DE60044992D1 - Halbleiterbauelement und dieses verwendender Leistungswandler - Google Patents
Halbleiterbauelement und dieses verwendender LeistungswandlerInfo
- Publication number
- DE60044992D1 DE60044992D1 DE60044992T DE60044992T DE60044992D1 DE 60044992 D1 DE60044992 D1 DE 60044992D1 DE 60044992 T DE60044992 T DE 60044992T DE 60044992 T DE60044992 T DE 60044992T DE 60044992 D1 DE60044992 D1 DE 60044992D1
- Authority
- DE
- Germany
- Prior art keywords
- semiconductor device
- power converter
- converter
- power
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7393—Insulated gate bipolar mode transistors, i.e. IGBT; IGT; COMFET
- H01L29/7395—Vertical transistors, e.g. vertical IGBT
- H01L29/7396—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions
- H01L29/7397—Vertical transistors, e.g. vertical IGBT with a non planar surface, e.g. with a non planar gate or with a trench or recess or pillar in the surface of the emitter, base or collector region for improving current density or short circuiting the emitter and base regions and a gate structure lying on a slanted or vertical surface or formed in a groove, e.g. trench gate IGBT
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0603—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions
- H01L29/0607—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration
- H01L29/0611—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices
- H01L29/0615—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE]
- H01L29/0619—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by particular constructional design considerations, e.g. for preventing surface leakage, for controlling electric field concentration or for internal isolations regions for preventing surface leakage or controlling electric field concentration for increasing or controlling the breakdown voltage of reverse biased devices by the doping profile or the shape or the arrangement of the PN junction, or with supplementary regions, e.g. junction termination extension [JTE] with a supplementary region doped oppositely to or in rectifying contact with the semiconductor containing or contacting region, e.g. guard rings with PN or Schottky junction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0684—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape, relative sizes or dispositions of the semiconductor regions or junctions between the regions
- H01L29/0692—Surface layout
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1095—Body region, i.e. base region, of DMOS transistors or IGBTs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thyristors (AREA)
- Semiconductor Integrated Circuits (AREA)
- Electrodes Of Semiconductors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3816699 | 1999-02-17 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE60044992D1 true DE60044992D1 (de) | 2010-11-04 |
Family
ID=12517825
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE60044992T Expired - Lifetime DE60044992D1 (de) | 1999-02-17 | 2000-02-11 | Halbleiterbauelement und dieses verwendender Leistungswandler |
Country Status (3)
Country | Link |
---|---|
EP (3) | EP1032047B9 (de) |
KR (1) | KR100745557B1 (de) |
DE (1) | DE60044992D1 (de) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001168333A (ja) * | 1999-09-30 | 2001-06-22 | Toshiba Corp | トレンチゲート付き半導体装置 |
EP1451921A4 (de) * | 2001-11-02 | 2006-01-11 | Aker Wade Power Technologies L | Schnelles ladegerät für batterien mit hoher kapazität |
US7301308B2 (en) | 2001-11-02 | 2007-11-27 | Aker Wade Power Technologies, Llc | Fast charger for high capacity batteries |
JP4085781B2 (ja) * | 2002-11-01 | 2008-05-14 | トヨタ自動車株式会社 | 電界効果型半導体装置 |
JP4136778B2 (ja) * | 2003-05-07 | 2008-08-20 | 富士電機デバイステクノロジー株式会社 | 絶縁ゲート型バイポーラトランジスタ |
JP4799829B2 (ja) * | 2003-08-27 | 2011-10-26 | 三菱電機株式会社 | 絶縁ゲート型トランジスタ及びインバータ回路 |
JP4703138B2 (ja) | 2004-06-18 | 2011-06-15 | 株式会社東芝 | 絶縁ゲート型半導体装置 |
JP4731848B2 (ja) * | 2004-07-16 | 2011-07-27 | 株式会社豊田中央研究所 | 半導体装置 |
JP5017850B2 (ja) * | 2005-11-30 | 2012-09-05 | 株式会社日立製作所 | 電力用半導体装置およびそれを用いた電力変換装置 |
JP5044950B2 (ja) | 2006-03-14 | 2012-10-10 | 株式会社デンソー | 半導体装置 |
EP2003694B1 (de) * | 2007-06-14 | 2011-11-23 | Denso Corporation | Halbleiterbauelement |
JP5561922B2 (ja) | 2008-05-20 | 2014-07-30 | 三菱電機株式会社 | パワー半導体装置 |
JP4644730B2 (ja) * | 2008-08-12 | 2011-03-02 | 株式会社日立製作所 | 半導体装置及びそれを用いた電力変換装置 |
US8344480B2 (en) | 2008-09-30 | 2013-01-01 | Ixys Corporation | Insulated gate bipolar transistor |
JP5423018B2 (ja) * | 2009-02-02 | 2014-02-19 | 三菱電機株式会社 | 半導体装置 |
EP2523217A4 (de) * | 2010-01-04 | 2014-06-25 | Hitachi Ltd | Halbleiterbauelement und stromumrichtervorrichtung damit |
KR101840903B1 (ko) * | 2011-07-07 | 2018-03-21 | 에이비비 슈바이쯔 아게 | 절연 게이트 바이폴라 트랜지스터 |
WO2013007654A1 (en) * | 2011-07-14 | 2013-01-17 | Abb Technology Ag | Insulated gate bipolar transistor |
JP5720805B2 (ja) * | 2011-11-28 | 2015-05-20 | 富士電機株式会社 | 絶縁ゲート型半導体装置およびその製造方法 |
JP5973730B2 (ja) | 2012-01-05 | 2016-08-23 | ルネサスエレクトロニクス株式会社 | Ie型トレンチゲートigbt |
KR101311538B1 (ko) * | 2012-01-19 | 2013-09-25 | 주식회사 케이이씨 | 전력 반도체 디바이스 및 그 제조 방법 |
JP6072445B2 (ja) | 2012-06-28 | 2017-02-01 | 株式会社 日立パワーデバイス | 半導体装置およびそれを用いた電力変換装置 |
US9595602B2 (en) | 2012-09-07 | 2017-03-14 | Hitachi, Ltd. | Switching device for power conversion and power conversion device |
US20170309704A1 (en) * | 2015-01-14 | 2017-10-26 | Mitsubishi Electric Corporation | Semiconductor device and manufacturing method therefor |
JP6299789B2 (ja) | 2016-03-09 | 2018-03-28 | トヨタ自動車株式会社 | スイッチング素子 |
JP6460016B2 (ja) | 2016-03-09 | 2019-01-30 | トヨタ自動車株式会社 | スイッチング素子 |
JP6588363B2 (ja) | 2016-03-09 | 2019-10-09 | トヨタ自動車株式会社 | スイッチング素子 |
JP6804379B2 (ja) * | 2017-04-24 | 2020-12-23 | 三菱電機株式会社 | 半導体装置 |
CN107464839B (zh) * | 2017-08-17 | 2020-02-04 | 电子科技大学 | 一种防止关断失效的栅控晶闸管器件 |
CN108493242B (zh) * | 2018-05-31 | 2020-08-28 | 电子科技大学 | 一种优化体内电场的载流子增强型igbt器件 |
CN108767006B (zh) * | 2018-05-31 | 2020-09-15 | 电子科技大学 | 一种集成电压采样功能的igbt器件 |
CN111384149B (zh) * | 2018-12-29 | 2021-05-14 | 比亚迪半导体股份有限公司 | 沟槽型igbt及其制备方法 |
CN110416294B (zh) * | 2019-08-29 | 2021-01-08 | 电子科技大学 | 一种高耐压低损耗超结功率器件 |
CN113793807B (zh) * | 2021-11-18 | 2022-02-11 | 南京华瑞微集成电路有限公司 | 一种集成源漏电容的超结mos器件及其制作方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4712124A (en) * | 1986-12-22 | 1987-12-08 | North American Philips Corporation | Complementary lateral insulated gate rectifiers with matched "on" resistances |
EP1469524A3 (de) * | 1991-08-08 | 2005-07-06 | Kabushiki Kaisha Toshiba | Bipolartransistor mit isoliertem Graben-Gate |
DE4407279C1 (de) * | 1994-03-04 | 1994-10-13 | Siemens Ag | Halbleiterbauelement für den Überspannungsschutz von MOSFET und IGBT |
DE69432407D1 (de) * | 1994-05-19 | 2003-05-08 | Cons Ric Microelettronica | Integrierte Leistungsschaltung ("PIC") mit vertikalem IGB und Verfahren zur Herstellung derselben |
JPH08116056A (ja) * | 1994-10-19 | 1996-05-07 | Hitachi Ltd | 電圧駆動型半導体装置及びそれを用いた電力変換装置 |
DE69617098T2 (de) | 1995-06-02 | 2002-04-18 | Siliconix Inc | Grabengate-Leistungs-MOSFET mit Schutzdioden in periodischer Anordnung |
KR100187635B1 (ko) * | 1996-03-20 | 1999-07-01 | 김충환 | 단락 애노우드 수평형 절연 게이트 바이폴라 트랜지스터 |
JP2776365B2 (ja) * | 1996-04-04 | 1998-07-16 | 日本電気株式会社 | 多段接続型半導体用キャリヤーとそれを用いた半導体装置、及びその製造方法 |
KR100200366B1 (ko) * | 1996-10-31 | 1999-06-15 | 윤종용 | 절연 게이트 바이폴라 트랜지스터 |
DE19705276A1 (de) | 1996-12-06 | 1998-08-20 | Semikron Elektronik Gmbh | IGBT mit Trench-Gate-Struktur |
JPH118385A (ja) * | 1997-06-18 | 1999-01-12 | Hitachi Ltd | 内燃機関用点火装置およびigbt |
US6110799A (en) * | 1997-06-30 | 2000-08-29 | Intersil Corporation | Trench contact process |
DE19727676A1 (de) * | 1997-06-30 | 1999-01-07 | Asea Brown Boveri | MOS gesteuertes Leistungshalbleiterbauelement |
-
2000
- 2000-02-09 KR KR1020000005888A patent/KR100745557B1/ko active IP Right Grant
- 2000-02-11 EP EP00301097A patent/EP1032047B9/de not_active Expired - Lifetime
- 2000-02-11 DE DE60044992T patent/DE60044992D1/de not_active Expired - Lifetime
- 2000-02-11 EP EP07009037A patent/EP1811572B1/de not_active Expired - Lifetime
- 2000-02-11 EP EP10007172.9A patent/EP2237319B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP1032047A2 (de) | 2000-08-30 |
EP2237319A2 (de) | 2010-10-06 |
EP1032047A3 (de) | 2001-11-28 |
EP1811572A3 (de) | 2007-09-19 |
KR20000076628A (ko) | 2000-12-26 |
EP2237319B1 (de) | 2015-04-08 |
EP1811572A2 (de) | 2007-07-25 |
EP1811572B1 (de) | 2012-05-30 |
EP2237319A3 (de) | 2010-10-27 |
EP1032047B9 (de) | 2011-02-09 |
KR100745557B1 (ko) | 2007-08-02 |
EP1032047B1 (de) | 2010-09-22 |
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