DE3215151A1 - Photoleitfaehiges element - Google Patents

Photoleitfaehiges element

Info

Publication number
DE3215151A1
DE3215151A1 DE3215151A DE3215151A DE3215151A1 DE 3215151 A1 DE3215151 A1 DE 3215151A1 DE 3215151 A DE3215151 A DE 3215151A DE 3215151 A DE3215151 A DE 3215151A DE 3215151 A1 DE3215151 A1 DE 3215151A1
Authority
DE
Germany
Prior art keywords
photo
conductive element
conductive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE3215151A
Other languages
English (en)
Other versions
DE3215151C2 (de
Inventor
Junichiro Kanbe
Shigeru Shirai
Tadaji Fukuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE3215151A1 publication Critical patent/DE3215151A1/de
Application granted granted Critical
Publication of DE3215151C2 publication Critical patent/DE3215151C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/14—Inert intermediate or cover layers for charge-receiving layers
    • G03G5/142—Inert intermediate layers
    • G03G5/144—Inert intermediate layers comprising inorganic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214—Silicon-based
    • G03G5/08221—Silicon-based comprising one or two silicon based layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214—Silicon-based
    • G03G5/08235—Silicon-based comprising three or four silicon-based layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Light Receiving Elements (AREA)
DE3215151A 1981-04-24 1982-04-23 Photoleitfaehiges element Granted DE3215151A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56062182A JPS57177156A (en) 1981-04-24 1981-04-24 Photoconductive material

Publications (2)

Publication Number Publication Date
DE3215151A1 true DE3215151A1 (de) 1982-11-11
DE3215151C2 DE3215151C2 (de) 1988-03-17

Family

ID=13192728

Family Applications (1)

Application Number Title Priority Date Filing Date
DE3215151A Granted DE3215151A1 (de) 1981-04-24 1982-04-23 Photoleitfaehiges element

Country Status (6)

Country Link
US (1) US4443529A (de)
JP (1) JPS57177156A (de)
CA (1) CA1180220A (de)
DE (1) DE3215151A1 (de)
FR (1) FR2504697A1 (de)
GB (1) GB2099600B (de)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3340568A1 (de) * 1983-01-26 1984-07-26 Tokyo Shibaura Denki K.K., Kawasaki Halbleiteranordnung
DE3443823A1 (de) * 1983-12-01 1985-06-13 Ricoh Co., Ltd., Tokio/Tokyo Elektrophotographischer photoleiter
DE3541764A1 (de) * 1984-11-26 1986-06-05 Kabushiki Kaisha Toshiba, Kawasaki, Kanagawa Photoleiterelement
DE3621269A1 (de) * 1985-06-25 1987-01-08 Toshiba Kk Lichtempfindliches elektrophotographisches aufzeichnungsmaterial
DE3621270A1 (de) * 1985-06-25 1987-01-08 Toshiba Kk Lichtempfindliches elektrophotographisches aufzeichnungsmaterial
DE3701488A1 (de) * 1986-02-26 1987-08-27 Toshiba Kawasaki Kk Elektrophotographisches lichtempfindliches element

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8204056A (nl) * 1982-10-21 1984-05-16 Oce Nederland Bv Fotogeleidend element voor toepassing in elektrofotografische kopieerprocessen.
JPH0616178B2 (ja) * 1983-07-19 1994-03-02 株式会社東芝 光導電部材
US4666808A (en) * 1983-04-01 1987-05-19 Kyocera Corp. Amorphous silicon electrophotographic sensitive member
JPS59184360A (ja) * 1983-04-04 1984-10-19 Fuji Photo Film Co Ltd 電子写真用感光体
JPS59193463A (ja) * 1983-04-18 1984-11-02 Canon Inc 電子写真用光導電部材
JPS59200248A (ja) * 1983-04-28 1984-11-13 Canon Inc 像形成部材の製造法
JPS59204048A (ja) * 1983-05-06 1984-11-19 Kyocera Corp 電子写真感光体
DE3420741C2 (de) * 1983-06-02 1996-03-28 Minolta Camera Kk Elektrophotographisches Aufzeichnungsmaterial
US4513073A (en) * 1983-08-18 1985-04-23 Minnesota Mining And Manufacturing Company Layered photoconductive element
US4659639A (en) * 1983-09-22 1987-04-21 Minolta Camera Kabushiki Kaisha Photosensitive member with an amorphous silicon-containing insulating layer
JPS6091360A (ja) * 1983-10-25 1985-05-22 Kyocera Corp 光導電部材
US4544617A (en) * 1983-11-02 1985-10-01 Xerox Corporation Electrophotographic devices containing overcoated amorphous silicon compositions
JPS60104955A (ja) * 1983-11-11 1985-06-10 Hitachi Koki Co Ltd 電子写真像形成部材
JPS60104954A (ja) * 1983-11-11 1985-06-10 Hitachi Koki Co Ltd 電子写真像形成部材
JPS60125846A (ja) * 1983-12-09 1985-07-05 Hitachi Koki Co Ltd 電子写真像形成部材
JPH067270B2 (ja) * 1983-12-16 1994-01-26 株式会社日立製作所 電子写真用感光体
JPS60146251A (ja) * 1984-01-10 1985-08-01 Sharp Corp 電子写真用感光体の製造方法
ATE70665T1 (de) * 1984-02-14 1992-01-15 Energy Conversion Devices Inc Verfahren zur herstellung eines fotoleitfaehigen elementes.
US4619877A (en) * 1984-08-20 1986-10-28 Eastman Kodak Company Low field electrophotographic process
CA1249476A (en) * 1984-08-20 1989-01-31 Paul M. Borsenberger Low field electrophotographic process
US4540647A (en) * 1984-08-20 1985-09-10 Eastman Kodak Company Method for the manufacture of photoconductive insulating elements with a broad dynamic exposure range
US4613556A (en) * 1984-10-18 1986-09-23 Xerox Corporation Heterogeneous electrophotographic imaging members of amorphous silicon and silicon oxide
US4713309A (en) * 1985-08-26 1987-12-15 Energy Conversion Devices, Inc. Enhancement layer for positively charged electrophotographic devices and method for decreasing charge fatigue through the use of said layer
US4721663A (en) * 1985-08-26 1988-01-26 Energy Conversion Devices, Inc. Enhancement layer for negatively charged electrophotographic devices
US4663258A (en) * 1985-09-30 1987-05-05 Xerox Corporation Overcoated amorphous silicon imaging members
JPH0785174B2 (ja) * 1986-01-18 1995-09-13 キヤノン株式会社 超薄膜積層構造を有する光受容部材
JPS62258464A (ja) * 1986-04-08 1987-11-10 Canon Inc 光受容部材
JPH07101317B2 (ja) * 1986-11-17 1995-11-01 富士通株式会社 アモルフアスシリコン電子写真感光体
US4845043A (en) * 1987-04-23 1989-07-04 Catalano Anthony W Method for fabricating photovoltaic device having improved short wavelength photoresponse
FR2631346B1 (fr) * 1988-05-11 1994-05-20 Air Liquide Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications
US4933246A (en) * 1989-01-03 1990-06-12 Xerox Corporation Electrophotographic imaging member with a copolymer blocking layer
JP3206916B2 (ja) * 1990-11-28 2001-09-10 住友電気工業株式会社 欠陥濃度低減方法、紫外線透過用光学ガラスの製造方法及び紫外線透過用光学ガラス
JP5346809B2 (ja) 2008-05-21 2013-11-20 キヤノン株式会社 負帯電用電子写真感光体、画像形成方法および電子写真装置
DE102017001097A1 (de) * 2017-02-07 2018-08-09 Gentherm Gmbh Elektrisch leitfähige Folie

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2746967A1 (de) * 1977-10-19 1979-04-26 Siemens Ag Drucktrommel fuer elektrostatisches kopierverfahren
DE2855718A1 (de) * 1977-12-22 1979-06-28 Canon Kk Lichtempfindliches element fuer die elektrophotographie und verfahren zu dessen herstellung
DE2933411A1 (de) * 1978-08-18 1980-03-20 Hitachi Ltd Festkoerper-abbildungs-bauelement

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2954551C2 (de) * 1978-03-03 1989-02-09 Canon K.K., Tokio/Tokyo, Jp
US4217374A (en) * 1978-03-08 1980-08-12 Energy Conversion Devices, Inc. Amorphous semiconductors equivalent to crystalline semiconductors
US4226898A (en) * 1978-03-16 1980-10-07 Energy Conversion Devices, Inc. Amorphous semiconductors equivalent to crystalline semiconductors produced by a glow discharge process
JPS564151A (en) * 1979-06-22 1981-01-17 Minolta Camera Co Ltd Electrophotographic receptor
JPS574172A (en) * 1980-06-09 1982-01-09 Canon Inc Light conductive member

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2746967A1 (de) * 1977-10-19 1979-04-26 Siemens Ag Drucktrommel fuer elektrostatisches kopierverfahren
DE2855718A1 (de) * 1977-12-22 1979-06-28 Canon Kk Lichtempfindliches element fuer die elektrophotographie und verfahren zu dessen herstellung
DE2933411A1 (de) * 1978-08-18 1980-03-20 Hitachi Ltd Festkoerper-abbildungs-bauelement

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3340568A1 (de) * 1983-01-26 1984-07-26 Tokyo Shibaura Denki K.K., Kawasaki Halbleiteranordnung
DE3443823A1 (de) * 1983-12-01 1985-06-13 Ricoh Co., Ltd., Tokio/Tokyo Elektrophotographischer photoleiter
DE3541764A1 (de) * 1984-11-26 1986-06-05 Kabushiki Kaisha Toshiba, Kawasaki, Kanagawa Photoleiterelement
US4716090A (en) * 1984-11-26 1987-12-29 Kabushiki Kaisha Toshiba Photoconductive member for exhibiting photoconductivity upon illumination by electromagnetic light in the visible to ultraviolet range
US4724193A (en) * 1984-11-26 1988-02-09 Toshiba Kk Photoconductive membrane for exhibiting photoconductivity upon illumination by electromagnetic light in the visible to ultraviolet range
DE3621269A1 (de) * 1985-06-25 1987-01-08 Toshiba Kk Lichtempfindliches elektrophotographisches aufzeichnungsmaterial
DE3621270A1 (de) * 1985-06-25 1987-01-08 Toshiba Kk Lichtempfindliches elektrophotographisches aufzeichnungsmaterial
US4717637A (en) * 1985-06-25 1988-01-05 Kabushiki Kaisha Toshiba Electrophotographic photosensitive member using microcrystalline silicon
DE3701488A1 (de) * 1986-02-26 1987-08-27 Toshiba Kawasaki Kk Elektrophotographisches lichtempfindliches element

Also Published As

Publication number Publication date
JPS57177156A (en) 1982-10-30
DE3215151C2 (de) 1988-03-17
FR2504697A1 (fr) 1982-10-29
GB2099600B (en) 1984-12-12
CA1180220A (en) 1985-01-02
US4443529A (en) 1984-04-17
FR2504697B1 (de) 1985-03-15
JPH0150904B2 (de) 1989-11-01
GB2099600A (en) 1982-12-08

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition