EP1918426A1 - Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten - Google Patents
Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten Download PDFInfo
- Publication number
- EP1918426A1 EP1918426A1 EP06021174A EP06021174A EP1918426A1 EP 1918426 A1 EP1918426 A1 EP 1918426A1 EP 06021174 A EP06021174 A EP 06021174A EP 06021174 A EP06021174 A EP 06021174A EP 1918426 A1 EP1918426 A1 EP 1918426A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- silver
- electrolyte composition
- sulfonic acid
- composition according
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 55
- 239000003792 electrolyte Substances 0.000 title claims abstract description 54
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 23
- 239000004332 silver Substances 0.000 title claims abstract description 23
- 239000000758 substrate Substances 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims abstract description 9
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 title description 3
- 229910045601 alloy Inorganic materials 0.000 title description 2
- 239000000956 alloy Substances 0.000 title description 2
- 238000007747 plating Methods 0.000 title 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 22
- 229910001316 Ag alloy Inorganic materials 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 16
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims abstract description 10
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 claims abstract description 9
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229940091173 hydantoin Drugs 0.000 claims abstract description 6
- 239000000080 wetting agent Substances 0.000 claims abstract description 6
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 claims description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 4
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 2
- 229910001923 silver oxide Inorganic materials 0.000 claims description 2
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 claims description 2
- 229910000367 silver sulfate Inorganic materials 0.000 claims description 2
- 150000003458 sulfonic acid derivatives Chemical class 0.000 claims 1
- 125000000542 sulfonic acid group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 description 8
- 230000000536 complexating effect Effects 0.000 description 4
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 3
- YIROYDNZEPTFOL-UHFFFAOYSA-N 5,5-Dimethylhydantoin Chemical compound CC1(C)NC(=O)NC1=O YIROYDNZEPTFOL-UHFFFAOYSA-N 0.000 description 3
- 239000008139 complexing agent Substances 0.000 description 3
- 229910000510 noble metal Inorganic materials 0.000 description 3
- XWIJIXWOZCRYEL-UHFFFAOYSA-M potassium;methanesulfonate Chemical compound [K+].CS([O-])(=O)=O XWIJIXWOZCRYEL-UHFFFAOYSA-M 0.000 description 3
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 2
- RHYBFKMFHLPQPH-UHFFFAOYSA-N N-methylhydantoin Chemical compound CN1CC(=O)NC1=O RHYBFKMFHLPQPH-UHFFFAOYSA-N 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 238000005275 alloying Methods 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- -1 for example Chemical class 0.000 description 2
- NVVZQXQBYZPMLJ-UHFFFAOYSA-N formaldehyde;naphthalene-1-sulfonic acid Chemical compound O=C.C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 NVVZQXQBYZPMLJ-UHFFFAOYSA-N 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 102000004169 proteins and genes Human genes 0.000 description 2
- 108090000623 proteins and genes Proteins 0.000 description 2
- QFYXSLAAXZTRLG-UHFFFAOYSA-N pyrrolidine-2,3-dione Chemical class O=C1CCNC1=O QFYXSLAAXZTRLG-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 150000003378 silver Chemical class 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 150000003460 sulfonic acids Chemical class 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- RFTORHYUCZJHDO-UHFFFAOYSA-N 1,3-dimethylimidazolidine-2,4-dione Chemical compound CN1CC(=O)N(C)C1=O RFTORHYUCZJHDO-UHFFFAOYSA-N 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- RYKLZUPYJFFNRR-UHFFFAOYSA-N 3-hydroxypiperidin-2-one Chemical compound OC1CCCNC1=O RYKLZUPYJFFNRR-UHFFFAOYSA-N 0.000 description 1
- KFIRODWJCYBBHY-UHFFFAOYSA-N 3-nitrophthalic acid Chemical compound OC(=O)C1=CC=CC([N+]([O-])=O)=C1C(O)=O KFIRODWJCYBBHY-UHFFFAOYSA-N 0.000 description 1
- SLBQXWXKPNIVSQ-UHFFFAOYSA-N 4-nitrophthalic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1C(O)=O SLBQXWXKPNIVSQ-UHFFFAOYSA-N 0.000 description 1
- ONMOULMPIIOVTQ-UHFFFAOYSA-N 98-47-5 Chemical compound OS(=O)(=O)C1=CC=CC([N+]([O-])=O)=C1 ONMOULMPIIOVTQ-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- 0 CC(*)(C(N1)=O)NC1=O Chemical compound CC(*)(C(N1)=O)NC1=O 0.000 description 1
- 102000005367 Carboxypeptidases Human genes 0.000 description 1
- 108010006303 Carboxypeptidases Proteins 0.000 description 1
- CXOFVDLJLONNDW-UHFFFAOYSA-N Phenytoin Chemical compound N1C(=O)NC(=O)C1(C=1C=CC=CC=1)C1=CC=CC=C1 CXOFVDLJLONNDW-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-M Thiocyanate anion Chemical compound [S-]C#N ZMZDMBWJUHKJPS-UHFFFAOYSA-M 0.000 description 1
- 230000002009 allergenic effect Effects 0.000 description 1
- 229910002065 alloy metal Inorganic materials 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- 230000029087 digestion Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M methanesulfonate group Chemical class CS(=O)(=O)[O-] AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- HKSGQTYSSZOJOA-UHFFFAOYSA-N potassium argentocyanide Chemical compound [K+].[Ag+].N#[C-].N#[C-] HKSGQTYSSZOJOA-UHFFFAOYSA-N 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- 210000000813 small intestine Anatomy 0.000 description 1
- KKVTYAVXTDIPAP-UHFFFAOYSA-M sodium;methanesulfonate Chemical compound [Na+].CS([O-])(=O)=O KKVTYAVXTDIPAP-UHFFFAOYSA-M 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical class O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
Definitions
- the present invention relates to a cyanide-free electrolyte composition for depositing a silver or silver alloy layer on a substrate. Moreover, the present invention relates to a method of depositing such layers using the cyanide-free electrolyte composition of the present invention.
- Galvanic electrolyte compositions for the deposition of silver or silver alloy layers are known both for use in the field of decorative surfaces and in the technical field. It is customary in the prior art to use soluble silver compounds, usually in the form of cyanide compounds such as potassium silver cyanide or in the form of sulfur-containing complexes such as sulfite, thiosulfate or thiocyanate and ammonium complexes.
- soluble silver compounds usually in the form of cyanide compounds such as potassium silver cyanide or in the form of sulfur-containing complexes such as sulfite, thiosulfate or thiocyanate and ammonium complexes.
- electrolyte compositions are generally unstable without the addition of other complexing or stabilizing agents, it is customary to use the complexing agent components in excess, so that such electrolyte compositions often have very high cyanide, sulfur-containing complexing agent or ammonium concentrations.
- the electrolyte compositions produced in this way are characterized by a wide range of applications. Cyanidic compositions are stable but toxic and therefore of environmental concern. The others mentioned have a lower risk potential, but tend to instability. Despite the significantly lower risk potential with respect to cyanides, the environmental relevance contained in such electrolyte compositions is not negligible and, because of their allergenic potential, can pose a threat to persons working with these electrolyte compositions.
- a low-pollutant to pollutant-free aqueous electrolyte composition for the electrodeposition of noble metals and noble metal alloys, which have to be deposited noble metal and optionally used alloying metals in the form of water-soluble compounds of protein amino acids or their salts or in the form of sulfonic acid compounds.
- the electrolyte compositions according to the DE 199 28 47 A1 have these water-soluble nitro compounds. These may be, for example, 3-nitrophthalic acid, 4-nitrophthalic acid or m-nitrobenzenesulfonic acid.
- these may include organic acids such as nicotinic acid or succinic acid.
- cyanide-free electrolyte compositions are known for depositing silver or silver alloys comprising silver in the form of imides of organic dicarboxylic acids.
- the reaction products of water-soluble silver salts with pyrrolidinediones may serve as silver sources in corresponding electrolyte compositions.
- silver can be used in the form of succinimides or maleimides.
- U.S. Patent No. 4,246,077 discloses the use of silver in the form of pyrrolidinediones as silver source in corresponding electrolyte compositions for depositing silver or silver alloy layers.
- the U.S. Patent 5,601,696 discloses the use of hydantoin as a complexing reagent in electrolyte compositions for depositing silver or silver alloy layers on substrates.
- hydantoin as a complexing reagent in electrolyte compositions for depositing silver or silver alloy layers on substrates.
- 1-methylhydantoin, 1,3-dimethylhydantoin, 5,5-dimethylhydantoin, 1-methanol-5,5-dimethylhydantoin or also 5,5-diphenylhydantoin can be used as complexing reagents.
- WO 2005/083156 discloses a hydantoin-containing electrolyte composition for depositing also mirror-finished silver or silver alloy layers.
- these electrolyte compositions have other environmentally harmful compounds such as 2,2'-bipyridine.
- 2,2'-bipyridine can lead to an inhibition of carboxypeptidases, which play a crucial role, for example, in the digestion of proteins in the small intestine, which justifies the toxicity of this class of compounds and requires extremely careful handling of these compounds.
- a cyanide-free electrolyte composition for depositing a silver or silver alloy layer on a substrate containing at least a silver ion source, a sulfonic acid and / or a derivative of a sulfonic acid, a wetting agent and a hydantoin of the general formula wherein R 1 and R 2 independently of one another may be an H, an alkyl group having 1 to 5 carbon atoms or a substituted or unsubstituted aryl group.
- the electrolyte composition according to the invention comprises the sulfonic acid and / or a derivative of a sulfonic acid in a concentration between 50 g / l and 500 g / l, preferably between 100 g / l and 300 g / l, more preferably between 130 g / l and 200 g / l ,
- the electrolyte composition according to the invention preferably comprises potassium methanesulfonate.
- methanesulfonates such as, for example, sodium methanesulfonate, but also sulfates and other compounds suitable as electrolyte salt are suitable for use in the electrolyte composition according to the invention.
- the electrolyte composition of the invention may have a silver concentration between 10 to 50 g / l, preferably between 20 and 40 g / l, more preferably between 25 and 35 g / l.
- the electrolyte composition of the present invention has at least one silver salt of a sulfonic acid.
- other silver ion sources may include inorganic silver salts selected from the group consisting of silver oxide, silver nitrate and silver sulfate in the electrolyte composition.
- the electrolyte composition of the present invention may have corresponding sources of alloy metal ions.
- corresponding alloying metals are used in the form of their sulfonic acid salts, oxides, nitrates or sulfates.
- the electrolyte composition according to the invention may for example comprise a naphthalenesulfonic acid-formaldehyde polycondensate and / or a sulfopropylated polyalkoxylated naphthol.
- the electrolyte composition may comprise other wetting agents or surfactants.
- the pH of the electrolyte composition of the invention is between pH 8 and pH 14, preferably between pH 9.0 and pH 12.5, more preferably between pH 9.5 and pH 12.0.
- the object is achieved by a method for depositing a silver or silver alloy layer on a substrate , wherein the substrate to be coated at a set current density between 0.1 and 1 A / dm 2 , preferably 0.3 to 0.8 A. / dm 2 is contacted with the electrolyte composition according to the invention.
- the deposition of lustrous, ductile silver or silver alloy layers in a wide range of applications is possible.
- layers for applications in the jewelery, electronics or automotive industry can be deposited with the aid of the electrolyte composition according to the invention.
- inventive method and the electrolyte composition of the invention are particularly applicable to suitable substrates such as gold-plated, nickel-plated and other, not prone to sedimentation sheets.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06021174A EP1918426A1 (de) | 2006-10-09 | 2006-10-09 | Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten |
| JP2009531764A JP5439181B2 (ja) | 2006-10-09 | 2007-10-09 | 基板に銀あるいは銀合金層を堆積するためのシアン化物非含有電解質組成物および方法 |
| KR1020097009568A KR101409701B1 (ko) | 2006-10-09 | 2007-10-09 | 은 또는 은 합금층의 기재 위 침착용 시아나이드가 없는 전해질 조성물 및 방법 |
| CN2007800454144A CN101627150B (zh) | 2006-10-09 | 2007-10-09 | 无氰电解液组合物及在基板沉积银或银合金镀层的方法 |
| PCT/EP2007/008780 WO2008043528A2 (de) | 2006-10-09 | 2007-10-09 | Cyanidfreie elektrolytzusammensetzung und verfahren zur abscheidung von silber- oder silberlegierungsschichten auf substraten |
| EP07818853.9A EP2089561B1 (de) | 2006-10-09 | 2007-10-09 | Cyanidfreie elektrolytzusammensetzung und verfahren zur abscheidung von silber- oder silberlegierungsschichten auf substraten |
| US12/445,049 US9212427B2 (en) | 2006-10-09 | 2007-10-09 | Cyanide-free electrolyte composition, and method for the deposition of silver or silver alloy layers on substrates |
| US14/962,863 US9657402B2 (en) | 2006-10-09 | 2015-12-08 | Cyanide-free electrolyte composition and method for the deposition of silver or silver alloy layers on substrates |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06021174A EP1918426A1 (de) | 2006-10-09 | 2006-10-09 | Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| EP1918426A1 true EP1918426A1 (de) | 2008-05-07 |
Family
ID=37806683
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP06021174A Withdrawn EP1918426A1 (de) | 2006-10-09 | 2006-10-09 | Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten |
| EP07818853.9A Active EP2089561B1 (de) | 2006-10-09 | 2007-10-09 | Cyanidfreie elektrolytzusammensetzung und verfahren zur abscheidung von silber- oder silberlegierungsschichten auf substraten |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP07818853.9A Active EP2089561B1 (de) | 2006-10-09 | 2007-10-09 | Cyanidfreie elektrolytzusammensetzung und verfahren zur abscheidung von silber- oder silberlegierungsschichten auf substraten |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9212427B2 (enExample) |
| EP (2) | EP1918426A1 (enExample) |
| JP (1) | JP5439181B2 (enExample) |
| KR (1) | KR101409701B1 (enExample) |
| CN (1) | CN101627150B (enExample) |
| WO (1) | WO2008043528A2 (enExample) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009029558A1 (de) | 2009-09-17 | 2011-03-31 | Schott Solar Ag | Elektrolytzusammensetzung |
| RU2536127C2 (ru) * | 2010-03-09 | 2014-12-20 | Общество с ограниченной ответственностью "Санкт-Петербургский Центр "ЭЛМА (Электроникс Менеджмент)" | Кислый электролит для серебрения |
| DE102015008686A1 (de) | 2015-07-02 | 2017-01-05 | ORU e.V. | Cyanidfreie, wässrige elektrolytische Zusammensetzung |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1918426A1 (de) * | 2006-10-09 | 2008-05-07 | Enthone, Inc. | Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten |
| EP2431501B1 (en) | 2010-09-21 | 2013-11-20 | Rohm and Haas Electronic Materials LLC | Method of electroplating silver strike over nickel |
| KR20150131346A (ko) * | 2013-03-15 | 2015-11-24 | 엔쏜 인코포레이티드 | 플루오로중합체 나노입자로 은의 전착 |
| CN105420770A (zh) * | 2015-11-30 | 2016-03-23 | 苏州市金星工艺镀饰有限公司 | 一种防变色无氰镀银电镀液及其电镀方法 |
| CN105350037A (zh) * | 2015-12-17 | 2016-02-24 | 宏正(福建)化学品有限公司 | 一种碱性无氰镀锌镍合金镀液及其电镀工艺 |
| DE102019106004B4 (de) * | 2019-03-08 | 2023-11-30 | Umicore Galvanotechnik Gmbh | Additiv für die cyanidfreie Abscheidung von Silber |
| EP3841233A1 (de) * | 2018-08-21 | 2021-06-30 | Umicore Galvanotechnik GmbH | Elektrolyt für die cyanidfreie abscheidung von silber |
| US11578418B2 (en) * | 2021-03-29 | 2023-02-14 | Rohm And Haas Electronic Materials Llc (Rhem) | Silver electroplating compositions and methods for electroplating silver with low coefficients of friction |
| FR3155008B1 (fr) | 2023-11-06 | 2025-11-07 | Axon Cable Sa | Composition de bain d’argenture sans cyanure et ses utilisations |
| CN121472943A (zh) * | 2024-08-06 | 2026-02-06 | 华为技术有限公司 | 电镀金银合金的电镀液及其应用 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06330372A (ja) * | 1993-05-20 | 1994-11-29 | Electroplating Eng Of Japan Co | ノンシアン銀めっき浴及びその銀めっき方法 |
| JPH1121693A (ja) * | 1997-07-01 | 1999-01-26 | Daiwa Kasei Kenkyusho:Kk | 錫−銀合金めっき浴及びめっき物 |
| JPH11302893A (ja) * | 1998-04-22 | 1999-11-02 | Okuno Chem Ind Co Ltd | 非シアン系電気銀めっき液 |
| WO2005083156A1 (en) * | 2004-02-24 | 2005-09-09 | Technic, Inc. | Non-cyanide silver plating bath composition |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4126524A (en) | 1975-03-12 | 1978-11-21 | Technic, Inc. | Silver complex, method of making said complex and method and electrolyte containing said complex for electroplating silver and silver alloys |
| US4246077A (en) * | 1975-03-12 | 1981-01-20 | Technic, Inc. | Non-cyanide bright silver electroplating bath therefor, silver compounds and method of making silver compounds |
| US4161432A (en) * | 1975-12-03 | 1979-07-17 | International Business Machines Corporation | Electroplating chromium and its alloys |
| JPS5293638A (en) * | 1976-02-04 | 1977-08-06 | Hitachi Ltd | Silver plating solution |
| SU724606A1 (ru) * | 1978-03-20 | 1980-03-30 | Институт общей и неорганической химии АН Украинской ССР | Электролит серебрени |
| US4461680A (en) * | 1983-12-30 | 1984-07-24 | The United States Of America As Represented By The Secretary Of Commerce | Process and bath for electroplating nickel-chromium alloys |
| JPH0361393A (ja) * | 1989-07-28 | 1991-03-18 | Daiichi Koushiyou Kk | 銀めっき法 |
| JPH08104993A (ja) * | 1994-10-04 | 1996-04-23 | Electroplating Eng Of Japan Co | 銀めっき浴及びその銀めっき方法 |
| JP3481020B2 (ja) * | 1995-09-07 | 2003-12-22 | ディップソール株式会社 | Sn−Bi系合金めっき浴 |
| US6251249B1 (en) * | 1996-09-20 | 2001-06-26 | Atofina Chemicals, Inc. | Precious metal deposition composition and process |
| JPH10121289A (ja) * | 1996-10-18 | 1998-05-12 | Electroplating Eng Of Japan Co | 非シアン系銀めっき浴 |
| CN1163633C (zh) * | 1997-10-02 | 2004-08-25 | 戈尔德施米特股份公司 | 制备银化合物的方法 |
| US6210556B1 (en) * | 1998-02-12 | 2001-04-03 | Learonal, Inc. | Electrolyte and tin-silver electroplating process |
| US7628903B1 (en) * | 2000-05-02 | 2009-12-08 | Ishihara Chemical Co., Ltd. | Silver and silver alloy plating bath |
| DE10026680C1 (de) * | 2000-05-30 | 2002-02-21 | Schloetter Fa Dr Ing Max | Elektrolyt und Verfahren zur Abscheidung von Zinn-Silber-Legierungsschichten und Verwendung des Elektrolyten |
| DE10124631C1 (de) * | 2001-05-18 | 2002-11-21 | Atotech Deutschland Gmbh | Verfahren zum direkten elektrolytischen Metallisieren von elektrisch nichtleiteitenden Substratoberflächen |
| US20030159938A1 (en) * | 2002-02-15 | 2003-08-28 | George Hradil | Electroplating solution containing organic acid complexing agent |
| WO2004079055A1 (ja) * | 2003-03-05 | 2004-09-16 | Tdk Corporation | 希土類磁石の製造方法およびめっき浴 |
| CN100355944C (zh) * | 2005-01-17 | 2007-12-19 | 上海大学 | 用于无氰镀银的光亮剂及其制备方法 |
| EP1918426A1 (de) * | 2006-10-09 | 2008-05-07 | Enthone, Inc. | Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten |
-
2006
- 2006-10-09 EP EP06021174A patent/EP1918426A1/de not_active Withdrawn
-
2007
- 2007-10-09 KR KR1020097009568A patent/KR101409701B1/ko active Active
- 2007-10-09 EP EP07818853.9A patent/EP2089561B1/de active Active
- 2007-10-09 JP JP2009531764A patent/JP5439181B2/ja active Active
- 2007-10-09 CN CN2007800454144A patent/CN101627150B/zh active Active
- 2007-10-09 WO PCT/EP2007/008780 patent/WO2008043528A2/de not_active Ceased
- 2007-10-09 US US12/445,049 patent/US9212427B2/en active Active
-
2015
- 2015-12-08 US US14/962,863 patent/US9657402B2/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06330372A (ja) * | 1993-05-20 | 1994-11-29 | Electroplating Eng Of Japan Co | ノンシアン銀めっき浴及びその銀めっき方法 |
| JPH1121693A (ja) * | 1997-07-01 | 1999-01-26 | Daiwa Kasei Kenkyusho:Kk | 錫−銀合金めっき浴及びめっき物 |
| JPH11302893A (ja) * | 1998-04-22 | 1999-11-02 | Okuno Chem Ind Co Ltd | 非シアン系電気銀めっき液 |
| WO2005083156A1 (en) * | 2004-02-24 | 2005-09-09 | Technic, Inc. | Non-cyanide silver plating bath composition |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009029558A1 (de) | 2009-09-17 | 2011-03-31 | Schott Solar Ag | Elektrolytzusammensetzung |
| EP2309035A1 (de) | 2009-09-17 | 2011-04-13 | SCHOTT Solar AG | Elektrolytzusammensetzung |
| CN102021613A (zh) * | 2009-09-17 | 2011-04-20 | 肖特太阳能控股公司 | 电解质组合物 |
| CN102021613B (zh) * | 2009-09-17 | 2015-09-30 | 肖特太阳能控股公司 | 电解质组合物 |
| RU2536127C2 (ru) * | 2010-03-09 | 2014-12-20 | Общество с ограниченной ответственностью "Санкт-Петербургский Центр "ЭЛМА (Электроникс Менеджмент)" | Кислый электролит для серебрения |
| DE102015008686A1 (de) | 2015-07-02 | 2017-01-05 | ORU e.V. | Cyanidfreie, wässrige elektrolytische Zusammensetzung |
Also Published As
| Publication number | Publication date |
|---|---|
| JP5439181B2 (ja) | 2014-03-12 |
| US9657402B2 (en) | 2017-05-23 |
| EP2089561B1 (de) | 2016-03-09 |
| CN101627150B (zh) | 2011-06-22 |
| US20160122890A1 (en) | 2016-05-05 |
| US9212427B2 (en) | 2015-12-15 |
| JP2010506048A (ja) | 2010-02-25 |
| KR101409701B1 (ko) | 2014-06-19 |
| US20100044239A1 (en) | 2010-02-25 |
| EP2089561A2 (de) | 2009-08-19 |
| KR20090073220A (ko) | 2009-07-02 |
| WO2008043528A3 (de) | 2009-04-16 |
| WO2008043528A2 (de) | 2008-04-17 |
| CN101627150A (zh) | 2010-01-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2089561B1 (de) | Cyanidfreie elektrolytzusammensetzung und verfahren zur abscheidung von silber- oder silberlegierungsschichten auf substraten | |
| EP0081183B1 (de) | Verfahren zur stromlosen Abscheidung von Edelmetallschichten auf Oberflächen von unedlen Metallen | |
| EP1190118B1 (de) | Badsystem zur galvanischen abscheidung von metallen | |
| DE3706497A1 (de) | Galvanisches bad zur abscheidung von palladium oder legierungen davon | |
| DE102008033174B3 (de) | Cyanidfreie Elektrolytzusammensetzung zur galvanischen Abscheidung einer Kupferschicht und Verfahren zur Abscheidung einer kupferhaltigen Schicht | |
| JP2010506048A5 (enExample) | ||
| EP1600528A2 (de) | Verfahren zur Metallisierung von Kunststoffoberflächen | |
| WO2015039152A1 (de) | Abscheidung von cu, sn, zn-beschichtungen auf metallischen substraten | |
| WO2007128702A1 (de) | Edelmetallhaltige nickelschicht | |
| DE60202378T2 (de) | Elektrolytisches bad zum elektrochemischen abscheiden von gold und goldlegierungen | |
| WO2009059915A2 (de) | Goldhaltige nickelschicht | |
| DE2114119A1 (de) | Verfahren zur elektrolytischen Abscheidung von Ruthenium und Elektrolysebad zur Durchfuehrung dieses Verfahrens | |
| DE10006128B4 (de) | Plattierungsbad zum Abscheiden einer Sn-Bi-Legierung und dessen Verwendung | |
| DE10052960C9 (de) | Bleifreie Nickellegierung | |
| AT514427B1 (de) | Elektrolytbad sowie damit erhältliche Objekte bzw. Artikel | |
| DE3013191A1 (de) | Im wesentlichen cyanidfreies bad zur elektrolytischen abscheidung von silber oder silberlegierung | |
| DE102020131371B4 (de) | Verwendung eines Elektrolyten zur Erzeugung einer Rutheniumlegierungsschicht | |
| EP1763594B1 (de) | Verfahren zur verbesserung der lötbarkeit von nickelüberzügen | |
| DE3232735A1 (de) | Verfahren zur erhoehung der korrosionsbestaendigkeit einer galvanisch abgeschiedenen palladium/nickel-legierung | |
| DE19745162C2 (de) | Verfahren zum Aktivieren eines Werkstoffes in einem ETE-Beschichtungsprozeß | |
| EP1035229A1 (de) | Rhodiumbad und Verfahren zum Abscheiden von Rhodium | |
| DE102015211685A1 (de) | Elektrolyt zur Abscheidung von Zinn-Nickel-Schichten | |
| DE2142103A1 (de) | Bad zur selektiven abloesung von nickel- und/oder kupferueberzuegen | |
| DD222346A1 (de) | Loesung zur autokatalytischen abscheidung von palladium | |
| DD247926A1 (de) | Loesung zur autokatalytischen abscheidung von palladium |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR |
|
| AX | Request for extension of the european patent |
Extension state: AL BA HR MK RS |
|
| 17P | Request for examination filed |
Effective date: 20080613 |
|
| 17Q | First examination report despatched |
Effective date: 20080724 |
|
| AKX | Designation fees paid |
Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LI LT LU LV MC NL PL PT RO SE SI SK TR |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
| 18D | Application deemed to be withdrawn |
Effective date: 20090721 |