DE69224914T2 - Stromloses goldbeschichtungsbad - Google Patents
Stromloses goldbeschichtungsbadInfo
- Publication number
- DE69224914T2 DE69224914T2 DE69224914T DE69224914T DE69224914T2 DE 69224914 T2 DE69224914 T2 DE 69224914T2 DE 69224914 T DE69224914 T DE 69224914T DE 69224914 T DE69224914 T DE 69224914T DE 69224914 T2 DE69224914 T2 DE 69224914T2
- Authority
- DE
- Germany
- Prior art keywords
- coating bath
- gold coating
- electricity gold
- electricity
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP1992/001538 WO1994012686A1 (en) | 1992-11-25 | 1992-11-25 | Electroless gold plating bath |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69224914D1 DE69224914D1 (de) | 1998-04-30 |
DE69224914T2 true DE69224914T2 (de) | 1998-10-22 |
Family
ID=14042674
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69224914T Expired - Fee Related DE69224914T2 (de) | 1992-11-25 | 1992-11-25 | Stromloses goldbeschichtungsbad |
DE0630991T Pending DE630991T1 (de) | 1992-11-25 | 1992-11-25 | Stromloses goldbeschichtungsbad. |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE0630991T Pending DE630991T1 (de) | 1992-11-25 | 1992-11-25 | Stromloses goldbeschichtungsbad. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5470381A (de) |
EP (1) | EP0630991B1 (de) |
DE (2) | DE69224914T2 (de) |
WO (1) | WO1994012686A1 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2927142B2 (ja) * | 1993-03-26 | 1999-07-28 | 上村工業株式会社 | 無電解金めっき浴及び無電解金めっき方法 |
US6194032B1 (en) | 1997-10-03 | 2001-02-27 | Massachusetts Institute Of Technology | Selective substrate metallization |
DE19745601C2 (de) * | 1997-10-08 | 2001-07-12 | Fraunhofer Ges Forschung | Lösung und Verfahren zum stromlosen Abscheiden von Goldschichten sowie Verwendung der Lösung |
DE19745602C1 (de) * | 1997-10-08 | 1999-07-15 | Atotech Deutschland Gmbh | Verfahren und Lösung zur Herstellung von Goldschichten |
US5935306A (en) * | 1998-02-10 | 1999-08-10 | Technic Inc. | Electroless gold plating bath |
JP3920462B2 (ja) * | 1998-07-13 | 2007-05-30 | 株式会社大和化成研究所 | 貴金属を化学的還元析出によって得るための水溶液 |
US6383269B1 (en) | 1999-01-27 | 2002-05-07 | Shipley Company, L.L.C. | Electroless gold plating solution and process |
JP3466521B2 (ja) * | 1999-10-04 | 2003-11-10 | 新光電気工業株式会社 | 置換型無電解金めっき液及び無電解金めっき方法 |
EP1090825A3 (de) | 1999-10-07 | 2002-04-10 | Österreichische Bundesbahnen | Zweiachsiger Eisenbahngüterwagen |
DE10018025A1 (de) * | 2000-04-04 | 2001-10-18 | Atotech Deutschland Gmbh | Verfahren zum Erzeugen von lötfähigen Oberflächen und funktionellen Oberflächen auf Schaltungsträgern |
JP3482402B2 (ja) * | 2001-06-29 | 2003-12-22 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 置換金メッキ液 |
JP4375702B2 (ja) * | 2001-10-25 | 2009-12-02 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | めっき組成物 |
US6911230B2 (en) * | 2001-12-14 | 2005-06-28 | Shipley Company, L.L.C. | Plating method |
JP3892730B2 (ja) * | 2002-01-30 | 2007-03-14 | 関東化学株式会社 | 無電解金めっき液 |
SG116489A1 (en) * | 2003-04-21 | 2005-11-28 | Shipley Co Llc | Plating composition. |
KR100953612B1 (ko) * | 2003-06-02 | 2010-04-20 | 삼성에스디아이 주식회사 | 생체물질 고정용 기판 및 이의 제조방법 |
EP1645658A4 (de) * | 2003-06-05 | 2011-08-03 | Nippon Mining Co | Lösung zur stromlosen vergoldung |
JP4603320B2 (ja) * | 2003-10-22 | 2010-12-22 | 関東化学株式会社 | 無電解金めっき液 |
KR100732794B1 (ko) * | 2004-04-05 | 2007-06-27 | 닛코킨조쿠 가부시키가이샤 | 무전해 금도금액 |
KR100767944B1 (ko) * | 2004-07-09 | 2007-10-17 | 닛코킨조쿠 가부시키가이샤 | 무전해 금도금액 |
CN1981347A (zh) * | 2004-07-15 | 2007-06-13 | 积水化学工业株式会社 | 导电性微粒、导电性微粒的制造方法、和各向异性导电材料 |
JP2006111960A (ja) | 2004-09-17 | 2006-04-27 | Shinko Electric Ind Co Ltd | 非シアン無電解金めっき液及び無電解金めっき方法 |
KR100832630B1 (ko) * | 2004-11-15 | 2008-05-27 | 닛코킨조쿠 가부시키가이샤 | 무전해금도금액 |
US20070175358A1 (en) * | 2006-02-01 | 2007-08-02 | Kilnam Hwang | Electroless gold plating solution |
US20070175359A1 (en) * | 2006-02-01 | 2007-08-02 | Kilnam Hwang | Electroless gold plating solution and method |
GB0903642D0 (en) * | 2009-02-27 | 2009-09-30 | Bae Systems Plc | Electroless metal deposition for micron scale structures |
DE102009041264A1 (de) | 2009-09-11 | 2011-03-24 | IPHT Jena Institut für Photonische Technologien e.V. | Verfahren zur Herstellung von optisch aktiven Nanostrukturen |
JP4831710B1 (ja) * | 2010-07-20 | 2011-12-07 | 日本エレクトロプレイテイング・エンジニヤース株式会社 | 無電解金めっき液及び無電解金めっき方法 |
JP5610500B1 (ja) * | 2014-05-21 | 2014-10-22 | 小島化学薬品株式会社 | 有機金錯体 |
KR101444687B1 (ko) * | 2014-08-06 | 2014-09-26 | (주)엠케이켐앤텍 | 무전해 금도금액 |
Family Cites Families (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3700469A (en) * | 1971-03-08 | 1972-10-24 | Bell Telephone Labor Inc | Electroless gold plating baths |
US3697296A (en) * | 1971-03-09 | 1972-10-10 | Du Pont | Electroless gold plating bath and process |
US3977884A (en) * | 1975-01-02 | 1976-08-31 | Shipley Company, Inc. | Metal plating solution |
JPS5217333A (en) * | 1975-08-01 | 1977-02-09 | Hitachi Ltd | Plating solution |
GB1547028A (en) * | 1976-11-19 | 1979-06-06 | Mine Safety Appliances Co | Electroless gold plating baths |
US4246195A (en) * | 1978-10-06 | 1981-01-20 | Halcon Research And Development Corporation | Purification of carbonylation products |
JPS56108869A (en) * | 1980-01-31 | 1981-08-28 | Asahi Glass Co Ltd | Nickel coat forming method |
JPS5819468A (ja) * | 1981-07-28 | 1983-02-04 | Asahi Glass Co Ltd | ニツケル被膜の形成方法 |
GB2114159B (en) * | 1982-01-25 | 1986-02-12 | Mine Safety Appliances Co | Method and bath for the electroless plating of gold |
JPS61253376A (ja) * | 1985-05-01 | 1986-11-11 | Shinko Electric Ind Co Ltd | 銅又は銅合金材の電解金めっき用前処理液 |
CN1003524B (zh) * | 1985-10-14 | 1989-03-08 | 株式会社日立制作所 | 无电浸镀金溶液 |
JPS6299477A (ja) * | 1985-10-25 | 1987-05-08 | C Uyemura & Co Ltd | 無電解金めつき液 |
DE3614090C1 (en) * | 1986-04-25 | 1987-04-30 | Heraeus Gmbh W C | Bath for the currentless deposition of gold layers |
DE3640028C1 (de) * | 1986-11-24 | 1987-10-01 | Heraeus Gmbh W C | Saures Bad fuer das stromlose Abscheiden von Goldschichten |
JP2655329B2 (ja) * | 1988-01-28 | 1997-09-17 | 関東化学 株式会社 | 無電解金めつき液 |
JPH0270084A (ja) * | 1988-09-06 | 1990-03-08 | C Uyemura & Co Ltd | 金めっき浴及び金めっき方法 |
US5130168A (en) * | 1988-11-22 | 1992-07-14 | Technic, Inc. | Electroless gold plating bath and method of using same |
US5258062A (en) * | 1989-06-01 | 1993-11-02 | Shinko Electric Industries Co., Ltd. | Electroless gold plating solutions |
US4985076A (en) * | 1989-11-03 | 1991-01-15 | General Electric Company | Autocatalytic electroless gold plating composition |
JPH04350172A (ja) * | 1991-05-28 | 1992-12-04 | Kanto Chem Co Inc | 無電解金めっき液 |
US5232492A (en) * | 1992-01-23 | 1993-08-03 | Applied Electroless Concepts Inc. | Electroless gold plating composition |
DE69406701T2 (de) * | 1993-03-26 | 1998-04-02 | Uyemura & Co C | Chemisches Vergoldungsbad |
JPH06299477A (ja) * | 1993-04-15 | 1994-10-25 | Mitsubishi Baarinton Kk | カーペツトの製造方法 |
US5338343A (en) * | 1993-07-23 | 1994-08-16 | Technic Incorporated | Catalytic electroless gold plating baths |
-
1992
- 1992-11-25 US US08/256,369 patent/US5470381A/en not_active Expired - Lifetime
- 1992-11-25 DE DE69224914T patent/DE69224914T2/de not_active Expired - Fee Related
- 1992-11-25 EP EP92924008A patent/EP0630991B1/de not_active Expired - Lifetime
- 1992-11-25 WO PCT/JP1992/001538 patent/WO1994012686A1/ja active IP Right Grant
- 1992-11-25 DE DE0630991T patent/DE630991T1/de active Pending
Also Published As
Publication number | Publication date |
---|---|
US5470381A (en) | 1995-11-28 |
EP0630991A4 (de) | 1995-01-18 |
WO1994012686A1 (en) | 1994-06-09 |
EP0630991A1 (de) | 1994-12-28 |
DE630991T1 (de) | 1995-07-13 |
DE69224914D1 (de) | 1998-04-30 |
EP0630991B1 (de) | 1998-03-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |