EP0906888B1 - Dispositif pour éviter le gouttage à un orifice de distribution - Google Patents
Dispositif pour éviter le gouttage à un orifice de distribution Download PDFInfo
- Publication number
- EP0906888B1 EP0906888B1 EP98115683A EP98115683A EP0906888B1 EP 0906888 B1 EP0906888 B1 EP 0906888B1 EP 98115683 A EP98115683 A EP 98115683A EP 98115683 A EP98115683 A EP 98115683A EP 0906888 B1 EP0906888 B1 EP 0906888B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- pipe
- liquid
- line
- arrangement according
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B67—OPENING, CLOSING OR CLEANING BOTTLES, JARS OR SIMILAR CONTAINERS; LIQUID HANDLING
- B67C—CLEANING, FILLING WITH LIQUIDS OR SEMILIQUIDS, OR EMPTYING, OF BOTTLES, JARS, CANS, CASKS, BARRELS, OR SIMILAR CONTAINERS, NOT OTHERWISE PROVIDED FOR; FUNNELS
- B67C3/00—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus; Filling casks or barrels with liquids or semiliquids
- B67C3/02—Bottling liquids or semiliquids; Filling jars or cans with liquids or semiliquids using bottling or like apparatus
- B67C3/22—Details
- B67C3/26—Filling-heads; Means for engaging filling-heads with bottle necks
- B67C3/2608—Filling-heads; Means for engaging filling-heads with bottle necks comprising anti-dripping means
Definitions
- the invention relates to an arrangement for preventing Leakage of liquids from line openings.
- Such Lines are used, for example, at the Manufacture of semiconductor wafers on this Apply treatment fluids.
- Such lines (Elution units) are e.g. in etching devices, such as they are described in EP 0 444 714 B.
- Valves are often used which suck back a small amount of liquid when closing.
- these valves with a 1 ⁇ 4-inch hose (inside diameter approx. 5 mm, cross section approx. 0.2 cm 2 )
- suck-back valves suck the liquid column back approx. 10 cm, which is approx. 2 ml liquid.
- a 1 ⁇ 4 inch hose results in a flow rate of approx. 2 m / sec. Since silicon wafers are getting bigger (currently diameters up to 300 mm), an ever increasing volume flow is necessary for the treatment. Volume flows of up to 6 l / min are currently required.
- a dosing device is known from EP 402 535 B1 a valve, an adjustable piston and on the Outlet opening has a porous insert.
- the piston moves after the Closing the valve away from the outlet opening, so that in the Area of the outlet opening creates negative pressure To prevent liquid from exiting drip out.
- DD 250 846 A3 there is a chamber valve for drip-free Closing liquid containers described, the of of the liquid to be dosed through a chamber Cuff is formed.
- the cuff is open Valve compressed (small interior of the chamber) and stretched when the valve is closed (large interior of the Chamber).
- In the chamber is created by enlarging her Volume when closing the valve (stretching the cuff) a negative pressure, causing the liquid from the Outlet opening is withdrawn.
- the liquid remains with the valve according to DD 250 846 A3 in the chamber of the valve and / or in the area between Outlet opening and valve. Gassing liquids would drip this facility anyway.
- the object of the invention is to provide an arrangement with which the dripping, even with high volume flow and / or when conveying liquids containing gas, is reliably prevented.
- the above object is reliable solved and dripping from line openings in particular even with high volume flow and in the case of gas containing Liquids reliably prevented because of liquid sucked away immediately in front of the outlet opening of the line is so that liquid does not come out of the opening of the line can leak more (drip).
- the chamber is closed vacuum is applied in due course, around the Outlet opening arranged.
- FIG. 1 shows a section of an arrangement according to FIG Invention, along the line B-B in Fig. 2, Fig. 2 Section along the line A-A in Fig. 1 and Fig. 3 a example embodiment of the circuit of the arrangement according to the invention.
- shut-off device see FIG. 3
- a suck-back valve is trained.
- the line 2 is one Device 1 assigned, which is used to prevent dripping Liquid from the outlet opening 6 to the line 2 prevent.
- a line 5 is connected via which in the chamber 3 Vacuum can be generated.
- line 5 is connected a vacuum source (see. Fig. 3) connected, in which 5 shut-off devices leading to the vacuum source can be provided.
- a vacuum source see. Fig. 3
- 5 shut-off devices leading to the vacuum source can be provided in the wall of line 2 are in Area of the chamber 3 several through openings 7 (in In principle, a single through opening 7) is sufficient.
- the through openings 7 can be designed as perforations be so have a very small diameter.
- the Distance of the area in which the through openings 7 in the pipeline 2 are provided, from the outlet opening 6 the line 2 can be chosen arbitrarily small.
- measures can be provided with which the Passages 7 closed in the wall of line 2 when liquid flows through line 2.
- Such Measures can be shut-off devices, e.g. in shape a sleeve rotatable relative to the end of the line 2, in the holes are provided. If the sleeve is twisted like this, that the holes in the sleeve with the passage opening 7th align, the negative pressure in chamber 3 acts for suction of liquid residues.
- FIG. 3 A possible circuit, like the device 1 only when needed made effective, so the chamber 3 with negative pressure can be applied is shown in Fig. 3.
- Line 8 is a compressed air line that divides into two branches.
- the simultaneous shutdown of the liquid flow 9 in the Line 2 and switching on the vacuum in chamber 3 can be ensured in the following way.
- Over a Venturi nozzle 12 with the compressed air flow 11 in one Branch of the compressed air line 8 generates a suction stream 10 which the chamber 3 is subjected to negative pressure.
- This with compressed air controlled valves by switching the Control air from one valve to another with a three-way valve 15 reached.
- the valve 13 for the liquid flow can, but does not have to be designed as a return valve.
- the negative pressure can be generated by a vacuum pump become.
- the suction flow is via its own Valve switched.
- the simultaneous switching off of the Liquid flow and switching on of the suction flow takes place in this case e.g. electric.
- the Drop suction device 1 has a housing 4, which the End of the line 2 surrounds forming a chamber 3.
- the Chamber 3 protrudes with the inside of line 2 Through openings 7 in connection and can be used for suction in the area of the outlet opening 6 after switching off the Liquid flow remaining through line 2 Liquid residues via a line 5 with negative pressure be charged.
- a circuit is proposed which only operates the droplet suction device 1, e.g. the chamber 3 pressurized when the Liquid flow through line 2 through line 2 assigned shut-off device is interrupted.
Landscapes
- Coating Apparatus (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Claims (12)
- Dispositif pour empêcher le gouttage de liquide par l'orifice de sortie (6) d'une conduite (2) lorsque l'écoulement de liquide dans la tuyauterie (2) a été interrompu, un dispositif (1) qui élimine par aspiration au niveau de l'orifice de sortie le liquide qui restant dans la région de l'orifice de sortie (6) étant prévu dans la région de l'orifice de sortie(6), caractérisé en ce que le dispositif (1) comprend une chambre (3) alimentée avec une pression négative, qui entoure la conduite et communique avec l'intérieur de la conduite (2) par l'intermédiaire d'au moins un orifice de passage (7) aménagé à distance de l'orifice de sortie (6) de la conduite (6).
- Dispositif selon la revendication 1, caractérisé en ce que la chambre (3) est prévue à distance de l'orifice de sortie (6) de la conduite (2).
- Dispositif selon la revendication 1 ou 2, caractérisé en ce que la chambre (3) est délimitée par une enceinte (4) disposée dans la région de l'orifice de sortie (6) de la conduite (2).
- Dispositif selon la revendication 3, caractérisé en ce qu'une conduite (5) menant à un dispositif (12) de production de pression négative est connectée à l'enceinte (4).
- Dispositif selon la revendication 3 ou 4, caractérisé en ce que la chambre (3) et l'enceinte (4) sont disposées autour de la conduite (2).
- Dispositif selon une des revendications 1 à 5, caractérisé en ce que plusieurs orifices de passage (7) sont répartis sur le pourtour de la conduite (2).
- Dispositif selon une des revendications 1 à 6, caractérisé en ce que l'organe d'arrêt (13) dans la conduite (2) est relié sur le plan fonctionnel à un organe d'arrêt (14) inséré dans la tuyauterie (5) menant au dispositif (12) de production de pression négative, de telle sorte que l'organe d'arrêt (14) prévu dans la conduite de pression négative (5) soit ouvert lorsque l'organe d'arrêt (13) dans la conduite (2) est fermé.
- Dispositif selon une des revendications 4 à 7, caractérisé en ce que le dispositif (12) de production de pression négative est un dispositif comportant une buse de venturi (12).
- Dispositif selon une des revendications 4 à 8, caractérisé en ce qu'un pare-gouttes (16) est prévu dans la conduite (5) menant au dispositif (12) de production de pression négative (12).
- Dispositif selon la revendication 9, caractérisé en ce qu'une conduite (18) à travers laquelle le liquide est évacué part du pare-gouttes (16).
- Dispositif selon la revendication 9, caractérisé en ce qu'une conduite (19) à travers laquelle le liquide est ramené dans le circuit de liquide part du pare-gouttes (16).
- Dispositif selon une des revendications 7 à 11, caractérisé en ce qu'un organe de retard est disposé dans la liaison fonctionnelle entre l'organe d'arrêt (13) dans la conduite (2) et l'organe d'arrêt (14) dans la conduite (5) menant au dispositif (12) de production de pression négative.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT1578/97 | 1997-09-18 | ||
AT0157897A AT407385B (de) | 1997-09-18 | 1997-09-18 | Anordnung um das nachtropfen von flüssigkeiten aus leitungen zu verhindern |
AT157897 | 1997-09-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0906888A1 EP0906888A1 (fr) | 1999-04-07 |
EP0906888B1 true EP0906888B1 (fr) | 2001-07-11 |
Family
ID=3516448
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98115683A Expired - Lifetime EP0906888B1 (fr) | 1997-09-18 | 1998-08-20 | Dispositif pour éviter le gouttage à un orifice de distribution |
Country Status (7)
Country | Link |
---|---|
US (1) | US6056208A (fr) |
EP (1) | EP0906888B1 (fr) |
JP (1) | JP3437773B2 (fr) |
KR (1) | KR100493254B1 (fr) |
AT (1) | AT407385B (fr) |
DE (1) | DE59800986D1 (fr) |
TW (1) | TW440539B (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4375230A1 (fr) * | 2022-11-25 | 2024-05-29 | Alfa Laval Corporate AB | Dispositif de remplissage pour remplir des récipients avec des produits liquides |
Families Citing this family (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6789748B2 (en) * | 2001-02-14 | 2004-09-14 | Valiant Corporation | Water jet |
JP2004131180A (ja) * | 2002-07-09 | 2004-04-30 | Imi Cornelius (Uk) Ltd | 飲料の注出における改良または飲料の注出に関連する改良 |
JP2006010038A (ja) * | 2004-06-29 | 2006-01-12 | Smc Corp | サックバックバルブ |
JP2006010037A (ja) * | 2004-06-29 | 2006-01-12 | Smc Corp | サックバックバルブ |
US7193295B2 (en) * | 2004-08-20 | 2007-03-20 | Semitool, Inc. | Process and apparatus for thinning a semiconductor workpiece |
US7354649B2 (en) | 2004-08-20 | 2008-04-08 | Semitool, Inc. | Semiconductor workpiece |
US20060046499A1 (en) * | 2004-08-20 | 2006-03-02 | Dolechek Kert L | Apparatus for use in thinning a semiconductor workpiece |
US20060040111A1 (en) * | 2004-08-20 | 2006-02-23 | Dolechek Kert L | Process chamber and system for thinning a semiconductor workpiece |
US7288489B2 (en) * | 2004-08-20 | 2007-10-30 | Semitool, Inc. | Process for thinning a semiconductor workpiece |
SI1890823T1 (sl) | 2005-05-06 | 2013-12-31 | Dieter Wurz | Pršilna šoba, pršilni sestav in postopek za obratovanje pršilne šobe in pršilnega sestava |
JP5440011B2 (ja) * | 2009-07-31 | 2014-03-12 | カシオ計算機株式会社 | 吐出ノズル、吐出装置及び塗布装置 |
WO2011080754A2 (fr) * | 2009-12-29 | 2011-07-07 | Indian Oil Corporation Ltd. | Ensemble de buses d'alimentation |
TWI585885B (zh) * | 2015-09-11 | 2017-06-01 | 辛耘企業股份有限公司 | 管尾關斷裝置以及基板處理裝置 |
US10023333B2 (en) * | 2016-03-07 | 2018-07-17 | The Procter & Gamble Company | Vacuum assisted nozzle and apparatus |
CN106956790B (zh) * | 2017-03-31 | 2020-12-29 | 长春融成智能设备制造股份有限公司 | 一种基于内回流式充料枪的防爆灌装机器人系统 |
NL2019096B1 (en) | 2017-06-20 | 2018-12-27 | Suss Microtec Lithography Gmbh | Nozzle tip adapter, nozzle assembly as well as nozzle |
CN107619012A (zh) * | 2017-09-29 | 2018-01-23 | 重庆尚洁日化用品有限公司 | 一种洗发水灌装机 |
JP7312304B2 (ja) * | 2018-09-21 | 2023-07-20 | 株式会社Screenホールディングス | 基板処理装置、及び基板処理方法 |
US10988363B1 (en) | 2019-02-06 | 2021-04-27 | Owens-Brockway Glass Container Inc. | System for preventing dripping from nozzles in a container filling system |
CN111960362B (zh) * | 2020-07-28 | 2021-12-14 | 江苏源泉泵业股份有限公司 | 一种水泵式灌装设备 |
CN114572439B (zh) * | 2022-04-07 | 2023-10-17 | 台州市祥珑食品容器科技股份有限公司 | 一种灌装管控制结构 |
CN114890366B (zh) * | 2022-05-28 | 2024-05-24 | 佛山市晋雄实业有限公司 | 一种瓶装化妆品定量包装装置及方法 |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE250846C (fr) * | ||||
US3583634A (en) * | 1968-12-02 | 1971-06-08 | Fmc Corp | Spray nozzle |
US3792724A (en) * | 1972-05-15 | 1974-02-19 | Delamere & Williams Co Ltd | Bag filling machine |
GB2002331A (en) * | 1977-08-09 | 1979-02-21 | Albro Fillers & Eng Co Ltd | Filling-nozzle wipers |
US4362572A (en) * | 1981-06-25 | 1982-12-07 | Burroughs Corporation | Method and apparatus for cleaning ink jet printer heads |
JPS58156567U (ja) * | 1982-04-12 | 1983-10-19 | トヨタ自動車株式会社 | 高粘弾性流体用ノズル |
JPS5984790A (ja) * | 1982-09-13 | 1984-05-16 | ハ−マン・ロ−ブ・ザ・サ−ド | 液体充填ノズル装置 |
US4634027A (en) * | 1985-01-04 | 1987-01-06 | Mvm Valve Co., Inc. | Liquid dispensing apparatus and an anti-drip valve cartridge therefor |
DD250846A3 (de) * | 1985-08-30 | 1987-10-28 | Colditz Veb Porzellan | Kammerventil zum tropfenfreien schliessen von fluessigkeitsbehaeltern |
US4911267A (en) * | 1987-08-31 | 1990-03-27 | Yohwa Trading Co., Ltd. | Oiler with drippage preventing device |
AT389959B (de) | 1987-11-09 | 1990-02-26 | Sez Semiconduct Equip Zubehoer | Vorrichtung zum aetzen von scheibenfoermigen gegenstaenden, insbesondere von siliziumscheiben |
US5016687A (en) * | 1989-06-15 | 1991-05-21 | Shikoku Kakoki Co., Ltd. | Device for preventing liquid from dripping from filling nozzle of liquid filling machine |
JPH0494589A (ja) * | 1990-08-10 | 1992-03-26 | Matsushita Electric Ind Co Ltd | 電子部品固定用接着剤塗布装置 |
ZA915594B (en) * | 1990-08-13 | 1993-03-31 | Colgate Palmolive Co | Package filling method and apparatus |
JPH04309460A (ja) * | 1991-04-04 | 1992-11-02 | Matsushita Electric Ind Co Ltd | クリームはんだ塗布装置 |
JPH06244543A (ja) * | 1993-02-17 | 1994-09-02 | Matsushita Electric Ind Co Ltd | 接着剤塗布装置用の接着剤塗布ノズル |
JPH0768208A (ja) * | 1993-09-06 | 1995-03-14 | Matsushita Electric Ind Co Ltd | 間欠塗布装置 |
JPH0975818A (ja) * | 1995-09-20 | 1997-03-25 | Matsushita Electric Ind Co Ltd | 塗布装置 |
US5756155A (en) * | 1996-01-22 | 1998-05-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Combination nozzle and vacuum hood that is self cleaning |
US5720433A (en) * | 1996-01-30 | 1998-02-24 | Dexter Corporation | Draw back valve for a glue gun |
US5830334A (en) * | 1996-11-07 | 1998-11-03 | Kobayashi; Hideyuki | Nozzle for fast plating with plating solution jetting and suctioning functions |
JP3940853B2 (ja) * | 1997-03-11 | 2007-07-04 | Smc株式会社 | サックバックバルブ |
JP3951150B2 (ja) * | 1997-04-09 | 2007-08-01 | Smc株式会社 | サックバックバルブ |
-
1997
- 1997-09-18 AT AT0157897A patent/AT407385B/de not_active IP Right Cessation
-
1998
- 1998-08-20 DE DE59800986T patent/DE59800986D1/de not_active Expired - Lifetime
- 1998-08-20 EP EP98115683A patent/EP0906888B1/fr not_active Expired - Lifetime
- 1998-09-01 KR KR10-1998-0035814A patent/KR100493254B1/ko not_active IP Right Cessation
- 1998-09-17 JP JP26356898A patent/JP3437773B2/ja not_active Expired - Fee Related
- 1998-09-18 US US09/156,598 patent/US6056208A/en not_active Expired - Lifetime
- 1998-10-09 TW TW087116804A patent/TW440539B/zh not_active IP Right Cessation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP4375230A1 (fr) * | 2022-11-25 | 2024-05-29 | Alfa Laval Corporate AB | Dispositif de remplissage pour remplir des récipients avec des produits liquides |
WO2024110549A1 (fr) * | 2022-11-25 | 2024-05-30 | Alfa Laval Corporate Ab | Dispositif de remplissage permettant de remplir des récipients avec des produits liquides |
Also Published As
Publication number | Publication date |
---|---|
JPH11179265A (ja) | 1999-07-06 |
KR19990029405A (ko) | 1999-04-26 |
US6056208A (en) | 2000-05-02 |
JP3437773B2 (ja) | 2003-08-18 |
ATA157897A (de) | 2000-07-15 |
DE59800986D1 (de) | 2001-08-16 |
TW440539B (en) | 2001-06-16 |
EP0906888A1 (fr) | 1999-04-07 |
KR100493254B1 (ko) | 2005-10-25 |
AT407385B (de) | 2001-02-26 |
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