EE200800048A - Deformeeritud metallesemete tootmise meetodid - Google Patents

Deformeeritud metallesemete tootmise meetodid

Info

Publication number
EE200800048A
EE200800048A EEP200800048A EEP200800048A EE200800048A EE 200800048 A EE200800048 A EE 200800048A EE P200800048 A EEP200800048 A EE P200800048A EE P200800048 A EEP200800048 A EE P200800048A EE 200800048 A EE200800048 A EE 200800048A
Authority
EE
Estonia
Prior art keywords
production
methods
metal objects
deformed metal
deformed
Prior art date
Application number
EEP200800048A
Other languages
English (en)
Inventor
M. Carpenter Craig
D. Maguire James
Original Assignee
Cabot Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cabot Corporation filed Critical Cabot Corporation
Publication of EE200800048A publication Critical patent/EE200800048A/et
Publication of EE05493B1 publication Critical patent/EE05493B1/et

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/08Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling structural sections, i.e. work of special cross-section, e.g. angle steel
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/02Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling heavy work, e.g. ingots, slabs, blooms, or billets, in which the cross-sectional form is unimportant ; Rolling combined with forging or pressing
    • B21B1/026Rolling
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B1/00Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations
    • B21B1/08Metal-rolling methods or mills for making semi-finished products of solid or profiled cross-section; Sequence of operations in milling trains; Layout of rolling-mill plant, e.g. grouping of stands; Succession of passes or of sectional pass alternations for rolling structural sections, i.e. work of special cross-section, e.g. angle steel
    • B21B1/0805Flat bars, i.e. having a substantially rectangular cross-section
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C27/00Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
    • C22C27/02Alloys based on vanadium, niobium, or tantalum
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18High-melting or refractory metals or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/16Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
    • C22F1/18High-melting or refractory metals or alloys based thereon
    • C22F1/183High-melting or refractory metals or alloys based thereon of titanium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12993Surface feature [e.g., rough, mirror]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)
  • Metal Rolling (AREA)
  • Control Of Metal Rolling (AREA)
EEP200800048A 2006-03-07 2007-03-06 Meetod l?pliku paksusega metallesemete valmistamiseks, saadud metallplaat ja selle valmistamiseks kasutatav BCC- metall EE05493B1 (et)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US77973506P 2006-03-07 2006-03-07
PCT/US2007/005584 WO2007103309A2 (en) 2006-03-07 2007-03-06 Methods of producing deformed metal articles

Publications (2)

Publication Number Publication Date
EE200800048A true EE200800048A (et) 2008-10-15
EE05493B1 EE05493B1 (et) 2011-12-15

Family

ID=38475466

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200800048A EE05493B1 (et) 2006-03-07 2007-03-06 Meetod l?pliku paksusega metallesemete valmistamiseks, saadud metallplaat ja selle valmistamiseks kasutatav BCC- metall

Country Status (12)

Country Link
US (2) US8382920B2 (et)
JP (1) JP5114812B2 (et)
KR (1) KR101466996B1 (et)
CN (1) CN101374611B (et)
AT (1) AT506547B1 (et)
CZ (1) CZ308045B6 (et)
DE (1) DE112007000440B4 (et)
EE (1) EE05493B1 (et)
FR (1) FR2900584A1 (et)
IE (1) IE86184B1 (et)
TW (1) TWI445834B (et)
WO (1) WO2007103309A2 (et)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8381385B2 (en) * 2004-12-27 2013-02-26 Tri-Arrows Aluminum Inc. Shaped direct chill aluminum ingot
US20060137851A1 (en) * 2004-12-27 2006-06-29 Gyan Jha Shaped direct chill aluminum ingot
US7776166B2 (en) * 2006-12-05 2010-08-17 Praxair Technology, Inc. Texture and grain size controlled hollow cathode magnetron targets and method of manufacture
US7754027B2 (en) * 2007-08-27 2010-07-13 China Steel Corporation Method for manufacturing a sputtering target
WO2010028495A1 (en) * 2008-09-10 2010-03-18 9128-5270 Quebec Inc. Process for making high electrical conductivity aluminium plates
CN102245795B (zh) * 2008-10-10 2013-06-26 东曹Smd有限公司 用于溅射靶制造的圆形凹槽挤压机构和方法
US9150957B2 (en) 2008-11-03 2015-10-06 Tosoh Smd, Inc. Method of making a sputter target and sputter targets made thereby
US20100180427A1 (en) * 2009-01-16 2010-07-22 Ford Motor Company Texturing of thin metal sheets/foils for enhanced formability and manufacturability
CN102378825B (zh) 2009-03-31 2013-10-23 吉坤日矿日石金属株式会社 溅射用镧靶
US20100330389A1 (en) * 2009-06-25 2010-12-30 Ford Motor Company Skin pass for cladding thin metal sheets
JP5291754B2 (ja) 2011-04-15 2013-09-18 三井金属鉱業株式会社 太陽電池用スパッタリングターゲット
ES2736006T3 (es) * 2011-10-07 2019-12-23 Bharat Forge Ltd Proceso para la fabricación de componentes forjados y maquinados
KR101690394B1 (ko) * 2012-03-21 2016-12-27 제이엑스금속주식회사 탄탈 스퍼터링 타깃의 제조 방법
CN102873093B (zh) * 2012-10-31 2014-12-03 西安诺博尔稀贵金属材料有限公司 一种大尺寸钽板材的制备方法
JP5905600B2 (ja) * 2013-03-04 2016-04-20 Jx金属株式会社 タンタルスパッタリングターゲット及びその製造方法
CN104561912B (zh) * 2013-10-15 2017-10-13 宁波江丰电子材料股份有限公司 钛聚焦环的制作方法
JP6599234B2 (ja) * 2013-10-29 2019-10-30 株式会社東芝 スパッタリングターゲットおよびその製造方法、ならびに半導体素子の製造方法
JP5828350B2 (ja) * 2014-04-11 2015-12-02 三菱マテリアル株式会社 円筒型スパッタリングターゲット用素材の製造方法
EP3275585B1 (en) 2015-03-26 2019-12-25 Institute of Metal Research Chinese Academy of Sciences Constructing and forging method for preparing homogenized forged pieces
JP7021069B2 (ja) * 2015-08-03 2022-02-16 ハネウェル・インターナショナル・インコーポレーテッド 向上した特性を有する無摩擦鍛造アルミニウム合金スパッタリングターゲット
US10371650B2 (en) * 2016-09-22 2019-08-06 Advanced Manufacturing LLC Macrotexture map visualizing texture heterogeneity in polycrystalline parts
US10900102B2 (en) 2016-09-30 2021-01-26 Honeywell International Inc. High strength aluminum alloy backing plate and methods of making
CN106893989B (zh) * 2016-12-29 2019-10-01 昆山全亚冠环保科技有限公司 一种银钛合金靶材防开裂轧制工艺
US11062889B2 (en) 2017-06-26 2021-07-13 Tosoh Smd, Inc. Method of production of uniform metal plates and sputtering targets made thereby
CN110000211A (zh) * 2018-01-05 2019-07-12 宁波江丰电子材料股份有限公司 靶材轧制方法
KR102117404B1 (ko) * 2018-05-10 2020-06-01 재단법인 포항산업과학연구원 스퍼터링 폐타겟으로부터 유가금속 회수방법 및 공정 부산물 재활용 방법
CN114650974B (zh) * 2019-09-18 2023-08-29 麻省理工学院 用于制造锋利边缘的系统、组合物和方法
CN113231465B (zh) * 2021-05-13 2022-05-13 太原理工大学 一种大尺寸Ni-Ni3Al-NiAl层状结构复合板的制备方法
CN113351676B (zh) * 2021-06-09 2024-04-12 湖北美科精毅科技有限公司 宽幅整体挤压壁板和轧制板材组织性能及尺寸均匀性控制方法
CN113751637B (zh) * 2021-09-16 2023-08-18 湖南湘投金天钛业科技股份有限公司 一种提高大规格钛板坯成品率的锻造方法
WO2023224084A1 (ja) * 2022-05-19 2023-11-23 東ソー株式会社 金属スパッタリングターゲット及びその製造方法、並びに、金属材料及びその製造方法

Family Cites Families (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1370328A (en) * 1921-03-01 Method of making tubes
US2516863A (en) * 1946-07-15 1950-08-01 Gardner Daniel Process of producing tantalum, columbium, and compounds thereof
DE1849708U (de) * 1959-06-11 1962-04-12 Siemag Siegener Masch Bau Hilfsvorrichtung fuer das pruefen der oberflaechenbeschaffenheit von walzgutknueppeln.
US3489533A (en) * 1967-03-01 1970-01-13 Fansteel Inc Refractory metal sheet
FR2129996B1 (et) * 1971-03-25 1975-01-17 Centre Nat Etd Spatiales
US3954514A (en) * 1975-04-02 1976-05-04 Lockheed Missiles & Space Company, Inc. Textureless forging of beryllium
DE2517180C3 (de) * 1975-04-18 1979-04-19 Fa. Hermann C. Starck Berlin, 1000 Berlin Verfahren zur kontinuierlichen Herstellung von feinem hochkapazitiven Erdsäuremetallpulver für Elektrolytkondensatoren
US4092181A (en) * 1977-04-25 1978-05-30 Rockwell International Corporation Method of imparting a fine grain structure to aluminum alloys having precipitating constituents
US4141719A (en) * 1977-05-31 1979-02-27 Fansteel Inc. Tantalum metal powder
FR2475426A1 (fr) * 1980-02-12 1981-08-14 Secim Procede de realisation de fils metalliques
FR2529578B1 (fr) * 1982-07-02 1986-04-11 Cegedur Procede pour ameliorer a la fois la resistance a la fatigue et la tenacite des alliages d'al a haute resistance
JPS61210158A (ja) * 1985-03-15 1986-09-18 Sumitomo Metal Ind Ltd 超塑性2相ステンレス鋼およびその熱間加工法
US4721537A (en) * 1985-10-15 1988-01-26 Rockwell International Corporation Method of producing a fine grain aluminum alloy using three axes deformation
US4684399A (en) * 1986-03-04 1987-08-04 Cabot Corporation Tantalum powder process
JPH0621346B2 (ja) 1986-06-11 1994-03-23 日本鉱業株式会社 高純度金属タンタル製ターゲットの製造方法
US4722754A (en) 1986-09-10 1988-02-02 Rockwell International Corporation Superplastically formable aluminum alloy and composite material
JPS63216966A (ja) * 1987-03-06 1988-09-09 Toshiba Corp スパツタタ−ゲツト
DE3712281A1 (de) * 1987-04-10 1988-10-27 Heraeus Gmbh W C Verfahren zur herstellung von hochduktilem tantal-halbzeug
JPH01290766A (ja) 1988-05-18 1989-11-22 Nippon Mining Co Ltd Ti含有高純度Taターゲット及びその製造方法
JP3031474B2 (ja) 1989-12-26 2000-04-10 株式会社東芝 高純度タンタル材,タンタルターゲット,薄膜および半導体装置の製造方法
CH682326A5 (et) * 1990-06-11 1993-08-31 Alusuisse Lonza Services Ag
DE4021207A1 (de) * 1990-07-03 1992-01-16 Starck Hermann C Fa Verfahren zur gewinnung und trennung von tantal und niob
FR2664618B1 (fr) * 1990-07-10 1993-10-08 Pechiney Aluminium Procede de fabrication de cathodes pour pulverisation cathodique a base d'aluminium de tres haute purete.
JPH04178940A (ja) 1990-11-13 1992-06-25 Mitsubishi Kasei Corp 光記録媒体
US5087297A (en) * 1991-01-17 1992-02-11 Johnson Matthey Inc. Aluminum target for magnetron sputtering and method of making same
US5693159A (en) * 1991-04-15 1997-12-02 United Technologies Corporation Superalloy forging process
US5370839A (en) * 1991-07-05 1994-12-06 Nippon Steel Corporation Tial-based intermetallic compound alloys having superplasticity
DE4207145C1 (en) 1992-03-06 1993-04-29 H.C. Starck Gmbh & Co Kg, 3380 Goslar, De Hydro:methallurgical process for recovery of tantalum and niobium - by digesting material e.g. columbite ore with hydrofluoric acid followed by solvent extn. of formed fluoro:complexes
JP3197640B2 (ja) 1992-11-30 2001-08-13 朝日興業株式会社 気泡発生装置
JPH06264232A (ja) 1993-03-12 1994-09-20 Nikko Kinzoku Kk Ta製スパッタリングタ−ゲットとその製造方法
DE4404374C1 (de) 1994-02-11 1995-05-18 Starck H C Gmbh Co Kg Verfahren zur Gewinnung und Trennung von Tantal und Niob
US5687600A (en) * 1994-10-26 1997-11-18 Johnson Matthey Electronics, Inc. Metal sputtering target assembly
US5850755A (en) * 1995-02-08 1998-12-22 Segal; Vladimir M. Method and apparatus for intensive plastic deformation of flat billets
US5665180A (en) * 1995-06-07 1997-09-09 The United States Of America As Represented By The Secretary Of The Air Force Method for hot rolling single crystal nickel base superalloys
US5993513A (en) 1996-04-05 1999-11-30 Cabot Corporation Method for controlling the oxygen content in valve metal materials
FR2756572B1 (fr) * 1996-12-04 1999-01-08 Pechiney Aluminium Alliages d'aluminium a temperature de recristallisation elevee utilisee dans les cibles de pulverisation cathodiques
US6569270B2 (en) * 1997-07-11 2003-05-27 Honeywell International Inc. Process for producing a metal article
US6323055B1 (en) 1998-05-27 2001-11-27 The Alta Group, Inc. Tantalum sputtering target and method of manufacture
US6348139B1 (en) 1998-06-17 2002-02-19 Honeywell International Inc. Tantalum-comprising articles
US6193821B1 (en) * 1998-08-19 2001-02-27 Tosoh Smd, Inc. Fine grain tantalum sputtering target and fabrication process
US6348113B1 (en) 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
JP3527647B2 (ja) 1998-11-27 2004-05-17 住友電装株式会社 抵抗溶接用電極の製造方法および抵抗溶接用電極
JP3997375B2 (ja) * 1999-07-30 2007-10-24 日立電線株式会社 スパッタ用銅ターゲット材およびその製造方法
US20040072009A1 (en) * 1999-12-16 2004-04-15 Segal Vladimir M. Copper sputtering targets and methods of forming copper sputtering targets
US6331233B1 (en) * 2000-02-02 2001-12-18 Honeywell International Inc. Tantalum sputtering target with fine grains and uniform texture and method of manufacture
DE60136351D1 (de) * 2000-05-22 2008-12-11 Cabot Corp Hochreines niobmetall und erzeugnisse daraus und verfahren zu dessen herstellung
US6462339B1 (en) 2000-09-20 2002-10-08 Cabot Corporation Method for quantifying the texture homogeneity of a polycrystalline material
US6946039B1 (en) * 2000-11-02 2005-09-20 Honeywell International Inc. Physical vapor deposition targets, and methods of fabricating metallic materials
US6887356B2 (en) * 2000-11-27 2005-05-03 Cabot Corporation Hollow cathode target and methods of making same
IL156802A0 (en) * 2001-01-11 2004-02-08 Cabot Corp Tantalum and niobium billets and methods of producing same
PT1366203E (pt) 2001-02-20 2006-12-29 Starck H C Inc Placas de metal refratario de textura uniforme e métodos para a sua preparação
WO2003046250A1 (fr) * 2001-11-26 2003-06-05 Nikko Materials Company, Limited Cible de pulverisation et procede de fabrication associe
JP4376487B2 (ja) * 2002-01-18 2009-12-02 日鉱金属株式会社 高純度ニッケル合金ターゲットの製造方法
JP4883546B2 (ja) * 2002-09-20 2012-02-22 Jx日鉱日石金属株式会社 タンタルスパッタリングターゲットの製造方法
JP4178940B2 (ja) 2002-12-18 2008-11-12 Jfeスチール株式会社 耐二次加工脆性に優れた高強度薄鋼板およびその製造方法
US7067197B2 (en) * 2003-01-07 2006-06-27 Cabot Corporation Powder metallurgy sputtering targets and methods of producing same
US6890393B2 (en) 2003-02-07 2005-05-10 Advanced Steel Technology, Llc Fine-grained martensitic stainless steel and method thereof
US7228722B2 (en) * 2003-06-09 2007-06-12 Cabot Corporation Method of forming sputtering articles by multidirectional deformation
US20050252268A1 (en) * 2003-12-22 2005-11-17 Michaluk Christopher A High integrity sputtering target material and method for producing bulk quantities of same
WO2005064037A2 (en) * 2003-12-22 2005-07-14 Cabot Corporation High integrity sputtering target material and method for producing bulk quantities of same
US20060042728A1 (en) * 2004-08-31 2006-03-02 Brad Lemon Molybdenum sputtering targets
US7998287B2 (en) * 2005-02-10 2011-08-16 Cabot Corporation Tantalum sputtering target and method of fabrication

Also Published As

Publication number Publication date
KR20080098414A (ko) 2008-11-07
CN101374611A (zh) 2009-02-25
WO2007103309A3 (en) 2007-11-22
CN101374611B (zh) 2015-04-08
JP5114812B2 (ja) 2013-01-09
US20130149553A1 (en) 2013-06-13
EE05493B1 (et) 2011-12-15
CZ2008543A3 (cs) 2009-03-25
DE112007000440B4 (de) 2021-01-07
IE20070150A1 (en) 2013-02-27
TWI445834B (zh) 2014-07-21
US8974611B2 (en) 2015-03-10
FR2900584A1 (fr) 2007-11-09
AT506547A5 (de) 2012-12-15
AT506547A2 (de) 2009-10-15
JP2009528922A (ja) 2009-08-13
IE86184B1 (en) 2013-05-08
US20070209741A1 (en) 2007-09-13
US8382920B2 (en) 2013-02-26
DE112007000440T5 (de) 2009-04-09
WO2007103309A2 (en) 2007-09-13
AT506547B1 (de) 2013-02-15
TW200801214A (en) 2008-01-01
KR101466996B1 (ko) 2014-12-01
CZ308045B6 (cs) 2019-11-20

Similar Documents

Publication Publication Date Title
EE200800048A (et) Deformeeritud metallesemete tootmise meetodid
BRPI0719843A2 (pt) Método para a produção de bisbenzoxazóis
EP2038375A4 (en) METHOD FOR MANUFACTURING BASIC OIL
FI20060288A0 (fi) Pinnoitusmenetelmä
PL1903019T3 (pl) Sposób wytwarzania izoolefin
DE602007008968D1 (de) Verbundene Metallrohre
BRPI0719783A2 (pt) Estrutura de metal vertical
DE602007013995D1 (de) Beschichtungsverfahren
FI20060726A0 (fi) Menetelmä metallipulverin valmistamiseksi
ATE509171T1 (de) Metallprofil
BRPI0815419A2 (pt) Método de produção
FR2902096B1 (fr) Procede de preparation de dihydroxybenzenedisulfonates metalliques
PL380727A1 (pl) Sposób wytwarzania saletrosiarczanu amonowego
HK1134925A1 (en) Method for the production of benzofuran-2-carboxamides
ZA200903936B (en) Method for the production of an agent against an infectuous disease
ES1066467Y (es) Union de piezas artisticas de forja
GB0624861D0 (en) Production of Metal Sections
UA13545S (uk) Фільонка металева
UA13546S (uk) Фільонка металева
UA13657S (uk) Фільонка металева
UA13547S (uk) Фільонка металева
UA13860S (uk) Фільонка металева
GB0721032D0 (en) Production of metal sections
FI20060135A0 (fi) Menetelmä tuotteen jäähdyttämiseksi
TH102384B (th) Method for production of disposableabsorbent articles

Legal Events

Date Code Title Description
MM4A Lapsed by not paying the annual fees

Effective date: 20160306