DE68928501D1 - Verfahren und apparat zur herstellung eines seitenwandkontakts in einer elektrisch veränderbaren nichtflüchtigen speicherzelle - Google Patents
Verfahren und apparat zur herstellung eines seitenwandkontakts in einer elektrisch veränderbaren nichtflüchtigen speicherzelleInfo
- Publication number
- DE68928501D1 DE68928501D1 DE68928501T DE68928501T DE68928501D1 DE 68928501 D1 DE68928501 D1 DE 68928501D1 DE 68928501 T DE68928501 T DE 68928501T DE 68928501 T DE68928501 T DE 68928501T DE 68928501 D1 DE68928501 D1 DE 68928501D1
- Authority
- DE
- Germany
- Prior art keywords
- floating gate
- polysilicon
- producing
- side wall
- wall contact
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 4
- 229920005591 polysilicon Polymers 0.000 abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 230000005641 tunneling Effects 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 230000008878 coupling Effects 0.000 abstract 1
- 238000010168 coupling process Methods 0.000 abstract 1
- 238000005859 coupling reaction Methods 0.000 abstract 1
- 235000012239 silicon dioxide Nutrition 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66825—Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a floating gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/401—Multistep manufacturing processes
- H01L29/4011—Multistep manufacturing processes for data storage electrodes
- H01L29/40114—Multistep manufacturing processes for data storage electrodes the electrodes comprising a conductor-insulator-conductor-insulator-semiconductor structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/788—Field effect transistors with field effect produced by an insulated gate with floating gate
- H01L29/7881—Programmable transistors with only two possible levels of programmation
- H01L29/7883—Programmable transistors with only two possible levels of programmation charging by tunnelling of carriers, e.g. Fowler-Nordheim tunnelling
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Non-Volatile Memory (AREA)
- Semiconductor Memories (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US07/227,811 US5023694A (en) | 1988-08-03 | 1988-08-03 | Side wall contact in a nonvolatile electrically alterable memory cell |
| PCT/US1989/003157 WO1990001804A1 (en) | 1988-08-03 | 1989-07-21 | Method and apparatus for forming a side wall contact in a nonvolatile electrically alterable memory cell |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE68928501D1 true DE68928501D1 (de) | 1998-01-29 |
| DE68928501T2 DE68928501T2 (de) | 1998-05-07 |
Family
ID=22854565
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE68928501T Expired - Lifetime DE68928501T2 (de) | 1988-08-03 | 1989-07-21 | Verfahren und apparat zur herstellung eines seitenwandkontakts in einer elektrisch veränderbaren nichtflüchtigen speicherzelle |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US5023694A (de) |
| EP (1) | EP0429509B1 (de) |
| JP (1) | JP2512181B2 (de) |
| KR (1) | KR0165855B1 (de) |
| AT (1) | ATE161360T1 (de) |
| DE (1) | DE68928501T2 (de) |
| WO (1) | WO1990001804A1 (de) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5153143A (en) * | 1990-02-26 | 1992-10-06 | Delco Electronics Corporation | Method of manufacturing CMOS integrated circuit with EEPROM |
| US5409568A (en) * | 1992-08-04 | 1995-04-25 | Vasche; Gregory S. | Method of fabricating a microelectronic vacuum triode structure |
| EP1359592A3 (de) * | 1995-10-31 | 2006-12-20 | STMicroelectronics S.r.l. | Taktgeber für nichtflüchtige elektrisch programmierbare Speicherzellen |
| US6492678B1 (en) * | 2000-05-03 | 2002-12-10 | Linear Technology Corporation | High voltage MOS transistor with gate extension |
| US7754552B2 (en) * | 2003-07-29 | 2010-07-13 | Intel Corporation | Preventing silicide formation at the gate electrode in a replacement metal gate technology |
| JP4670243B2 (ja) * | 2004-01-29 | 2011-04-13 | ヤマハ株式会社 | Ｅｅｐｒｏｍの製法 |
| US8461335B2 (en) | 2009-06-30 | 2013-06-11 | Nalco Company | Acid gas scrubbing composition |
| US8541622B2 (en) | 2009-06-30 | 2013-09-24 | Nalco Company | Acid gas scrubbing composition |
| US9555364B2 (en) | 2009-06-30 | 2017-01-31 | Nalco Company | Acid gas scrubbing composition |
| US8318114B2 (en) | 2010-04-16 | 2012-11-27 | Nalco Company | Composition for treating acid gas |
| JP5588293B2 (ja) * | 2010-09-30 | 2014-09-10 | セイコーインスツル株式会社 | 半導体不揮発性メモリ装置 |
| US8765083B2 (en) | 2010-11-19 | 2014-07-01 | Nalco Company | Acid gas absorbent composition |
| CN102214702B (zh) * | 2011-05-23 | 2016-02-17 | 上海华虹宏力半导体制造有限公司 | 半导体电容器结构及其形成方法 |
| CN103426728B (zh) * | 2013-08-29 | 2017-06-09 | 上海华虹宏力半导体制造有限公司 | 电容器结构及其制作方法 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4274012A (en) * | 1979-01-24 | 1981-06-16 | Xicor, Inc. | Substrate coupled floating gate memory cell |
| US4373250A (en) * | 1980-11-17 | 1983-02-15 | Signetics Corporation | Process for fabricating a high capacity memory cell |
| JPS5846678A (ja) * | 1981-09-14 | 1983-03-18 | Oki Electric Ind Co Ltd | Ｐｎｐｎ半導体スイツチ |
| NL8200756A (nl) * | 1982-02-25 | 1983-09-16 | Philips Nv | Halfgeleiderinrichting en werkwijze ter vervaardiging daarvan. |
| JPS60226281A (ja) * | 1984-04-25 | 1985-11-11 | Hitachi Ltd | ビデオカメラの信号処理装置 |
| JPS61131486A (ja) * | 1984-11-29 | 1986-06-19 | Res Dev Corp Of Japan | 半導体不揮発性メモリ |
| JPS61208865A (ja) * | 1985-03-13 | 1986-09-17 | Mitsubishi Electric Corp | 半導体記憶装置 |
| US4752912A (en) * | 1985-05-14 | 1988-06-21 | Xicor, Inc. | Nonvolatile electrically alterable memory and method |
| US4599706A (en) * | 1985-05-14 | 1986-07-08 | Xicor, Inc. | Nonvolatile electrically alterable memory |
| US4764801A (en) * | 1985-10-08 | 1988-08-16 | Motorola Inc. | Poly-sidewall contact transistors |
| US4706102A (en) * | 1985-11-07 | 1987-11-10 | Sprague Electric Company | Memory device with interconnected polysilicon layers and method for making |
| IT1191566B (it) * | 1986-06-27 | 1988-03-23 | Sgs Microelettronica Spa | Dispositivo di memoria non labile a semiconduttore del tipo a porta non connessa (floating gate) alterabile elettricamente con area di tunnel ridotta e procedimento di fabbricazione |
| US4872050A (en) * | 1988-03-15 | 1989-10-03 | Mitsubishi Denki Kabushiki Kaisha | Interconnection structure in semiconductor device and manufacturing method of the same |
-
1988
- 1988-08-03 US US07/227,811 patent/US5023694A/en not_active Expired - Lifetime
-
1989
- 1989-07-21 WO PCT/US1989/003157 patent/WO1990001804A1/en active IP Right Grant
- 1989-07-21 EP EP89909313A patent/EP0429509B1/de not_active Expired - Lifetime
- 1989-07-21 KR KR1019900700686A patent/KR0165855B1/ko not_active IP Right Cessation
- 1989-07-21 AT AT89909313T patent/ATE161360T1/de not_active IP Right Cessation
- 1989-07-21 DE DE68928501T patent/DE68928501T2/de not_active Expired - Lifetime
- 1989-07-21 JP JP1508787A patent/JP2512181B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH04502232A (ja) | 1992-04-16 |
| WO1990001804A1 (en) | 1990-02-22 |
| EP0429509A4 (en) | 1992-07-08 |
| KR0165855B1 (ko) | 1999-01-15 |
| KR900702577A (ko) | 1990-12-07 |
| US5023694A (en) | 1991-06-11 |
| DE68928501T2 (de) | 1998-05-07 |
| EP0429509B1 (de) | 1997-12-17 |
| ATE161360T1 (de) | 1998-01-15 |
| EP0429509A1 (de) | 1991-06-05 |
| JP2512181B2 (ja) | 1996-07-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE68928501D1 (de) | Verfahren und apparat zur herstellung eines seitenwandkontakts in einer elektrisch veränderbaren nichtflüchtigen speicherzelle | |
| EP0405140B1 (de) | Bit- und Block-Löschen einer elektrisch löschbaren und programmierbaren Nur-Lese-Speicheranordnung | |
| US5173436A (en) | Method of manufacturing an EEPROM with trench-isolated bitlines | |
| US5674768A (en) | Method of making flash EEPROM cell having first and second floating gates | |
| DE69636178D1 (de) | Verfahren zum Löschen einer Flash EEPROM Speicherzelle | |
| KR960043300A (ko) | 플래쉬 이이피롬(flash eeprom)셀, 그 제조방법, 프로그램 및 독출방법 | |
| TW360980B (en) | Single transistor EEPROM memory device | |
| US6127229A (en) | Process of forming an EEPROM device having a split gate | |
| TW200623428A (en) | Non-volatile memory with erase gate on isolation zones | |
| EP1069619A3 (de) | Integriertes Halbleiterschaltkreiselement, dessen Herstellung und dessen Betrieb | |
| JPS577162A (en) | Nonvolatile semiconductor memory and manufacture therefor | |
| KR20000035157A (ko) | 불휘발성 반도체 기억 장치, 제조 방법 및 기입 방법 | |
| ATE208536T1 (de) | Überlöschungsdetektion in einer niederspannungs- eintransistor-flash-eeprom-zelle unter verwendung von fowler-nordheim-programmierung und -löschung | |
| DE69614223D1 (de) | PMOS-Flash-Speicherzelle mit mehrstufiger Schwellspannung | |
| JPS57157573A (en) | Semiconductor non-volatile memory cell | |
| US5051795A (en) | EEPROM with trench-isolated bitlines | |
| JPS5642375A (en) | Semiconductor nonvolatile memory | |
| JPS59112657A (ja) | 書込可能なリ−ドオンリ−メモリ | |
| DE69312676D1 (de) | Prozess zur Herstellung von integrierten Bauelementen einschliesslich nichtvolatiler Speicher und Transistoren mit Tunneloxidschutz | |
| JPS57112078A (en) | Manufacture of electrically rewritable fixed memory | |
| ATE168215T1 (de) | Elektrisch aenderbare einzel-transistor- halbleiterfestwertspeicheranordnung | |
| GB2239734B (en) | A method for improving the electrical erase characteristics of floating gate memory cells | |
| DE3481667D1 (de) | Mos-speicherzelle mit schwimmendem gate und verfahren zu ihrer verfertigung. | |
| US5723888A (en) | Non-volatile semiconductor memory device | |
| KR930020733A (ko) | 반도체 장치 제조방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8364 | No opposition during term of opposition | ||
| 8328 | Change in the person/name/address of the agent |
Representative=s name: WIESE KONNERTH FISCHER PATENTANWAELTE PARTNERSCHAF |
|
| 8328 | Change in the person/name/address of the agent |
Representative=s name: SCHROETER LEHMANN FISCHER & NEUGEBAUER, 81479 MUEN |
|
| 8328 | Change in the person/name/address of the agent |
Representative=s name: NEUGEBAUER, J., DIPL.-PHYS.UNIV. M.A./SUNY, PAT.-A |