DE69825511D1 - Herstellungsverfahren für Schichtstruktur aus Polysilizium und Wolframsilizid - Google Patents

Herstellungsverfahren für Schichtstruktur aus Polysilizium und Wolframsilizid

Info

Publication number
DE69825511D1
DE69825511D1 DE69825511T DE69825511T DE69825511D1 DE 69825511 D1 DE69825511 D1 DE 69825511D1 DE 69825511 T DE69825511 T DE 69825511T DE 69825511 T DE69825511 T DE 69825511T DE 69825511 D1 DE69825511 D1 DE 69825511D1
Authority
DE
Germany
Prior art keywords
polysilicon
manufacturing process
layer structure
tungsten silicide
silicide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69825511T
Other languages
English (en)
Other versions
DE69825511T2 (de
Inventor
Masato Koizumi
Kazuya Okubo
Tsuyoshi Takahashi
Tsuyoshi Hashimoto
Kimihiro Matsuse
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Application granted granted Critical
Publication of DE69825511D1 publication Critical patent/DE69825511D1/de
Publication of DE69825511T2 publication Critical patent/DE69825511T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/40—Electrodes ; Multistep manufacturing processes therefor
    • H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
    • H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
    • H01L29/4916—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a silicon layer, e.g. polysilicon doped with boron, phosphorus or nitrogen
    • H01L29/4925—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a silicon layer, e.g. polysilicon doped with boron, phosphorus or nitrogen with a multiple layer structure, e.g. several silicon layers with different crystal structure or grain arrangement
    • H01L29/4933—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET the conductor material next to the insulator being a silicon layer, e.g. polysilicon doped with boron, phosphorus or nitrogen with a multiple layer structure, e.g. several silicon layers with different crystal structure or grain arrangement with a silicide layer contacting the silicon layer, e.g. Polycide gate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/28008—Making conductor-insulator-semiconductor electrodes
    • H01L21/28017—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon
    • H01L21/28026—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor
    • H01L21/28035—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities
    • H01L21/28044—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer
    • H01L21/28061—Making conductor-insulator-semiconductor electrodes the insulator being formed after the semiconductor body, the semiconductor being silicon characterised by the conductor the final conductor layer next to the insulator being silicon, e.g. polysilicon, with or without impurities the conductor comprising at least another non-silicon conductive layer the conductor comprising a metal or metal silicide formed by deposition, e.g. sputter deposition, i.e. without a silicidation reaction
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76838—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the conductors
    • H01L21/76886—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances
    • H01L21/76889—Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances by forming silicides of refractory metals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
DE69825511T 1997-02-25 1998-02-25 Herstellungsverfahren für Schichtstruktur aus Polysilizium und Wolframsilizid Expired - Fee Related DE69825511T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP05699497A JP3635843B2 (ja) 1997-02-25 1997-02-25 膜積層構造及びその形成方法
JP5699497 1997-02-25

Publications (2)

Publication Number Publication Date
DE69825511D1 true DE69825511D1 (de) 2004-09-16
DE69825511T2 DE69825511T2 (de) 2005-08-04

Family

ID=13043053

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69825511T Expired - Fee Related DE69825511T2 (de) 1997-02-25 1998-02-25 Herstellungsverfahren für Schichtstruktur aus Polysilizium und Wolframsilizid

Country Status (6)

Country Link
US (2) US6404021B1 (de)
EP (2) EP0860863B1 (de)
JP (1) JP3635843B2 (de)
KR (1) KR100466152B1 (de)
DE (1) DE69825511T2 (de)
TW (1) TW410388B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7829144B2 (en) * 1997-11-05 2010-11-09 Tokyo Electron Limited Method of forming a metal film for electrode
US6130145A (en) * 1998-01-21 2000-10-10 Siemens Aktiengesellschaft Insitu doped metal policide
JPH11238697A (ja) * 1998-02-23 1999-08-31 Mitsubishi Electric Corp 半導体装置及びその製造方法
JPH11307765A (ja) * 1998-04-20 1999-11-05 Nec Corp 半導体装置及びその製造方法
JP2000150416A (ja) * 1998-09-01 2000-05-30 Tokyo Electron Ltd タングステンシリサイド膜及びその成膜方法
JP3437111B2 (ja) * 1999-02-15 2003-08-18 松下電器産業株式会社 半導体装置の製造方法
JP2000277447A (ja) 1999-03-24 2000-10-06 Tokyo Electron Ltd 薄膜の熱処理方法
KR100379107B1 (ko) * 2001-03-21 2003-04-07 삼성전자주식회사 반도체 장치에서 폴리사이드 구조물의 형성 방법
KR100447031B1 (ko) 2001-03-23 2004-09-07 삼성전자주식회사 텅스텐 실리사이드막의 형성방법
US6686637B1 (en) * 2002-11-21 2004-02-03 International Business Machines Corporation Gate structure with independently tailored vertical doping profile
JP2005353975A (ja) * 2004-06-14 2005-12-22 Oki Electric Ind Co Ltd 半導体装置、及びその製造方法
JP6102140B2 (ja) * 2012-09-20 2017-03-29 三菱電機株式会社 半導体装置

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6127627A (ja) 1984-07-18 1986-02-07 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
JPS6476759A (en) 1987-09-17 1989-03-22 Seiko Instr & Electronics Tungsten silicide film and manufacture thereof
JPH0212835A (ja) * 1988-06-30 1990-01-17 Toshiba Corp 半導体装置およびその製造方法
JPH0239471A (ja) 1988-07-28 1990-02-08 Fujitsu Ltd Ｍｏｓ電界効果トランジスタと導電体構造
JPH02155273A (ja) 1988-12-07 1990-06-14 Nec Corp Ｍｏｓ電界効果トランジスタ
JPH02181918A (ja) 1989-01-09 1990-07-16 Matsushita Electron Corp 半導体装置の製造方法
US4992391A (en) 1989-11-29 1991-02-12 Advanced Micro Devices, Inc. Process for fabricating a control gate for a floating gate FET
JP2558931B2 (ja) 1990-07-13 1996-11-27 株式会社東芝 半導体装置およびその製造方法
US5168072A (en) * 1990-10-12 1992-12-01 Texas Instruments Incorporated Method of fabricating an high-performance insulated-gate field-effect transistor
JPH05315333A (ja) 1991-04-22 1993-11-26 Toshiba Corp 半導体装置の製造方法
JPH04354118A (ja) 1991-05-31 1992-12-08 Mitsubishi Electric Corp 半導体装置の製造方法
US5355010A (en) * 1991-06-21 1994-10-11 Matsushita Electric Industrial Co., Ltd. Semiconductor device with a dual type polycide layer comprising a uniformly p-type doped silicide
US5147820A (en) 1991-08-26 1992-09-15 At&T Bell Laboratories Silicide formation on polysilicon
US5428244A (en) 1992-06-29 1995-06-27 Matsushita Electric Industrial Co., Ltd. Semiconductor device having a silicon rich dielectric layer
JPH06305409A (ja) 1993-04-23 1994-11-01 Jidosha Kiki Co Ltd マスタシリンダ
JPH07297400A (ja) 1994-03-01 1995-11-10 Hitachi Ltd 半導体集積回路装置の製造方法およびそれにより得られた半導体集積回路装置
KR0161398B1 (ko) * 1995-03-13 1998-12-01 김광호 고내압 트랜지스터 및 그 제조방법
EP0746027A3 (de) 1995-05-03 1998-04-01 Applied Materials, Inc. Auf einer integrierten Schaltung hergestellter Polysilizium/Wolframsilizid-Mehrschichtverbund und verbessertes Herstellungsverfahren
JPH0917705A (ja) 1995-06-28 1997-01-17 Tokyo Electron Ltd 連続熱処理方法
JPH0992728A (ja) * 1995-09-21 1997-04-04 Mitsubishi Electric Corp 相補型ｍｏｓ電界効果トランジスタおよびその製造方法
US5849629A (en) * 1995-10-31 1998-12-15 International Business Machines Corporation Method of forming a low stress polycide conductors on a semiconductor chip
US5710454A (en) * 1996-04-29 1998-01-20 Vanguard International Semiconductor Corporation Tungsten silicide polycide gate electrode formed through stacked amorphous silicon (SAS) multi-layer structure.
US5767558A (en) * 1996-05-10 1998-06-16 Integrated Device Technology, Inc. Structures for preventing gate oxide degradation
US5923999A (en) * 1996-10-29 1999-07-13 International Business Machines Corporation Method of controlling dopant diffusion and metal contamination in thin polycide gate conductor of mosfet device
US6335280B1 (en) * 1997-01-13 2002-01-01 Asm America, Inc. Tungsten silicide deposition process
US6001681A (en) * 1999-01-19 1999-12-14 Taiwan Semiconductor Manufacturing Company, Ltd. Method to reduce the depth of a buried contact trench by using a thin split polysilicon thickness

Also Published As

Publication number Publication date
KR19980071647A (ko) 1998-10-26
EP0860863A2 (de) 1998-08-26
EP1463098A3 (de) 2005-02-02
DE69825511T2 (de) 2005-08-04
JP3635843B2 (ja) 2005-04-06
EP0860863A3 (de) 1998-10-21
EP0860863B1 (de) 2004-08-11
US6404021B1 (en) 2002-06-11
US20020058384A1 (en) 2002-05-16
EP1463098A2 (de) 2004-09-29
JPH10242076A (ja) 1998-09-11
US6489208B2 (en) 2002-12-03
KR100466152B1 (ko) 2005-03-16
TW410388B (en) 2000-11-01

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee