FR2129996B1 - - Google Patents

Info

Publication number
FR2129996B1
FR2129996B1 FR7110598A FR7110598A FR2129996B1 FR 2129996 B1 FR2129996 B1 FR 2129996B1 FR 7110598 A FR7110598 A FR 7110598A FR 7110598 A FR7110598 A FR 7110598A FR 2129996 B1 FR2129996 B1 FR 2129996B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7110598A
Other languages
French (fr)
Other versions
FR2129996A1 (et
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National dEtudes Spatiales CNES
Original Assignee
Centre National dEtudes Spatiales CNES
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National dEtudes Spatiales CNES filed Critical Centre National dEtudes Spatiales CNES
Priority to FR7110598A priority Critical patent/FR2129996B1/fr
Priority to US236609A priority patent/US3925187A/en
Publication of FR2129996A1 publication Critical patent/FR2129996A1/fr
Application granted granted Critical
Publication of FR2129996B1 publication Critical patent/FR2129996B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/46—Sputtering by ion beam produced by an external ion source

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
FR7110598A 1971-03-25 1971-03-25 Expired FR2129996B1 (et)

Priority Applications (2)

Application Number Priority Date Filing Date Title
FR7110598A FR2129996B1 (et) 1971-03-25 1971-03-25
US236609A US3925187A (en) 1971-03-25 1972-03-21 Apparatus for the formation of coatings on a substratum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7110598A FR2129996B1 (et) 1971-03-25 1971-03-25

Publications (2)

Publication Number Publication Date
FR2129996A1 FR2129996A1 (et) 1972-11-03
FR2129996B1 true FR2129996B1 (et) 1975-01-17

Family

ID=9074128

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7110598A Expired FR2129996B1 (et) 1971-03-25 1971-03-25

Country Status (2)

Country Link
US (1) US3925187A (et)
FR (1) FR2129996B1 (et)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH611938A5 (et) * 1976-05-19 1979-06-29 Battelle Memorial Institute
US4199448A (en) * 1976-06-09 1980-04-22 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Reverse osmosis membrane of high urea rejection properties
US4142958A (en) * 1978-04-13 1979-03-06 Litton Systems, Inc. Method for fabricating multi-layer optical films
USRE32849E (en) * 1978-04-13 1989-01-31 Litton Systems, Inc. Method for fabricating multi-layer optical films
DE2847620C2 (de) * 1978-11-02 1984-10-18 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur Herstellung von elektrischen Bauelementen, insbesondere Schichtkondensatoren
CH640886A5 (de) * 1979-08-02 1984-01-31 Balzers Hochvakuum Verfahren zum aufbringen harter verschleissfester ueberzuege auf unterlagen.
US4305801A (en) * 1980-04-16 1981-12-15 The United States Of America As Represented By The United States Department Of Energy Line-of-sight deposition method
US5250327A (en) * 1986-04-28 1993-10-05 Nissin Electric Co. Ltd. Composite substrate and process for producing the same
FR2619247A1 (fr) * 1987-08-05 1989-02-10 Realisations Nucleaires Et Implanteur d'ions metalliques
DE3737142A1 (de) * 1987-11-02 1989-05-11 Christiansen Jens Erzeugung von (duennen) schichten aus hochschmelzender bzw. sublimierender materie (leitender, halbleitender und nichtleitender) und gemischen davon mit pseudofunkenelektronenstrahlen
US5087478A (en) * 1989-08-01 1992-02-11 Hughes Aircraft Company Deposition method and apparatus using plasma discharge
US5601652A (en) * 1989-08-03 1997-02-11 United Technologies Corporation Apparatus for applying ceramic coatings
US5855950A (en) * 1996-12-30 1999-01-05 Implant Sciences Corporation Method for growing an alumina surface on orthopaedic implant components
GB2321063A (en) * 1997-01-08 1998-07-15 Oxford Plasma Technology Ltd Reactive particle beam sputtering
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
US6413380B1 (en) 2000-08-14 2002-07-02 International Business Machines Corporation Method and apparatus for providing deposited layer structures and articles so produced
AT506547B1 (de) 2006-03-07 2013-02-15 Cabot Corp Verfahren zur erzeugung verformter metallgegenstände

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3472751A (en) * 1965-06-16 1969-10-14 Ion Physics Corp Method and apparatus for forming deposits on a substrate by cathode sputtering using a focussed ion beam
US3484358A (en) * 1966-09-01 1969-12-16 Bell Telephone Labor Inc Method and apparatus for reactive sputtering wherein the sputtering target is contacted by an inert gas
US3408283A (en) * 1966-09-15 1968-10-29 Kennecott Copper Corp High current duoplasmatron having an apertured anode positioned in the low pressure region
GB1217685A (en) * 1967-06-05 1970-12-31 Smiths Industries Ltd Improvements in or relating to methods and apparatus for sputtering of materials
US3409529A (en) * 1967-07-07 1968-11-05 Kennecott Copper Corp High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability

Also Published As

Publication number Publication date
FR2129996A1 (et) 1972-11-03
USB236609I5 (et) 1975-01-28
US3925187A (en) 1975-12-09

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Legal Events

Date Code Title Description
ST Notification of lapse