GB1554389A - Curable compositions and method for curing same - Google Patents

Curable compositions and method for curing same

Info

Publication number
GB1554389A
GB1554389A GB22440/77A GB2244077A GB1554389A GB 1554389 A GB1554389 A GB 1554389A GB 22440/77 A GB22440/77 A GB 22440/77A GB 2244077 A GB2244077 A GB 2244077A GB 1554389 A GB1554389 A GB 1554389A
Authority
GB
United Kingdom
Prior art keywords
curable compositions
curing same
curing
same
curable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB22440/77A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of GB1554389A publication Critical patent/GB1554389A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
GB22440/77A 1976-07-09 1977-05-27 Curable compositions and method for curing same Expired GB1554389A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
US73242176A 1976-10-14 1976-10-14

Publications (1)

Publication Number Publication Date
GB1554389A true GB1554389A (en) 1979-10-17

Family

ID=27107218

Family Applications (1)

Application Number Title Priority Date Filing Date
GB22440/77A Expired GB1554389A (en) 1976-07-09 1977-05-27 Curable compositions and method for curing same

Country Status (8)

Country Link
JP (1) JPS6035930B2 (en)
AU (1) AU517415B2 (en)
BR (1) BR7704527A (en)
DE (1) DE2730725A1 (en)
FR (1) FR2357931A1 (en)
GB (1) GB1554389A (en)
MX (2) MX159499A (en)
NL (1) NL183948C (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369A (en) * 1983-05-06 1984-11-07 Sericol Group Ltd Photosensitive systems showing visible indication of exposure

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6076735A (en) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol Photosetting resin composition
JPS6078442A (en) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol Photosetting resin composition
JPS6078443A (en) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol Photo-insoluble resin composition
ATE37242T1 (en) * 1984-02-10 1988-09-15 Ciba Geigy Ag PROCESS FOR PRODUCING A PROTECTIVE COATING OR A RELIEF IMAGE.
ES2396118T3 (en) * 2002-02-01 2013-02-19 Saint-Gobain Glass France S.A. Barrier layer made of a curable resin containing a polymer polyol
EP2485290A4 (en) 2009-10-01 2013-03-06 Hitachi Chemical Co Ltd Material for organic electronics, organic electronic element, organic electroluminescent element, display element using organic electroluminescent element, illuminating device, and display device
KR101537654B1 (en) 2010-04-22 2015-07-17 히타치가세이가부시끼가이샤 Organic electronic material, polymerization initiator and thermal polymerization initiator, ink composition, organic thin film and production method for same, organic electronic element, organic electroluminescent element, lighting device, display element, and display device
CN106939074B (en) 2013-03-08 2020-06-16 日立化成株式会社 Treatment liquid containing ionic compound

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (en) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition containing glycidyl ether and a polyvinyl acetal resin
BE522162A (en) * 1952-08-19
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (en) * 1965-09-17 1966-07-08 Air-heated fireplace door
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1516351A (en) * 1974-05-02 1978-07-05 Gen Electric Curable epoxide compositions
GB1516512A (en) * 1974-05-02 1978-07-05 Gen Electric Chalcogenium salts
GB1512982A (en) * 1974-05-02 1978-06-01 Gen Electric Salts
DE2551347A1 (en) * 1975-08-14 1977-02-24 Alusuisse Negative working light sensitive compsn. - contg. epoxide and polyvinyl acetal and/or short oil alkyd resins is dry and stable

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369A (en) * 1983-05-06 1984-11-07 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
US4659649A (en) * 1983-05-06 1987-04-21 Sericol Group Limited Photosensitive systems showing visible indication of exposure

Also Published As

Publication number Publication date
AU2553177A (en) 1978-11-30
MX145409A (en) 1982-02-04
FR2357931A1 (en) 1978-02-03
AU517415B2 (en) 1981-07-30
JPS6035930B2 (en) 1985-08-17
DE2730725C2 (en) 1990-08-16
NL7707609A (en) 1978-01-11
DE2730725A1 (en) 1978-01-12
JPS5322597A (en) 1978-03-02
FR2357931B1 (en) 1983-11-25
MX159499A (en) 1989-06-20
BR7704527A (en) 1978-04-25
NL183948B (en) 1988-10-03
NL183948C (en) 1989-03-01

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
746 Register noted 'licences of right' (sect. 46/1977)
PCNP Patent ceased through non-payment of renewal fee

Effective date: 19940527