MX159499A - Metodo mejorado para hacer un elemento fotoresistente a base de una composicion curable y un substrato - Google Patents

Metodo mejorado para hacer un elemento fotoresistente a base de una composicion curable y un substrato

Info

Publication number
MX159499A
MX159499A MX189147A MX18914777A MX159499A MX 159499 A MX159499 A MX 159499A MX 189147 A MX189147 A MX 189147A MX 18914777 A MX18914777 A MX 18914777A MX 159499 A MX159499 A MX 159499A
Authority
MX
Mexico
Prior art keywords
photoresistent
substrate
making
curable composition
improved method
Prior art date
Application number
MX189147A
Other languages
English (en)
Inventor
James Vincent Crivello
Original Assignee
Gen Electric
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric filed Critical Gen Electric
Publication of MX159499A publication Critical patent/MX159499A/es

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L29/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical; Compositions of hydrolysed polymers of esters of unsaturated alcohols with saturated carboxylic acids; Compositions of derivatives of such polymers
    • C08L29/14—Homopolymers or copolymers of acetals or ketals obtained by polymerisation of unsaturated acetals or ketals or by after-treatment of polymers of unsaturated alcohols
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
MX189147A 1976-07-09 1977-07-08 Metodo mejorado para hacer un elemento fotoresistente a base de una composicion curable y un substrato MX159499A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US70386076A 1976-07-09 1976-07-09
US73242176A 1976-10-14 1976-10-14

Publications (1)

Publication Number Publication Date
MX159499A true MX159499A (es) 1989-06-20

Family

ID=27107218

Family Applications (2)

Application Number Title Priority Date Filing Date
MX189147A MX159499A (es) 1976-07-09 1977-07-08 Metodo mejorado para hacer un elemento fotoresistente a base de una composicion curable y un substrato
MX169783A MX145409A (es) 1976-07-09 1977-07-08 Composicion curable mejorada

Family Applications After (1)

Application Number Title Priority Date Filing Date
MX169783A MX145409A (es) 1976-07-09 1977-07-08 Composicion curable mejorada

Country Status (8)

Country Link
JP (1) JPS6035930B2 (es)
AU (1) AU517415B2 (es)
BR (1) BR7704527A (es)
DE (1) DE2730725A1 (es)
FR (1) FR2357931A1 (es)
GB (1) GB1554389A (es)
MX (2) MX159499A (es)
NL (1) NL183948C (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4299938A (en) 1979-06-19 1981-11-10 Ciba-Geigy Corporation Photopolymerizable and thermally polymerizable compositions
GB2139369B (en) * 1983-05-06 1987-01-21 Sericol Group Ltd Photosensitive systems showing visible indication of exposure
JPS6078442A (ja) * 1983-10-04 1985-05-04 Agency Of Ind Science & Technol 光硬化性樹脂組成物
JPS6076735A (ja) * 1983-10-04 1985-05-01 Agency Of Ind Science & Technol 光硬化樹脂組成物
JPS6078443A (ja) * 1983-10-05 1985-05-04 Agency Of Ind Science & Technol 光不溶性樹脂組成物
ATE37242T1 (de) * 1984-02-10 1988-09-15 Ciba Geigy Ag Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.
WO2003064529A1 (en) * 2002-02-01 2003-08-07 Shell Solar Gmbh Barrier layer made of a curable resin containing polymeric polyol
TWI498350B (zh) 2009-10-01 2015-09-01 Hitachi Chemical Co Ltd 有機電子用材料、有機電子元件、有機電激發光元件、及使用其之顯示元件、照明裝置、顯示裝置
US10566105B2 (en) 2010-04-22 2020-02-18 Hitachi Chemical Company, Ltd. Method for producing charge transport film
CN106939074B (zh) 2013-03-08 2020-06-16 日立化成株式会社 含有离子性化合物的处理液

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1077246A (fr) * 1952-04-14 1954-11-05 Bataafsche Petroleum Composition contenant du glycidyléther et une résine de polyvinyl acétal
BE522162A (es) * 1952-08-19
US3552963A (en) * 1964-10-13 1971-01-05 Kalvar Corp Photographic vesicular materials and imaging process therefor
FR1456922A (fr) * 1965-09-17 1966-07-08 Porte de foyer à réchauffage d'air
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
GB1516352A (en) * 1974-05-02 1978-07-05 Gen Electric Halonium salts
GB1516512A (en) * 1974-05-02 1978-07-05 Gen Electric Chalcogenium salts
GB1512981A (en) * 1974-05-02 1978-06-01 Gen Electric Curable epoxide compositions
DE2551347A1 (de) * 1975-08-14 1977-02-24 Alusuisse Verfahren zur herstellung einer negativ arbeitenden, lichtempfindlichen masse

Also Published As

Publication number Publication date
BR7704527A (pt) 1978-04-25
AU2553177A (en) 1978-11-30
DE2730725C2 (es) 1990-08-16
GB1554389A (en) 1979-10-17
AU517415B2 (en) 1981-07-30
NL183948B (nl) 1988-10-03
NL7707609A (nl) 1978-01-11
DE2730725A1 (de) 1978-01-12
NL183948C (nl) 1989-03-01
FR2357931A1 (fr) 1978-02-03
FR2357931B1 (es) 1983-11-25
MX145409A (es) 1982-02-04
JPS5322597A (en) 1978-03-02
JPS6035930B2 (ja) 1985-08-17

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