DE2730725A1 - Haertbare zusammensetzung und ihre verwendung - Google Patents

Haertbare zusammensetzung und ihre verwendung

Info

Publication number
DE2730725A1
DE2730725A1 DE19772730725 DE2730725A DE2730725A1 DE 2730725 A1 DE2730725 A1 DE 2730725A1 DE 19772730725 DE19772730725 DE 19772730725 DE 2730725 A DE2730725 A DE 2730725A DE 2730725 A1 DE2730725 A1 DE 2730725A1
Authority
DE
Germany
Prior art keywords
curable composition
composition according
integer
group
aromatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19772730725
Other languages
German (de)
English (en)
Other versions
DE2730725C2 (es
Inventor
James Vincent Crivello
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of DE2730725A1 publication Critical patent/DE2730725A1/de
Application granted granted Critical
Publication of DE2730725C2 publication Critical patent/DE2730725C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
DE19772730725 1976-07-09 1977-07-07 Haertbare zusammensetzung und ihre verwendung Granted DE2730725A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
US73242176A 1976-10-14 1976-10-14

Publications (2)

Publication Number Publication Date
DE2730725A1 true DE2730725A1 (de) 1978-01-12
DE2730725C2 DE2730725C2 (es) 1990-08-16

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19772730725 Granted DE2730725A1 (de) 1976-07-09 1977-07-07 Haertbare zusammensetzung und ihre verwendung

Country Status (8)

Country Link
JP (1) JPS6035930B2 (es)
AU (1) AU517415B2 (es)
BR (1) BR7704527A (es)
DE (1) DE2730725A1 (es)
FR (1) FR2357931A1 (es)
GB (1) GB1554389A (es)
MX (2) MX159499A (es)
NL (1) NL183948C (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
ATE37242T1 (de) * 1984-02-10 1988-09-15 Ciba Geigy Ag Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.
WO2003064529A1 (en) * 2002-02-01 2003-08-07 Shell Solar Gmbh Barrier layer made of a curable resin containing polymeric polyol
TWI498350B (zh) 2009-10-01 2015-09-01 Hitachi Chemical Co Ltd 有機電子用材料、有機電子元件、有機電激發光元件、及使用其之顯示元件、照明裝置、顯示裝置
US10566105B2 (en) 2010-04-22 2020-02-18 Hitachi Chemical Company, Ltd. Method for producing charge transport film
CN106939074B (zh) 2013-03-08 2020-06-16 日立化成株式会社 含有离子性化合物的处理液

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2518652A1 (de) * 1974-05-02 1975-11-06 Gen Electric Haertbare zusammensetzungen
DE2518656A1 (de) * 1974-05-02 1975-11-06 Gen Electric Haertbare zusammensetzungen

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
BE522162A (es) * 1952-08-19
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1516352A (en) * 1974-05-02 1978-07-05 Gen Electric Halonium salts
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2518652A1 (de) * 1974-05-02 1975-11-06 Gen Electric Haertbare zusammensetzungen
DE2518656A1 (de) * 1974-05-02 1975-11-06 Gen Electric Haertbare zusammensetzungen

Also Published As

Publication number Publication date
BR7704527A (pt) 1978-04-25
AU2553177A (en) 1978-11-30
DE2730725C2 (es) 1990-08-16
GB1554389A (en) 1979-10-17
AU517415B2 (en) 1981-07-30
NL183948B (nl) 1988-10-03
NL7707609A (nl) 1978-01-11
NL183948C (nl) 1989-03-01
FR2357931A1 (fr) 1978-02-03
MX159499A (es) 1989-06-20
FR2357931B1 (es) 1983-11-25
MX145409A (es) 1982-02-04
JPS5322597A (en) 1978-03-02
JPS6035930B2 (ja) 1985-08-17

Similar Documents

Publication Publication Date Title
DE2518656C3 (de) Härtbare Zusammensetzungen
US4193799A (en) Method of making printing plates and printed circuit
DE2559718C2 (de) Verfahren zur kationischen Polymerisation von Epoxyharz
DE2518749C2 (de) Fotopolymerisierbare Zusammensetzungen, Verfahren zum Fotopolymerisieren dieser Zusammensetzungen und deren Verwendung
EP0022081B1 (de) Sulphoxoniumsalze enthaltende polymerisierbare Mischungen sowie Verfahren zur Herstellung hochmolekularer Produkte aus diesen Mischungen durch Bestrahlung
EP0104143B1 (de) Diaryljodosylsalze enthaltende photopolymerisierbare Zusammensetzungen
EP0146501B1 (de) Polymerisierbare Zusammensetzungen
EP0003040B1 (de) Strahlungsempfindliche Überzugsmasse und Verfahren zur Herstellung eines negativen Photoresistbildes
DE2518639A1 (de) Haertbare zusammensetzungen
DE3604581A1 (de) 4-acylbenzylsulfoniumsalze, ihre herstellung sowie sie enthaltende photohaertbare gemische und aufzeichnungsmaterialien
DE3604580A1 (de) Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren
CH640222A5 (de) Triarylsulfoniumkomplexsalze, verfahren zu ihrer herstellung und diese salze enthaltende photopolymerisierbare gemische.
DE2618897A1 (de) Haertbare zusammensetzungen
EP0207893B1 (de) Verfahren zur Bilderzeugung
DE2730725C2 (es)
EP0119959A1 (de) Verfahren zur Bilderzeugung
DE1570748A1 (de) Photopolymer
DE2557078C3 (de) Lichtempfindliche Masse
DE2507008A1 (de) Polymerisierbare ester
DE4207264B4 (de) Negativ arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial
DE1296975B (de) Lichtempfindliches Gemisch
EP0145653A2 (de) Photopolymerisierbare Zusammensetzungen
DE2410238A1 (de) Polymerisierbare massen
EP0132710B1 (de) Zur Herstellung von Reliefbildern oder Resistmustern geeignetes lichtempfindliches Aufzeichnungsmaterial
DE3841437A1 (de) Strahlungsempfindliches gemisch

Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
D2 Grant after examination
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
8328 Change in the person/name/address of the agent

Free format text: SIEB, R., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 6947 LAUDENBACH

8339 Ceased/non-payment of the annual fee