DE69417684T2 - Leitfähige Pastenzusammensetzung zum Füllen von Kontaktlöchern, Leiterplatte unter Anwendung dieser leifähigen Paste und Verfahren zur Herstellung - Google Patents

Leitfähige Pastenzusammensetzung zum Füllen von Kontaktlöchern, Leiterplatte unter Anwendung dieser leifähigen Paste und Verfahren zur Herstellung

Info

Publication number
DE69417684T2
DE69417684T2 DE69417684T DE69417684T DE69417684T2 DE 69417684 T2 DE69417684 T2 DE 69417684T2 DE 69417684 T DE69417684 T DE 69417684T DE 69417684 T DE69417684 T DE 69417684T DE 69417684 T2 DE69417684 T2 DE 69417684T2
Authority
DE
Germany
Prior art keywords
conductive paste
circuit board
printed circuit
manufacturing process
contact holes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69417684T
Other languages
English (en)
Other versions
DE69417684D1 (de
Inventor
Kouji Kawakita
Seiichi Nakatani
Tatsuo Ogawa
Masatoshi Suehiro
Kouichi Iwaisako
Hideo Akiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Holdings Co Ltd
Panasonic Corp
DKS Co Ltd
Original Assignee
Dai Ichi Kogyo Seiyaku Co Ltd
Dowa Mining Co Ltd
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Ichi Kogyo Seiyaku Co Ltd, Dowa Mining Co Ltd, Matsushita Electric Industrial Co Ltd filed Critical Dai Ichi Kogyo Seiyaku Co Ltd
Publication of DE69417684D1 publication Critical patent/DE69417684D1/de
Application granted granted Critical
Publication of DE69417684T2 publication Critical patent/DE69417684T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • H05K1/095Dispersed materials, e.g. conductive pastes or inks for polymer thick films, i.e. having a permanent organic polymeric binder
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/4038Through-connections; Vertical interconnect access [VIA] connections
    • H05K3/4053Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques
    • H05K3/4069Through-connections; Vertical interconnect access [VIA] connections by thick-film techniques for via connections in organic insulating substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29199Material of the matrix
    • H01L2224/2929Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29301Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
    • H01L2224/29311Tin [Sn] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29301Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
    • H01L2224/29316Lead [Pb] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29338Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/29339Silver [Ag] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29338Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/29344Gold [Au] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29338Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/29347Copper [Cu] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29338Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/29355Nickel [Ni] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29299Base material
    • H01L2224/293Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29363Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than 1550°C
    • H01L2224/29364Palladium [Pd] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/29198Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
    • H01L2224/29298Fillers
    • H01L2224/29399Coating material
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0355Metal foils
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10227Other objects, e.g. metallic pieces
    • H05K2201/10378Interposers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/14Related to the order of processing steps
    • H05K2203/1461Applying or finishing the circuit pattern after another process, e.g. after filling of vias with conductive paste, after making printed resistors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4614Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4614Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
    • H05K3/462Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination characterized by laminating only or mainly similar double-sided circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4623Manufacturing multilayer circuits by laminating two or more circuit boards the circuit boards having internal via connections between two or more circuit layers before lamination, e.g. double-sided circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4652Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/901Printed circuit
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/24Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/25Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
DE69417684T 1993-10-29 1994-10-28 Leitfähige Pastenzusammensetzung zum Füllen von Kontaktlöchern, Leiterplatte unter Anwendung dieser leifähigen Paste und Verfahren zur Herstellung Expired - Lifetime DE69417684T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP27261993 1993-10-29
JP27261893 1993-10-29

Publications (2)

Publication Number Publication Date
DE69417684D1 DE69417684D1 (de) 1999-05-12
DE69417684T2 true DE69417684T2 (de) 1999-09-09

Family

ID=26550292

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69417684T Expired - Lifetime DE69417684T2 (de) 1993-10-29 1994-10-28 Leitfähige Pastenzusammensetzung zum Füllen von Kontaktlöchern, Leiterplatte unter Anwendung dieser leifähigen Paste und Verfahren zur Herstellung

Country Status (3)

Country Link
US (4) US5652042A (de)
EP (1) EP0651602B1 (de)
DE (1) DE69417684T2 (de)

Families Citing this family (115)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0645950B1 (de) * 1993-09-21 1998-09-02 Matsushita Electric Industrial Co., Ltd. Verbindungsteil eines Schaltungssubstrats und Verfahren zur Herstellung mehrschichtiger Schaltungssubstrate unter Verwendung dieses Teils
CN1044762C (zh) * 1993-09-22 1999-08-18 松下电器产业株式会社 印刷电路板及其制造方法
DE69417684T2 (de) * 1993-10-29 1999-09-09 Matsushita Electric Ind Co Ltd Leitfähige Pastenzusammensetzung zum Füllen von Kontaktlöchern, Leiterplatte unter Anwendung dieser leifähigen Paste und Verfahren zur Herstellung
US5780143A (en) * 1995-03-01 1998-07-14 Tokuyama Corporation Circuit board
US5575956A (en) * 1995-07-19 1996-11-19 Hughes Aircraft Company Room-temperature stable, one-component, electrically-conductive, flexible epoxy adhesives
US5837356A (en) * 1995-09-22 1998-11-17 Kyocera Corporation Wiring board and method for manufacturing the same
US5829694A (en) 1996-01-04 1998-11-03 Resource Concepts, Inc. Apparatus and systems that separate and isolate precious and semi-precious metals from electronic circuit boards
WO1997048260A1 (fr) * 1996-06-14 1997-12-18 Ibiden Co., Ltd. Plaquette a circuit sur un seul cote pour carte a circuits imprimes multicouche, carte a circuits imprimes multicouche, et procede pour sa production
US5822856A (en) * 1996-06-28 1998-10-20 International Business Machines Corporation Manufacturing circuit board assemblies having filled vias
US5744285A (en) * 1996-07-18 1998-04-28 E. I. Du Pont De Nemours And Company Composition and process for filling vias
US6703565B1 (en) * 1996-09-06 2004-03-09 Matsushita Electric Industrial Co., Ltd. Printed wiring board
TW398163B (en) * 1996-10-09 2000-07-11 Matsushita Electric Ind Co Ltd The plate for heat transfer substrate and manufacturing method thereof, the heat-transfer substrate using such plate and manufacturing method thereof
DE69725689T2 (de) * 1996-12-26 2004-04-29 Matsushita Electric Industrial Co., Ltd., Kadoma Gedruckte Leiterplatte und elektronische Bauteile
DE19835613C2 (de) * 1997-01-13 2002-12-12 Aisin Seiki Elektrisch leitfähige Harzzusammensetzung und deren Verwendung zur Herstellung von Harzformteilen
JPH10256687A (ja) * 1997-03-14 1998-09-25 Matsushita Electric Ind Co Ltd ビアホール充填用導体ペースト組成物とそれを用いたプリント配線基板
JP3324437B2 (ja) * 1997-04-04 2002-09-17 松下電器産業株式会社 多層プリント配線板の製造方法
WO1999010769A1 (en) * 1997-08-28 1999-03-04 E-Ink Corporation Applications for encapsulated electrophoretic displays
JP3422233B2 (ja) * 1997-09-26 2003-06-30 株式会社村田製作所 バイアホール用導電性ペースト、およびそれを用いた積層セラミック基板の製造方法
US6300686B1 (en) * 1997-10-02 2001-10-09 Matsushita Electric Industrial Co., Ltd. Semiconductor chip bonded to a thermal conductive sheet having a filled through hole for electrical connection
BR9814819A (pt) * 1997-10-14 2001-11-13 Cytec Tech Corp Composições de moldagem determofixação de enchimento elevado e processopara produção das mesmas
JPH11150135A (ja) * 1997-11-17 1999-06-02 Nec Corp 熱伝導性が良好な導電性ペースト及び電子部品
US6038133A (en) 1997-11-25 2000-03-14 Matsushita Electric Industrial Co., Ltd. Circuit component built-in module and method for producing the same
DE19757877A1 (de) * 1997-12-24 1999-07-01 Bosch Gmbh Robert Verfahren zur Herstellung piezoelektrischer Aktoren und piezoelektrischer Aktor
US6303881B1 (en) * 1998-03-20 2001-10-16 Viasystems, Inc. Via connector and method of making same
US6598291B2 (en) 1998-03-20 2003-07-29 Viasystems, Inc. Via connector and method of making same
US6580035B1 (en) * 1998-04-24 2003-06-17 Amerasia International Technology, Inc. Flexible adhesive membrane and electronic device employing same
US6139777A (en) * 1998-05-08 2000-10-31 Matsushita Electric Industrial Co., Ltd. Conductive paste for filling via-hole, double-sided and multilayer printed circuit boards using the same, and method for producing the same
US6565954B2 (en) 1998-05-14 2003-05-20 Matsushita Electric Industrial Co., Ltd. Circuit board and method of manufacturing the same
SG86345A1 (en) 1998-05-14 2002-02-19 Matsushita Electric Ind Co Ltd Circuit board and method of manufacturing the same
US6080336A (en) * 1998-06-19 2000-06-27 Kyoto Elex Co., Ltd. Via-filling conductive paste composition
US6274070B1 (en) 1998-08-07 2001-08-14 Aisin Seiki Kabushiki Kaisha Methods of producing resin moldings
US6312621B1 (en) * 1998-11-17 2001-11-06 Johnson Matthey Electronics, Inc. Via fill formulations which are electrically and/or thermally conductive, or non-conductive
JP2000276945A (ja) * 1999-03-25 2000-10-06 Murata Mfg Co Ltd 導体ペースト及びそれを用いた回路基板
US6183669B1 (en) * 1999-03-25 2001-02-06 Murata Manufacturing Co., Ltd. Paste composition, circuit board using the same, ceramic green sheet, ceramic substrate, and method for manufacturing ceramic multilayer substrate
WO2000062312A1 (fr) * 1999-04-12 2000-10-19 Toyota Jidosha Kabushiki Kaisha Produit a parties conductrices en resine hautement conductrice, et procede de fabrication
US6188027B1 (en) 1999-06-30 2001-02-13 International Business Machines Corporation Protection of a plated through hole from chemical attack
JP3739600B2 (ja) * 1999-07-06 2006-01-25 太陽インキ製造株式会社 液状熱硬化性樹脂組成物及びそれを用いたプリント配線板の永久穴埋め方法
DE60030743T2 (de) * 1999-07-12 2007-09-06 Ibiden Co., Ltd., Ogaki Verfahren zum Herstellen einer Leiterplatte
TW512653B (en) * 1999-11-26 2002-12-01 Ibiden Co Ltd Multilayer circuit board and semiconductor device
US6337037B1 (en) 1999-12-09 2002-01-08 Methode Electronics Inc. Printed wiring board conductive via hole filler having metal oxide reducing capability
JP3620404B2 (ja) * 1999-12-14 2005-02-16 株式会社村田製作所 ガラス膜の形成方法、金属膜の形成方法、および電子部品の製造方法
US6871396B2 (en) 2000-02-09 2005-03-29 Matsushita Electric Industrial Co., Ltd. Transfer material for wiring substrate
US7467742B1 (en) 2000-02-24 2008-12-23 International Business Machines Corporation Electrically conducting adhesives for via fill applications
JP2001257471A (ja) * 2000-03-10 2001-09-21 Ngk Insulators Ltd 多層配線基板及びその製造方法
US6518514B2 (en) 2000-08-21 2003-02-11 Matsushita Electric Industrial Co., Ltd. Circuit board and production of the same
JP2002094200A (ja) * 2000-09-18 2002-03-29 Matsushita Electric Ind Co Ltd 回路基板用電気絶縁材と回路基板およびその製造方法
JP2002124763A (ja) 2000-10-16 2002-04-26 Matsushita Electric Ind Co Ltd 回路形成基板の製造方法、回路形成基板および回路形成基板用材料
TW591095B (en) * 2000-10-25 2004-06-11 Harima Chemical Inc Electro-conductive metal paste and method for production thereof
EP1213952A3 (de) * 2000-12-05 2004-06-30 Matsushita Electric Industrial Co., Ltd. Schaltungssubstrat und Verfahren zu dessen Herstellung
JP3473601B2 (ja) * 2000-12-26 2003-12-08 株式会社デンソー プリント基板およびその製造方法
JP3867523B2 (ja) * 2000-12-26 2007-01-10 株式会社デンソー プリント基板およびその製造方法
US6692818B2 (en) * 2001-06-07 2004-02-17 Matsushita Electric Industrial Co., Ltd. Method for manufacturing circuit board and circuit board and power conversion module using the same
JP2002362987A (ja) * 2001-06-08 2002-12-18 Hitachi Ltd 電子部品およびその製造方法
JP3840921B2 (ja) * 2001-06-13 2006-11-01 株式会社デンソー プリント基板のおよびその製造方法
US6656389B2 (en) * 2001-06-29 2003-12-02 International Business Machines Corporation Thermal paste for low temperature applications
US20030066679A1 (en) * 2001-10-09 2003-04-10 Castro Abram M. Electrical circuit and method of formation
JP4062907B2 (ja) 2001-11-12 2008-03-19 松下電器産業株式会社 回路基板およびその製造方法
JP2003163458A (ja) * 2001-11-29 2003-06-06 Fujitsu Ltd 多層配線基板及びその製造方法
US6743380B2 (en) 2001-12-28 2004-06-01 Caterpillar Inc High temperature electrically conductive material
US6749775B2 (en) * 2002-01-29 2004-06-15 Cts Corporation Conductive via composition
US6742247B2 (en) * 2002-03-14 2004-06-01 General Dynamics Advanced Information Systems, Inc. Process for manufacturing laminated high layer count printed circuit boards
US20040094751A1 (en) * 2002-03-25 2004-05-20 Toshiaki Ogiwara Composition for filling through-holes in printed wiring boards
JP4191678B2 (ja) * 2002-05-31 2008-12-03 タツタ電線株式会社 導電性ペースト、これを用いた多層基板及びその製造方法
US7438969B2 (en) * 2002-07-10 2008-10-21 Ngk Spark Plug Co., Ltd. Filling material, multilayer wiring board, and process of producing multilayer wiring board
WO2004016054A1 (ja) * 2002-08-07 2004-02-19 Denso Corporation 配線基板および配線基板の接続構造
US7387827B2 (en) 2002-12-17 2008-06-17 Intel Corporation Interconnection designs and materials having improved strength and fatigue life
US7521115B2 (en) * 2002-12-17 2009-04-21 Intel Corporation Low temperature bumping process
TWI325739B (en) * 2003-01-23 2010-06-01 Panasonic Corp Electroconductive paste, its manufacturing method, circuit board using the same electroconductive paste, and its manufacturing method
JP4110170B2 (ja) * 2003-02-13 2008-07-02 株式会社フジクラ 多層基板およびその製造方法
JP2006523760A (ja) * 2003-04-01 2006-10-19 アグイラ テクノロジーズ インコーポレイテッド デバイス取付け用熱伝導性接着剤組成物および取付け方法
JP2005045150A (ja) * 2003-07-25 2005-02-17 Matsushita Electric Ind Co Ltd 中間接続用配線基材および多層配線基板、ならびにこれらの製造方法
JP3979391B2 (ja) * 2004-01-26 2007-09-19 松下電器産業株式会社 回路形成基板の製造方法および回路形成基板の製造用材料
JP4593123B2 (ja) * 2004-02-13 2010-12-08 ハリマ化成株式会社 導電性接着剤
JP2005240092A (ja) * 2004-02-26 2005-09-08 Dowa Mining Co Ltd 銀粉およびその製造方法
JP2005340687A (ja) * 2004-05-31 2005-12-08 Fujitsu Ltd 積層基板及びその製造方法、かかる積層基板を有する電子機器
US7494923B2 (en) * 2004-06-14 2009-02-24 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of wiring substrate and semiconductor device
JP4595471B2 (ja) * 2004-09-30 2010-12-08 住友電気工業株式会社 導電性ペースト、及びそれを用いた多層プリント配線板の製造方法
US8211502B2 (en) * 2004-12-30 2012-07-03 Veyance Technologies, Inc. Aramid cord treatment
US7452568B2 (en) * 2005-02-04 2008-11-18 International Business Machines Corporation Centrifugal method for filing high aspect ratio blind micro vias with powdered materials for circuit formation
US7763188B2 (en) * 2005-03-04 2010-07-27 International Business Machines Corporation Electrically stable copper filled electrically conductive adhesive
US20070023292A1 (en) * 2005-07-26 2007-02-01 The Regents Of The University Of California Small object moving on printed circuit board
KR101046197B1 (ko) * 2005-09-21 2011-07-04 니혼한다가부시끼가이샤 페이스트형 은입자 조성물, 고형상 은의 제조 방법, 고형상은, 접합 방법 및 인쇄 배선판의 제조 방법
ATE397647T1 (de) * 2006-03-06 2008-06-15 Umicore Ag & Co Kg Zusammensetzung zur befestigung von hochleistungshalbleiter
US20070231475A1 (en) * 2006-03-31 2007-10-04 Tadanori Shimoto Conductor structure on dielectric material
US7750650B2 (en) * 2006-10-26 2010-07-06 Verigy (Singapore) Pte. Ltd. Solid high aspect ratio via hole used for burn-in boards, wafer sort probe cards, and package test load boards with electronic circuitry
GB0622060D0 (en) 2006-11-06 2006-12-13 Hexcel Composites Ltd Improved composite materials
JP5214154B2 (ja) * 2007-01-19 2013-06-19 住友電気工業株式会社 プリント配線板およびその製造方法
JP4352097B2 (ja) * 2007-10-24 2009-10-28 積水化学工業株式会社 導電性微粒子、異方性導電材料、接続構造体及び導電性微粒子の製造方法
JP2009290135A (ja) * 2008-05-30 2009-12-10 Fujitsu Ltd プリント配線板の製造方法および導電性接合剤
JP2009290124A (ja) * 2008-05-30 2009-12-10 Fujitsu Ltd プリント配線板
JP5217639B2 (ja) * 2008-05-30 2013-06-19 富士通株式会社 コア基板およびプリント配線板
JP5217640B2 (ja) * 2008-05-30 2013-06-19 富士通株式会社 プリント配線板の製造方法およびプリント基板ユニットの製造方法
WO2009152388A1 (en) * 2008-06-12 2009-12-17 Nanomas Technologies, Inc. Conductive inks and pastes
JP5344394B2 (ja) * 2008-07-10 2013-11-20 山栄化学株式会社 硬化性樹脂組成物、並びにハロゲンフリー樹脂基板及びハロゲンフリービルドアッププリント配線板
CN101525469B (zh) * 2009-04-01 2011-05-04 哈尔滨理工大学 力敏环氧树脂基复合材料
US8383948B2 (en) * 2009-09-18 2013-02-26 Ibiden Co., Ltd. Flex-rigid wiring board and method for manufacturing the same
CN103369872A (zh) * 2012-03-30 2013-10-23 北大方正集团有限公司 多层印刷电路板的压合方法
US10111049B2 (en) 2012-10-26 2018-10-23 Qualcomm Incorporated Multiband eMBMS enhancement using carrier aggregation
US9232640B2 (en) 2013-03-10 2016-01-05 Qualcomm Incorporated Thermal isolation in printed circuit board assemblies
JP2014216552A (ja) 2013-04-26 2014-11-17 富士通株式会社 積層構造体及びその製造方法
CN203707402U (zh) * 2013-12-05 2014-07-09 番禺得意精密电子工业有限公司 电连接器
US20150203694A1 (en) * 2014-01-17 2015-07-23 E I Du Pont De Nemours And Company Conductivity thick film pastes containing platinum powder
EP3104400B1 (de) * 2014-02-04 2022-08-31 Murata Manufacturing Co., Ltd. Herstellungsverfahren für ein elektronisches komponentenmodul
WO2015141769A1 (ja) 2014-03-20 2015-09-24 住友電気工業株式会社 プリント配線板用基板、プリント配線板及びプリント配線板用基板の製造方法
CN106134298B (zh) * 2014-03-27 2019-02-22 住友电气工业株式会社 印刷线路板用基板、印刷线路板以及制造印刷线路板用基板的方法
KR20160010960A (ko) * 2014-07-21 2016-01-29 삼성전기주식회사 인쇄회로기판 및 그 제조방법
US10076028B2 (en) 2015-01-22 2018-09-11 Sumitomo Electric Industries, Ltd. Substrate for printed circuit board, printed circuit board, and method for producing printed circuit board
DE102015207551A1 (de) * 2015-04-24 2016-10-27 Robert Bosch Gmbh Vorrichtung und Verfahren zur photothermischen Qualitätskontrolle von Korngröße und Schichthaftung eines Bauteils
CN107172808A (zh) * 2016-03-08 2017-09-15 讯芯电子科技(中山)有限公司 双面直接镀铜陶瓷电路板及其制造方法
WO2017154692A1 (ja) * 2016-03-11 2017-09-14 株式会社村田製作所 複合基板及び複合基板の製造方法
DE102016006813B4 (de) 2016-06-03 2021-04-08 Ksg Austria Gmbh Verfahren zur Herstellung einer Mehrlagenleiterplatte mit Kontaktierung von Innenlagen sowie Mehrlagenleiterplatte
EP3290399B1 (de) * 2016-08-29 2022-03-02 Infineon Technologies AG Verfahren zum herstellen eines metall-keramik-substrats mit mindestens einem via
CN111128439A (zh) * 2019-12-31 2020-05-08 合肥圣达电子科技实业有限公司 一种环保型介质陶瓷滤波器用银电极浆料及其制备方法
JP2021125521A (ja) * 2020-02-04 2021-08-30 矢崎総業株式会社 プリント配線板、プリント回路板、及びプリント配線板の製造方法
CN113163628B (zh) * 2021-04-29 2022-11-15 成都天锐星通科技有限公司 线路板结构及其制程方法

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3211584A (en) * 1962-02-12 1965-10-12 Chomerics Inc Radar antenna
US3983075A (en) * 1974-06-21 1976-09-28 Kennecott Copper Corporation Copper filled conductive epoxy
US4383363A (en) * 1977-09-01 1983-05-17 Sharp Kabushiki Kaisha Method of making a through-hole connector
JPS55160072A (en) 1979-05-31 1980-12-12 Matsushita Electric Ind Co Ltd Electrically conductive adhesive
JPS56103260A (en) 1980-01-22 1981-08-18 Asahi Kagaku Kenkyusho:Kk Conductive paint containing copper powder
JPS57113505A (en) 1981-01-07 1982-07-15 Matsushita Electric Ind Co Ltd Conductive composition
US4634623A (en) * 1983-07-18 1987-01-06 The Gates Corporation Conductive elastomeric ink composition
US4598037A (en) * 1984-12-21 1986-07-01 E. I. Du Pont De Nemours And Company Photosensitive conductive metal composition
US4964948A (en) * 1985-04-16 1990-10-23 Protocad, Inc. Printed circuit board through hole technique
US4747968A (en) * 1985-05-08 1988-05-31 Sheldahl, Inc. Low temperature cure having single component conductive adhesive
US4652398A (en) 1985-09-12 1987-03-24 Stauffer Chemical Company Rapid curing, thermally stable adhesive composition comprising epoxy resin, polyimide, reactive solvent, and crosslinker
US4937148A (en) * 1986-03-06 1990-06-26 Catalysts & Chemicals Industries Co., Ltd. Process for preparing conductive fine particles
US4880570A (en) 1986-03-31 1989-11-14 Harris Corporation Electroconductive adhesive
DE3782522T2 (de) 1986-03-31 1993-06-03 Tatsuta Densen Kk Leitfaehige kupferpastenzusammensetzung.
JPH0759660B2 (ja) 1987-09-25 1995-06-28 アルプス電気株式会社 導電性組成物
US4967314A (en) * 1988-03-28 1990-10-30 Prime Computer Inc. Circuit board construction
US5117069A (en) * 1988-03-28 1992-05-26 Prime Computer, Inc. Circuit board fabrication
JP2585070B2 (ja) * 1988-08-02 1997-02-26 日本ペイント株式会社 画像形成方法
US5180523A (en) * 1989-11-14 1993-01-19 Poly-Flex Circuits, Inc. Electrically conductive cement containing agglomerate, flake and powder metal fillers
US5043102A (en) * 1989-11-29 1991-08-27 Advanced Products, Inc. Conductive adhesive useful for bonding a semiconductor die to a conductive support base
US5376403A (en) 1990-02-09 1994-12-27 Capote; Miguel A. Electrically conductive compositions and methods for the preparation and use thereof
JP2702796B2 (ja) * 1990-02-23 1998-01-26 旭化成工業株式会社 銀合金導電性ペースト
US4999699A (en) * 1990-03-14 1991-03-12 International Business Machines Corporation Solder interconnection structure and process for making
JPH0412595A (ja) * 1990-05-02 1992-01-17 Mitsubishi Petrochem Co Ltd 導電性ペースト組成物
US5243142A (en) * 1990-08-03 1993-09-07 Hitachi Aic Inc. Printed wiring board and process for producing the same
JPH05175650A (ja) * 1991-12-25 1993-07-13 Tokuyama Soda Co Ltd 回路基板の製造方法
JP2601128B2 (ja) * 1992-05-06 1997-04-16 松下電器産業株式会社 回路形成用基板の製造方法および回路形成用基板
JP3057924B2 (ja) * 1992-09-22 2000-07-04 松下電器産業株式会社 両面プリント基板およびその製造方法
DE69417684T2 (de) * 1993-10-29 1999-09-09 Matsushita Electric Ind Co Ltd Leitfähige Pastenzusammensetzung zum Füllen von Kontaktlöchern, Leiterplatte unter Anwendung dieser leifähigen Paste und Verfahren zur Herstellung

Also Published As

Publication number Publication date
DE69417684D1 (de) 1999-05-12
EP0651602B1 (de) 1999-04-07
US5977490A (en) 1999-11-02
EP0651602A1 (de) 1995-05-03
US5733467A (en) 1998-03-31
US5652042A (en) 1997-07-29
US5914358A (en) 1999-06-22

Similar Documents

Publication Publication Date Title
DE69417684T2 (de) Leitfähige Pastenzusammensetzung zum Füllen von Kontaktlöchern, Leiterplatte unter Anwendung dieser leifähigen Paste und Verfahren zur Herstellung
DE68909853T2 (de) Verfahren und Film zur Herstellung von gedruckten Schaltungsplatten.
DE69418698T2 (de) Verfahren zur Herstellung von Leiterplatten
DE69841424D1 (de) Mehrschichtige gedruckte leiterplatte, verfahren zu deren herstellung, und harzzusammensetzung zum füllen von kontaktlöchern
DE69024594D1 (de) Verfahren zum Verbinden von Leiterplatten
DE69204516T2 (de) Leiterplatte mit Lötüberzug und Verfahren zu ihrer Herstellung.
DE68921732D1 (de) Verfahren zur Herstellung von gedruckten Mehrschicht-Leiterplatten.
DE69830623D1 (de) Klebstoff zum verbinden von schaltelementen, leiterplatte und verfahren zur herstellung derselben
DE69631573D1 (de) Prepreg, Verfahren zur Herstellung und gedrucktes Leiterplattensubstrat und dessen Verwendung
DE69031159T2 (de) Lichtempfindliche Harzzusammensetzung zur Herstellung von Leitermustern und mehrschichtige gedruckte Leiterplatten unter Verwendung dieser Zusammensetzung
DE69431828D1 (de) Verfahren zur Herstellung von gedruckten Schaltungskarten
DE60012657D1 (de) Kupferverkleidete Platte, Verfahren zur Herstellung von Löchern in dieser Platte, und die kupferverkleidete Platte enthaltende gedruckte Leiterplatte
DE68917813D1 (de) Verfahren und Vorrichtung zum Spritzgiessen von Leiterplatten.
DE59009928D1 (de) Verfahren zum Beloten von Leiterplatten.
DE69227277D1 (de) Verfahren zur Benützung von Lötflussmittel, gedruckte Schaltungsplatte und Verfahren zu seiner Herstellung
DE3856450T2 (de) Verfahren zur Herstellung von einer elektrisch programmierbaren integrierten Schaltung mit schmelzbaren Kontaktbrücken
DE69708814T2 (de) Dielektrisches Material mit niedrigem Temperaturkoeffizient und mit hoher unbelasteten Qualität, Verfahren zur Herstellung und einzel/mehrschichtige gedruckte Leiterplatte mit diesem Material
DE69803664D1 (de) Verfahren zur herstellung von gedruckten leiterplatten und so hergestellte gedruckte leiterplatten
DE69730288D1 (de) Verfahren zur Herstellung gedruckter Leiterplatten mit plattierten Widerständen
DE59502633D1 (de) Verfahren zur Codierung von Leiterplatten
DE3480822D1 (de) Verfahren zur beschichtung von bohrungswaenden in elektrischen schaltungstraegern mit tinte und vorrichtung zur anwendung dieser methode.
DE69023816D1 (de) Verfahren zur Herstellung gedruckter Schaltungsplatten.
DE59813900D1 (de) Schaltungsanordnung mit einzelelektron-bauelementen, verfahren zu deren betrieb und anwendung des verfahrens zur addition von binärzahlen
DE69012454T2 (de) Verfahren mit abgekürztem Zyklus zur Herstellung von gedruckten Leiterplatten und Zusammensetzung für die Anwendung.
DE69735750D1 (de) Verfahren zur Herstellung von Leiterplatten

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: DAI-ICHI KOGYO SEIYAKU CO., LTD., KYOTO, JP

Owner name: DOWA MINING CO., LTD., TOKIO/TOKYO, JP

Owner name: PANASONIC CORP., KADOMA, OSAKA, JP