DE69130777T2 - Herstellungsverfahren für Mikrolinsen - Google Patents
Herstellungsverfahren für MikrolinsenInfo
- Publication number
- DE69130777T2 DE69130777T2 DE69130777T DE69130777T DE69130777T2 DE 69130777 T2 DE69130777 T2 DE 69130777T2 DE 69130777 T DE69130777 T DE 69130777T DE 69130777 T DE69130777 T DE 69130777T DE 69130777 T2 DE69130777 T2 DE 69130777T2
- Authority
- DE
- Germany
- Prior art keywords
- microlenses
- manufacturing process
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0056—Arrays characterized by the distribution or form of lenses arranged along two different directions in a plane, e.g. honeycomb arrangement of lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00009—Production of simple or compound lenses
- B29D11/00278—Lenticular sheets
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0037—Arrays characterized by the distribution or form of lenses
- G02B3/0062—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between
- G02B3/0068—Stacked lens arrays, i.e. refractive surfaces arranged in at least two planes, without structurally separate optical elements in-between arranged in a single integral body or plate, e.g. laminates or hybrid structures with other optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14618—Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
- H01L27/14627—Microlenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
- H01L27/14868—CCD or CID colour imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
- H01L31/02164—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors for shielding light, e.g. light blocking layers, cold shields for infrared detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02325—Optical elements or arrangements associated with the device the optical elements not being integrated nor being directly associated with the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2025788A JPH03230567A (ja) | 1990-02-05 | 1990-02-05 | 固体撮像装置 |
JP2082064A JPH03280574A (ja) | 1990-03-29 | 1990-03-29 | 固体撮像装置 |
JP2149630A JP2518955B2 (ja) | 1990-06-07 | 1990-06-07 | 固体撮像素子のマイクロレンズ形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69130777D1 DE69130777D1 (de) | 1999-02-25 |
DE69130777T2 true DE69130777T2 (de) | 1999-07-01 |
Family
ID=27285161
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69130399T Expired - Lifetime DE69130399T2 (de) | 1990-02-05 | 1991-02-05 | Festkörperbildaufnahmeelement mit Mikrolinsen |
DE69130777T Expired - Lifetime DE69130777T2 (de) | 1990-02-05 | 1991-02-05 | Herstellungsverfahren für Mikrolinsen |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69130399T Expired - Lifetime DE69130399T2 (de) | 1990-02-05 | 1991-02-05 | Festkörperbildaufnahmeelement mit Mikrolinsen |
Country Status (3)
Country | Link |
---|---|
US (1) | US5239412A (de) |
EP (2) | EP0441594B1 (de) |
DE (2) | DE69130399T2 (de) |
Families Citing this family (117)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0567762A (ja) * | 1991-03-06 | 1993-03-19 | Matsushita Electron Corp | 固体撮像装置およびその製造方法 |
US5321249A (en) * | 1991-10-31 | 1994-06-14 | Matsushita Electric Industrial Co., Ltd. | Solid-state imaging device and method of manufacturing the same |
JPH05134111A (ja) * | 1991-11-15 | 1993-05-28 | Sharp Corp | 固体撮像装置 |
JP3170847B2 (ja) * | 1992-02-14 | 2001-05-28 | キヤノン株式会社 | 固体撮像素子及びそれを用いた光学機器 |
GB2267579A (en) * | 1992-05-15 | 1993-12-08 | Sharp Kk | Optical device comprising facing lenticular or parallax screens of different pitch |
US5514888A (en) * | 1992-05-22 | 1996-05-07 | Matsushita Electronics Corp. | On-chip screen type solid state image sensor and manufacturing method thereof |
JPH05335531A (ja) * | 1992-05-27 | 1993-12-17 | Sharp Corp | 固体撮像装置 |
JPH06232379A (ja) * | 1993-02-01 | 1994-08-19 | Sharp Corp | 固体撮像素子 |
US5581379A (en) * | 1993-02-15 | 1996-12-03 | Omron Corporation | Rectangular based convex microlenses surrounded within a frame and method of making |
GB9314402D0 (en) * | 1993-07-12 | 1993-08-25 | Philips Electronics Uk Ltd | An imaging device |
US5563738A (en) * | 1993-09-03 | 1996-10-08 | Jenmar Visual Systems | Light transmitting and dispersing filter having low reflectance |
JP2950714B2 (ja) * | 1993-09-28 | 1999-09-20 | シャープ株式会社 | 固体撮像装置およびその製造方法 |
JP2925444B2 (ja) * | 1993-10-05 | 1999-07-28 | シャープ株式会社 | 固体撮像素子およびその製造方法 |
KR970005706B1 (ko) * | 1994-01-24 | 1997-04-19 | 금성일렉트론 주식회사 | 고체촬상소자 및 그 제조방법 |
KR0147401B1 (ko) * | 1994-02-23 | 1998-08-01 | 구본준 | 고체촬상소자 및 그 제조방법 |
JPH08204059A (ja) * | 1995-01-20 | 1996-08-09 | Kyocera Corp | 半導体素子収納用パッケージ |
JPH08243078A (ja) * | 1995-03-07 | 1996-09-24 | Fuji Photo Optical Co Ltd | 電子内視鏡の撮像素子組付け体 |
JP3405620B2 (ja) * | 1995-05-22 | 2003-05-12 | 松下電器産業株式会社 | 固体撮像装置 |
US5801884A (en) * | 1995-10-09 | 1998-09-01 | Mitsubishi Chemical Corporation | Optical device and process for producing the same |
KR100213968B1 (ko) | 1996-07-15 | 1999-08-02 | 구자홍 | 액정표시장치 |
US6043481A (en) * | 1997-04-30 | 2000-03-28 | Hewlett-Packard Company | Optoelectronic array device having a light transmissive spacer layer with a ridged pattern and method of making same |
WO1999008149A1 (fr) * | 1997-08-08 | 1999-02-18 | Japan, As Represented By Director General Of Agency Of Industrial Science And Technology | Element optique, procede et appareil de commande optique et procede de fabrication dudit element optique |
JPH11211902A (ja) * | 1998-01-21 | 1999-08-06 | Micro Opt:Kk | 平板型マイクロレンズアレイ |
JP3931936B2 (ja) * | 1998-05-11 | 2007-06-20 | セイコーエプソン株式会社 | マイクロレンズアレイ基板及びその製造方法並びに表示装置 |
US6600599B2 (en) | 1998-06-09 | 2003-07-29 | Avery Dennison Corporation | Rear projection screens and light filters with conformable coatings and methods of making the same |
JP3824425B2 (ja) * | 1998-06-17 | 2006-09-20 | 日本板硝子株式会社 | 平板型マイクロレンズアレイ |
US6137634A (en) * | 1999-02-01 | 2000-10-24 | Intel Corporation | Microlens array |
US6583438B1 (en) * | 1999-04-12 | 2003-06-24 | Matsushita Electric Industrial Co., Ltd. | Solid-state imaging device |
US6986579B2 (en) | 1999-07-02 | 2006-01-17 | E-Vision, Llc | Method of manufacturing an electro-active lens |
US6733130B2 (en) | 1999-07-02 | 2004-05-11 | E-Vision, Llc | Method for refracting and dispensing electro-active spectacles |
US6619799B1 (en) | 1999-07-02 | 2003-09-16 | E-Vision, Llc | Optical lens system with electro-active lens having alterably different focal lengths |
US6857741B2 (en) | 2002-01-16 | 2005-02-22 | E-Vision, Llc | Electro-active multi-focal spectacle lens |
US6517203B1 (en) | 1999-07-02 | 2003-02-11 | E-Vision, Llc | System, apparatus, and method for correcting vision using electro-active spectacles |
US6491391B1 (en) | 1999-07-02 | 2002-12-10 | E-Vision Llc | System, apparatus, and method for reducing birefringence |
US6871951B2 (en) * | 2000-06-23 | 2005-03-29 | E-Vision, Llc | Electro-optic lens with integrated components |
US7023594B2 (en) | 2000-06-23 | 2006-04-04 | E-Vision, Llc | Electro-optic lens with integrated components |
US6491394B1 (en) | 1999-07-02 | 2002-12-10 | E-Vision, Llc | Method for refracting and dispensing electro-active spectacles |
US7264354B2 (en) | 1999-07-02 | 2007-09-04 | E-Vision, Llc | Method and apparatus for correcting vision using an electro-active phoropter |
US7775660B2 (en) | 1999-07-02 | 2010-08-17 | E-Vision Llc | Electro-active ophthalmic lens having an optical power blending region |
US7604349B2 (en) | 1999-07-02 | 2009-10-20 | E-Vision, Llc | Static progressive surface region in optical communication with a dynamic optic |
US7290875B2 (en) * | 2004-11-02 | 2007-11-06 | Blum Ronald D | Electro-active spectacles and method of fabricating same |
US7404636B2 (en) | 1999-07-02 | 2008-07-29 | E-Vision, Llc | Electro-active spectacle employing modal liquid crystal lenses |
US7988286B2 (en) | 1999-07-02 | 2011-08-02 | E-Vision Llc | Static progressive surface region in optical communication with a dynamic optic |
US6851805B2 (en) * | 1999-07-02 | 2005-02-08 | E-Vision, Llc | Stabilized electro-active contact lens |
US7290876B2 (en) * | 1999-07-02 | 2007-11-06 | E-Vision, Llc | Method and system for electro-active spectacle lens design |
US6324010B1 (en) | 1999-07-19 | 2001-11-27 | Eastman Kodak Company | Optical assembly and a method for manufacturing lens systems |
EP1233285B1 (de) * | 1999-11-10 | 2012-07-25 | Hamamatsu Photonics K.K. | Herstellungsverfahren für eine optische linse |
US6221687B1 (en) | 1999-12-23 | 2001-04-24 | Tower Semiconductor Ltd. | Color image sensor with embedded microlens array |
FR2803395A1 (fr) * | 1999-12-30 | 2001-07-06 | Commissariat Energie Atomique | Microsysteme optique solide a face plane et procede de realisation d'un tel microsysteme |
JP4123667B2 (ja) * | 2000-01-26 | 2008-07-23 | 凸版印刷株式会社 | 固体撮像素子の製造方法 |
JP3840058B2 (ja) * | 2000-04-07 | 2006-11-01 | キヤノン株式会社 | マイクロレンズ、固体撮像装置及びそれらの製造方法 |
EP1235104A4 (de) * | 2000-08-29 | 2008-10-01 | Jsr Corp | Zusammensetzung deren brechungsindex durch bestrahlung variiert werden kann, sowie ein verfahren zur erzeugung eines beugungsmusters |
GB2378522B (en) * | 2001-08-08 | 2003-08-13 | Pearpoint Ltd | Integrated camera and lighting device and a method of manufacture thereof |
CN1599881A (zh) * | 2001-10-05 | 2005-03-23 | E-视觉有限公司 | 复合电活性透镜 |
JP2003197897A (ja) | 2001-12-28 | 2003-07-11 | Fuji Film Microdevices Co Ltd | 半導体光電変換装置 |
JP2003244560A (ja) * | 2002-02-21 | 2003-08-29 | Seiko Precision Inc | 固体撮像装置 |
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US7474350B2 (en) * | 2003-09-08 | 2009-01-06 | Sanyo Electric Co., Ltd. | Solid state image pickup device comprising lenses for condensing light on photodetection parts |
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JP4508619B2 (ja) * | 2003-12-03 | 2010-07-21 | キヤノン株式会社 | 固体撮像装置の製造方法 |
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US9801709B2 (en) | 2004-11-02 | 2017-10-31 | E-Vision Smart Optics, Inc. | Electro-active intraocular lenses |
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US7931373B2 (en) | 2004-12-03 | 2011-04-26 | The Invention Science Fund I, Llc | Vision modification with reflected image |
US7334892B2 (en) | 2004-12-03 | 2008-02-26 | Searete Llc | Method and system for vision enhancement |
US7486988B2 (en) | 2004-12-03 | 2009-02-03 | Searete Llc | Method and system for adaptive vision modification |
US7350919B2 (en) | 2004-12-03 | 2008-04-01 | Searete Llc | Vision modification with reflected image |
US7656569B2 (en) | 2004-12-03 | 2010-02-02 | Searete Llc | Vision modification with reflected image |
US8244342B2 (en) | 2004-12-03 | 2012-08-14 | The Invention Science Fund I, Llc | Method and system for adaptive vision modification |
US7470027B2 (en) | 2004-12-03 | 2008-12-30 | Searete Llc | Temporal vision modification |
US7594727B2 (en) | 2004-12-03 | 2009-09-29 | Searete Llc | Vision modification with reflected image |
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US11061252B2 (en) | 2007-05-04 | 2021-07-13 | E-Vision, Llc | Hinge for electronic spectacles |
US10613355B2 (en) | 2007-05-04 | 2020-04-07 | E-Vision, Llc | Moisture-resistant eye wear |
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US8154804B2 (en) | 2008-03-25 | 2012-04-10 | E-Vision Smart Optics, Inc. | Electro-optic lenses for correction of higher order aberrations |
JP5553707B2 (ja) * | 2009-08-21 | 2014-07-16 | 株式会社半導体エネルギー研究所 | 光検出装置 |
JP5556122B2 (ja) * | 2009-10-27 | 2014-07-23 | ソニー株式会社 | 固体撮像装置、固体撮像装置の製造方法、電子機器 |
CN102130138B (zh) | 2010-01-12 | 2013-01-02 | 中芯国际集成电路制造(上海)有限公司 | 图像传感器及其形成方法 |
DE102011117228A1 (de) * | 2011-10-28 | 2013-05-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Mikroskopiesystem zur Zustandsbestimmung von Zellen |
JP5845856B2 (ja) * | 2011-11-30 | 2016-01-20 | ソニー株式会社 | 固体撮像素子およびその製造方法、並びに電子機器 |
KR102495254B1 (ko) | 2012-01-06 | 2023-02-06 | 이-비전 스마트 옵틱스, 아이엔씨. | 안경류 도킹 스테이션 및 전자 모듈 |
JP2014187160A (ja) * | 2013-03-22 | 2014-10-02 | Toshiba Corp | 固体撮像装置および携帯情報端末 |
EP3440508B1 (de) | 2016-04-12 | 2021-01-27 | E- Vision Smart Optics, Inc. | Elektroaktive linsen mit erhöhten resistiven brücken |
US10599006B2 (en) | 2016-04-12 | 2020-03-24 | E-Vision Smart Optics, Inc. | Electro-active lenses with raised resistive bridges |
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US1943995A (en) * | 1930-04-03 | 1934-01-16 | Herbert W Weld | Glass construction |
US3018313A (en) * | 1961-01-04 | 1962-01-23 | Daniel H Gattone | Light gathering power converter |
US3383676A (en) * | 1963-02-14 | 1968-05-14 | Robert I. Nagel | Lenticular signal lens having a smooth outer surface |
US3984583A (en) * | 1972-02-29 | 1976-10-05 | Agfa-Gevaert N.V. | Electron beam recording method |
US4129628A (en) * | 1976-07-19 | 1978-12-12 | Rca Corporation | Method of making a thermoplastic lens by vacuum forming |
JPS5990466A (ja) * | 1982-11-15 | 1984-05-24 | Mitsubishi Electric Corp | 固体撮像素子 |
US4667092A (en) * | 1982-12-28 | 1987-05-19 | Nec Corporation | Solid-state image device with resin lens and resin contact layer |
JPS6029703A (ja) * | 1983-07-29 | 1985-02-15 | Nippon Telegr & Teleph Corp <Ntt> | マイクロレンズアレイおよびその製造方法 |
JPS6059752A (ja) * | 1983-09-13 | 1985-04-06 | Nec Corp | 半導体装置の製造方法 |
JPS6060756A (ja) * | 1983-09-14 | 1985-04-08 | Hitachi Ltd | マイクロレンズ付固体撮像素子の製造方法 |
US4695719A (en) * | 1983-12-05 | 1987-09-22 | Honeywell Inc. | Apparatus and method for opto-electronic package |
JPS60175001A (ja) * | 1984-02-21 | 1985-09-09 | Toshiba Corp | マイクロレンズアレ− |
JPS61134061A (ja) * | 1984-12-05 | 1986-06-21 | Mitsubishi Electric Corp | モ−ルド型撮像素子 |
DE3607259A1 (de) * | 1985-03-05 | 1986-09-18 | Nippon Sheet Glass Co. Ltd., Osaka | Mikrolinsenplatte und verfahren zu ihrer herstellung |
US4807978A (en) * | 1987-09-10 | 1989-02-28 | Hughes Aircraft Company | Color display device and method using holographic lenses |
JPH02162318A (ja) * | 1988-12-16 | 1990-06-21 | Nippon Sheet Glass Co Ltd | 画像伝送装置 |
-
1991
- 1991-02-04 US US07/650,238 patent/US5239412A/en not_active Expired - Lifetime
- 1991-02-05 EP EP91300933A patent/EP0441594B1/de not_active Expired - Lifetime
- 1991-02-05 EP EP94202306A patent/EP0627637B1/de not_active Expired - Lifetime
- 1991-02-05 DE DE69130399T patent/DE69130399T2/de not_active Expired - Lifetime
- 1991-02-05 DE DE69130777T patent/DE69130777T2/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0441594A2 (de) | 1991-08-14 |
DE69130399T2 (de) | 1999-05-20 |
EP0627637A1 (de) | 1994-12-07 |
EP0441594A3 (en) | 1992-08-19 |
DE69130777D1 (de) | 1999-02-25 |
US5239412A (en) | 1993-08-24 |
EP0441594B1 (de) | 1998-10-28 |
EP0627637B1 (de) | 1999-01-13 |
DE69130399D1 (de) | 1998-12-03 |
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