DE602005014984D1 - Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter - Google Patents

Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter

Info

Publication number
DE602005014984D1
DE602005014984D1 DE602005014984T DE602005014984T DE602005014984D1 DE 602005014984 D1 DE602005014984 D1 DE 602005014984D1 DE 602005014984 T DE602005014984 T DE 602005014984T DE 602005014984 T DE602005014984 T DE 602005014984T DE 602005014984 D1 DE602005014984 D1 DE 602005014984D1
Authority
DE
Germany
Prior art keywords
made therefrom
waveguides made
waveguide compositions
waveguide
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005014984T
Other languages
English (en)
Inventor
James G Shelnut
Nicola Pugliano
Matthew L Moynihan
Hai Bin Zheng
Daniel E Lundy
Nathan Pawlowski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials LLC
Original Assignee
Rohm and Haas Electronic Materials LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials LLC filed Critical Rohm and Haas Electronic Materials LLC
Publication of DE602005014984D1 publication Critical patent/DE602005014984D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12133—Functions
    • G02B2006/1215—Splitter

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Optical Integrated Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE602005014984T 2004-04-14 2005-04-09 Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter Active DE602005014984D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US56205904P 2004-04-14 2004-04-14

Publications (1)

Publication Number Publication Date
DE602005014984D1 true DE602005014984D1 (de) 2009-07-30

Family

ID=34940759

Family Applications (2)

Application Number Title Priority Date Filing Date
DE602005001341T Active DE602005001341T2 (de) 2004-04-14 2005-04-09 Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter
DE602005014984T Active DE602005014984D1 (de) 2004-04-14 2005-04-09 Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE602005001341T Active DE602005001341T2 (de) 2004-04-14 2005-04-09 Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter

Country Status (7)

Country Link
US (1) US7072565B2 (de)
EP (1) EP1586603B1 (de)
JP (1) JP2005325344A (de)
KR (1) KR101183269B1 (de)
CN (1) CN100378468C (de)
DE (2) DE602005001341T2 (de)
TW (1) TWI398732B (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5102428B2 (ja) * 2003-11-25 2012-12-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 導波路組成物およびこれから形成された導波路
US7072564B2 (en) * 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom
JP4639685B2 (ja) * 2004-07-26 2011-02-23 Ｊｓｒ株式会社 光硬化性組成物及びそれを用いた光導波路
US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
KR101423167B1 (ko) * 2006-07-13 2014-07-25 신닛테츠 수미킨 가가쿠 가부시키가이샤 가요성 광도파로 및 광-전기 복합배선판용 적층판
JP5018307B2 (ja) * 2006-09-26 2012-09-05 富士通株式会社 レジストパターン厚肉化材料、レジストパターンの形成方法、半導体装置及びその製造方法
JP5305707B2 (ja) * 2007-03-29 2013-10-02 株式会社日本触媒 樹脂組成物及び光学部材
US8470516B2 (en) * 2007-05-18 2013-06-25 International Business Machines Corporation Method of forming a relief pattern by e-beam lithography using chemical amplification, and derived articles
US7867689B2 (en) * 2007-05-18 2011-01-11 International Business Machines Corporation Method of use for photopatternable dielectric materials for BEOL applications
US20080305255A1 (en) * 2007-06-07 2008-12-11 Fujifilm Manufacturing U.S.A. Inc. Optical waveguide coating
US7496263B2 (en) * 2007-06-07 2009-02-24 Fujifilm Manfacturing U.S.A. Inc. Thermosetting optical waveguide coating
US9011752B2 (en) 2008-03-03 2015-04-21 Nokia Corporation Electromagnetic wave transmission lines using magnetic nanoparticle composites
JP5448358B2 (ja) * 2008-04-03 2014-03-19 株式会社日本触媒 樹脂組成物、光学材料、及び、光学部材
JP5654479B2 (ja) 2008-12-10 2015-01-14 ダウ コーニング コーポレーションＤｏｗ Ｃｏｒｎｉｎｇ Ｃｏｒｐｏｒａｔｉｏｎ 切り替え可能な反射防止膜
US8809482B2 (en) 2008-12-10 2014-08-19 Dow Corning Corporation Silsesquioxane resins
KR20110096155A (ko) * 2008-12-10 2011-08-29 다우 코닝 코포레이션 습식 에칭가능한 반사방지 코팅
JP4748229B2 (ja) * 2009-02-16 2011-08-17 住友ベークライト株式会社 感光性樹脂組成物、光導波路形成用感光性樹脂組成物、光導波路形成用フィルム、光導波路、光配線、光電気混載基板および電子機器
WO2011084250A2 (en) 2009-12-21 2011-07-14 Dow Corning Corporation Methods for fabricating flexible waveguides using alkyl-functional silsesquioxane resins
CN102207621B (zh) * 2010-03-29 2013-08-07 成都易生玄科技有限公司 光线分流开关的方法
JP5308398B2 (ja) * 2010-05-11 2013-10-09 日東電工株式会社 光導波路形成用樹脂組成物およびそれを用いた光導波路
WO2012162376A1 (en) 2011-05-25 2012-11-29 Duane Raymond Bujalski Epoxy-functional radiation-curable composition containing an epoxy-functional siloxane oligomer
US8871425B2 (en) * 2012-02-09 2014-10-28 Az Electronic Materials (Luxembourg) S.A.R.L. Low dielectric photoimageable compositions and electronic devices made therefrom
CN110361604B (zh) * 2019-07-23 2021-08-13 北京无线电计量测试研究所 电场探测量子组件和制备方法以及量子场强传感器

Family Cites Families (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57168246A (en) 1981-04-09 1982-10-16 Fujitsu Ltd Formation of negative pattern
JPS6025061B2 (ja) 1981-12-02 1985-06-15 日立化成工業株式会社 感光性シリコ−ン樹脂組成物
JPS63279245A (ja) 1987-05-12 1988-11-16 Fujitsu Ltd ネガ型レジスト組成物
FR2656617A1 (fr) 1989-12-28 1991-07-05 Thomson Csf Procede de synthese de polysilsesquioxanes et applications des produits contenus.
EP0464614B1 (de) 1990-06-25 1999-09-29 Matsushita Electronics Corporation Licht- oder strahlungsempfindliche Zusammensetzung
US5457003A (en) 1990-07-06 1995-10-10 Nippon Telegraph And Telephone Corporation Negative working resist material, method for the production of the same and process of forming resist patterns using the same
JPH04271306A (ja) 1991-02-27 1992-09-28 Sumitomo Electric Ind Ltd プラスチック光伝送体
JPH04366958A (ja) 1991-06-14 1992-12-18 Oki Electric Ind Co Ltd 放射線感応性樹脂組成物
US5262280A (en) * 1992-04-02 1993-11-16 Shipley Company Inc. Radiation sensitive compositions
JPH06148895A (ja) * 1992-11-06 1994-05-27 Toray Ind Inc 感光性樹脂組成物およびこれを用いたパターン形成方法
JP3273519B2 (ja) 1992-12-04 2002-04-08 日本電信電話株式会社 ポリシロキサン系光導波路の製造方法
JPH06256523A (ja) 1993-03-02 1994-09-13 Nippon Telegr & Teleph Corp <Ntt> 遷移金属元素を含むポリシロキサンおよびそれを用いた光導波路
JP3376629B2 (ja) * 1993-03-19 2003-02-10 東レ株式会社 感光性樹脂組成物およびこれを使用したパターン形成方法
JPH08176444A (ja) 1994-10-26 1996-07-09 Nippon Telegr & Teleph Corp <Ntt> 高分子光学材料及びこれを用いた光導波路
TW397936B (en) 1994-12-09 2000-07-11 Shinetsu Chemical Co Positive resist comosition based on a silicone polymer containing a photo acid generator
JPH07258604A (ja) * 1995-02-21 1995-10-09 Toray Ind Inc 光学材料および光学材料用コーティング組成物
JP3724004B2 (ja) 1995-03-28 2005-12-07 東レ株式会社 熱硬化性組成物、その製造方法およびカラーフィルタ
JP3204359B2 (ja) 1995-04-28 2001-09-04 日本電信電話株式会社 フレキシブル高分子光導波路
JPH08327842A (ja) 1995-05-29 1996-12-13 Nippon Telegr & Teleph Corp <Ntt> 光導波路
US5972516A (en) 1996-02-29 1999-10-26 Kyocera Corporation Method for manufacturing optical waveguide using siloxane polymer, and optoelectronic hybrid substrate using the optical waveguide
JPH10148729A (ja) 1996-11-21 1998-06-02 Nippon Telegr & Teleph Corp <Ntt> 高分子光導波路コア部のリッジ・パターン形成方法
US6144795A (en) 1996-12-13 2000-11-07 Corning Incorporated Hybrid organic-inorganic planar optical waveguide device
JP3870471B2 (ja) * 1997-03-05 2007-01-17 東レ株式会社 感光性樹脂組成物、およびこれを使用したパターン形成方法
JP3571482B2 (ja) 1997-03-13 2004-09-29 日本電信電話株式会社 口径変換用高分子光導波路パターン形成方法
US5962067A (en) 1997-09-09 1999-10-05 Lucent Technologies Inc. Method for coating an article with a ladder siloxane polymer and coated article
US6054253A (en) 1997-10-10 2000-04-25 Mcgill University-The Royal Institute For The Advancement Of Learning Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon
US6087064A (en) 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
US6537723B1 (en) * 1998-10-05 2003-03-25 Nippon Telegraph And Telephone Corporation Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same
JP3133039B2 (ja) * 1998-10-05 2001-02-05 日本電信電話株式会社 光導波路用感光性組成物およびその製造方法および高分子光導波路パターン形成方法
US6187505B1 (en) 1999-02-02 2001-02-13 International Business Machines Corporation Radiation sensitive silicon-containing resists
JP2001083342A (ja) * 1999-09-09 2001-03-30 Jsr Corp 光導波路形成用組成物、光導波路の形成方法、および光導波路
JP2001288364A (ja) * 2000-04-05 2001-10-16 Jsr Corp 放射線硬化性組成物およびそれを用いた光導波路ならびに光導波路の製造方法
US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
US7035518B2 (en) 2001-04-13 2006-04-25 Hitachi Cable, Ltd. Polymer waveguides and process for producing the same
TW594416B (en) * 2001-05-08 2004-06-21 Shipley Co Llc Photoimageable composition
TWI300516B (de) * 2001-07-24 2008-09-01 Jsr Corp
JP2003185860A (ja) * 2001-12-17 2003-07-03 Jsr Corp 光導波路形成用放射線硬化性組成物および光導波路
JP2003185820A (ja) * 2001-12-21 2003-07-03 Jsr Corp 感放射線性屈折率変化性組成物および屈折率変化法
US6751396B2 (en) 2001-12-26 2004-06-15 Lucent Technologies Inc. Integrated optical devices and method of fabrication therefor
JP3952149B2 (ja) 2002-02-06 2007-08-01 信越化学工業株式会社 光導波路形成用材料及び光導波路の製造方法
JP4205368B2 (ja) 2002-06-11 2009-01-07 株式会社Ａｄｅｋａ 光学材料用硬化性組成物
US6856745B2 (en) 2002-07-02 2005-02-15 Lucent Technologies Inc. Waveguide and applications therefor
JP4143835B2 (ja) 2002-07-18 2008-09-03 信越化学工業株式会社 光導波路形成材料、それを用いた光導波路及び光導波路の製造方法
US7031591B2 (en) 2002-07-18 2006-04-18 Shin-Etsu Chemical Co., Ltd. Optical waveguide, forming material and making method
DE10240105B4 (de) * 2002-08-30 2005-03-24 Infineon Technologies Ag Herstellung organischer elektronischer Schaltkreise durch Kontaktdrucktechniken
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
EP1434068A3 (de) * 2002-12-02 2004-07-28 Shipley Company, L.L.C. Herstellungsmethoden von Lichtwellenleitern mit runden Querschnitten und Lichtwellenleitern die nach diesen Methoden hergestellt werden
JP5102428B2 (ja) * 2003-11-25 2012-12-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 導波路組成物およびこれから形成された導波路
US7072564B2 (en) 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom

Also Published As

Publication number Publication date
CN1690125A (zh) 2005-11-02
DE602005001341T2 (de) 2008-02-21
TWI398732B (zh) 2013-06-11
DE602005001341D1 (de) 2007-07-26
US20050244124A1 (en) 2005-11-03
US7072565B2 (en) 2006-07-04
KR20060045601A (ko) 2006-05-17
EP1586603B1 (de) 2007-06-13
JP2005325344A (ja) 2005-11-24
KR101183269B1 (ko) 2012-09-14
EP1586603A1 (de) 2005-10-19
TW200606590A (en) 2006-02-16
CN100378468C (zh) 2008-04-02

Similar Documents

Publication Publication Date Title
DE602005014984D1 (de) Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter
DE602005004675D1 (de) Optischer Wellenleiter und Herstellungsmethode
DE602006002917D1 (de) Gekoppelter optischer Wellenleitermikroresonator
DK1740612T3 (da) Pdx1 udtrykkende endoderm
DK2074205T3 (da) Detergentsammensætninger og anvendelsen af enzymkombinationer deri
DE602006014268D1 (de) Keramikfaser und herstellungsverfahren dafür
NO20051704D0 (no) Virvler
FR2865867B1 (fr) Coupleur electromagnetique
DE602005001977D1 (de) Messtisch und optisches Messsystem
DE602005011364D1 (de) Faserlaser
DE602006001386D1 (de) Faserbehandlungsmittel
GB2420225B (en) Integrated waveguide
DK1704213T3 (da) Petroleumpræparat
DE602004016382D1 (de) Dreieckige konforme üebrtragungsstruktur
DE602005001286D1 (de) Universalmikroskop
DE602005004462D1 (de) Instrumententafel-Querträger
FR2865729B1 (fr) Composiion de verre silico-sodo-calcique
EP1757920A4 (de) Optischer wellenleiter
DE602004010589D1 (de) Integrierter Koppler
FI20050214A0 (fi) Uudet kuituoptiset laitteet
FI6367U1 (fi) Taana
GB2435181B (en) Optical devices and their manufacture
DE502005009579D1 (de) Leiteinrichtung
FI20041296A0 (fi) Integroitu valojohde ja sekoittaja
FR2876095B1 (fr) Composition de verre silico-sodo-calcique

Legal Events

Date Code Title Description
8364 No opposition during term of opposition