EP1244827B1 - Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür - Google Patents

Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür Download PDF

Info

Publication number
EP1244827B1
EP1244827B1 EP00990767A EP00990767A EP1244827B1 EP 1244827 B1 EP1244827 B1 EP 1244827B1 EP 00990767 A EP00990767 A EP 00990767A EP 00990767 A EP00990767 A EP 00990767A EP 1244827 B1 EP1244827 B1 EP 1244827B1
Authority
EP
European Patent Office
Prior art keywords
sulfate
whitening agent
compound
atoms
rhodium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP00990767A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1244827A1 (de
Inventor
Uwe Manz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Umicore Galvanotechnik GmbH
Original Assignee
Umicore Galvanotechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Umicore Galvanotechnik GmbH filed Critical Umicore Galvanotechnik GmbH
Publication of EP1244827A1 publication Critical patent/EP1244827A1/de
Application granted granted Critical
Publication of EP1244827B1 publication Critical patent/EP1244827B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/50Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30Injector mixers
    • B01F25/31Injector mixers in conduits or tubes through which the main component flows
    • B01F25/313Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/236Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids specially adapted for aerating or carbonating beverages
    • B01F23/2361Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids specially adapted for aerating or carbonating beverages within small containers, e.g. within bottles
    • B01F23/23611Portable appliances comprising a gas cartridge
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20Mixing gases with liquids
    • B01F23/23Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23761Aerating, i.e. introducing oxygen containing gas in liquids

Definitions

  • the invention relates to a galvanic bath for the deposition of high-gloss white rhodium coatings and a whitening agent for this purpose.
  • Rhodium coatings are e.g. deposited as a tarnish protection on silver and should have high gloss and the brightest possible, white color, similar to that of silver.
  • electrolytes are composed on the basis of rhodium sulfate, phosphate or sulfamate, sulfuric acid, phosphoric acid, alkanesulfonic acid or amidosulfuric acid.
  • these usually contain certain organic compounds as brightener additives.
  • Typical, very frequently used brightener additives are, as described, for example, in EP 0 056 590, the compounds pyridine-3-sulfonic acid and naphthalene-trisulfonic acid.
  • a wetting agent and / or a phosphonic acid may additionally be contained in such a bath.
  • a disadvantage of the existing systems lies in the fact that the very bright, white color of silver is not achieved and that with increasing layer thickness increasingly hazy deposition occurs.
  • the whiteners according to formula I are selected compounds from the class of alkyl sulfates (first embodiment) or from the class of alkyl sulfates or alkyl sulfonates (second embodiment).
  • R is a straight- or branched-chain or cyclic alkyl group having up to 20 C atoms.
  • These compounds are sufficiently water-soluble and compatible with the electroplating bath.
  • the compounds have surfactant properties wherein the corresponding effect is reduced to less than 4 for a total number of C atoms, and generally no sufficient solubility is given for a total number of C atoms greater than 20.
  • Preferred brightener additives are compounds of the formula I in which R represents straight-chain or branched-chain or cyclic alkyl groups having 5 to 12 C atoms and in particular branched-chain alkyl groups having 6 to 10 C atoms.
  • Branched-chain compounds are particularly useful in processes and equipment where there is a high degree of foaming, e.g. in air-agitated electrolytes, in drum processing, in high-speed separation equipment (spray equipment) and in selective deposition equipment, e.g. Diving cells.
  • Typical whiteners according to the invention are Hexyl sulfate (first and second embodiments) Hexylsulfonate (second embodiment) 2-ethylhexyl sulfate (first and second embodiments) Heptyl sulfate (first and second embodiments) Octyl sulfate (first and second embodiments) Octylsulfonate (second embodiment) Decyl sulfate (first and second embodiments) Decyl sulfonate (second embodiment) Dodecyl sulfate (first and second embodiments) 7-ethyl-2-methyl-4-undecanol sulfate (first and second embodiments) Cyclohexylsulfate (First and Second Embodiments) and their isomers.
  • the application of the whitening agent according to the invention in baths for the electrodeposition of rhodium layers is expediently carried out in a concentration range from 0.01 to 10 g / l.
  • Baths according to the invention which contain the whitening agent according to formula I in a concentration of 0.1 to 6 g / l are particularly advantageous.
  • the galvanic rhodium baths according to the invention typically contain about 0.1-20 g / l Rhodium as rhodium sulfate, phosphate, alkanesulfonate or sulfamate, 10-200 g / l Sulfuric acid, phosphoric acid, amidosulfuric acid or mixtures of these acids, 0 - 5 g / l Pyridine-3-sulfonic acid as brightener, 0.01-2 g / l wetting agent 0.1-10 g / l Compound of the formula I as a whitening agent according to the invention.
  • the baths are usually operated at current densities of 0.5-5 A / dm 2 (rack operation) and temperatures up to 60 ° C.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Pyridine Compounds (AREA)
  • Physical Vapour Deposition (AREA)
  • Paper (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
EP00990767A 1999-12-23 2000-12-15 Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür Expired - Lifetime EP1244827B1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19962839 1999-12-23
DE19962839 1999-12-23
PCT/EP2000/012796 WO2001048273A1 (de) 1999-12-23 2000-12-15 Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumüberzügen und weissmacher hierfür

Publications (2)

Publication Number Publication Date
EP1244827A1 EP1244827A1 (de) 2002-10-02
EP1244827B1 true EP1244827B1 (de) 2006-04-19

Family

ID=7934370

Family Applications (1)

Application Number Title Priority Date Filing Date
EP00990767A Expired - Lifetime EP1244827B1 (de) 1999-12-23 2000-12-15 Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür

Country Status (9)

Country Link
US (1) US6878411B2 (zh)
EP (1) EP1244827B1 (zh)
JP (1) JP4545367B2 (zh)
CN (1) CN1181226C (zh)
AT (1) ATE323789T1 (zh)
DE (1) DE50012619D1 (zh)
HK (1) HK1054057B (zh)
TW (1) TW573074B (zh)
WO (1) WO2001048273A1 (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20032218A1 (it) * 2003-11-14 2005-05-15 Calegaro Di Luigi Di Francesc O Calegaro S P Flli Metodo di finitura superficiale dell'argento e di sue leghe
US20070012575A1 (en) * 2005-07-12 2007-01-18 Morrissey Ronald J Bright rhodium electrodeposition
CN101949043B (zh) * 2010-09-08 2011-11-02 深圳大学 电镀黑色铑层的配方及其方法
US9248416B2 (en) 2012-09-14 2016-02-02 Marc C. Striebinger Apparatus for the pressurization and evacuation of a container
CN107687008A (zh) * 2017-08-28 2018-02-13 立美珠宝服务(深圳)有限公司 电金水及其制备方法
CN109778262A (zh) * 2017-11-10 2019-05-21 丹阳市金地生态园林发展有限公司 一种含环氧氯丙烷的金属合金增白电镀液
CN111850631B (zh) * 2020-07-30 2021-10-08 金川集团股份有限公司 高光泽装饰性镀铑层电镀液
IT202100027197A1 (it) 2021-10-22 2023-04-22 Berkem Srl Bagno galvanico per la deposizione elettrochimica di leghe rodio-rutenio avente colore simile al rodio puro ed elevata resistenza meccanica e deposito così ottenuto

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3780198A (en) * 1971-06-07 1973-12-18 Crown Cork & Seal Co System for carbonating beverages
FR2293968A1 (fr) * 1974-12-13 1976-07-09 Cem Comp Electro Mec Procede et dispositif pour realiser des emulsions gaz-liquide
JPS5224131A (en) * 1975-08-14 1977-02-23 Dowa Mining Co Luster* thick rhodium plating method
DE2644378A1 (de) * 1976-10-01 1978-04-06 Fuellpack Dipl Brauerei Ing Di Verfahren zur einleitung von gas, insbesondere kohlendioxidgas, in eine in einer leitung stroemende fluessigkeit, insbesondere ein getraenk, sowie einrichtung zur durchfuehrung des verfahrens
JPS604920B2 (ja) * 1981-03-30 1985-02-07 日本鉱業株式会社 耐摩耗性良好な黒色ロジウムメッキ被覆物品の製造方法
JPS5757883A (en) * 1980-09-25 1982-04-07 Nippon Mining Co Ltd Production of black or blue rhodium coated articles and plating bath for this
US4402802A (en) * 1981-01-03 1983-09-06 Dequssa Aktiengesellschaft Electrolytic bath for the deposition of rhodium coatings
DE3100997C2 (de) * 1981-01-15 1986-08-14 Degussa Ag, 6000 Frankfurt Bad zum galvanischen Abscheiden von Rhodiumüberzügen
JPS63206492A (ja) * 1987-02-23 1988-08-25 Ishifuku Kinzoku Kogyo Kk 光沢ロジウムめつき液
US5329975A (en) * 1993-09-22 1994-07-19 Heitel Robert G Apparatus for pressurizing containers and carbonating liquids
DE9404731U1 (de) * 1994-03-21 1994-09-01 Negele, Helfried, 86916 Kaufering Vorrichtung zur Einspeisung von Kohlendioxid in Leitungswasser
JPH1150295A (ja) * 1997-07-28 1999-02-23 Daiwa Kasei Kenkyusho:Kk めっき浴
TR199801497U (xx) * 1998-08-03 2000-03-21 Çağlar Şeref Soda makinalarında yenilik.

Also Published As

Publication number Publication date
DE50012619D1 (de) 2006-05-24
US6878411B2 (en) 2005-04-12
HK1054057A1 (en) 2003-11-14
WO2001048273A1 (de) 2001-07-05
JP2003518559A (ja) 2003-06-10
US20030111352A1 (en) 2003-06-19
CN1420948A (zh) 2003-05-28
HK1054057B (zh) 2005-07-29
EP1244827A1 (de) 2002-10-02
JP4545367B2 (ja) 2010-09-15
ATE323789T1 (de) 2006-05-15
TW573074B (en) 2004-01-21
CN1181226C (zh) 2004-12-22

Similar Documents

Publication Publication Date Title
DE2255584C2 (de) Saures Kupfergalvanisierbad
DE69127394T2 (de) Zinn-Elektroplattierung bei hoher Geschwindigkeit
DE4126502C1 (zh)
DE3836521A1 (de) Waessriges saures bad zur galvanischen abscheidung von glaenzenden und rissfreien kupferueberzuegen und verwendung dieses bades
DE2255728A1 (de) Elektrochemische zubereitungen und verfahren
DE1062079B (de) Cyanidisches Bad und Verfahren zur galvanischen Abscheidung von Kupferueberzuegen
EP1408141B1 (de) Verfahren und Elektrolyt zur galvanischen Abscheidung von Bronzen
DE4023444C2 (de) Verfahren zum galvanischen Abscheiden von Kupfer aus einem wäßrigen, alkalischen, Cyanid-freien Bad, bei dem sowohl eine lösliche als auch eine unlösliche Anode verwendet wird
DE3428277A1 (de) Waessriges bad und ein verfahren zur galvanischen abscheidung einer zink-eisen-legierung
EP1244827B1 (de) Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür
DE3012168C2 (zh)
DE3447813A1 (de) Waessriges saures bad sowie ein verfahren zur galvanischen abscheidung von zink oder zinklegierungen
DE3854551T2 (de) Zinn-, Blei- und Zinn-Blei-Legierungs-Elektrolyten für Elekroplattieren bei hoher Geschwindigkeit.
DE10025552C1 (de) Saures galvanisches Nickelbad und Verfahren zum Abscheiden eines satinglänzenden Nickel- oder Nickellegierungsüberzuges
EP1192297B1 (de) Saures bad zur galvanischen abscheidung von glänzenden gold- und goldlegierungsschichten und glanzzusatz hierfür
DE2630980C2 (zh)
DE2537065C2 (zh)
WO2015000010A1 (de) Elektrolytbad sowie objekte bzw. artikel, die mithilfe des bades beschichtet werden
DE602004011520T2 (de) Wässrige, saure lösung und verfahren zur elektrolytischen abscheidung von kupferüberzügen sowie verwendung der lösung
DE2215737C3 (de) Wäßriges saures galvanisches Halbglanznickelbad
DE3611627A1 (de) Verbindung, zusammensetzung und verfahren zum elektroplattieren
DE2450133A1 (de) Verfahren und galvanisches bad zur abscheidung von nickel/eisen- und nickel/ kobalt/eisen-legierungen
DE2032867B2 (de) Galvanisches Goldbad und Verfahren zur Abscheidung gleichmäßiger, dicker Goldüberzüge
DE2642666A1 (de) Verfahren und zusammensetzung zur herstellung einer galvanischen abscheidung
DE10306823B4 (de) Verfahren und Elektrolyt zur Hochgeschwindigkeitsabscheidung von Zink-Mangan-Legierungen

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20020718

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

AX Request for extension of the european patent

Free format text: AL;LT;LV;MK;RO;SI

17Q First examination report despatched

Effective date: 20021218

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: UMICORE GALVANOTECHNIK GMBH

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060419

Ref country code: IE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060419

Ref country code: GB

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060419

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060419

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REF Corresponds to:

Ref document number: 50012619

Country of ref document: DE

Date of ref document: 20060524

Kind code of ref document: P

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: GERMAN

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060719

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060719

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060730

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060919

NLV1 Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act
ET Fr: translation filed
REG Reference to a national code

Ref country code: IE

Ref legal event code: FD4D

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 20061107

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20061231

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20061231

Ref country code: MC

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20061231

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20061231

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20070122

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

BERE Be: lapsed

Owner name: UMICORE GALVANOTECHNIK G.M.B.H.

Effective date: 20061231

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060720

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20061215

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20060419

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: TR

Payment date: 20121120

Year of fee payment: 13

Ref country code: GB

Payment date: 20121212

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: AT

Payment date: 20121127

Year of fee payment: 13

Ref country code: FR

Payment date: 20130107

Year of fee payment: 13

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20131107

Year of fee payment: 14

REG Reference to a national code

Ref country code: AT

Ref legal event code: MM01

Ref document number: 323789

Country of ref document: AT

Kind code of ref document: T

Effective date: 20131215

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20131215

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20140829

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20131215

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20131215

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20131231

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20131215

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20141215

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20191203

Year of fee payment: 20

REG Reference to a national code

Ref country code: DE

Ref legal event code: R071

Ref document number: 50012619

Country of ref document: DE