ATE323789T1 - Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür - Google Patents

Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür

Info

Publication number
ATE323789T1
ATE323789T1 AT00990767T AT00990767T ATE323789T1 AT E323789 T1 ATE323789 T1 AT E323789T1 AT 00990767 T AT00990767 T AT 00990767T AT 00990767 T AT00990767 T AT 00990767T AT E323789 T1 ATE323789 T1 AT E323789T1
Authority
AT
Austria
Prior art keywords
bath
whitener
gloss white
galvanic deposition
white rhodium
Prior art date
Application number
AT00990767T
Other languages
English (en)
Inventor
Uwe Manz
Original Assignee
Umicore Galvanotechnik Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Umicore Galvanotechnik Gmbh filed Critical Umicore Galvanotechnik Gmbh
Application granted granted Critical
Publication of ATE323789T1 publication Critical patent/ATE323789T1/de

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
    • B01F25/30—Injector mixers
    • B01F25/31—Injector mixers in conduits or tubes through which the main component flows
    • B01F25/313—Injector mixers in conduits or tubes through which the main component flows wherein additional components are introduced in the centre of the conduit
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/50—Electroplating: Baths therefor from solutions of platinum group metals
    • C25D3/52—Electroplating: Baths therefor from solutions of platinum group metals characterised by the organic bath constituents used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/236—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids specially adapted for aerating or carbonating beverages
    • B01F23/2361—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids specially adapted for aerating or carbonating beverages within small containers, e.g. within bottles
    • B01F23/23611—Portable appliances comprising a gas cartridge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/20—Mixing gases with liquids
    • B01F23/23—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids
    • B01F23/237—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media
    • B01F23/2376—Mixing gases with liquids by introducing gases into liquid media, e.g. for producing aerated liquids characterised by the physical or chemical properties of gases or vapours introduced in the liquid media characterised by the gas being introduced
    • B01F23/23761—Aerating, i.e. introducing oxygen containing gas in liquids

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Chemically Coating (AREA)
  • Pyridine Compounds (AREA)
  • Physical Vapour Deposition (AREA)
  • Paper (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
AT00990767T 1999-12-23 2000-12-15 Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür ATE323789T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19962839 1999-12-23

Publications (1)

Publication Number Publication Date
ATE323789T1 true ATE323789T1 (de) 2006-05-15

Family

ID=7934370

Family Applications (1)

Application Number Title Priority Date Filing Date
AT00990767T ATE323789T1 (de) 1999-12-23 2000-12-15 Bad zur galvanischen abscheidung von hochglänzenden weissen rhodiumschichten und weissmacher hierfür

Country Status (9)

Country Link
US (1) US6878411B2 (de)
EP (1) EP1244827B1 (de)
JP (1) JP4545367B2 (de)
CN (1) CN1181226C (de)
AT (1) ATE323789T1 (de)
DE (1) DE50012619D1 (de)
HK (1) HK1054057B (de)
TW (1) TW573074B (de)
WO (1) WO2001048273A1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITMI20032218A1 (it) * 2003-11-14 2005-05-15 Calegaro Di Luigi Di Francesc O Calegaro S P Flli Metodo di finitura superficiale dell'argento e di sue leghe
US20070012575A1 (en) * 2005-07-12 2007-01-18 Morrissey Ronald J Bright rhodium electrodeposition
CN101949043B (zh) * 2010-09-08 2011-11-02 深圳大学 电镀黑色铑层的配方及其方法
US9248416B2 (en) 2012-09-14 2016-02-02 Marc C. Striebinger Apparatus for the pressurization and evacuation of a container
CN107687008A (zh) * 2017-08-28 2018-02-13 立美珠宝服务（深圳）有限公司 电金水及其制备方法
CN109778262A (zh) * 2017-11-10 2019-05-21 丹阳市金地生态园林发展有限公司 一种含环氧氯丙烷的金属合金增白电镀液
CN111850631B (zh) * 2020-07-30 2021-10-08 金川集团股份有限公司 高光泽装饰性镀铑层电镀液
IT202100027197A1 (it) 2021-10-22 2023-04-22 Berkem Srl Bagno galvanico per la deposizione elettrochimica di leghe rodio-rutenio avente colore simile al rodio puro ed elevata resistenza meccanica e deposito così ottenuto

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3780198A (en) * 1971-06-07 1973-12-18 Crown Cork & Seal Co System for carbonating beverages
FR2293968A1 (fr) * 1974-12-13 1976-07-09 Cem Comp Electro Mec Procede et dispositif pour realiser des emulsions gaz-liquide
JPS5224131A (en) * 1975-08-14 1977-02-23 Dowa Mining Co Luster* thick rhodium plating method
DE2644378A1 (de) * 1976-10-01 1978-04-06 Fuellpack Dipl Brauerei Ing Di Verfahren zur einleitung von gas, insbesondere kohlendioxidgas, in eine in einer leitung stroemende fluessigkeit, insbesondere ein getraenk, sowie einrichtung zur durchfuehrung des verfahrens
JPS5757883A (en) * 1980-09-25 1982-04-07 Nippon Mining Co Ltd Production of black or blue rhodium coated articles and plating bath for this
JPS604920B2 (ja) * 1981-03-30 1985-02-07 日本鉱業株式会社 耐摩耗性良好な黒色ロジウムメッキ被覆物品の製造方法
US4402802A (en) * 1981-01-03 1983-09-06 Dequssa Aktiengesellschaft Electrolytic bath for the deposition of rhodium coatings
DE3100997C2 (de) * 1981-01-15 1986-08-14 Degussa Ag, 6000 Frankfurt Bad zum galvanischen Abscheiden von Rhodiumüberzügen
JPS63206492A (ja) * 1987-02-23 1988-08-25 Ishifuku Kinzoku Kogyo Kk 光沢ロジウムめつき液
US5329975A (en) * 1993-09-22 1994-07-19 Heitel Robert G Apparatus for pressurizing containers and carbonating liquids
DE9404731U1 (de) * 1994-03-21 1994-09-01 Negele Helfried Vorrichtung zur Einspeisung von Kohlendioxid in Leitungswasser
JPH1150295A (ja) * 1997-07-28 1999-02-23 Daiwa Kasei Kenkyusho:Kk めっき浴
TR199801497U (xx) * 1998-08-03 2000-03-21 Çağlar Şeref Soda makinalarında yenilik.

Also Published As

Publication number Publication date
DE50012619D1 (de) 2006-05-24
HK1054057B (zh) 2005-07-29
US6878411B2 (en) 2005-04-12
WO2001048273A1 (de) 2001-07-05
EP1244827A1 (de) 2002-10-02
TW573074B (en) 2004-01-21
JP4545367B2 (ja) 2010-09-15
EP1244827B1 (de) 2006-04-19
CN1181226C (zh) 2004-12-22
CN1420948A (zh) 2003-05-28
HK1054057A1 (en) 2003-11-14
JP2003518559A (ja) 2003-06-10
US20030111352A1 (en) 2003-06-19

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