DE69629287D1 - Polyimidharzzusammensetzung - Google Patents
PolyimidharzzusammensetzungInfo
- Publication number
- DE69629287D1 DE69629287D1 DE69629287T DE69629287T DE69629287D1 DE 69629287 D1 DE69629287 D1 DE 69629287D1 DE 69629287 T DE69629287 T DE 69629287T DE 69629287 T DE69629287 T DE 69629287T DE 69629287 D1 DE69629287 D1 DE 69629287D1
- Authority
- DE
- Germany
- Prior art keywords
- polyimide resin
- polyimide
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0387—Polyamides or polyimides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1007—Preparatory processes from tetracarboxylic acids or derivatives and diamines
- C08G73/1025—Preparatory processes from tetracarboxylic acids or derivatives and diamines polymerised by radiations
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/34—Heterocyclic compounds having nitrogen in the ring
- C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
- C08K5/3472—Five-membered rings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D179/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen, with or without oxygen, or carbon only, not provided for in groups C09D161/00 - C09D177/00
- C09D179/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C09D179/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Paints Or Removers (AREA)
- Preventing Corrosion Or Incrustation Of Metals (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11633695A JP3170174B2 (ja) | 1995-04-18 | 1995-04-18 | ポリイミド系樹脂組成物 |
JP11633695 | 1995-04-18 | ||
PCT/JP1996/001045 WO1996033239A1 (fr) | 1995-04-18 | 1996-04-17 | Composition de resine polyimide |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69629287D1 true DE69629287D1 (de) | 2003-09-04 |
DE69629287T2 DE69629287T2 (de) | 2004-06-17 |
Family
ID=14684441
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69629287T Expired - Fee Related DE69629287T2 (de) | 1995-04-18 | 1996-04-17 | Polyimidharzzusammensetzung |
Country Status (6)
Country | Link |
---|---|
US (3) | US6310135B1 (de) |
EP (1) | EP0822229B1 (de) |
JP (1) | JP3170174B2 (de) |
KR (1) | KR100442211B1 (de) |
DE (1) | DE69629287T2 (de) |
WO (1) | WO1996033239A1 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3170174B2 (ja) * | 1995-04-18 | 2001-05-28 | 日本ゼオン株式会社 | ポリイミド系樹脂組成物 |
JP3997487B2 (ja) * | 2001-05-30 | 2007-10-24 | 株式会社カネカ | 感光性樹脂組成物及びそれを用いた感光性ドライフィルムレジスト、感光性カバーレイフィルム |
US20030171812A1 (en) * | 2001-12-31 | 2003-09-11 | Ilan Grunberg | Minimally invasive modular support implant device and method |
JP4517640B2 (ja) * | 2003-09-04 | 2010-08-04 | 日立化成デュポンマイクロシステムズ株式会社 | 耐熱性感光性ポリイミド前駆体組成物及びそれを用いたパターン製造方法並びに電子部品 |
KR100562524B1 (ko) * | 2003-10-21 | 2006-03-23 | 한국화학연구원 | 평탄화 특성이 우수한 감광성 투명 폴리아믹산 올리고머와이를 경화하여 제조된 폴리이미드 수지 |
JP4701673B2 (ja) * | 2004-10-22 | 2011-06-15 | トヨタ自動車株式会社 | ブレーキシステム |
JP4657899B2 (ja) * | 2005-11-30 | 2011-03-23 | 富士通株式会社 | レジストパターン厚肉化材料、レジストパターンの形成方法、半導体装置及びその製造方法 |
KR100839760B1 (ko) * | 2006-02-06 | 2008-06-19 | 주식회사 엘지화학 | 칩 온 필름용 동장 적층판 |
JPWO2008020469A1 (ja) * | 2006-08-14 | 2010-01-07 | 日立化成デュポンマイクロシステムズ株式会社 | ポジ型感光性樹脂組成物、パターンの製造方法及び電子部品 |
EP2157209B1 (de) * | 2008-07-31 | 2014-10-22 | Rohm and Haas Electronic Materials LLC | Hemmung der Hintergrundplattierung |
WO2011025307A2 (ko) * | 2009-08-28 | 2011-03-03 | 주식회사 엘지화학 | 저온 경화성 감광성 수지 조성물 및 이를 이용하여 제조된 드라이 필름 |
JP5998546B2 (ja) * | 2012-03-13 | 2016-09-28 | 三菱化学株式会社 | カラーフィルタ用着色樹脂組成物、カラーフィルタ、液晶表示装置及び有機el表示装置 |
JP5940843B2 (ja) * | 2012-03-14 | 2016-06-29 | 四国化成工業株式会社 | 銅または銅合金の表面処理剤およびその利用 |
US9751984B2 (en) * | 2012-12-21 | 2017-09-05 | Hitachi Chemical Dupont Microsystems, Ltd. | Polyimide precursor, photosensitive resin composition containing said polyimide precursor, and cured-pattern-film manufacturing method and semiconductor device using said photosensitive resin composition |
CN104870565B (zh) | 2012-12-21 | 2019-04-26 | 日立化成杜邦微系统股份有限公司 | 聚酰亚胺前体树脂组合物 |
CN105829968B (zh) | 2013-10-09 | 2020-03-27 | 日立化成杜邦微系统股份有限公司 | 包含聚酰亚胺前体的树脂组合物和使用其的固化膜的制造方法 |
JP7091881B2 (ja) * | 2018-06-29 | 2022-06-28 | Hdマイクロシステムズ株式会社 | 樹脂組成物、硬化物の製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜及び電子部品 |
JP7171890B2 (ja) * | 2019-03-15 | 2022-11-15 | 富士フイルム株式会社 | 硬化性樹脂組成物、硬化膜、積層体、硬化膜の製造方法、半導体デバイス、及び、ポリマー前駆体 |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1803605A1 (de) * | 1968-10-17 | 1970-05-21 | Agfa Gevaert Ag | Photographisches Material |
US3615617A (en) * | 1968-12-03 | 1971-10-26 | Agfa Gevaert Ag | Stabilized photographic material with tetrazole thiocarbonic acid ester |
NL177718C (nl) | 1973-02-22 | 1985-11-01 | Siemens Ag | Werkwijze ter vervaardiging van reliefstructuren uit warmte-bestendige polymeren. |
GB1463659A (en) * | 1973-06-01 | 1977-02-02 | Agfa Gevaert | Development of exposed silver halide material in the presence of polyoxyalkylenes |
JPS5932319B2 (ja) * | 1974-03-22 | 1984-08-08 | 富士写真フイルム株式会社 | 記録材料 |
USRE30186E (en) | 1974-08-02 | 1980-01-08 | Siemens Aktiengesellschaft | Method for the preparation of relief structures |
DE2437348B2 (de) | 1974-08-02 | 1976-10-07 | Ausscheidung in: 24 62 105 | Verfahren zur herstellung von reliefstrukturen |
JPS5952822B2 (ja) | 1978-04-14 | 1984-12-21 | 東レ株式会社 | 耐熱性感光材料 |
JPS5839437B2 (ja) | 1978-08-24 | 1983-08-30 | 岩崎通信機株式会社 | ボタン電話装置における本電話機接続方式 |
JPS5541422A (en) | 1978-09-18 | 1980-03-24 | Fujitsu Ltd | Encipherment treatment system |
JPS5952822A (ja) | 1982-09-21 | 1984-03-27 | Toshiba Corp | 永久磁石の製造法 |
JP2516897B2 (ja) * | 1983-10-21 | 1996-07-24 | 信越化学工業株式会社 | 感光性組成物 |
JPS60157286A (ja) | 1984-01-27 | 1985-08-17 | 株式会社日立製作所 | フレキシブルプリント基板の製造方法 |
JPS6182326A (ja) * | 1984-09-29 | 1986-04-25 | Sony Corp | 磁気記録媒体 |
JP2640470B2 (ja) | 1987-08-19 | 1997-08-13 | 旭化成工業株式会社 | 新しい感光性組成物 |
JPH01174439A (ja) | 1987-12-28 | 1989-07-11 | Mitsui Toatsu Chem Inc | フレキシブル金属箔積層材 |
DE68919453T2 (de) | 1988-08-24 | 1995-03-30 | Asahi Chemical Ind | Vorläufer für ein Polymid mit geringer thermischer Spannung und einen Polymidvorläufer enthaltende photopolymensierbare Zusammensetzung. |
JP2821547B2 (ja) * | 1989-10-11 | 1998-11-05 | 三菱レイヨン株式会社 | 架橋硬化型樹脂組成物 |
US4985343A (en) | 1989-02-09 | 1991-01-15 | Mitsubishi Rayon Co., Ltd. | Crosslinking-curable resin composition |
JPH02228359A (ja) | 1989-03-01 | 1990-09-11 | Hitachi Chem Co Ltd | ポリアミド酸組成物 |
US4991285A (en) * | 1989-11-17 | 1991-02-12 | Rockwell International Corporation | Method of fabricating multi-layer board |
DE69030643T2 (de) * | 1989-11-30 | 1997-09-25 | Sumitomo Bakelite Co | Lichtempfindliche Harzzusammensetzung und ihre Verwendung zur Herstellung eines Halbleiterapparats |
US5346927A (en) | 1990-11-26 | 1994-09-13 | Toyo Kasei Kogyo Company, Ltd. | Blowing agents of the tetrazoles and their derivatives |
US5310862A (en) * | 1991-08-20 | 1994-05-10 | Toray Industries, Inc. | Photosensitive polyimide precursor compositions and process for preparing same |
JP2693670B2 (ja) * | 1991-11-06 | 1997-12-24 | 住友ベークライト株式会社 | 感光性樹脂組成物 |
JPH05198559A (ja) | 1992-01-21 | 1993-08-06 | Toray Ind Inc | ポリイミド・パタ−ンの形成方法 |
JP3102818B2 (ja) * | 1992-04-16 | 2000-10-23 | 日本ジーイープラスチックス株式会社 | レーザーマーキング用樹脂組成物 |
US5300403A (en) * | 1992-06-18 | 1994-04-05 | International Business Machines Corporation | Line width control in a radiation sensitive polyimide |
NL9300126A (nl) * | 1993-01-22 | 1994-08-16 | Od & Me Bv | Substraatplaat voor vervaardiging van matrijs voor produktie van optische registratiedragers en werkwijze voor het vervaardigen daarvan. |
US5756260A (en) * | 1993-02-16 | 1998-05-26 | Sumitomo Bakelite Company Limited | Photosensitive polyimide resin composition containing a stabilizer and method for formation of relief pattern using same |
JPH06242613A (ja) | 1993-02-18 | 1994-09-02 | Toray Ind Inc | ポリイミドパターンの形成方法 |
JP3051821B2 (ja) * | 1994-07-05 | 2000-06-12 | 信越化学工業株式会社 | 感光性樹脂組成物及びそれを用いるパターン化されたポリイミド皮膜の形成方法 |
JP3378375B2 (ja) | 1994-09-13 | 2003-02-17 | 日本ゼオン株式会社 | 感光性ポリイミド樹脂組成物 |
JP3378379B2 (ja) | 1994-09-26 | 2003-02-17 | 日本ゼオン株式会社 | 感光性ポリイミド樹脂組成物 |
JP3170174B2 (ja) * | 1995-04-18 | 2001-05-28 | 日本ゼオン株式会社 | ポリイミド系樹脂組成物 |
-
1995
- 1995-04-18 JP JP11633695A patent/JP3170174B2/ja not_active Expired - Fee Related
-
1996
- 1996-04-17 WO PCT/JP1996/001045 patent/WO1996033239A1/ja active IP Right Grant
- 1996-04-17 KR KR1019970707394A patent/KR100442211B1/ko not_active IP Right Cessation
- 1996-04-17 DE DE69629287T patent/DE69629287T2/de not_active Expired - Fee Related
- 1996-04-17 EP EP96910185A patent/EP0822229B1/de not_active Expired - Lifetime
- 1996-04-17 US US08/945,277 patent/US6310135B1/en not_active Expired - Lifetime
-
2001
- 2001-09-25 US US09/962,573 patent/US6734248B2/en not_active Expired - Fee Related
- 2001-09-25 US US09/962,637 patent/US6743851B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0822229B1 (de) | 2003-07-30 |
US6743851B2 (en) | 2004-06-01 |
US6310135B1 (en) | 2001-10-30 |
US20020032273A1 (en) | 2002-03-14 |
US6734248B2 (en) | 2004-05-11 |
JP3170174B2 (ja) | 2001-05-28 |
DE69629287T2 (de) | 2004-06-17 |
JPH08286374A (ja) | 1996-11-01 |
KR100442211B1 (ko) | 2004-10-14 |
KR19990007871A (ko) | 1999-01-25 |
WO1996033239A1 (fr) | 1996-10-24 |
EP0822229A4 (de) | 1998-07-15 |
US20020035196A1 (en) | 2002-03-21 |
EP0822229A1 (de) | 1998-02-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE69533393D1 (de) | Epoxyharzzusammensetzung | |
DE69629287D1 (de) | Polyimidharzzusammensetzung | |
DK0697439T3 (da) | Epoxyharpikssystem | |
DE69503151T2 (de) | Polyimid | |
DE69619903D1 (de) | Polyamidharzzusammensetzung | |
DE69628891D1 (de) | Polyacetalharzzusammensetzung | |
DE69618742D1 (de) | Schaltungsanordnung | |
DE69611199D1 (de) | Polyamidharzzusammensetzung | |
DE59610028D1 (de) | Schleuderdüngerstreuer | |
ID17236A (id) | Senyawa resin fenolat | |
DE59607444D1 (de) | Trampolin-Bahn | |
DE69406606D1 (de) | Polyimidharzzusammensetzung | |
DE69620843T2 (de) | Polyamidharz-Zusammensetzung | |
DE29501890U1 (de) | Trampolin | |
DE69619622T2 (de) | Schaltungsanordnung | |
NO962736L (no) | Modifiserte harpikser | |
KR970004284U (ko) | 수지쑥뜸기 | |
DE29520451U1 (de) | Kurzski | |
KR970044696U (ko) | 수지제 풀리 | |
KR970004285U (ko) | 수지침 시술용 침관 | |
KR970004287U (ko) | 수지침 | |
KR960031586U (ko) | 합성수지 침목 | |
KR970027104U (ko) | 수지침용 시술장치 | |
KR970004291U (ko) | 수지용 침 | |
KR950022787U (ko) | 수지운동기 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJITSU LTD., KAWASAKI, KANAGAWA, JP Owner name: NIPPON ZEON CO., LTD., TOKIO/TOKYO, JP |
|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |