TWI298089B - Acid plating bath and method for the electrolytic deposition of satin nickel deposits - Google Patents
Acid plating bath and method for the electrolytic deposition of satin nickel deposits Download PDFInfo
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- TWI298089B TWI298089B TW092114025A TW92114025A TWI298089B TW I298089 B TWI298089 B TW I298089B TW 092114025 A TW092114025 A TW 092114025A TW 92114025 A TW92114025 A TW 92114025A TW I298089 B TWI298089 B TW I298089B
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- Prior art keywords
- group
- plating bath
- acid
- polyether
- hydrogen
- Prior art date
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- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 94
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 46
- 239000002253 acid Substances 0.000 title claims abstract description 26
- 238000007747 plating Methods 0.000 title claims abstract description 24
- 238000000034 method Methods 0.000 title claims description 28
- 230000008021 deposition Effects 0.000 title abstract description 8
- 229920000570 polyether Polymers 0.000 claims abstract description 36
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 30
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 27
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 11
- 239000000080 wetting agent Substances 0.000 claims abstract description 9
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 22
- -1 polyethylene Polymers 0.000 claims description 18
- 238000009713 electroplating Methods 0.000 claims description 16
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 15
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 150000003856 quaternary ammonium compounds Chemical class 0.000 claims description 14
- 150000001875 compounds Chemical class 0.000 claims description 12
- 238000000151 deposition Methods 0.000 claims description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 10
- 229920001577 copolymer Polymers 0.000 claims description 9
- 229920000642 polymer Polymers 0.000 claims description 9
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 150000002500 ions Chemical class 0.000 claims description 8
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 claims description 7
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 7
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 claims description 7
- 229920001515 polyalkylene glycol Polymers 0.000 claims description 7
- 229920001223 polyethylene glycol Polymers 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 7
- 239000002202 Polyethylene glycol Substances 0.000 claims description 6
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 claims description 6
- 125000002091 cationic group Chemical group 0.000 claims description 6
- 229920001451 polypropylene glycol Polymers 0.000 claims description 6
- 239000004698 Polyethylene Substances 0.000 claims description 5
- 150000002148 esters Chemical class 0.000 claims description 5
- 229920000573 polyethylene Polymers 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 4
- 229920001400 block copolymer Polymers 0.000 claims description 4
- 239000003906 humectant Substances 0.000 claims description 4
- BGHCVCJVXZWKCC-UHFFFAOYSA-N tetradecane Chemical compound CCCCCCCCCCCCCC BGHCVCJVXZWKCC-UHFFFAOYSA-N 0.000 claims description 4
- SZSAPIBCGOJGHD-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6-tridecafluoro-6-(1,1,2,2,3,3,4,4,5,5,6,6,6-tridecafluorohexoxy)hexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SZSAPIBCGOJGHD-UHFFFAOYSA-N 0.000 claims description 3
- SNGREZUHAYWORS-UHFFFAOYSA-M 2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-pentadecafluorooctanoate Chemical compound [O-]C(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-M 0.000 claims description 3
- 239000004743 Polypropylene Substances 0.000 claims description 3
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 229920001155 polypropylene Polymers 0.000 claims description 3
- 239000004593 Epoxy Substances 0.000 claims description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 125000005007 perfluorooctyl group Chemical group FC(C(C(C(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)F)(F)* 0.000 claims description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-L succinate(2-) Chemical compound [O-]C(=O)CCC([O-])=O KDYFGRWQOYBRFD-UHFFFAOYSA-L 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims 6
- FAVWNIYSNODYCW-UHFFFAOYSA-N 2,2,3,3,4,4,5-heptamethylundecane Chemical compound CCCCCCC(C)C(C)(C)C(C)(C)C(C)(C)C FAVWNIYSNODYCW-UHFFFAOYSA-N 0.000 claims 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims 2
- WDZLGCSJJWEQJO-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,6-tridecafluorohexane-1-sulfonamide Chemical compound NS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F WDZLGCSJJWEQJO-UHFFFAOYSA-N 0.000 claims 1
- JPEWDCTZJFUITH-UHFFFAOYSA-N 1-methoxydecane Chemical compound CCCCCCCCCCOC JPEWDCTZJFUITH-UHFFFAOYSA-N 0.000 claims 1
- PQXKWPLDPFFDJP-UHFFFAOYSA-N 2,3-dimethyloxirane Chemical compound CC1OC1C PQXKWPLDPFFDJP-UHFFFAOYSA-N 0.000 claims 1
- QEOYFXGZVHAOLO-UHFFFAOYSA-N FC(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(C(C(C(N(N(F)F)F)(F)F)(F)F)(F)F)F Chemical compound FC(C(C(C(C(F)(F)F)(F)F)(F)F)(F)F)(C(C(C(N(N(F)F)F)(F)F)(F)F)(F)F)F QEOYFXGZVHAOLO-UHFFFAOYSA-N 0.000 claims 1
- GOMZSHRUUMYEMM-UHFFFAOYSA-N N,N,1,1,2,2,3,3,4,4,4-undecafluorobutane-1-sulfonamide Chemical compound C(C(C(F)(F)S(=O)(=O)N(F)F)(F)F)(C(F)(F)F)(F)F GOMZSHRUUMYEMM-UHFFFAOYSA-N 0.000 claims 1
- PHHLZLAIQAUKFT-UHFFFAOYSA-N OS(=O)(=O)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F Chemical compound OS(=O)(=O)OC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F PHHLZLAIQAUKFT-UHFFFAOYSA-N 0.000 claims 1
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims 1
- 239000005864 Sulphur Substances 0.000 claims 1
- 238000007334 copolymerization reaction Methods 0.000 claims 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- 229910021653 sulphate ion Inorganic materials 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 10
- 238000001914 filtration Methods 0.000 abstract description 6
- 238000001816 cooling Methods 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 150000003868 ammonium compounds Chemical class 0.000 abstract description 3
- 230000035945 sensitivity Effects 0.000 abstract description 2
- 239000003792 electrolyte Substances 0.000 description 40
- 230000000694 effects Effects 0.000 description 12
- 239000010949 copper Substances 0.000 description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 10
- 238000005242 forging Methods 0.000 description 8
- 239000000203 mixture Substances 0.000 description 7
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 6
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 6
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 4
- 150000001721 carbon Chemical group 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 230000001788 irregular Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
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- 125000003827 glycol group Chemical group 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910001453 nickel ion Inorganic materials 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 3
- 229940081974 saccharin Drugs 0.000 description 3
- 235000019204 saccharin Nutrition 0.000 description 3
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 3
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- 239000004332 silver Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
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- GSOLWAFGMNOBSY-UHFFFAOYSA-N cobalt Chemical compound [Co][Co][Co][Co][Co][Co][Co][Co] GSOLWAFGMNOBSY-UHFFFAOYSA-N 0.000 description 2
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- 239000010439 graphite Substances 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000002934 lysing effect Effects 0.000 description 1
- OFXSXYCSPVKZPF-UHFFFAOYSA-N methoxyperoxymethane Chemical compound COOOC OFXSXYCSPVKZPF-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 150000002891 organic anions Chemical class 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920000151 polyglycol Polymers 0.000 description 1
- 239000010695 polyglycol Substances 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 159000000001 potassium salts Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical compound CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- APSBXTVYXVQYAB-UHFFFAOYSA-M sodium docusate Chemical compound [Na+].CCCCC(CC)COC(=O)CC(S([O-])(=O)=O)C(=O)OCC(CC)CCCC APSBXTVYXVQYAB-UHFFFAOYSA-M 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 229940075554 sorbate Drugs 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 1
- 125000001010 sulfinic acid amide group Chemical group 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000003760 tallow Substances 0.000 description 1
- LMYRWZFENFIFIT-UHFFFAOYSA-N toluene-4-sulfonamide Chemical compound CC1=CC=C(S(N)(=O)=O)C=C1 LMYRWZFENFIFIT-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B35/00—Supplying, feeding, arranging or orientating articles to be packaged
- B65B35/10—Feeding, e.g. conveying, single articles
- B65B35/24—Feeding, e.g. conveying, single articles by endless belts or chains
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10222962A DE10222962A1 (de) | 2002-05-23 | 2002-05-23 | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200400282A TW200400282A (en) | 2004-01-01 |
| TWI298089B true TWI298089B (en) | 2008-06-21 |
Family
ID=29432252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW092114025A TWI298089B (en) | 2002-05-23 | 2003-05-23 | Acid plating bath and method for the electrolytic deposition of satin nickel deposits |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US7361262B2 (enExample) |
| EP (1) | EP1513967B1 (enExample) |
| JP (1) | JP4382656B2 (enExample) |
| KR (1) | KR100977435B1 (enExample) |
| CN (1) | CN1656255B (enExample) |
| AT (1) | ATE435317T1 (enExample) |
| AU (1) | AU2003240657A1 (enExample) |
| BR (1) | BR0311213B1 (enExample) |
| CA (1) | CA2484534C (enExample) |
| DE (2) | DE10222962A1 (enExample) |
| ES (1) | ES2326266T3 (enExample) |
| MX (1) | MXPA04011604A (enExample) |
| MY (1) | MY140082A (enExample) |
| RU (1) | RU2311497C2 (enExample) |
| TW (1) | TWI298089B (enExample) |
| WO (1) | WO2003100137A2 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060096868A1 (en) * | 2004-11-10 | 2006-05-11 | Siona Bunce | Nickel electroplating bath designed to replace monovalent copper strike solutions |
| ATE507327T1 (de) * | 2006-01-06 | 2011-05-15 | Enthone | Elektrolyt und verfahren zur abscheidung einer matten metallschicht |
| ES2615337T3 (es) * | 2008-07-08 | 2017-06-06 | Enthone, Inc. | Electrolito y método para depositar una capa metálica mate |
| US7951600B2 (en) | 2008-11-07 | 2011-05-31 | Xtalic Corporation | Electrodeposition baths, systems and methods |
| CN102289160B (zh) * | 2011-08-24 | 2012-11-21 | 绵阳艾萨斯电子材料有限公司 | 光致蚀刻剂用显影液及其制备方法与应用 |
| JP2013129902A (ja) * | 2011-12-22 | 2013-07-04 | Om Sangyo Kk | めっき品及びその製造方法 |
| US10246778B2 (en) | 2013-08-07 | 2019-04-02 | Macdermid Acumen, Inc. | Electroless nickel plating solution and method |
| CN103484901A (zh) * | 2013-09-27 | 2014-01-01 | 昆山纯柏精密五金有限公司 | 一种五金件的镀镍工艺 |
| RU2583569C1 (ru) * | 2014-12-10 | 2016-05-10 | Федеральное государственное бюджетное учреждение науки Иркутский институт химии им. А.Е. Фаворского Сибирского отделения Российской академии наук | Способ получения блестящих никелевых покрытий |
| JP6410640B2 (ja) * | 2015-03-02 | 2018-10-24 | 株式会社Ｊｃｕ | サテンニッケルめっき浴およびサテンニッケルめっき方法 |
| CN104789997A (zh) * | 2015-04-27 | 2015-07-22 | 南京宁美表面技术有限公司 | 珍珠镍电镀用添加剂、珍珠镍电镀溶液及电镀方法 |
| EP3372709A4 (en) * | 2015-11-06 | 2019-06-19 | JCU Corporation | NICKELING ADDITIVE AND SATIN NICKELING BATH THEREWITH |
| CN105350034B (zh) * | 2015-11-25 | 2017-11-17 | 广东致卓环保科技有限公司 | 珍珠镍电镀添加剂及其应用 |
| CN105603470A (zh) * | 2016-03-31 | 2016-05-25 | 奕东电子(常熟)有限公司 | 一种沙丁镍溶液及其镀镍工艺 |
| JP6774212B2 (ja) * | 2016-04-20 | 2020-10-21 | 株式会社Ｊｃｕ | 多孔質直管状鉄族元素めっき皮膜形成用電気めっき浴およびこれを用いた多孔質直管状鉄族元素めっき皮膜の形成方法 |
| CN109112583B (zh) * | 2018-10-29 | 2019-12-10 | 清远信和汽车部件有限公司 | 一种珍珠镍电镀工艺 |
| CN110714212B (zh) * | 2019-10-12 | 2021-04-30 | 常州大学 | 一种水溶液体系中由氯化镍一步法制备超疏水镍薄膜的方法 |
| CN111850623A (zh) * | 2020-05-08 | 2020-10-30 | 德锡化学(山东)有限公司 | 一种用于获得绒面镍层的电镀液及电镀工艺 |
| US20250137156A1 (en) * | 2023-10-26 | 2025-05-01 | Macdermid Enthone Inc. | Boric acid-free satin nickel |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1621085C3 (de) * | 1967-05-16 | 1980-02-14 | Henkel Kgaa, 4000 Duesseldorf | Saures galvanisches Bad zur Abscheidung satinglanzender Nickelniederschlage |
| US3839165A (en) * | 1967-08-26 | 1974-10-01 | Henkel & Cie Gmbh | Nickel electroplating method |
| US3697391A (en) * | 1970-07-17 | 1972-10-10 | M & T Chemicals Inc | Electroplating processes and compositions |
| DE2327881B2 (de) * | 1973-06-01 | 1978-06-22 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge |
| SU475874A1 (ru) * | 1973-07-24 | 1977-12-05 | Ордена Трудового Красного Знамени Институт Химии И Химической Технологии Ан Литовской Сср | Электролит дл нанесени никелевого покрыти с внедренными инертными частицами |
| JPS5855236B2 (ja) * | 1975-07-17 | 1983-12-08 | ソニー株式会社 | 酸性Ｎｉ電気メッキ浴 |
| JPS56152988A (en) * | 1980-04-30 | 1981-11-26 | Nobuyuki Koura | Nickel satin finish plating bath of heavy ruggedness |
| US6306466B1 (en) | 1981-04-01 | 2001-10-23 | Surface Technology, Inc. | Stabilizers for composite electroless plating |
| JPS6012434B2 (ja) | 1981-08-21 | 1985-04-01 | 荏原ユ−ジライト株式会社 | 亜鉛−ニツケル合金電気めつき液 |
| US4546423A (en) | 1982-02-23 | 1985-10-08 | Tokyo Shibaura Denki Kabushiki Kaisha | Multiple inverters with overcurrent and shoot-through protection |
| SU1468980A1 (ru) * | 1987-04-23 | 1989-03-30 | Минский радиотехнический институт | Электролит дл осаждени покрытий сплавом олово-никель |
| DE3736171A1 (de) * | 1987-10-26 | 1989-05-03 | Collardin Gmbh Gerhard | Verbessertes verfahren zur abscheidung satinglaenzender nickelniederschlaege |
| DE19540011C2 (de) * | 1995-10-27 | 1998-09-10 | Lpw Chemie Gmbh | Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen |
| US5788822A (en) * | 1996-05-15 | 1998-08-04 | Elf Atochem North America, Inc. | High current density semi-bright and bright zinc sulfur-acid salt electrogalvanizing process and composition |
| JP3687722B2 (ja) | 1999-01-12 | 2005-08-24 | 上村工業株式会社 | 無電解複合めっき液及び無電解複合めっき方法 |
| US6306275B1 (en) * | 2000-03-31 | 2001-10-23 | Lacks Enterprises, Inc. | Method for controlling organic micelle size in nickel-plating solution |
| DE10025552C1 (de) * | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
-
2002
- 2002-05-23 DE DE10222962A patent/DE10222962A1/de not_active Ceased
-
2003
- 2003-05-15 EP EP03730051A patent/EP1513967B1/en not_active Expired - Lifetime
- 2003-05-15 JP JP2004507574A patent/JP4382656B2/ja not_active Expired - Lifetime
- 2003-05-15 CA CA2484534A patent/CA2484534C/en not_active Expired - Lifetime
- 2003-05-15 US US10/515,412 patent/US7361262B2/en not_active Expired - Lifetime
- 2003-05-15 KR KR1020047018940A patent/KR100977435B1/ko not_active Expired - Lifetime
- 2003-05-15 MX MXPA04011604A patent/MXPA04011604A/es active IP Right Grant
- 2003-05-15 DE DE60328188T patent/DE60328188D1/de not_active Expired - Lifetime
- 2003-05-15 AU AU2003240657A patent/AU2003240657A1/en not_active Abandoned
- 2003-05-15 RU RU2004137798/02A patent/RU2311497C2/ru active
- 2003-05-15 AT AT03730051T patent/ATE435317T1/de not_active IP Right Cessation
- 2003-05-15 CN CN038117312A patent/CN1656255B/zh not_active Expired - Lifetime
- 2003-05-15 ES ES03730051T patent/ES2326266T3/es not_active Expired - Lifetime
- 2003-05-15 WO PCT/EP2003/005134 patent/WO2003100137A2/en not_active Ceased
- 2003-05-15 BR BRPI0311213-6A patent/BR0311213B1/pt active IP Right Grant
- 2003-05-22 MY MYPI20031899A patent/MY140082A/en unknown
- 2003-05-23 TW TW092114025A patent/TWI298089B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW200400282A (en) | 2004-01-01 |
| AU2003240657A1 (en) | 2003-12-12 |
| MXPA04011604A (es) | 2005-03-07 |
| WO2003100137A2 (en) | 2003-12-04 |
| RU2004137798A (ru) | 2005-10-10 |
| WO2003100137A3 (en) | 2005-01-20 |
| JP2006508238A (ja) | 2006-03-09 |
| CN1656255A (zh) | 2005-08-17 |
| ES2326266T3 (es) | 2009-10-06 |
| JP4382656B2 (ja) | 2009-12-16 |
| DE10222962A1 (de) | 2003-12-11 |
| CA2484534A1 (en) | 2003-12-04 |
| RU2311497C2 (ru) | 2007-11-27 |
| ATE435317T1 (de) | 2009-07-15 |
| AU2003240657A8 (en) | 2003-12-12 |
| KR100977435B1 (ko) | 2010-08-24 |
| US7361262B2 (en) | 2008-04-22 |
| BR0311213B1 (pt) | 2012-08-21 |
| CN1656255B (zh) | 2010-06-16 |
| EP1513967A2 (en) | 2005-03-16 |
| CA2484534C (en) | 2011-09-27 |
| KR20050012749A (ko) | 2005-02-02 |
| US20050150774A1 (en) | 2005-07-14 |
| MY140082A (en) | 2009-11-30 |
| EP1513967B1 (en) | 2009-07-01 |
| BR0311213A (pt) | 2007-04-27 |
| DE60328188D1 (de) | 2009-08-13 |
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Legal Events
| Date | Code | Title | Description |
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| MK4A | Expiration of patent term of an invention patent |