JP2010506048A - 基板に銀あるいは銀合金層を堆積するためのシアン化物を使用しない電解質組成および方法 - Google Patents
基板に銀あるいは銀合金層を堆積するためのシアン化物を使用しない電解質組成および方法 Download PDFInfo
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- JP2010506048A JP2010506048A JP2009531764A JP2009531764A JP2010506048A JP 2010506048 A JP2010506048 A JP 2010506048A JP 2009531764 A JP2009531764 A JP 2009531764A JP 2009531764 A JP2009531764 A JP 2009531764A JP 2010506048 A JP2010506048 A JP 2010506048A
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- silver
- electrolyte composition
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- sulfonic acid
- electrolyte
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- 239000000203 mixture Substances 0.000 title claims abstract description 79
- 239000003792 electrolyte Substances 0.000 title claims abstract description 73
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 38
- 239000004332 silver Substances 0.000 title claims abstract description 38
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims abstract description 35
- 238000000151 deposition Methods 0.000 title claims abstract description 25
- 229910001316 Ag alloy Inorganic materials 0.000 title claims abstract description 17
- 239000000758 substrate Substances 0.000 title claims abstract description 12
- 238000000034 method Methods 0.000 title claims abstract description 10
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 claims abstract description 13
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims abstract description 8
- -1 silver ions Chemical class 0.000 claims abstract description 6
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229940091173 hydantoin Drugs 0.000 claims abstract description 5
- 239000000080 wetting agent Substances 0.000 claims abstract description 5
- 150000003460 sulfonic acids Chemical class 0.000 claims abstract description 4
- 230000008021 deposition Effects 0.000 claims description 19
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 14
- 239000003513 alkali Substances 0.000 claims description 11
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 claims description 8
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 claims description 5
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 5
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 claims description 4
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 claims description 4
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 claims description 3
- 235000019345 sodium thiosulphate Nutrition 0.000 claims description 3
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims description 3
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 229910001961 silver nitrate Inorganic materials 0.000 claims description 2
- 229910001923 silver oxide Inorganic materials 0.000 claims description 2
- YPNVIBVEFVRZPJ-UHFFFAOYSA-L silver sulfate Chemical compound [Ag+].[Ag+].[O-]S([O-])(=O)=O YPNVIBVEFVRZPJ-UHFFFAOYSA-L 0.000 claims description 2
- 229910000367 silver sulfate Inorganic materials 0.000 claims description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 claims description 2
- 150000003458 sulfonic acid derivatives Chemical class 0.000 claims 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-L thiosulfate(2-) Chemical compound [O-]S([S-])(=O)=O DHCDFWKWKRSZHF-UHFFFAOYSA-L 0.000 claims 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 7
- XWIJIXWOZCRYEL-UHFFFAOYSA-M potassium;methanesulfonate Chemical compound [K+].CS([O-])(=O)=O XWIJIXWOZCRYEL-UHFFFAOYSA-M 0.000 description 6
- 238000005476 soldering Methods 0.000 description 6
- YIROYDNZEPTFOL-UHFFFAOYSA-N 5,5-Dimethylhydantoin Chemical compound CC1(C)NC(=O)NC1=O YIROYDNZEPTFOL-UHFFFAOYSA-N 0.000 description 5
- 150000001875 compounds Chemical class 0.000 description 5
- NVVZQXQBYZPMLJ-UHFFFAOYSA-N formaldehyde;naphthalene-1-sulfonic acid Chemical compound O=C.C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 NVVZQXQBYZPMLJ-UHFFFAOYSA-N 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 229910001369 Brass Inorganic materials 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000010951 brass Substances 0.000 description 4
- 239000008139 complexing agent Substances 0.000 description 4
- RYKLZUPYJFFNRR-UHFFFAOYSA-N 3-hydroxypiperidin-2-one Chemical compound OC1CCCNC1=O RYKLZUPYJFFNRR-UHFFFAOYSA-N 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- VMAQYKGITHDWKL-UHFFFAOYSA-N 5-methylimidazolidine-2,4-dione Chemical compound CC1NC(=O)NC1=O VMAQYKGITHDWKL-UHFFFAOYSA-N 0.000 description 2
- RHYBFKMFHLPQPH-UHFFFAOYSA-N N-methylhydantoin Chemical compound CN1CC(=O)NC1=O RHYBFKMFHLPQPH-UHFFFAOYSA-N 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000536 complexating effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 102000004169 proteins and genes Human genes 0.000 description 2
- 108090000623 proteins and genes Proteins 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 231100000331 toxic Toxicity 0.000 description 2
- 230000002588 toxic effect Effects 0.000 description 2
- RFTORHYUCZJHDO-UHFFFAOYSA-N 1,3-dimethylimidazolidine-2,4-dione Chemical compound CN1CC(=O)N(C)C1=O RFTORHYUCZJHDO-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- KFIRODWJCYBBHY-UHFFFAOYSA-N 3-nitrophthalic acid Chemical compound OC(=O)C1=CC=CC([N+]([O-])=O)=C1C(O)=O KFIRODWJCYBBHY-UHFFFAOYSA-N 0.000 description 1
- SLBQXWXKPNIVSQ-UHFFFAOYSA-N 4-nitrophthalic acid Chemical compound OC(=O)C1=CC=C([N+]([O-])=O)C=C1C(O)=O SLBQXWXKPNIVSQ-UHFFFAOYSA-N 0.000 description 1
- ONMOULMPIIOVTQ-UHFFFAOYSA-N 98-47-5 Chemical compound OS(=O)(=O)C1=CC=CC([N+]([O-])=O)=C1 ONMOULMPIIOVTQ-UHFFFAOYSA-N 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- 102000005367 Carboxypeptidases Human genes 0.000 description 1
- 108010006303 Carboxypeptidases Proteins 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 1
- CXOFVDLJLONNDW-UHFFFAOYSA-N Phenytoin Chemical compound N1C(=O)NC(=O)C1(C=1C=CC=CC=1)C1=CC=CC=C1 CXOFVDLJLONNDW-UHFFFAOYSA-N 0.000 description 1
- 230000007815 allergy Effects 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000010668 complexation reaction Methods 0.000 description 1
- ZFTFAPZRGNKQPU-UHFFFAOYSA-N dicarbonic acid Chemical compound OC(=O)OC(O)=O ZFTFAPZRGNKQPU-UHFFFAOYSA-N 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 230000000968 intestinal effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M methanesulfonate group Chemical class CS(=O)(=O)[O-] AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 description 1
- GTBQRHOYAUGRPV-UHFFFAOYSA-N methanesulfonic acid;silver Chemical compound [Ag].CS(O)(=O)=O GTBQRHOYAUGRPV-UHFFFAOYSA-N 0.000 description 1
- KRLNGOFZGKIRNU-UHFFFAOYSA-N naphthalen-1-ol;potassium Chemical compound [K].C1=CC=C2C(O)=CC=CC2=C1 KRLNGOFZGKIRNU-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 150000002828 nitro derivatives Chemical class 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- HKSGQTYSSZOJOA-UHFFFAOYSA-N potassium argentocyanide Chemical compound [K+].[Ag+].N#[C-].N#[C-] HKSGQTYSSZOJOA-UHFFFAOYSA-N 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- KKVTYAVXTDIPAP-UHFFFAOYSA-M sodium;methanesulfonate Chemical compound [Na+].CS([O-])(=O)=O KKVTYAVXTDIPAP-UHFFFAOYSA-M 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 150000003567 thiocyanates Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/46—Electroplating: Baths therefor from solutions of silver
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
【選択図】なし
Description
この発明はさらに本発明に従う電解質組成を使用してこのような層の堆積のための相応する方法を提供する目標に基礎をおいている。
ここで、R1およびR2は独立してH、1から5の炭素原子をもつアルキルグループあるいは置換あるいは非置換アリールグループである。
金メッキされた真鍮シートが次の組成をもつ電解質組成で設定電流密度0.5A/dm2で15分間接触された:
30g/L 銀 メタンスルホン酸銀(Ag−MSA)として
150g/L メタンスルホン酸カリウム
80g/L 5,5ジメチルヒダントイン
15g/L ナフタレンスルホン酸ホルムアルデヒド重縮合物
2.5g/L スルホプロピル化ポリアルコキシル化ナフトール カリウム塩として
5μmの均一の輝く銀層が堆積された。
金メッキされた真鍮シートが次の組成をもつ電解質組成で設定電流密度0.5A/dm2で15分間接触された:
35g/L 銀 メタンスルホン酸銀(Ag−MSA)として
150g/L メタンスルホン酸カリウム
120g/L 5,5ジメチルヒダントイン
20g/L ナフタレンスルホン酸ホルムアルデヒド重縮合物
150mg/L 臭化カリウム
3μmの均一の曇った銀層が堆積された。層は応力がなくそして良好なはんだ付け性質を示した。
金メッキされた真鍮シートが次の組成をもつ電解質組成で設定電流密度0.5A/dm2で15分間接触された:
35g/L 銀 銀メタンスルホン酸(Ag−MSA)として
150g/L メタンスルホン酸カリウム
120g/L 5,5ジメチルヒダントイン
20g/L ナフタレンスルホン酸ホルムアルデヒド重縮合物
150mg/L チオ硫酸ナトリウム
3μmの均一の曇った銀層が堆積された。層は応力がなくそして良好なはんだ付け性質を示した。
金メッキされた真鍮シートが次の組成をもつ電解質組成で設定電流密度0.5A/dm2で15分間接触された:
35g/L 銀 メタンスルホン酸銀(Ag−MSA)として
150g/L メタンスルホン酸カリウム
120g/L 5,5ジメチルヒダントイン
20g/L ナフタレンスルホン酸ホルムアルデヒド重縮合物
75mg/L 臭化カリウム
75mg/L チオ硫酸ナトリウム
3μmの均一の曇った銀層が堆積された。層は応力がなくそして良好なはんだ付け性質を示した。
Claims (12)
- 10g/Lと50g/Lの間、望ましくは20g/Lと40g/Lの間、さらに望ましくは25g/Lと35g/Lの間の銀イオン濃度からなる請求項1に従う電解質組成。
- 同じものが50g/Lと500g/Lの間、望ましくは100g/Lと300g/Lの間、さらに望ましくは130g/Lと200g/Lの間の濃度でスルホン酸および/あるいはスルホン酸の誘導体からなる請求項1あるいは請求項2の電解質組成。
- pH8とpH14の間、望ましくはpH9.0とpH12.5の間、さらに望ましくはpH9.5とpH12.0の間のpH値からなる請求項1から請求項3のいずれか1項に従う電解質組成。
- 銀イオン源として少なくとも1つのスルホン酸の銀塩からなる請求項1から請求項4のいずれか1項に従う電解質組成。
- さらなる銀イオン源として酸化銀、硝酸銀および硫酸銀からなるグループから選ばれる銀塩からなる請求項5に従う電解質組成。
- アルカリ臭化物の50mg/Lから500mg/L、望ましくは100mg/Lから200mg/Lからなる請求項1から請求項6のいずれか1項に従う電解質組成。
- 同じものがアルカリ臭化物として臭化カリウムからなる請求項7に従う電解質組成。
- チオ硫酸塩の50mg/Lから500mg/L、望ましくは100mg/Lから200mg/Lからなる請求項1から請求項6のいずれか1項に従う電解質組成。
- 同じものがチオ硫酸塩としてアルカリ硫酸塩、望ましくはチオ硫酸ナトリウムからなる請求項9に従う電解質組成。
- ≧100Ah/Lの安定性をもつ請求項1から請求項10のいずれか1項に従う電解質組成。
- 被覆される基板が0.1と2A/dm2の間、望ましくは0.3と1.5A/dm2の間の設定電流密度で、請求項1から請求項6のいずれか1項に従う電解質組成で接触される基板に銀あるいは銀合金層の堆積ための方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06021174A EP1918426A1 (de) | 2006-10-09 | 2006-10-09 | Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten |
EP06021174.5 | 2006-10-09 | ||
PCT/EP2007/008780 WO2008043528A2 (de) | 2006-10-09 | 2007-10-09 | Cyanidfreie elektrolytzusammensetzung und verfahren zur abscheidung von silber- oder silberlegierungsschichten auf substraten |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010506048A true JP2010506048A (ja) | 2010-02-25 |
JP2010506048A5 JP2010506048A5 (ja) | 2010-10-21 |
JP5439181B2 JP5439181B2 (ja) | 2014-03-12 |
Family
ID=37806683
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009531764A Active JP5439181B2 (ja) | 2006-10-09 | 2007-10-09 | 基板に銀あるいは銀合金層を堆積するためのシアン化物非含有電解質組成物および方法 |
Country Status (6)
Country | Link |
---|---|
US (2) | US9212427B2 (ja) |
EP (2) | EP1918426A1 (ja) |
JP (1) | JP5439181B2 (ja) |
KR (1) | KR101409701B1 (ja) |
CN (1) | CN101627150B (ja) |
WO (1) | WO2008043528A2 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1918426A1 (de) * | 2006-10-09 | 2008-05-07 | Enthone, Inc. | Cyanidfreie Elektrolytzusammensetzung und Verfahren zur Abscheidung von Silber- oder Silberlegierungsschichten auf Substraten |
DE102009029558A1 (de) * | 2009-09-17 | 2011-03-31 | Schott Solar Ag | Elektrolytzusammensetzung |
RU2536127C2 (ru) * | 2010-03-09 | 2014-12-20 | Общество с ограниченной ответственностью "Санкт-Петербургский Центр "ЭЛМА (Электроникс Менеджмент)" | Кислый электролит для серебрения |
JP5854726B2 (ja) | 2010-09-21 | 2016-02-09 | ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC | ニッケル上に銀ストライクを電気めっきする方法 |
EP2971263A1 (en) * | 2013-03-15 | 2016-01-20 | Enthone, Inc. | Electrodeposition of silver with fluoropolymer nanoparticles |
DE102015008686A1 (de) | 2015-07-02 | 2017-01-05 | ORU e.V. | Cyanidfreie, wässrige elektrolytische Zusammensetzung |
CN105420770A (zh) * | 2015-11-30 | 2016-03-23 | 苏州市金星工艺镀饰有限公司 | 一种防变色无氰镀银电镀液及其电镀方法 |
CN105350037A (zh) * | 2015-12-17 | 2016-02-24 | 宏正(福建)化学品有限公司 | 一种碱性无氰镀锌镍合金镀液及其电镀工艺 |
DE102019106004B4 (de) * | 2019-03-08 | 2023-11-30 | Umicore Galvanotechnik Gmbh | Additiv für die cyanidfreie Abscheidung von Silber |
CN112469847A (zh) | 2018-08-21 | 2021-03-09 | 优美科电镀技术有限公司 | 用于银的无氰化物沉积的电解质 |
US11578418B2 (en) * | 2021-03-29 | 2023-02-14 | Rohm And Haas Electronic Materials Llc (Rhem) | Silver electroplating compositions and methods for electroplating silver with low coefficients of friction |
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Also Published As
Publication number | Publication date |
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KR101409701B1 (ko) | 2014-06-19 |
US9657402B2 (en) | 2017-05-23 |
WO2008043528A2 (de) | 2008-04-17 |
JP5439181B2 (ja) | 2014-03-12 |
CN101627150A (zh) | 2010-01-13 |
WO2008043528A3 (de) | 2009-04-16 |
EP1918426A1 (de) | 2008-05-07 |
EP2089561B1 (de) | 2016-03-09 |
EP2089561A2 (de) | 2009-08-19 |
KR20090073220A (ko) | 2009-07-02 |
US9212427B2 (en) | 2015-12-15 |
US20100044239A1 (en) | 2010-02-25 |
CN101627150B (zh) | 2011-06-22 |
US20160122890A1 (en) | 2016-05-05 |
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