ATE70665T1 - Verfahren zur herstellung eines fotoleitfaehigen elementes. - Google Patents

Verfahren zur herstellung eines fotoleitfaehigen elementes.

Info

Publication number
ATE70665T1
ATE70665T1 AT84115397T AT84115397T ATE70665T1 AT E70665 T1 ATE70665 T1 AT E70665T1 AT 84115397 T AT84115397 T AT 84115397T AT 84115397 T AT84115397 T AT 84115397T AT E70665 T1 ATE70665 T1 AT E70665T1
Authority
AT
Austria
Prior art keywords
photoconductive
layer
members
substrate
microwave energy
Prior art date
Application number
AT84115397T
Other languages
English (en)
Inventor
Annette G Johncock
Stephen J Hudgens
Original Assignee
Energy Conversion Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Energy Conversion Devices Inc filed Critical Energy Conversion Devices Inc
Application granted granted Critical
Publication of ATE70665T1 publication Critical patent/ATE70665T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
    • H01L31/03762—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic System
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
    • H01L31/09—Devices sensitive to infrared, visible or ultraviolet radiation
    • H01L31/095—Devices sensitive to infrared, visible or ultraviolet radiation comprising amorphous semiconductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/20—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials
    • H01L31/202—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof such devices or parts thereof comprising amorphous semiconductor materials including only elements of Group IV of the Periodic System
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Light Receiving Elements (AREA)
  • Chemical Vapour Deposition (AREA)
  • Discharging, Photosensitive Material Shape In Electrophotography (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
  • Manufacturing Of Electric Cables (AREA)
AT84115397T 1984-02-14 1984-12-13 Verfahren zur herstellung eines fotoleitfaehigen elementes. ATE70665T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58008184A 1984-02-14 1984-02-14
EP84115397A EP0151754B1 (de) 1984-02-14 1984-12-13 Verfahren zur Herstellung eines fotoleitfähigen Elementes

Publications (1)

Publication Number Publication Date
ATE70665T1 true ATE70665T1 (de) 1992-01-15

Family

ID=24319608

Family Applications (1)

Application Number Title Priority Date Filing Date
AT84115397T ATE70665T1 (de) 1984-02-14 1984-12-13 Verfahren zur herstellung eines fotoleitfaehigen elementes.

Country Status (6)

Country Link
EP (1) EP0151754B1 (de)
JP (1) JPH07107896B2 (de)
AT (1) ATE70665T1 (de)
AU (1) AU3872885A (de)
CA (1) CA1241617A (de)
DE (2) DE151754T1 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4619729A (en) * 1984-02-14 1986-10-28 Energy Conversion Devices, Inc. Microwave method of making semiconductor members
EP0192473A3 (de) * 1985-02-19 1988-04-06 Exxon Research And Engineering Company Amorpher Photoempfänger mit grosser Empfindlichkeit im langen Wellenlängenbereich
IN166164B (de) * 1985-08-26 1990-03-24 Energy Conversion Devices Inc
US4675272A (en) * 1985-11-01 1987-06-23 Energy Conversion Devices, Inc. Electrolevelled substrate for electrophotographic photoreceptors and method of fabricating same
EP0231531A3 (de) * 1986-02-03 1988-10-05 Energy Conversion Devices, Inc. Anpassungsverfahren und -vorrichtung eines Mikrowellen durchlassenden Fensters
JPS62220961A (ja) * 1986-03-20 1987-09-29 Minolta Camera Co Ltd 感光体
EP0238095A1 (de) * 1986-03-20 1987-09-23 Minolta Camera Kabushiki Kaisha Lichtempfindliches Element, bestehend aus einer Ladungstransportschicht und einer Ladungserzeugungsschicht
JPS62220959A (ja) * 1986-03-20 1987-09-29 Minolta Camera Co Ltd 感光体
EP0241033A1 (de) * 1986-04-09 1987-10-14 Minolta Camera Kabushiki Kaisha Lichtempfindliches Element, bestehend aus einer Ladungstransportschicht und einer Ladungserzeugungsschicht
US4888521A (en) * 1986-07-04 1989-12-19 Hitachi Ltd. Photoconductive device and method of operating the same
US5233265A (en) * 1986-07-04 1993-08-03 Hitachi, Ltd. Photoconductive imaging apparatus
US4799968A (en) * 1986-09-26 1989-01-24 Sanyo Electric Co., Ltd. Photovoltaic device
EP0261651A1 (de) * 1986-09-26 1988-03-30 Minolta Camera Kabushiki Kaisha Lichtempfindliches Element, das eine Ladungserzeugungsschicht und eine Ladungstransportschicht enthält
DE3850157T2 (de) * 1987-03-23 1995-02-09 Hitachi Ltd Photoelektrische Umwandlungsanordnung.
JP2627323B2 (ja) * 1988-10-27 1997-07-02 三洋電機株式会社 半導体装置及びその製造方法
JPH02141578A (ja) * 1988-11-24 1990-05-30 Canon Inc 堆積膜形成装置
US5256576A (en) * 1992-02-14 1993-10-26 United Solar Systems Corporation Method of making pin junction semiconductor device with RF deposited intrinsic buffer layer
JP2008115460A (ja) 2006-10-12 2008-05-22 Canon Inc 半導体素子の形成方法及び光起電力素子の形成方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2033355B (en) * 1978-09-07 1982-05-06 Standard Telephones Cables Ltd Semiconductor processing
US4282267A (en) * 1979-09-20 1981-08-04 Western Electric Co., Inc. Methods and apparatus for generating plasmas
JPS56125881A (en) * 1980-03-06 1981-10-02 Fuji Photo Film Co Ltd Optical semiconductor element
KR890000479B1 (ko) * 1980-09-09 1989-03-18 에너지 컨버션 디바이시즈, 인코포레이리드 광응답 비정질 합금 제조방법 및 그 합금과 그로부터 만든 디바이스
US4394425A (en) * 1980-09-12 1983-07-19 Canon Kabushiki Kaisha Photoconductive member with α-Si(C) barrier layer
US4557987A (en) * 1980-12-23 1985-12-10 Canon Kabushiki Kaisha Photoconductive member having barrier layer and amorphous silicon charge generation and charge transport layers
DE3200376A1 (de) * 1981-01-09 1982-11-04 Canon K.K., Tokyo Fotoleitfaehiges element
JPS57177156A (en) * 1981-04-24 1982-10-30 Canon Inc Photoconductive material
JPS5825226A (ja) * 1982-07-19 1983-02-15 Shunpei Yamazaki プラズマ気相反応装置
JPS5918685A (ja) * 1982-07-21 1984-01-31 Matsushita Electric Ind Co Ltd 光電変換素子の製造方法

Also Published As

Publication number Publication date
DE3485373D1 (de) 1992-01-30
EP0151754A3 (en) 1987-04-01
EP0151754B1 (de) 1991-12-18
EP0151754A2 (de) 1985-08-21
AU3872885A (en) 1985-08-22
DE151754T1 (de) 1986-01-16
CA1241617A (en) 1988-09-06
JPS60189274A (ja) 1985-09-26
JPH07107896B2 (ja) 1995-11-15

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Legal Events

Date Code Title Description
UEP Publication of translation of european patent specification
REN Ceased due to non-payment of the annual fee