JP4382656B2 - 酸めっき浴およびサテンニッケル皮膜の電解析出法 - Google Patents
酸めっき浴およびサテンニッケル皮膜の電解析出法 Download PDFInfo
- Publication number
- JP4382656B2 JP4382656B2 JP2004507574A JP2004507574A JP4382656B2 JP 4382656 B2 JP4382656 B2 JP 4382656B2 JP 2004507574 A JP2004507574 A JP 2004507574A JP 2004507574 A JP2004507574 A JP 2004507574A JP 4382656 B2 JP4382656 B2 JP 4382656B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- plating bath
- acid plating
- integer
- polyether
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims abstract description 133
- 229910052759 nickel Inorganic materials 0.000 title claims abstract description 66
- 238000007747 plating Methods 0.000 title claims abstract description 31
- 239000002253 acid Substances 0.000 title claims abstract description 25
- 238000000576 coating method Methods 0.000 title description 29
- 239000011248 coating agent Substances 0.000 title description 26
- 238000004070 electrodeposition Methods 0.000 title 1
- 229920000570 polyether Polymers 0.000 claims abstract description 34
- 239000004721 Polyphenylene oxide Substances 0.000 claims abstract description 26
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 26
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 10
- 238000000151 deposition Methods 0.000 claims description 18
- 238000000034 method Methods 0.000 claims description 16
- 150000001875 compounds Chemical class 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 150000003856 quaternary ammonium compounds Chemical group 0.000 claims description 14
- -1 Polyethylene Polymers 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 12
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 10
- 229920001515 polyalkylene glycol Polymers 0.000 claims description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 239000000758 substrate Substances 0.000 claims description 5
- 150000002431 hydrogen Chemical class 0.000 claims description 4
- 125000006702 (C1-C18) alkyl group Chemical group 0.000 claims description 3
- 229920001400 block copolymer Polymers 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 229920000642 polymer Polymers 0.000 claims description 3
- 239000002202 Polyethylene glycol Substances 0.000 claims description 2
- 229920001223 polyethylene glycol Polymers 0.000 claims description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 8
- 125000004432 carbon atom Chemical group C* 0.000 claims 5
- 239000004698 Polyethylene Substances 0.000 claims 1
- 239000004743 Polypropylene Substances 0.000 claims 1
- 229910001429 cobalt ion Inorganic materials 0.000 claims 1
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims 1
- PXRMLPZQBFWPCV-UHFFFAOYSA-N dioxasilirane Chemical compound O1O[SiH2]1 PXRMLPZQBFWPCV-UHFFFAOYSA-N 0.000 claims 1
- 229920000573 polyethylene Polymers 0.000 claims 1
- 229920001155 polypropylene Polymers 0.000 claims 1
- 229920001451 polypropylene glycol Polymers 0.000 claims 1
- 150000003459 sulfonic acid esters Chemical class 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract description 15
- 239000000080 wetting agent Substances 0.000 abstract description 13
- 230000008021 deposition Effects 0.000 abstract description 11
- 238000001914 filtration Methods 0.000 abstract description 7
- 238000001816 cooling Methods 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 230000035945 sensitivity Effects 0.000 abstract description 3
- 150000003868 ammonium compounds Chemical class 0.000 abstract description 2
- 239000003792 electrolyte Substances 0.000 description 30
- 230000000694 effects Effects 0.000 description 14
- 150000002148 esters Chemical class 0.000 description 7
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 6
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical compound OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 6
- 125000003827 glycol group Chemical group 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 239000008151 electrolyte solution Substances 0.000 description 5
- 238000009713 electroplating Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- 241000080590 Niso Species 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 150000001721 carbon Chemical group 0.000 description 3
- 125000002091 cationic group Chemical group 0.000 description 3
- 229910017052 cobalt Inorganic materials 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 239000000839 emulsion Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 150000002815 nickel Chemical class 0.000 description 3
- 229910001453 nickel ion Inorganic materials 0.000 description 3
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 3
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 3
- 239000011236 particulate material Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000004094 surface-active agent Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical group [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000008055 alkyl aryl sulfonates Chemical class 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 2
- 229940081974 saccharin Drugs 0.000 description 2
- 235000019204 saccharin Nutrition 0.000 description 2
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 0 CCC(C)(*)C(F)(F)F Chemical compound CCC(C)(*)C(F)(F)F 0.000 description 1
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 description 1
- 241000737241 Cocos Species 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-M Formate Chemical compound [O-]C=O BDAGIHXWWSANSR-UHFFFAOYSA-M 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000005909 Kieselgur Substances 0.000 description 1
- OHQPGFAOUPSZMY-UHFFFAOYSA-N S1(=O)(=O)NC(=O)C2=CC=CC=C12.[SH2]=N.C(C1=CC=CC=C1)(=O)O Chemical compound S1(=O)(=O)NC(=O)C2=CC=CC=C12.[SH2]=N.C(C1=CC=CC=C1)(=O)O OHQPGFAOUPSZMY-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- WRUAHXANJKHFIL-UHFFFAOYSA-N benzene-1,3-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC(S(O)(=O)=O)=C1 WRUAHXANJKHFIL-UHFFFAOYSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 159000000007 calcium salts Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000012377 drug delivery Methods 0.000 description 1
- 238000011043 electrofiltration Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 150000002462 imidazolines Chemical class 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000002198 insoluble material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002891 organic anions Chemical class 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229940083254 peripheral vasodilators imidazoline derivative Drugs 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- KNXVOGGZOFOROK-UHFFFAOYSA-N trimagnesium;dioxido(oxo)silane;hydroxy-oxido-oxosilane Chemical compound [Mg+2].[Mg+2].[Mg+2].O[Si]([O-])=O.O[Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O KNXVOGGZOFOROK-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65B—MACHINES, APPARATUS OR DEVICES FOR, OR METHODS OF, PACKAGING ARTICLES OR MATERIALS; UNPACKING
- B65B35/00—Supplying, feeding, arranging or orientating articles to be packaged
- B65B35/10—Feeding, e.g. conveying, single articles
- B65B35/24—Feeding, e.g. conveying, single articles by endless belts or chains
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electrolytic Production Of Metals (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10222962A DE10222962A1 (de) | 2002-05-23 | 2002-05-23 | Saurer galvanischer Badelektrolyt und Verfahren zur elektrolytischen Abscheidung satinglänzender Nickelniederschläge |
| PCT/EP2003/005134 WO2003100137A2 (en) | 2002-05-23 | 2003-05-15 | Acid plating bath and method for the electolytic deposition of satin nickel deposits |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006508238A JP2006508238A (ja) | 2006-03-09 |
| JP2006508238A5 JP2006508238A5 (enExample) | 2006-06-08 |
| JP4382656B2 true JP4382656B2 (ja) | 2009-12-16 |
Family
ID=29432252
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004507574A Expired - Lifetime JP4382656B2 (ja) | 2002-05-23 | 2003-05-15 | 酸めっき浴およびサテンニッケル皮膜の電解析出法 |
Country Status (16)
| Country | Link |
|---|---|
| US (1) | US7361262B2 (enExample) |
| EP (1) | EP1513967B1 (enExample) |
| JP (1) | JP4382656B2 (enExample) |
| KR (1) | KR100977435B1 (enExample) |
| CN (1) | CN1656255B (enExample) |
| AT (1) | ATE435317T1 (enExample) |
| AU (1) | AU2003240657A1 (enExample) |
| BR (1) | BR0311213B1 (enExample) |
| CA (1) | CA2484534C (enExample) |
| DE (2) | DE10222962A1 (enExample) |
| ES (1) | ES2326266T3 (enExample) |
| MX (1) | MXPA04011604A (enExample) |
| MY (1) | MY140082A (enExample) |
| RU (1) | RU2311497C2 (enExample) |
| TW (1) | TWI298089B (enExample) |
| WO (1) | WO2003100137A2 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060096868A1 (en) * | 2004-11-10 | 2006-05-11 | Siona Bunce | Nickel electroplating bath designed to replace monovalent copper strike solutions |
| ATE507327T1 (de) * | 2006-01-06 | 2011-05-15 | Enthone | Elektrolyt und verfahren zur abscheidung einer matten metallschicht |
| ES2615337T3 (es) * | 2008-07-08 | 2017-06-06 | Enthone, Inc. | Electrolito y método para depositar una capa metálica mate |
| US7951600B2 (en) | 2008-11-07 | 2011-05-31 | Xtalic Corporation | Electrodeposition baths, systems and methods |
| CN102289160B (zh) * | 2011-08-24 | 2012-11-21 | 绵阳艾萨斯电子材料有限公司 | 光致蚀刻剂用显影液及其制备方法与应用 |
| JP2013129902A (ja) * | 2011-12-22 | 2013-07-04 | Om Sangyo Kk | めっき品及びその製造方法 |
| US10246778B2 (en) | 2013-08-07 | 2019-04-02 | Macdermid Acumen, Inc. | Electroless nickel plating solution and method |
| CN103484901A (zh) * | 2013-09-27 | 2014-01-01 | 昆山纯柏精密五金有限公司 | 一种五金件的镀镍工艺 |
| RU2583569C1 (ru) * | 2014-12-10 | 2016-05-10 | Федеральное государственное бюджетное учреждение науки Иркутский институт химии им. А.Е. Фаворского Сибирского отделения Российской академии наук | Способ получения блестящих никелевых покрытий |
| JP6410640B2 (ja) * | 2015-03-02 | 2018-10-24 | 株式会社Ｊｃｕ | サテンニッケルめっき浴およびサテンニッケルめっき方法 |
| CN104789997A (zh) * | 2015-04-27 | 2015-07-22 | 南京宁美表面技术有限公司 | 珍珠镍电镀用添加剂、珍珠镍电镀溶液及电镀方法 |
| EP3372709A4 (en) * | 2015-11-06 | 2019-06-19 | JCU Corporation | NICKELING ADDITIVE AND SATIN NICKELING BATH THEREWITH |
| CN105350034B (zh) * | 2015-11-25 | 2017-11-17 | 广东致卓环保科技有限公司 | 珍珠镍电镀添加剂及其应用 |
| CN105603470A (zh) * | 2016-03-31 | 2016-05-25 | 奕东电子(常熟)有限公司 | 一种沙丁镍溶液及其镀镍工艺 |
| JP6774212B2 (ja) * | 2016-04-20 | 2020-10-21 | 株式会社Ｊｃｕ | 多孔質直管状鉄族元素めっき皮膜形成用電気めっき浴およびこれを用いた多孔質直管状鉄族元素めっき皮膜の形成方法 |
| CN109112583B (zh) * | 2018-10-29 | 2019-12-10 | 清远信和汽车部件有限公司 | 一种珍珠镍电镀工艺 |
| CN110714212B (zh) * | 2019-10-12 | 2021-04-30 | 常州大学 | 一种水溶液体系中由氯化镍一步法制备超疏水镍薄膜的方法 |
| CN111850623A (zh) * | 2020-05-08 | 2020-10-30 | 德锡化学(山东)有限公司 | 一种用于获得绒面镍层的电镀液及电镀工艺 |
| US20250137156A1 (en) * | 2023-10-26 | 2025-05-01 | Macdermid Enthone Inc. | Boric acid-free satin nickel |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE1621085C3 (de) * | 1967-05-16 | 1980-02-14 | Henkel Kgaa, 4000 Duesseldorf | Saures galvanisches Bad zur Abscheidung satinglanzender Nickelniederschlage |
| US3839165A (en) * | 1967-08-26 | 1974-10-01 | Henkel & Cie Gmbh | Nickel electroplating method |
| US3697391A (en) * | 1970-07-17 | 1972-10-10 | M & T Chemicals Inc | Electroplating processes and compositions |
| DE2327881B2 (de) * | 1973-06-01 | 1978-06-22 | Langbein-Pfanhauser Werke Ag, 4040 Neuss | Verfahren zur galvanischen Abscheidung mattglänzender Nickel- bzw. Nickel/Kobalt-Niederschläge |
| SU475874A1 (ru) * | 1973-07-24 | 1977-12-05 | Ордена Трудового Красного Знамени Институт Химии И Химической Технологии Ан Литовской Сср | Электролит дл нанесени никелевого покрыти с внедренными инертными частицами |
| JPS5855236B2 (ja) * | 1975-07-17 | 1983-12-08 | ソニー株式会社 | 酸性Ｎｉ電気メッキ浴 |
| JPS56152988A (en) * | 1980-04-30 | 1981-11-26 | Nobuyuki Koura | Nickel satin finish plating bath of heavy ruggedness |
| US6306466B1 (en) | 1981-04-01 | 2001-10-23 | Surface Technology, Inc. | Stabilizers for composite electroless plating |
| JPS6012434B2 (ja) | 1981-08-21 | 1985-04-01 | 荏原ユ−ジライト株式会社 | 亜鉛−ニツケル合金電気めつき液 |
| US4546423A (en) | 1982-02-23 | 1985-10-08 | Tokyo Shibaura Denki Kabushiki Kaisha | Multiple inverters with overcurrent and shoot-through protection |
| SU1468980A1 (ru) * | 1987-04-23 | 1989-03-30 | Минский радиотехнический институт | Электролит дл осаждени покрытий сплавом олово-никель |
| DE3736171A1 (de) * | 1987-10-26 | 1989-05-03 | Collardin Gmbh Gerhard | Verbessertes verfahren zur abscheidung satinglaenzender nickelniederschlaege |
| DE19540011C2 (de) * | 1995-10-27 | 1998-09-10 | Lpw Chemie Gmbh | Verfahren zur galvanischen Abscheidung von blendfreien Nickel- oder Nickellegierungsniederschlägen |
| US5788822A (en) * | 1996-05-15 | 1998-08-04 | Elf Atochem North America, Inc. | High current density semi-bright and bright zinc sulfur-acid salt electrogalvanizing process and composition |
| JP3687722B2 (ja) | 1999-01-12 | 2005-08-24 | 上村工業株式会社 | 無電解複合めっき液及び無電解複合めっき方法 |
| US6306275B1 (en) * | 2000-03-31 | 2001-10-23 | Lacks Enterprises, Inc. | Method for controlling organic micelle size in nickel-plating solution |
| DE10025552C1 (de) * | 2000-05-19 | 2001-08-02 | Atotech Deutschland Gmbh | Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges |
-
2002
- 2002-05-23 DE DE10222962A patent/DE10222962A1/de not_active Ceased
-
2003
- 2003-05-15 EP EP03730051A patent/EP1513967B1/en not_active Expired - Lifetime
- 2003-05-15 JP JP2004507574A patent/JP4382656B2/ja not_active Expired - Lifetime
- 2003-05-15 CA CA2484534A patent/CA2484534C/en not_active Expired - Lifetime
- 2003-05-15 US US10/515,412 patent/US7361262B2/en not_active Expired - Lifetime
- 2003-05-15 KR KR1020047018940A patent/KR100977435B1/ko not_active Expired - Lifetime
- 2003-05-15 MX MXPA04011604A patent/MXPA04011604A/es active IP Right Grant
- 2003-05-15 DE DE60328188T patent/DE60328188D1/de not_active Expired - Lifetime
- 2003-05-15 AU AU2003240657A patent/AU2003240657A1/en not_active Abandoned
- 2003-05-15 RU RU2004137798/02A patent/RU2311497C2/ru active
- 2003-05-15 AT AT03730051T patent/ATE435317T1/de not_active IP Right Cessation
- 2003-05-15 CN CN038117312A patent/CN1656255B/zh not_active Expired - Lifetime
- 2003-05-15 ES ES03730051T patent/ES2326266T3/es not_active Expired - Lifetime
- 2003-05-15 WO PCT/EP2003/005134 patent/WO2003100137A2/en not_active Ceased
- 2003-05-15 BR BRPI0311213-6A patent/BR0311213B1/pt active IP Right Grant
- 2003-05-22 MY MYPI20031899A patent/MY140082A/en unknown
- 2003-05-23 TW TW092114025A patent/TWI298089B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW200400282A (en) | 2004-01-01 |
| AU2003240657A1 (en) | 2003-12-12 |
| TWI298089B (en) | 2008-06-21 |
| MXPA04011604A (es) | 2005-03-07 |
| WO2003100137A2 (en) | 2003-12-04 |
| RU2004137798A (ru) | 2005-10-10 |
| WO2003100137A3 (en) | 2005-01-20 |
| JP2006508238A (ja) | 2006-03-09 |
| CN1656255A (zh) | 2005-08-17 |
| ES2326266T3 (es) | 2009-10-06 |
| DE10222962A1 (de) | 2003-12-11 |
| CA2484534A1 (en) | 2003-12-04 |
| RU2311497C2 (ru) | 2007-11-27 |
| ATE435317T1 (de) | 2009-07-15 |
| AU2003240657A8 (en) | 2003-12-12 |
| KR100977435B1 (ko) | 2010-08-24 |
| US7361262B2 (en) | 2008-04-22 |
| BR0311213B1 (pt) | 2012-08-21 |
| CN1656255B (zh) | 2010-06-16 |
| EP1513967A2 (en) | 2005-03-16 |
| CA2484534C (en) | 2011-09-27 |
| KR20050012749A (ko) | 2005-02-02 |
| US20050150774A1 (en) | 2005-07-14 |
| MY140082A (en) | 2009-11-30 |
| EP1513967B1 (en) | 2009-07-01 |
| BR0311213A (pt) | 2007-04-27 |
| DE60328188D1 (de) | 2009-08-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP4382656B2 (ja) | 酸めっき浴およびサテンニッケル皮膜の電解析出法 | |
| JP5048003B2 (ja) | スズめっき | |
| US20120298519A1 (en) | Electrolyte and process for depositing a matt metal layer | |
| CA1104152A (en) | Nitrogen and sulfur compositions and acid copper plating baths | |
| KR900005845B1 (ko) | 아연-닉켈 합금 전착용 전해액 및 그의 전착방법 | |
| JP6836016B2 (ja) | 電解銅析出用のめっき組成物、その使用、および基材の少なくとも１つの表面上に銅層または銅合金層を電解析出させる方法 | |
| US6919014B2 (en) | Satin-finished nickel or nickel alloy coating | |
| JPS60169588A (ja) | 亜鉛用または亜鉛合金用酸性電着浴 | |
| JPH08246184A (ja) | 高電流密度硫酸亜鉛電気亜鉛メッキ方法及び組成物 | |
| JPH08260182A (ja) | 高電流密度塩化亜鉛電気亜鉛メッキ方法及び組成物 | |
| JPH07157890A (ja) | 酸性銅めっき浴及びこれを使用するめっき方法 | |
| US11555252B2 (en) | Satin copper bath and method of depositing a satin copper layer | |
| CN101874128B (zh) | 铜-锌合金电镀浴及使用其的镀敷方法 | |
| JPS5841357B2 (ja) | エトキシル化／プロポキシル化多価アルコ−ルを使用した酸性亜鉛めっき溶液およびメッキ法 | |
| HK1051223B (en) | Satin-finished nickel or nickel alloy coating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060413 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060413 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20081027 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090428 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090722 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090825 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090917 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20121002 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4382656 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131002 Year of fee payment: 4 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| EXPY | Cancellation because of completion of term |