971-03-11 | Henkel & Cie Gmbh | Saures galvanisches Bad zur Erzeugung satinglaenzender Nickelniederschlaege |
| DE2327881A1 (de) * | 1973-06-01 | 1975-01-02 | Langbein Pfanhauser Werke Ag | Verfahren zur erzeugung mattglaenzender nickel-niederschlaege oder nickel/kobaltniederschlaege auf metalloberflaechen |
| DE2522130B1 (de) * | 1975-05-17 | 1976-10-28 | Blasberg Gmbh & Co Kg Friedr | Saures galvanisches nickel-, nickel- kobalt- odernickel-eisen-bad zum abscheiden seidenmatter schichten |
| DE2134457C2 (de) * | 1970-07-17 | 1982-06-03 | M & T Chemicals Inc., New York, N.Y. | Wäßriges galvanisches Bad für die Abscheidung von Nickel und/oder Kobalt |
| DE3736171A1 (de) * | 1987-10-26 | 1989-05-03 | Collardin Gmbh Gerhard | Verbessertes verfahren zur abscheidung satinglaenzender nickelniederschlaege |
| DE19540011A1 (de) * | 1995-10-27 | 1997-04-30 | Lpw Chemie Gmbh | Verfahren zur galvanischen Abscheidung von blendfreien Nickelniederschlägen |
| DE10025552C1 (de) * | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3839165A (en) * | 1967-08-26 | 1974-10-01 | Henkel & Cie Gmbh | Nickel electroplating method |
| SU475874A1 (ru) * | 1973-07-24 | 1977-12-05 | Ордена Трудового Красного Знамени Институт Химии И Химической Технологии Ан Литовской Сср | Электролит дл нанесени никелевого покрыти с внедренными инертными частицами |
| JPS5855236B2 (ja) * | 1975-07-17 | 1983-12-08 | ソニー株式会社 | 酸性Ni電気メッキ浴 |
| JPS56152988A (en) * | 1980-04-30 | 1981-11-26 | Nobuyuki Koura | Nickel satin finish plating bath of heavy ruggedness |
| US6306466B1 (en) | 1981-04-01 | 2001-10-23 | Surface Technology, Inc. | Stabilizers for composite electroless plating |
| JPS6012434B2 (ja) | 1981-08-21 | 1985-04-01 | 荏原ユ−ジライト株式会社 | 亜鉛−ニツケル合金電気めつき液 |
| US4546423A (en) | 1982-02-23 | 1985-10-08 | Tokyo Shibaura Denki Kabushiki Kaisha | Multiple inverters with overcurrent and shoot-through protection |
| SU1468980A1 (ru) * | 1987-04-23 | 1989-03-30 | Минский радиотехнический институт | Электролит дл осаждени покрытий сплавом олово-никель |
| US5788822A (en) * | 1996-05-15 | 1998-08-04 | Elf Atochem North America, Inc. | High current density semi-bright and bright zinc sulfur-acid salt electrogalvanizing process and composition |
| JP3687722B2 (ja) | 1999-01-12 | 2005-08-24 | 上村工業株式会社 | 無電解複合めっき液及び無電解複合めっき方法 |
| US6306275B1 (en) * | 2000-03-31 | 2001-10-23 | Lacks Enterprises, Inc. | Method for controlling organic micelle size in nickel-plating solution |
-
2002
- 2002-05-23 DE DE10222962A patent/DE10222962A1/de not_active Ceased
-
2003
- 2003-05-15 EP EP03730051A patent/EP1513967B1/en not_active Expired - Lifetime
- 2003-05-15 JP JP2004507574A patent/JP4382656B2/ja not_active Expired - Lifetime
- 2003-05-15 CA CA2484534A patent/CA2484534C/en not_active Expired - Lifetime
- 2003-05-15 US US10/515,412 patent/US7361262B2/en not_active Expired - Lifetime
- 2003-05-15 KR KR1020047018940A patent/KR100977435B1/ko not_active Expired - Lifetime
- 2003-05-15 MX MXPA04011604A patent/MXPA04011604A/es active IP Right Grant
- 2003-05-15 DE DE60328188T patent/DE60328188D1/de not_active Expired - Lifetime
- 2003-05-15 AU AU2003240657A patent/AU2003240657A1/en not_active Abandoned
- 2003-05-15 RU RU2004137798/02A patent/RU2311497C2/ru active
- 2003-05-15 AT AT03730051T patent/ATE435317T1/de not_active IP Right Cessation
- 2003-05-15 CN CN038117312A patent/CN1656255B/zh not_active Expired - Lifetime
- 2003-05-15 ES ES03730051T patent/ES2326266T3/es not_active Expired - Lifetime
- 2003-05-15 WO PCT/EP2003/005134 patent/WO2003100137A2/en not_active Ceased
- 2003-05-15 BR BRPI0311213-6A patent/BR0311213B1/pt active IP Right Grant
- 2003-05-22 MY MYPI20031899A patent/MY140082A/en unknown
- 2003-05-23 TW TW092114025A patent/TWI298089B/zh not_active IP Right Cessation
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1621085A1 (de) * | 1967-05-16 | 1971-03-11 | Henkel & Cie Gmbh | Saures galvanisches Bad zur Erzeugung satinglaenzender Nickelniederschlaege |
| DE2134457C2 (de) * | 1970-07-17 | 1982-06-03 | M & T Chemicals Inc., New York, N.Y. | Wäßriges galvanisches Bad für die Abscheidung von Nickel und/oder Kobalt |
| DE2327881A1 (de) * | 1973-06-01 | 1975-01-02 | Langbein Pfanhauser Werke Ag | Verfahren zur erzeugung mattglaenzender nickel-niederschlaege oder nickel/kobaltniederschlaege auf metalloberflaechen |
| DE2522130B1 (de) * | 1975-05-17 | 1976-10-28 | Blasberg Gmbh & Co Kg Friedr | Saures galvanisches nickel-, nickel- kobalt- odernickel-eisen-bad zum abscheiden seidenmatter schichten |
| DE3736171A1 (de) * | 1987-10-26 | 1989-05-03 | Collardin Gmbh Gerhard | Verbessertes verfahren zur abscheidung satinglaenzender nickelniederschlaege |
| DE19540011A1 (de) * | 1995-10-27 | 1997-04-30 | Lpw Chemie Gmbh | Verfahren zur galvanischen Abscheidung von blendfreien Nickelniederschlägen |
| DE10025552C1 (de) * | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
Non-Patent Citations (1)
| Title |
|---|
| Pat. Abstr. of Japan, Abstract zu JP 56-152988 A * |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200400282A (en) | 2004-01-01 |
| AU2003240657A1 (en) | 2003-12-12 |
| TWI298089B (en) | 2008-06-21 |
| MXPA04011604A (es) | 2005-03-07 |
| WO2003100137A2 (en) | 2003-12-04 |
| RU2004137798A (ru) | 2005-10-10 |
| WO2003100137A3 (en) | 2005-01-20 |
| JP2006508238A (ja) | 2006-03-09 |
| CN1656255A (zh) | 2005-08-17 |
| ES2326266T3 (es) | 2009-10-06 |
| JP4382656B2 (ja) | 2009-12-16 |
| CA2484534A1 (en) | 2003-12-04 |
| RU2311497C2 (ru) | 2007-11-27 |
| ATE435317T1 (de) | 2009-07-15 |
| AU2003240657A8 (en) | 2003-12-12 |
| KR100977435B1 (ko) | 2010-08-24 |
| US7361262B2 (en) | 2008-04-22 |
| BR0311213B1 (pt) | 2012-08-21 |
| CN1656255B (zh) | 2010-06-16 |
| EP1513967A2 (en) | 2005-03-16 |
| CA2484534C (en) | 2011-09-27 |
| KR20050012749A (ko) | 2005-02-02 |
| US20050150774A1 (en) | 2005-07-14 |
| MY140082A (en) | 2009-11-30 |
| EP1513967B1 (en) | 2009-07-01 |
| BR0311213A (pt) | 2007-04-27 |
| DE60328188D1 (de) | 2009-08-13 |
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